TW200811598A - Radiation sensitive composition for forming a colored layer, color filter and color liquid crystal display device - Google Patents

Abstract

A radiation sensitive composition for forming a colored layer, comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a photoradical generator, wherein the alkali-soluble resin (B) comprises a polyester having an alicyclic hydrocarbon skeleton in the main chain and a polymerizable unsaturated bond in the side chain. The radiation sensitive composition for forming a colored layer does not produce the residual undissolved product or scum on the pattern edge at the time of development and provides a colored layer without a missing part of the pattern edge or an undercut even when the amount of exposure is small.

Description

200811598 (1) Description of the Invention [Technical Field] The present invention relates to a radiation-sensitive composition Λ, a color filter, and a color liquid crystal display device for forming a dye layer. In particular, it relates to a radiation-sensitive composition for forming a dyed layer, which can be used to manufacture color filters for use in transmissive and reflective color liquid crystal displays and color and color imaging devices. A color filter of the dyed layer obtained from the radiation-sensitive composition and a color liquid crystal display device comprising the color filter. [Prior Art] As a method of manufacturing a color filter using a color radiation-sensitive composition, a substrate in which a color radiation-sensitive composition is applied to a substrate or a light-shielding layer having a desired pattern is known, dried, and then dried. The coating film is exposed to radiation of a desired pattern (hereinafter referred to as "exposure") and developed to obtain a color pixel (refer to JP-A 2-144502 and JP-A 3-53201). In the technical field of color filters, the adhesive time is currently shortened by • reducing the amount of exposure, and it is highly desirable to form a finer pattern to reflect the higher clarity of the liquid crystal display device. However, when the adhesive time is shortened, it is difficult to obtain a satisfactory pixel pattern and a black matrix pattern from the color radiation-sensitive composition of the prior art because the edge portion of the pattern is easily lost or etched during development. The ability of prior art radiation-sensitive compositions to form extremely fine patterns cannot be said to be satisfactory. 200811598 (2) SUMMARY OF THE INVENTION The object of the present invention is to provide a radiation-sensitive composition for forming a dyed layer having excellent developability, in particular, a novel radiation-sensitive composition for forming a dyed layer, which does not The insoluble product remains at the time of development or a floating film is formed at the edge of the pattern, and a pixel and a black matrix having no missing or side etching of the pattern edge portion even when the exposure amount is low are provided, and a fine pattern can be formed. Another object of the present invention is to provide a color filter having a dyed layer and a color liquid crystal display device comprising the color filter. Other objects and advantages of the invention will be apparent from the description. According to the present invention, the foregoing objects and advantages are first attained by a radiation-sensitive composition comprising (A) a colorant, (B) a soluble resin, (C) a polyfunctional monomer, and (D) a photosensitive film. a radical generating agent, wherein the soluble resin (B) comprises a polyester having an alicyclic hydrocarbon skeleton in a main chain and a polymerizable unsaturated bond in a side chain, and the radiation-sensitive composition is used for dyeing Floor. The term "dyed layer" as used in the present invention means a thin layer composed of a pixel and/or a black matrix for use in a color filter. According to the present invention, secondly, the foregoing objects and advantages of the present invention are attained by a color filter having a dyed layer prepared from the aforementioned radiation-sensitive composition. According to the present invention, third, the above objects and advantages of the present invention are achieved by a color liquid crystal display device including the above-described color filter. The invention is described in detail below. 200811598 (3) [Embodiment] DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The radiation-sensitive composition component (A) - the component (A) as a colorant is not limited to the application purpose of a color filter prepared by a specific color. Appropriately selected, dye or natural coloring matter. Because of the color development and heat resistance of high-definition color, a coloring agent having high color rendering property and high heat resistance, and a heat-decomposable coloring agent are preferably used in the present invention, or an organic pigment or Inorganic pigments, good to use. Examples of the aforementioned organic pigments are based on colorimetric indicators! The compound returned by S ociety of Dyers and Colourists, in particular, has the following colorimetric index (C.I.

CI·Pigment Yellow 1, CI Pigment Yellow 3, CI Pigment Yellow 1, 3 · C · I · Pigment Yellow 1 4, C · I · Pigment Yellow 1 5, C (: 1. Pigment Yellow 17, (:.1) .Pigment Yellow 20, 匕1. Pigment Yellow Yellow 31, CI·Pig Yellow 55, CI·Pig Yellow 60, CCI·Pig Yellow 65, CI Pigment Yellow 71, CI·Pig Yellow 74, CI Pigment Yellow 81, CI· Pigment Yellow 83, CCI·Pig Yellow 95, CI Pigment Yellow 97, Cl·Pig Yellow 100, CI·Pig Yellow 101, CI·Pig Yellow 104, I Color, according to the pigment color filter It is especially necessary to have a high coloring agent. Therefore, pigment or carbon black (CI; The class is a group of pigments) numbered compound yellow 12, CI Yan. 1. Pigment Yellow 16, 24, CI Pigment I. Pigment Yellow 61, 7 3, C. I. Pigment I. Pigment Yellow 93, 98, C. I. Pigment::.I. Pigment Yellow 1 0 6 -7- 200811598 (4), CI Pigment Yellow 108, CI Pigment Yellow 109, CI Pigment Yellow 110, CI Pigment Yellow 113, CI Pigment Yellow 114, CI Pigment Yellow 116, CI Pigment Yellow 117, CL Pigment Yellow 119, CI Pigment Yellow 120, CI Pigment Yellow 126, CI Pigment Yellow 127, CI·Pig Yellow 128 , CI pigment 129, CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 15 1, CI·Pig Yellow 152, CI Pigment Yellow 153, CI·Pigment Yellow 154, C · I · Pigment Yellow 1 5 5, C · I. Pigment Yellow 1 5 6 , C · I · Pigment Yellow 1 6 6 , C . I · Pigment Yellow 168, CI Pigment Yellow 175, CI Pigment Yellow 180 and CI Pigment Yellow 1 8 5 ; C. I. Pigment Orange 1, C. I. Pigment Orange 5, C. I. Pigment Orange 1 3, CI Pigment Orange 14, CI Pigment Orange 16, CI Pigment Orange 17, CI Pigment Orange 2 4, C. I · Pigment Orange 3 4, C · I · Pigment Orange 3 6 , C · I. Pigment Orange 3 8 , C . I. Pigment Orange 4 0, C · I. Pigment Orange 4 3, C. I. Pigment Orange 4 6 , C. I. Pigment Orange 49, CI Pigment Orange 51, CI Pigment Orange 61, CI Pigment Orange 63, CI Pigment Orange 64, CI Pigment Orange 71 and CI Pigment Orange 73; CI Pigment Violet 1, CI Pigment Violet 19, CI Pigment Violet 23, CI Pigment Violet 29, CI·Pigment Violet 32, CI Pigment Violet 36 and CI Pigment Violet 38; C. I. Pigment Red 1, C. I. Pigment Red 2, C. I. Pigment Red 3, C. I. Pigment Red 4 , C. I. Pigment Red 5, C. I. Pigment Red 6, C. I. Pigment Red 7, C. I. Pigment Red 8, C. I · Red 9, C. I · Pigment Red 1 0, C · I. Pigment Red 1 1 , C . I. Pigment Red 1 2, C · I · Pigment Red 1 4, C · I · Pigment Red 1 5, C · I · Pigment Red 1 6 , C . I. Pigment Red 1 7 , C · I. Pigment Red 1 8 , C . I. Pigment Red 1 9 , C . I. Pigment Red 21 , CI Pigment Red 22 , CI Pigment Red 23, CI Pigment Red 30, C. I. Pigment Red 3 1 , C · I. Pigment Red 3 2, C. I. Pigment Red 3 7 , C . I · Pigment Red 3 8 , C · I · Pigment Red 4 0, C · I. Pigment Red 4 1 , C · I. Pigment Red 4 2, -8- 200811598 (5) CI Pigment Red 48 : 1, CI Pigment Red 48 : 2, CI · Pigment Red 48 : 3, C · 1 · Pigment Red 4 8 : 4, C . I. Pigment Red 4 9 : 1, C · I · Pigment Red 4 9 : 2 , C · I · Pigment Red 5 0 : 1, C · I · Pigment Red 5 2 : 1, C · I · Pigment Red 5 3 : ' 1, C · I · Pigment Red 5 7 , C · I · Pigment Red 5 7 : 1, c · 1 · Pigment Red 5 7 : 2 - , CI · Pigment Red 58 : 2, CI · Pigment Red 58 : 4, CI Pigment Red 60 : 1, C. I · Pigment Red 6 3 : 1, c · I · Pigment Red 6 3 ·· 2, C · I · Pigment Red 6 4 :1, CI·Pigment Red 81 : 1, CI·Pigment Red 83, CI Pigment Red 88 , C · I · Pigment Red 9 0 : 1, C. I. Pigment Red 9 7 , C · I · Pigment Red 1 〇 1, c · 1 · Pigment Red 1 0 2, C · 1 . Pigment Red 1 〇 4 , C · I · Pigment Red 1 〇 5, C · I · Pigment Red 106, CI·Pigment Red 108, CI Pigment Red 112, CI·Pigment Red 113, CI Pigment Red 114, CI Pigment Red 122, CI·Pigment Red 123, CI Pigment Red 144, CI Pigment Red 146, CI·Pigment Red 149, CI·Pigment Red 1 50, C · I · Pigment Red 1 5 1 , C · I · Pigment Red 1 6 6 , C · I · Pigment Red 1 6 8 , C . I · Pigment Red 1.7, C. I · Pigment Red 1 7 1 , C · I · Pigment Red 1 7 2, C · I · Pigment Red 1 7 4, C · I. Pigment Red 1 7 5, C · I · Pigment Red 1 7 6 , C · I · Pigment Red 1 7 7 , C · I · Pigment Red 1 7 8 , C · I. Pigment Red 1 7 9 , C · I · Pigment Red 1 80 0, C . I · Pigment Red 1 8 5, C . I · Pigment Red 1 8 7 , C · I · Pigment Red 1 8 8 , C · I · ' Pigment Red 1 9 0, C · I .Pigment Red 1 9 3, C · I · Pigment Red 1 9 4, C · I · Pigment - Red 2 0 2, C · I · Pigment Red 2 0 6 , C · I · Pigment Red 2 0 7 , C · I. Pigment Red 2 0 8 , C . I · Pigment Red 2 0 9 , C · I · Pigment Red 2 1 5, C · I · Pigment Red 2 1 6 , C · I · Pigment Red 2 2 0, C · I · Pigment Red 2 2 4, C · I · Pigment Red 2 2 6 , C · I · Pigment Red 2 4 2, C · I · Pigment Red 2 4 3, C . I · Pigment Red 2 4 5, C · I · Pigment Red 2 5 4 , CI· Pigment Red 25 5, CI·Pigment Red 264 and CI Pigment Red 265; C · I. Pigment Blue 1 5, C · I · Pigment Blue 1 5 : 3, C · I · Pigment Blue 1 5 : 4 -9- 200811598 (6), CI·Pigment Blue 15: 6 and CI·Pigment Blue 60; C · I. Pigment Green 7 and C. I · Pigment Green 3 6 ; CI·Pigment Brown 23 and CI Pigment Brown 25; and CI Pigment Black 1 and CI Pigment Black 7. These organic pigments can be purified by recrystallization of sulfuric acid, solvent washing or a combination thereof before use. Examples of the aforementioned inorganic pigments include titanium oxide, barium sulfate, calcium carbonate, zinc white, lead sulfate, yellow lead, zinc yellow, red iron oxide (red iron oxide (III)), cadmium red, ultramarine blue, Prussian blue, chromium oxide. Green, inscription, amber, titanium black, synthetic iron black and carbon black. In the present invention, the aforementioned pigments may be used singly or in combination of two or more kinds, or an organic pigment and an inorganic pigment may be used in combination. For example, it is preferred to form a pixel using one or more organic pigments, and it is preferred to form a black matrix using two or more organic pigments and/or carbon black. In the present invention, the surface of the particles of the pigment may be modified with a polymer as appropriate before use. Examples of the polymer for modifying the surface of the pigment particles include polymers disclosed in JP-A 8-259876 and polymers and oligomers which are commercially available for dispersing pigments. In the present invention, the colorant may optionally be used in combination with a dispersing agent. The dispersant is, for example, a cationic, anionic, nonionic, amphoteric, or a surfactant based on polyfluorene as a substrate or a fluorine-based substrate. Examples of the foregoing surfactant include polyethylene oxide alkyl ethers such as polyethylene oxide lauryl ether, polyethylene oxide stearyl ether, and polyethylene oxide oleyl ether; polyethylene oxide An alkylalkyl phenyl ether such as polyethylene oxide n-octyl-10- 200811598 (7) phenyl ether and polyethylene oxide n-decyl phenyl ether; polyethylene glycol diester such as polyethylene Alcohol dilaurate and polyethylene glycol distearate; sorbitan fatty acid ester; fatty acid modified polyester; tertiary amine modified polyamine-ethyl formate; and polyethylidene amine. The commercial trademarks of these surfactants are KP (Shen-Etsu Chemical, Co., Ltd.), Polyflow (

Ky o ei sha Kagaku C o. 5 Ltd. ) , F Top ( Tokem Products

Co., Ltd. ), Megafac ( Dainippon Ink and Chemicals,

Inc.), Florade (Sumitomo 3 M Limited ), Asahi Guard and Surflon (Asahi Glass Co., Ltd.), BYK and Disperbyk (BYK Chemie Japan Co., Ltd. ), Solsperse (Seneca

Co., Ltd.) and EFKA (EFKA Chemicals BV). These surfactants may be used singly or in combination of two or more. The amount of the surfactant is preferably 50 parts by weight or less, more preferably 0 to 30 parts by weight, based on 100 parts by weight of the coloring agent. In the present invention, the radiation-sensitive resin composition can be prepared by an appropriate method. When a pigment is used as a coloring agent, it is preferably mixed with an alkali-soluble resin (B) and a solvent in the presence of a dispersing agent, and dispersed therein, and milled by a bead mill or a roll mill to prepare a pigment dispersion. The dispersion, which is then mixed with the components (B), (C) and (D) described below. The amount of the dispersant used to prepare the aforementioned pigment dispersion is preferably 100 parts by weight or less, more preferably 0.5 to 1 part by weight, still more preferably 1 to 70 parts by weight, based on 100 parts by weight of the pigment. The number is preferably 10 to 50 parts by weight. When the amount of the dispersant is more than 100 parts by weight, the developability may be impaired. -11 - 200811598 (8) The solvent for preparing the aforementioned pigment dispersion can be used as a solvent for preparing a liquid radiation-sensitive resin composition as described below. The amount of the solvent used to prepare the pigment dispersion is preferably from 500 to 1,000 parts by weight, more preferably from 700 to 900 parts by weight, based on 100 parts by weight of the pigment. When a pigment dispersion is prepared using a bead mill, glass beads or titanium dioxide beads having a diameter of about 0.5 to 10 mm are mixed and dispersed with a pigment, preferably cooled by cooling water or the like. A solution comprising a pigment, a solvent and a dispersing agent. In this case, the beading rate of the beads is preferably from 50 to 80% by volume of the mill capacity, and the injection amount of the pigment-mixed solution is preferably from about 20 to 50% by volume of the mill capacity. The treatment time is preferably from 2 to 50 hours, more preferably from 2 to 25 hours. The pigment dispersion is prepared using a roll mill, and the three-roll mill or the two-roll mill mixes and disperses the pigment-mixed solution, preferably while cooling with cooling water or the like. The spacing between the rolls is preferably 1 〇 micrometer or less, and the shear force is preferably about 1 〇 8 dynes/second. The treatment time is preferably from 2 to 50 hours, more preferably from 2 to 25 hours. One component (B) - the component (B) in the present invention is an alkali-soluble resin containing a polyester having an alicyclic hydrocarbon skeleton in the main chain and having a polymerizable unsaturated bond in a side chain (hereinafter referred to as "( B) alkali-soluble resin"), component (B) is -12-200811598 (9) is a binder of coloring agent (A), and has solubility in an alkali developer used in a developing step for producing a dyed layer . Examples of the alicyclic hydrocarbon skeleton in the side chain unsaturated alicyclic polyester include: a skeleton derived from a hydrocarbon having 4 to 8 membered carbon rings: cyclopentane, methyl • cyclopentane, ethyl cyclopentane Alkane, n-propylcyclopentane, isopropylcyclopentane, 1-methyl-3-isopropylcyclopentane, cyclopentene, cyclohexene, methylcyclohexane, ethylcyclohexane, positive Propylcyclohexane, isopropylcyclohexane, 1-methyl-3-isopropylcyclohexane, 1-methyl-4-isopropylcyclohexane, cyclohexene, cycloheptane, A Cycloheptane, ethylcycloheptane, n-propylcycloheptane, isopropylcycloheptane, 1-methyl-3-isopropylcycloheptane, 1-methyl-4-isopropyl ring Heptane, cycloheptene, cyclooctane and cyclooctene. Among these alicyclic hydrocarbon skeletons, the skeleton having a cyclohexane ring is preferably 'derived from 1-methyl-3-isopropylcyclohexane and 1-methyl-4-isopropylcyclohexane. The skeleton is especially good. In the side chain unsaturated alicyclic polyester, the alicyclic hydrocarbon skeleton may form a main chain ester structure for interconnecting the structural units of the polyester directly or via a divalent bond group. Examples of the aforementioned divalent bond group include a methyl group and a linear or branched alkyl group having 1 to 6 'chain carbon atoms' such as a methyl group, an ethyl group, a propyl group, and a third group. And a tetra-butyl group; a cycloalkyl group having a carbon ring of 4 to 8 members, such as a cyclobutyl group, a cyclopentyl group, and a cyclohexylene group; having a cycloalkane bonded to a carbon ring having 4 to 8 members a group having a divalent hydrocarbon chain having 1 to 6 main chain carbon atoms (such as a methyl group, an ethyl group or a propyl group) such as a cyclopentylmethyl group, a cyclopentyl group, and an ethyl group. Cyclopentyl propyl-13- 200811598 (10), Cyclohexylmethyl, Cyclohexylethyl and Cyclohexyl propyl; aryl having 6 to 10 carbon atoms, such as 1, a 3-phenylene group, a 1,4-phenylene group, and a 1,4-naphthyl group; having a aryl group bonded to the aforementioned carbon atom of 6 to 10 members and having 1 to 6 main chain carbon atoms a group of divalent hydrocarbon chains (such as methyl, ethyl or propyl); an extended aryloxy group having 6 to 10 carbon atoms, such as m-phenyleneoxy (-m) -C6H4-0-) or p-phenyleneoxy (-p-C6H4-0-); A divalent hydrocarbon chain bonded to the extension in the aryloxy group and 1 to 6 main chain carbon atoms (such as methyl stretch, stretching or extending ethyl propyl) group. Among these divalent bond groups, an extended aryloxy group having 6 to 10 carbon atoms is preferred, and a p-phenyleneoxy group is particularly preferred. The polymerizable unsaturated bond in the side chain of the side chain unsaturated alicyclic polyester is not particularly limited, and is limited in that it is as described below when a radiation-sensitive composition for forming a dye layer is to be produced. The functional monomer (c) and optionally a monofunctional monomer are copolymerized. However, from the viewpoint of the ease of synthesizing the side chain unsaturated alicyclic polyester, it is preferably a self-polymerizable unsaturated carboxylic acid (such as (meth)acrylic acid, crotonic acid, maleic acid, % unsaturated bond derived from fumaric acid or isaconic acid, especially an unsaturated bond derived from (meth)acrylic acid. The side chain unsaturated alicyclic polyester of the present invention is particularly preferably a polyester represented by the following formula (1) (hereinafter referred to as "polyester (〇)) °

-14- 200811598 (11) [In the formula (1), each of X is independently a divalent group represented by the following formula (2) or (3), and each of Y is independently derived from an organic tetracarboxylic acid. The residue obtained by removing four carboxyl groups, each independently being a hydrogen atom or a methyl group 'r2' is a residue of a hydrogen atom or a carboxyl terminal blocking agent, and η is an integer of 1 to 40. ]

The side chain unsaturated alicyclic polyester can be synthesized by synthesizing a diol compound having an alicyclic hydrocarbon skeleton in a main chain and having a polymerizable unsaturated bond in a side chain, and having two or more diol compounds An acid anhydride of a carboxyl group (preferably 2 to 4 carboxyl groups, particularly preferably a tetracarboxylic anhydride) is obtained by subjecting an esterification reaction. The polyester (1) can be referred to as "tetracarboxylic dianhydride (8) from the diol compound containing a bis(meth) acrylonitrile group of the following formula (6) or (7) and represented by the following formula (8). The esterification reaction between tetracarboxylic dianhydrides is obtained. -15- 200811598 (12)

[In the formula (6), R1 is as defined in the formula (1). ]

[In the formula (7), R1 is as defined in the formula (1). 〇 〇

[In the formula (8), γ is as defined in the above formula (1). The following is mainly directed to the method of producing a side chain unsaturated alicyclic polyester for polyester (1). The diol compound containing a (meth) propylene fluorenyl group can be represented by the following formula (9), which is represented by the following formula (9), or hereinafter referred to as "diphenol (9)") or - (13) (13) 200811598) Diphenols (hereinafter referred to as "diphenol (10)") diglycidyl ether, synthesis of diglycidyl etherification of the following formula (11) or (12) The product is obtained by subjecting acrylic acid and/or methacrylic acid to an addition reaction with an epoxy group at both ends of the diglycidyl etherification product. Preferably, the diol compound containing the bis(meth)acrylonitrile group prepared as described above has an acid oxime of less than 10 mgKOH/g and an epoxy equivalent of 10, 〇〇〇 to 20,000.

-17- 200811598

When synthesizing the bis(meth)acrylonitrile-containing diol compound, it is desirable to use a weight of preferably 80 to 60··20 to 40 bisphenol (9) and diphenol (10), and the bisphenol can be used alone. Or two or more combinations are used. The diglycidyl etherification reaction between diphenols for synthesizing a diol compound containing a bis(meth)acryl fluorenyl group can be carried out according to a general method for synthesizing an epoxy resin. For example, the di(meth)acrylonitrile-containing diol compound can be synthesized by reacting diphenol with epichlorohydrin in the presence of a basic catalyst. The diglycidyl etherification product obtained as described above has an epoxy equivalent of 26 〇 ^ 300. The tetracarboxylic dianhydride (8) is not particularly limited, but is preferably a compound of the following formula (8, hydrazine), a compound represented by the following formula (8-2) or a formula (8-3): Compound. Ο Ο

-18- 200811598 (15) Ο ο ο ο

The method for producing an esterification reaction between a diol compound containing bis(meth)acryl fluorenyl group and tetracarboxylic dianhydride (8) is not particularly limited. For example, polyester (1) can be used. The diol compound containing di(meth)acryl fluorenyl group is dissolved in an organic solvent by heating, and tetracarboxylic dianhydride (8) is added to the formed solution, and reacted with each other under stirring. In the polyester (1) obtained by the above esterification reaction, R2 in the formula (1) is a hydrogen atom, and the residue of the tetracarboxylic dianhydride (8) has two or three carboxyl groups, so that the polyester (1) exhibiting excellent solubility in an aqueous alkali solution. In the present invention, at least a part of the free carboxyl group in the polyester (1) obtained by the esterification reaction may be blocked with a carboxyl blocking agent before use. The ratio of the terminal carboxyl group is adjusted to adjust the alkali solubility of the polyester (1). The above carboxyl terminal blocking agent is not particularly limited, and a known blocking agent such as glycidyl ether or carbodiimide can be used. For example, benzene Glycidyl ether, 4-n-butylphenyl glycidyl ether and resorcinol glycidyl ether Preferably, in the present invention, the acid oxime of the polyester (1) is preferably from 20 to 80 mg ΚΟΗ / 克, more preferably from 30 to 70 mg ΚΟΗ / 克. Depending on the type of the tetracarboxylic dianhydride ( 8 ) Preferably, it is preferred that the total amount of all r2 in the polyester (丨) is 5 〇 mol / 〇 or higher, more preferably 70 mol % or higher should be composed of hydrogen atoms 'to determine the high alkali developability. -19- 200811598 (16) The polyester (1) after being terminated with a carboxyl blocking agent is 60,000 or more. Since the polyester (1) has a plurality of poly(meth) or methacrylinyl groups, It is cured by exposure, and liquid. At the same time, it is soluble in the form of alkali water soluble film when it is not cured, leaving a solidified part, uncured, soluble in alkali aqueous solution and removed. Polyaldehyde material has high adhesion. The low curing shrinkage ratio and the excellent glass transition temperature (Tg) can form a high flexibility, and the polyester (1) has high flexibility when it is contained in the alicyclic hydrocarbon skeleton structure contained in the molecular main chain. , side chain unsaturated alicyclic polyester GPC) (dissolved solvent: tetrahydrofuran) measured by average molecular weight (hereinafter referred to as "Mw") 1 00,000, more preferably 5,000 to 25,000. At this time, flexibility or adhesion may be lowered, and when Mw may lower the photocurable or uncured base * (1), the MW may be adjusted by changing the amount of the organic solvent and the reaction. The side chain unsaturated alicyclic polyester by gel permeation solvent: tetrahydrofuran) is preferably measured in terms of polystyrene (hereinafter referred to as "Μη") in the range of 1,000: 2,000 to 25,000. The side chain unsaturated alicyclic polyester preferably has a epoxide group having a preferred epoxy group equivalent capacity to become insoluble in an aqueous alkali solution, so that it has an alkali development j ( 1 ) in a portion of the photoresist A variety of base heat resistant and high hardness photoresist films. The relatively soft knot is formed by gel permeation chromatography (the viscosity of the polystyrene is preferably from 3,0 0 至 to M w below the range above the above-mentioned range) solubility. Ester chromatography (GPC) (dissolved mass average molecular weight g 60,000, more preferably 60 to 70 mg-20-200811598 (17) KOH / gram of acid hydrazine to determine the high alkali solubility in the uncured state. The side chain unsaturated alicyclic polyester may be used singly or in combination of two or more. * In the present invention, another alkali-soluble resin may be used as an alkali-soluble resin in combination with the side chain unsaturated fat: a cyclic polyester. The other alkali-soluble resin is, for example, a polymerizable unsaturated monomer having an acid functional group (such as a carboxyl group), a phenolic hydroxyl group or a sulfonic acid group, and another copolymerizable unsaturated monomer different from the aforementioned monomer (hereinafter a copolymer called a "copolymerizable unsaturated monomer". Examples of the carboxyl group-containing polymerizable unsaturated monomer (hereinafter referred to as "carboxy group-containing unsaturated monomer") include unsaturated monocarboxylic acids such as ( Methyl) propyl Alkenoic acid, crotonic acid, α-chloroacrylic acid and cinnamic acid; unsaturated dicarboxylic acid and anhydride thereof, such as maleic acid, maleic anhydride, fumaric acid, isaconic acid, isaconic anhydride, Citraconic acid, citraconic anhydride and mesaconic acid; unsaturated polycarboxylic acid having three or more carboxyl groups and anhydride thereof; mono[(methyl)propene oxide having two or more carboxyl groups of polycarboxylic acid Alkyl]ester, such as mono[2-(methyl)propenyloxyethyl] succinate and mono [2-(*methyl)propenyloxyethyl] phthalate; a mono(meth)acrylate having a carboxyl group and a hydroxyl group-based polymer at the end, such as ω-carboxypolycaprolactone mono(meth)acrylate. The aforementioned carboxyl group-containing unsaturated monomer may be used alone or two or more. Various combinations are used. Examples of the aforementioned polymerizable unsaturated monomer having a phenolic hydroxyl group include o-hydroxystyrene, m-hydroxystyrene, p-hydroxystyrene, o-α--21-200811598 (18) A Hydroxystyrene, m-α-methylhydroxystyrene, p-α-methylhydroxystyrene, fluorene-o-hydroxyphenyl maleimide, hydrazine- -Hydroxyphenyl maleimide and fluorene-p-hydroxyphenyl maleimide. These polymerizable unsaturated monomers having a phenolic hydroxyl group may be used alone or as: two or more Examples of the polymerizable unsaturated monomer having a sulfonic acid group include isoprene-butadienesulfonic acid and p-styrenesulfonic acid. These polymerizable unsaturated monomers having a sulfonic acid group may be used alone or One or more combinations are used. Examples of the copolymerizable unsaturated monomer include a macromonomer having a mono(meth)acrylonitrile group at the end of the polymer chain (hereinafter referred to as "macromonomer"), such as polystyrene. , poly(methyl) methacrylate, poly(meth) butyl acrylate and poly methoxy hydride; Ν-aryl maleimide, such as fluorene-phenyl maleimide, _ _ o-hydroxyphenyl maleimide, hydrazine-m-phenylphenyl maleimide, 1-p-hydroxyphenyl maleimide, Ν-o-A Phenyl phenyl succinimide, hydrazine-m-methylphenyl cis-butyl quinone imine, Ν-p-methylphenyl maleimide, N-o-methoxy Phenyl maleimide, Ν _ m-methoxyphenyl cis-butene. styrene, Ν_p-methoxyphenyl maleimide and hydrazine-substituted cis Butene-imine, such as fluorene-cyclohexylmethyleneimine; aromatic ethoxylated compounds such as styrene, alpha-methylstyrene, o-vinyltoluene, m-vinyltoluene, P-vinyltoluene, p-chlorostyrene, o-methoxy styrene, m-methoxystyrene, p-methoxystyrene, o-ethylidene benzyl methyl ether, m-ethylene Benzyl methyl ether, p-ethylene-22- 200811598 (19) benzyl benzyl ether, o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether and p-vinyl Benzyl glycidyl ether; hydrazine, such as hydrazine and 1-methyl hydrazine; unsaturated carboxylic acid esters such as (meth) propylene; methyl ester, ethyl (meth) acrylate, n-propyl (meth) acrylate Ester, -isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate , 2-hydroxyethyl (meth)acrylate, 2-hydroxypropyl (meth)acrylate, 3-hydroxypropyl (meth)acrylate, 2-hydroxybutyl (meth)acrylate, (meth)acrylic acid 3-hydroxybutyl ester, 4-hydroxybutyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, cyclohexyl (meth)acrylate, phenyl (meth)acrylate , 2-methoxyethyl (meth)acrylate, 2-phenoxyethyl (meth)acrylate, methoxybisethylene glycol (meth) acrylate, methoxyethylene glycol (A) Acrylate, methoxypropylene glycol (meth) acrylate, methoxybispropanediol (meth) acrylate, isodecyl (meth) acrylate, dicyclopentadienyl (meth) acrylate, ( 2-hydroxy-3-phenoxypropyl methacrylate and glycerol mono(methyl)propenoate; aminoalkyl ester of unsaturated carboxylic acid, such as 2-ethylaminoethyl (meth)acrylate, 2-Dimethylaminoethyl (meth)acrylate, 2-aminopropyl (meth)acrylate, 2-dimethylaminopropyl (meth)acrylate Ester, 3-aminopropyl (meth)acrylate and methylaminopropyl (meth)acrylate; unsaturated glycidyl carboxylate such as glycidyl (meth)acrylate; vinyl carboxylate , such as vinyl acetate, @vinyl acetate, vinyl butyrate and vinyl benzoate; unsaturated ethers, such as -23- 200811598 (20) vinyl methyl ether, vinyl ethyl ether and allyl glycidol Vinyl cyanide compounds such as (meth)acrylonitrile, α-chloroacrylonitrile and vinylidene cyanide; unsaturated decylamines such as (meth) acrylamide, α-chloro' acrylamide and hydrazine 2-Hydroxyethyl (meth) acrylamide; aliphatic conjugate: dienes such as 1,3-butadiene, isoprene and chloroprene. In the present invention, the other alkali-soluble resin is preferably a copolymer of a carboxyl group-containing unsaturated monomer and a copolymerizable unsaturated monomer (hereinafter referred to as "carboxyl group-containing copolymer"), and more preferably a monomer of the following Copolymer of the mixture: (a) a carboxyl group-containing unsaturated monomer containing (meth)acrylic acid and (b) at least one selected from the group consisting of polystyrene macromonomers, polymethyl methacrylate macromonomers, and N-phenyl groups Maleimide, N-cyclohexylmethyleneimine, 2-hydroxyethyl (meth)acrylate, benzyl (meth)acrylate, and glycerol (meth)acrylate, and optionally (c) at least one selected from the group consisting of styrene, α-methylstyrene, methyl (meth)acrylate, allyl (meth)acrylate, and phenyl (meth)acrylate. The Mw of the other alkali-soluble resin is preferably from 2,000 to 300, more preferably from 3,000 to 100,000. Μη is preferably from 1, 至 to 60,000, more preferably from 2,000 to 25,000 °. In the present invention, the aforementioned alkali-soluble resins may be used singly or in combination of two or more. In the present invention, the total amount of the alkali-soluble resin is preferably from 1 to 1 in terms of 100 parts by weight of the coloring agent, more preferably 2 parts by weight to 5 parts by weight. . When the total amount of the alkali-soluble resin is less than 10 parts by weight, alkali developability may be lowered, or contamination or film residue may be generated on the unexposed portion of the substrate or the light-shielding layer -24-200811598 (21). When the total amount is more than 1,000 parts by weight, the concentration of the colorant becomes relatively low' and it may be difficult to attain the target color density of the film. The amount of the side chain unsaturated alicyclic polyester in the alkali-soluble resin is preferably from 10 to 100% by weight, more preferably from 20 to 100% by weight. When the amount of the side chain unsaturated alicyclic polyester is less than 1% by weight, the effects to be achieved by the present invention may be impaired. One component (c) - The component (C) of the present invention is a polyfunctional monomer having two or more polymerizable unsaturated bonds in the molecule. Examples of the polyfunctional monomer include alkanediols such as di(meth)acrylates of ethylene glycol and propylene glycol; polyalkylene glycols such as di(meth)acrylates of polyethylene glycol and polypropylene glycol a poly(meth) acrylate having a polyhydric alcohol having 3 or more hydroxyl groups and a dicarboxylic acid-modified product thereof such as glycerin, trimethylolpropane, isovaerythritol and diisopentaerythritol; (Meth) acrylates, such as polyesters, epoxies, urethane resins, alkyds, polyoxyxides, and spiro resins; polymers having hydroxyl groups at both ends, such as at both ends Hydroxy poly-1,3-butadiene, polyisoprene with hydroxyl groups at both ends, and di(meth)acrylate of polycaprolactone having hydroxyl groups at both ends; and phosphoric acid tri[ 2-(Methyl)propenyloxyethyl]ester. Among these polyfunctional monomers, polyhydric alcohols having 3 or more hydroxyl groups and poly(meth)acrylates thereof modified by dicarboxylic acid are preferred, and -25-200811598 (22) Examples are trihydroxyl Methylpropane triacrylate, trimethylolpropane trienoate, pentaerythritol triacrylate, isopentaerythritol trimethyl propyl, isoamyl alcohol tetraacrylate, isovaerythritol tetramethacrylate Ethyl pentaerythritol pentaacrylate, diisopentaerythritol pentamethyl acrylate, tetraol hexaacrylate, diisopentyl alcohol hexamethacrylate, and compounds represented by (13) and (14) . Ch2ococh=ch2 H2C=CHCOOCH2—c—CH20C0CH2CH2C00H (13) CH2〇COCH=CH2 ch3 ch3 ch2ococ=ch2 H2C=CCOOCH2—C—CH2OCOCH2CH2COOH (14) CH20COC——CH2 ch3 Among these compounds, trimethylolpropane triacrylate Ester, isotriacrylate and diisopentaerythritol hexaacrylate are particularly preferred because of their excellent strength and surface smoothness, and extremely less than the dyed layer of stain or film residue on the unshielded portion of the light-shielding layer. The aforementioned polyfunctional monomer may be used singly or in combination of two or more. The amount of the polyfunctional monomer of the present invention is 100 parts by weight of the base.

The resin (B) is preferably from 5 to 5,000 parts by weight, more preferably from P 3 00 parts by weight. When the amount of the polyfunctional monomer is less than 5 parts by weight, the strength and surface smoothness of the dye layer may be lowered, and when the part by weight is 500 parts by weight, the alkali developability may be lowered, or the unexposed material or the light shielding layer may be May cause contamination or film residue. -26- methacrylate, diisodiisoamyl pentaerythritol for use with a substrate or a combination of soluble I 20 to parts when the amount is higher than the fraction 200811598 (23) In the present invention, the polyfunctional single The body can be used in combination with a monofunctional monomer having a polymerizable unsaturated bond in the molecule. Examples of the aforementioned monofunctional monomer include the aforementioned other alkali-soluble tree: a carboxyl group-containing unsaturated monomer in a fat and a copolymerizable unsaturated monomer; the compound, N-(meth)acrylonitrile group Morpholine, N-vinylpyrrolidone, N-ethylcanyl-ε-caprolactam and commercially available M-5600 (trademark of Toagosei Chemical Industry Co., Ltd.). These monofunctional monomers may be used singly or in combination of two or more. The amount of the monofunctional monomer is preferably 90% by weight based on the total of the polyfunctional monomer and the monofunctional monomer. Or lower, more preferably 50% by weight or less. When the amount of the monofunctional monomer is more than 90% by weight, the strength and surface smoothness of the resulting coloring layer may become unsatisfactory. The total amount of the polyfunctional monomer and the monofunctional monomer in the present invention is preferably from 5 to 50,000 parts by weight, more preferably from 20 to 30,000 parts by weight based on 100 parts by weight of the alkali-soluble resin (B). Number of copies. When the total amount is less than 5 parts by weight, the strength and surface smoothness of the dye layer may be lowered, and when the total amount is more than 5 parts by weight, the alkali developability may be lowered, or the base portion of the unexposed portion may be lowered. Or contamination or film residue may form on the shading layer. (D) Photosensitive radical generator - The photoradical radical generator (D) of the present invention forms a radical upon exposure to radiation such as visible radiation, ultraviolet radiation, far ultraviolet radiation, charged particle radiation or X-radiation. For the compound, the free radical can be initiated by the polymerization of the polyfunctional monomer (c) and optionally the monofunctional monomer previously described in -27-(24)(24)200811598. The photoactive radical generating agent of the present invention is preferably a compound represented by the following formula (4) or (5) (hereinafter referred to as "carbazole-based compound (D1)).

[In the formulae (4) and (5), each R3 is independently a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or a phenyl group, and each R4 is independently a hydrogen atom and has 1 a linear, branched or cyclic alkyl group or a phenyl group of 12 carbon atoms, and R5 is a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, and each of R6 and R7 And R8 is independently a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, and is limited to an alkyl group represented by each of R3, R4, R5, R6, R7 and R8. Substituted by a substituent selected from a linear, branched or cyclic alkoxy group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, and represented by each of R3 and R4 -28 - 200811598 (25) a phenyl group may be substituted by a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, a linear, branched or cyclic alkoxy group having 1 to 6 carbon atoms, and a halogen atom. Substituted by the base. In the formulae (4) and (5), examples of the linear, branched or cyclic alkyl group having 1 to 12 carbon atoms represented by R3, R4 and R5 include a methyl group and an ethyl group. , n-propyl, isopropyl, n-butyl, isobutyl, t-butyl, tert-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-decyl, n-decyl, N-undecyl, n-dodecyl, cyclopentyl and cyclohexyl. Examples of the linear, branched or cyclic alkyl group having 1 to 6 carbon atoms represented by R6, R7 and R8 include methyl, ethyl, n-propyl, isopropyl, n-butyl and iso Butyl, second butyl, tert-butyl, n-pentyl, n-hexyl, cyclopentyl and cyclohexyl. a linear or branched chain having 1 to 6 carbon atoms in the alkyl group represented by R3, R4, R5, R6, R7 and R8 and the substituent on the phenyl group represented by R3 and R4 The cyclic alkoxy group includes, for example, a methoxy group, an ethoxy group, a n-propoxy group, an isopropoxy group, a n-butoxy group, and a third butoxy group, and the halogen atom includes, for example, a fluorine atom and a chlorine atom. 'In the substituent on the phenyl group represented by R3 and R4, a linear, branched or cyclic alkyl group having 1 \ to 6 carbon atoms includes, for example, a methyl group, an ethyl group, a n-propyl group or a different alkyl group. Propyl, n-butyl and tert-butyl. One or more substituents of the same or different type may be present on the alkyl group and the phenyl group. In the formulae (4) and (5), R3 is preferably a methyl group, an ethyl group, a n-propyl group, an isopropyl group, an n-butyl group or a phenyl group, and R4 is preferably a hydrogen atom, a methyl group or an ethyl group. N-propyl, isopropyl, n-butyl, n-pentyl, n-hexyl, n--29-200811598 (26) heptyl or n-octyl, R5 is preferably a hydrogen atom, a methyl group, an ethyl group, a n-propyl group A group, isopropyl or n-butyl, and each of R0, R7 and R8 is preferably a hydrogen atom, a methyl group, an ethyl group, a n-propyl group, an isopropyl group or an n-butyl group. Preferred examples of the carbazole-based compound (D 1 ) include i _ ; [9-ethyl-6-benzamide-9, Η--oxazol-3-yl]-decane- 1,2-decane-2-indole-indole-benzoic acid ester, 1-[9-ethyl-6-benzoguanidine-9·indole-oxazol-3-yl]-nonane-1 2-壬院-2-肟-0-acetate, 1-[9-ethyl-6-benzamide-9.11.-oxazol-3-yl]-pentane-1,2-pentane- 2-肟-0-acetate, 1-[9-ethyl-6-benzamide-9.Η--oxazol-3-yl]-octane-1-one oxime-0-acetate , 1-[9-ethyl-6-(2-methylbenzhydrazin)-9·Η·-oxazol-3-yl]-ethane-1-one oxime-indole-benzoate, 1 -[9-ethyl-6-(2-methylbenzhydrazide)-9.11.-oxazol-3-yl]-ethane-1-one oxime-indole-acetate, 1-[9-B -6-(1,3,5-trimethylbenzhydrazide)-9.H.-oxazol-3-yl]-ethane-1-one oxime-0-benzoate and 1-[ 9-n-Butyl-6-(2-ethylbenzhydrazide)-9.11.-oxazol-3-yl]-ethane-1-one oxime-indole-benzoate. 1-[9-ethyl-6-(2-methylbenzhydrazin)-9·Η·-oxazol-3-yl]-ethane in the carbazole-based compound (D1) 1- Ketone oxime-〇-acetate is particularly preferred. In the present invention, the carbazole-based compound (D1) may be used singly or in combination of two or more. In the present invention, a photoradical generating agent other than the carbazole-based compound (D 1 ) (hereinafter referred to as "another photoradical generating agent") can be used. The other photoactive radical generating agent is, for example, a compound based on biimidazole, a compound based on benzoin, a compound based on acetophenone-30-200811598 (27), and benzophenone. a compound that is a substrate, a compound based on α-diketone, a compound based on polycyclic oxime, a compound based on xanthone, a compound based on phosphine or a substrate based on triterpene A compound having at least one main skeleton represented by the following formula (15-1), (15-2) or (15-3).

Examples of the aforementioned biimidazole-based compound include 22,-(2-chlorophenyl)-4,4',5,5'-tetrakis(4-ethoxycarbonyl ruthenium, _ taste wow , 2,2,-bis(2-indolyl)-4,4·,5,5,-tetrakis(4ethoxycarbonylphenyl)-1,2'-biimidazole, 2,2'-double (2-Chlorophenyl)-4,4, sym glycan 5 J,]-tetrabenyl-1,2,biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4, 4,5,5, tetraphenyl 1,2, biimidazole, 2,2,-bis(2,4,6-trichlorophenyl)-4,4,5,5, tetraphenyl 1, 2'-biimidazole, 2,2'-bis(2-bromophenyl)-4,4',5,5, tetraphenyl-indole 2, biimidazole, 2,2'-bis (2,4- Dibromophenyl)-4,4',5,5, tetraphenyl-indole 2, biimidazole and 2,2'-bis(2,4,6-tribromophenyl)-4,4',5, 5, tetraphenyl _12, biimidazole. These compounds are based on biimidazole as '2,2, bis (2_ stomach $ # -31 - 200811598 (28) )-4,4,5, 5'-Tetraphenyl-1,2'biimidazole, 2,2'-bis(2,4-dichlorophenyl)-4,4,5,5--tetraphenyl-1,2'-biimidazole And 2,2'-bis(2,4,6-trichlorophenyl)-4,4',5,5'-tetraphenyl-1,2'-biimidazole is preferred, 2,2'-bis(2-chlorobenzene:yl)_4,4',5,5'-tetraphenyl-l,2f-biimidazole is preferred. - Hydrogen donor should be used as biphenyl. When the compound is used as the photoradical generating agent of the present invention, it is preferably used in combination with the following hydrogen donor to further improve the sensitivity. The term "hydrogen donor" as used in the present invention means that a hydrogen atom can be supplied upon exposure. A compound derived from a radical formed by the biimidazole-based compound. The hydrogen donor is preferably a thiol-based compound or an amine-based compound as defined below. The thiol-based compound is a compound having a benzene ring or a heterocyclic ring as a mother nucleus and one or more, preferably 1 to 3, more preferably 1 or 2 thiol groups directly bonded to the mother nucleus. (hereinafter referred to as "thiol-based" "hydrogen donor"). 'The above-mentioned amine-based compound is a benzene ring or a heterocyclic ring as a mother nucleus and one or more, preferably 1 Up to 3, more preferably 1 or 2 compounds directly bonded to the amine group of the mother nucleus (hereinafter referred to as "amine-based hydrogen donor j") The donor may have both a thiol group and an amine group. These ammonia donors are described in detail below. -32- 200811598 (29) A thiol-based gas donor may have at least one benzene ring or heterocyclic ring or Both. When it has two or more of such rings, a fused ring may be formed. When the thiol-based hydrogen donor has two or more thiol groups, " 'as long as at least A free sulfur thio group, at least one of the other thiol groups can be replaced by a hospital base, a aryl group or an aryl group. Further, as long as at least one free thiol group is retained, the thiol-based hydrogen donor may have a structural unit in which two sulfur atoms are bonded via a divalent organic group (such as an alkylene group) or two of them A structural unit in which an atom is bonded in the form of a disulfide. Further, the thiol-based hydrogen donor may be substituted at a position other than the thiol group (etc.) by a carboxy group, a substituted or unsubstituted alkoxycarbonyl group, substituted or unsubstituted. Substituted phenoxycarbonyl or nitrile group. Examples of such thiol-based hydrogen donors include 2-hydrothiobenzothiazinium, 2-hydrothiobenzobenzene, and 2-hydrothiobenzopyrene, 2,5. - Dihydrothio-1,3,4-thiadiazole and 2-hydrosulfanyl-2,5-dimethylamino hydrazine are compared to these thiol-based hydrogen donors. -Hexylthiobenzothiazepine D and 2-hydrothiobenzoxanthroquinone are preferred, and 2-hydrothiobenzothiazinium is particularly preferred. The amine-based hydrogen donor may have at least one benzene ring or heterocyclic ring or two. When it has two or more of such rings, a fused ring can be formed. At least one amine group of the amine-based hydrogen donor may be substituted with an alkyl group or a substituted alkyl group. The amine-based hydrogen donor may be substituted at a position other than the amine group (etc.) by a carboxyl group, a substituted or unsubstituted oxynitride group, substituted or unsubstituted. Phenoxy amine or nitrile group. -33- 200811598 (30) Examples of the aforementioned amine-based hydrogen donor include 4,4f-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino) Benzophenone, 4-diethylaminoethenylbenzene, 4-dimethylaminopropyl phenyl benzene, ethyl-4-: dimethylamino benzoate, 4-dimethyl Isoamyl benzoate, 4-di; methylaminobenzoic acid and 4-dimethylaminobenzonitrile. Among these amine-based hydrogen donors, 4,4'-bis(dimethylamino)benzophenone and 4,4.-bis(diethylamino)benzophenone are preferred. And 4,4f-bis(diethylamino)benzophenone is particularly preferred. 4,4'-bis(dimethylamino)benzophenone and 4,4'-bis(diethylamino)benzophenone can be used alone as a photoradical generator, even when bi-imidazole When the compound as a substrate is not present. In the present invention, the aforementioned hydrogen donors may be used singly or in combination of two or more. It is preferred to use at least one thiol-based hydrogen donor and at least one amine-based hydrogen donor composition because the resulting dyed layer hardly detaches from the substrate during development and has High strength and sensitivity. Preferred examples of the composition of the thiol-based hydrogen donor and the amine-based hydrogen donor include thiosulfonylthiazole and 4,4,-bis(dimethylamino) a composition of benzophenone, a composition of thiophanebenzothiazole and '4,4'-bis(diethylamino)benzophenone, 2-hydrothiobenzobenzo B I1 Composition of 4,4 ' _bis(dimethylamino)benzophenone and 2-hydrothiobenzophenanthrene D and 4,4,-bis(diethylamino)benzophenone combination. Compositions of thiothiobenzothiazole and 4,4,-bis(diethylamino)benzophenone and 2-hydrothiobenzoxazole and 4,4·-double in such compositions A compound of (diethylamino)benzophenone is preferred, and 2-hydrothio-34-200811598 (31) benzothiazole and 4,4'-bis(diethylamino)benzophenone The composition is particularly good. The thiol-based hydrogen donor and the amine-based hydrogen donor: in the composition, the thiol-based hydrogen donor is relative to the amine-based hydrogen: donor The weight is preferably from 1:1 to 1:4, more preferably from 1:1 to 1:3. Examples of the aforementioned benzoin-based compound include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl. Ether, benzoin butyl ether and methyl 2-benzoin benzoate. Examples of the aforementioned acetophenone-based compound include 2,2-dimethoxyacetamidine, 2,2-diethoxyethyl benzene, and 2,2-dimethoxy-2-phenyl. Ethyl acetate, 2-carbyl-2-methyl-1-phenylpropan-1-oxime, 1-(4-isopropylphenyl)-2-pyridyl-2-methylpropan-1- Ketone, 2-methyl-(4-methylthiophenyl-2-morpholine-1-propan-1-one, 4-(2-hydroxyethoxy)phenyl-2-(hydroxy-2-propanol Ketone, 2-benzyl-2-dimethylamino-1-(4-morpholinyl)butan-one, 1-hydroxycyclohexyl phenyl ketone and 2,2-dimethoxy -; i, 2_diphenylethyl-; 1 ketone. Examples of a 'substituted thiol as a substrate compound include 4,4 '-bis(dimethylamino)diphenyl ketone And 4,4'-bis(diethylamino)diphenyl ketone. BU is an example of a compound containing α - - 嗣 as a substrate.

Examples of the polycyclic awakening as a substrate compound include hydrazine, 2-ethyl hydrazine, 2-tert-butyl fluorene, and 1,4-naphthoquinone. -35- 200811598 (32) The foregoing examples of the xanthone as a substrate compound include xanthone, thioxanthone and 2-chloroxanthone. Examples of the aforementioned phosphine-based compound include bis(2,4,6-trimethylbenzylidene)phenylphosphine oxide and 2,4,6-trimethylbenzhydryldiphenylphosphine oxide. . Examples of the aforementioned triterpenoid compound include a triterpenoid compound having a halomethyl group such as 2,4,6-tris(trichloromethyl)-s-triterpene, 2-methyl-4,6-. Bis(trichloromethyl)-s-triazine, 2-[2-(furan-2-yl)vinyl]-4,6-bis(trichloromethyl)-3 triterpene, 2-[2- (5-methylfuran-2-yl)vinyl]-4,6-bis(trichloromethyl)-s-triterpene, 2-[2-(4-diethylamino-2-methyl Phenyl)vinyl]-4,6-bis(trichloromethyl)-s-three tillage, 2-[2-(3,4-dimethoxyphenyl)vinyl]-4,6-double (trichloromethyl)-s-triterpene, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triterpene, 2-(4-ethoxybenzene Vinyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-n-butoxyphenyl)-4,6-bis(trichloromethyl)+trimium, lower a compound of the formula (16) and (17).

In the present invention, the photoradical generating agent may be used singly or in combination of two or more -36-200811598 (33). In the present invention, the photo-sensitive radical generating agent may optionally be used together with at least one sensitizer, curing accelerator and polymer photocrosslinking/sensitizer. In the present invention, the amount of the photoradical generating agent is preferably 0.01 to 200 by weight based on 100 parts by weight of the polyfunctional monomer (C) or the total of the polyfunctional monomer and the monofunctional monomer. The number of parts is more preferably from 1 to 120 parts by weight, particularly from 1 to 100 parts by weight. When the amount of the photoradical generating agent is less than 0.01 part by weight, the curing by exposure is incomplete, and it may be difficult to obtain a pattern array having a predetermined pixel pattern or a black matrix pattern. When the amount is more than 200 parts by weight, the formed dye layer is liable to be detached from the substrate during development or to cause substrate contamination or residual film or the like on the substrate or the light-shielding layer of the unexposed portion. When the carbazole-based compound (D1) and another photoradical generating agent are combined as a photoradical generating agent in the present invention, the amount of the other photoradical generating agent is based on the carbazole The total amount of the compound (D 1 ) and the other photoradical generating agent is preferably 50% by weight, % by weight or less, more preferably 30% by weight or less. An Additive I The radiation-sensitive composition of the present invention for forming the dyed layer of the present invention may optionally contain various additives. The foregoing additives include an organic acid or an organic amine-based compound (excluding the aforementioned hydrogen donor) to further improve the solubility of the radiation-sensitive composition in the alkali-developing agent and further inhibit the residue after development. Insoluble product production. The above organic acid is preferably an aliphatic group having at least one carboxyl group in the molecule: a carboxylic acid or a carboxylic acid having a phenyl group. Examples of the aforementioned aliphatic carboxylic acid include monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, pivalic acid, caproic acid, diethyl acetic acid, heptanoic acid, and octanoic acid; dicarboxylic acids such as Oxalic acid, malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, basic acid, methylmalonic acid, ethylmalonic acid, two Methylmalonic acid, methyl succinic acid, tetramethyl succinic acid, cyclohexane dicarboxylic acid, isaconic acid, citraconic acid, maleic acid, fumaric acid and mesaconic acid; and tricarboxylic acid Acids such as glycerol, aconitic acid and camphorone acid. The phenyl group-containing carboxylic acid is, for example, a compound having a carboxyl group directly bonded to a phenyl group or a carboxylic acid having a phenyl group bonded via a carbon chain. Examples of the phenyl group-containing carboxylic acid include aromatic monocarboxylic acids such as benzoic acid, toluic acid, lauric acid, benzotricarboxylic acid, and dimethylbenzoic acid; aromatic dicarboxylic acids such as phthalic acid, Anisophthalic acid and terephthalic acid; an aromatic polycarboxylic acid having 3 or more carboxyl groups, such as trimellitic acid, trimellitic acid, 'tetradecanoic acid and pyromellitic acid; and phenylacetic acid, hydrogenated Atropic acid, hydrogenated cinnamic acid, mandelic acid, phenyl acid, atopic acid, cinnamic acid, cinnamic acid, coumaric acid and chelating acid. Among these organic acids, the aliphatic di-residual acid is preferred from the viewpoints of alkali solubility, solubility in a solvent described below, and prevention of contamination and film residue on a substrate or a light-shielding layer of an unexposed portion. And malonic acid, hexamethylene-38-200811598 (35) acid, isaconic acid, citraconic acid, fumaric acid and mesaconic acid are particularly preferred aliphatic carboxylic acids. The aromatic dicarboxylic acid is preferred, and the phthalic acid is a particularly preferred carboxylic acid containing a phenyl group. : The aforementioned organic acids may be used singly or in combination of two or more. The amount of the organic acid is preferably 15% by weight or less, more preferably 10% by weight or less, based on the total radiation-sensitive composition. When the amount of the organic acid is more than 15% by weight, the adhesion of the formed dye layer to the substrate may be lowered. The above organic amine-based compound is preferably an aliphatic amine or a phenyl group-containing amine having at least one amine group in the molecule. Examples of the aforementioned aliphatic amines include mono(cyclo)alkylamines such as n-propylamine, isopropylamine, n-butylamine, isobutylamine, second butylamine, tert-butylamine, positive Amylamine, n-hexylamine, n-heptylamine, n-octylamine, n-decylamine, n-decylamine, n-undecylamine, n-dodecylamine, cyclohexylamine, 2-methyl Cyclohexylamine, 3-methylcyclohexylamine, 4-methylcyclohexylamine, 2-ethylcyclohexylamine, 3-ethylcyclohexylamine, and 4-ethylcyclohexylamine; di(cyclo)alkyl Amines such as methyl ethylamine, diethylamine, methyl " propyl-n-propylamine, ethyl-n-propylamine, di-n-propylamine, di-isopropyl-amine, di- n-Butylamine, di-isobutylamine, di-secondbutylamine, di-tert-butylamine, di-n-pentylamine, d-n-hexylamine, methylcyclohexylamine, ethyl ring Hexylamine and dicyclohexylamine; tri(cyclo)alkylamines such as dimethylethylamine, methyldiethylamine, triethylamine, dimethyl-n-propylamine, diethyl • n-propylamine, methyl • di-n-propylamine, ethyl • di-n-propylamine, tri- N-propylamine, tri-isopropylamine, tri-n-butylamine, tri-iso-39- 200811598 (36) butylamine, tri-tert-butylamine, tri-tert-butylamine, three - n-pentylamine, tri-n-hexylamine, dimethylcyclohexylamine, diethylcyclohexylamine, methyldicyclohexylamine, ethyldicyclohexylamine and tricyclohexylamine; mono(cyclo): Alkanolamines, such as 2-aminoethanol, 3-amino-1-propanol, 1-amino-2-propanol, alcohol, 4-amino-1-butanol, 5-amino-1-pentane Alcohol, 6-amino-1-hexanol and 4-amino-1-cyclohexanol; di(cyclo)alkanolamines, such as diethanolamine, di-n-propanolamine, di-isopropanolamine, two - n-butanolamine, di-isobutanolamine, di-n-pentanolamine, di-n-hexanolamine and bis(4-cyclohexanol)amine; tri(cyclo)alkanolamines such as triethanolamine, tri- N-propanolamine, tri-isopropanolamine, tri-n-butanolamine, tri-isobutanolamine, tri-n-pentanolamine, tri-n-hexanolamine and tris(4-cyclohexanol)amine; amine Base (cyclo)alkanediols, such as 3-amino-1,2-propanediol, 2-amino-1,3-propanediol, 4-amino-1,2-butanediol, 4 -amino-1,3-butanediol 4-amino-1,2-cyclohexanediol, 4-amino-1,3-cyclohexanediol, 3-dimethylamino-1,2-propanediol, 3-diethyl Amino-1,2-propanediol, 2-dimethylamino-1,3-propanediol and 2-diethylamino-1,3-propanediol; amine-containing naphthenes Methanol, such as 1-aminocyclopentane methanol, 4-aminocyclopentane methanol, 1-aminocyclohexane methanol, 4-" aminocyclohexane methanol, 4-dimethylaminocyclopentane Alkanol, 4-diethylamine\cyclopentane methanol, 4-dimethylaminocyclohexane methanol and 4-diethylaminocyclohexane methanol; and aminocarboxylic acid such as A-propylamine Acid, 2-aminobutyric acid, 3-aminobutyric acid, 4-aminobutyric acid, 2-aminoisobutyric acid, 3-aminoisobutyric acid, 2-aminopentanoic acid, 5-amino group Valeric acid, 6-aminohexanoic acid, 1-aminocyclopropanecarboxylic acid, chlorocyclohexanecarboxylic acid and 4-aminocyclohexanecarboxylic acid. The aforementioned phenyl group-containing amine is, for example, a compound having an amine group -40 - 200811598 (37) directly bonded to a phenyl group or a compound having an amine group bonded to a phenyl group via a carbon chain. Examples of the phenyl group-containing amine include aromatic amines such as aniline, 2-methylaniline, 3-methylaniline, 4-methylaniline, 4-ethylaniline, 4-n-propyl-phenylaniline, 4 -Isopropylaniline, 4-n-butylaniline, 4-tert-butylaniline; ,naphthylamine, 2-naphthylamine, N,N-dimethylaniline, N,N-diethylaniline and 4 -methyl-N,N-dimethylaniline; aminobenzyl alcohol such as 2-aminobenzyl alcohol, 3-aminobenzyl alcohol, 4-aminobenzyl alcohol, 4-dimethylamine Base benzyl alcohol and 4-diethylaminobenzyl alcohol; and aminophenols such as 2-aminophenol, 3-aminophenol, 4-aminophenol, 4-dimethylaminophenol and 4 - diethylamine based. Among these organic amine-based compounds, mono(cyclo)alkanolamines and amines from the viewpoints of solubility in a solvent described below and prevention of contamination or film residue on a substrate or a light-shielding layer of an unexposed portion Alkyl (cyclo)alkane is preferred, and 2-aminoethanol, 3-amino-1-propanol, 5-amino-1-pentanol, 3-amino-1,2-propanediol, 2-Amino-1,3-propanediol and 4-amino-1,2-butanediol are particularly preferred aliphatic amines. The aminophenol is preferred, and the 2-aminophenol, 3-aminophenol and 4-aminophenol are particularly preferred phenylamine-containing amines. " The aforementioned organic amine-based compounds may be used singly or in combination of two or more. The amount of the organic amine-based compound is preferably 15% by weight or less, more preferably 10% by weight or less based on the total radiation-sensitive composition. When the amount of the organic amine compound is more than 15% by weight, the adhesion of the formed dye layer to the substrate may be lowered. Additives other than the aforementioned organic acids and organic amine-based compounds include -41 - 200811598 (38) dispersing assistants such as blue pigment derivatives or yellow pigment derivatives, benzahed cyanine derivatives; anthraquinones such as glass Or alumina; a polymer compound such as polyvinyl alcohol, polyethylene glycol monoalkyl ether or poly(fluoro: acrylate); nonionic, cationic or anionic interface:; adhesion accelerator, such as ethylene Trimethoxy decane, vinyl tridecane, vinyl tris(2-methoxyethoxy)decane, N-(2-ethyl)-3-aminopropyl•methyl•dimethoxy Decane, N-(2-amino)-3-aminopropyltrimethoxydecane, 3-aminopropyltriethoxy, 3-glycidoxypropyltrimethoxydecane, 3-glycidol Oxy-methyl-dimethoxydecane, 2_(3,4-epoxycyclohexyl)ethoxymethoxydecane, 3-chloropropyl•methyl•dimethoxydecane, 3-chloropropane Oxydecane, 3-methacryloxypropyltrimethoxydecane or thiopropyltrimethoxynonane; antioxidants such as 2,2·-thio-4-methyl-6- Tributylphenol) or 2,6-di-t-butylphenol; UV-receptor, such as 2-(3-tert-butyl-5-methyl-2-hydroxyphenyl)-5-triazole Or alkoxybenzophenone; a binding inhibitor such as polypropylene; and a thermal radical generator such as 1, Γ-azobis(cyclohexane) or 2-phenylazo-4 -Methoxy-2,4-dimethylvaleronitrile. Solvent The radiation-sensitive composition of the present invention for forming a dyed layer comprises components (A) to (D) as a basic component and optionally a pre-additive, usually mixed with a solvent, to prepare a liquid composition. A suitable solvent may be selected and used as long as it is dispersed or dissolved, for example, the physicochemical base agent ethoxylated ethyl decyl propyl trisyltris 3-trihydro bis (sodium chlorobenzoate small nitrile) Radiation-42- 200811598 (39) The components (A) to (D) and additives of the sensitive composition are not reacted with these components and have appropriate volatility. Examples of solvents include (poly)alkanes. a diol monoalkyl ether such as ethylene: alcohol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono-n-propyl ether, ethylene; glycol mono-n-butyl ether, diethylene glycol Monomethyl ether, bisethylene glycol monoethyl ether, bisethylene glycol mono-n-propyl ether, bisethylene glycol mono-n-butyl ether, ginseng ethylene glycol monomethyl ether, ginseng ethylene glycol Ethyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol mono- N-propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol monomethyl ether and tripropylene glycol monoethyl ether; (poly)alkylene glycol monoalkyl ether Esters such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, bisethylene glycol monomethyl ether acetate, bisethylene glycol monoethyl ether acetate, propylene glycol Monomethyl ether acetate and propylene glycol monoethyl ether acetate; other ethers such as bisglycol dimethyl ether, bisethylene glycol methyl ethyl ether, diethylene glycol diethyl ether and tetrahydrofuran Ketones such as methyl ethyl ketone, cyclohexanone, 2-heptanone and 3-heptanone; alkyl lactates such as methyl lactate and ethyl lactate; other esters, 'such as 2-hydroxy-2-methyl Ethyl propionate, methyl 3-methoxypropionate, ethyl 3-methyl'oxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethoxyacetic acid Ethyl ester, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutylpropane Acid ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, n-amyl formate, isoamyl acetate, n-butyl propionate, ethyl butyrate, butyric acid N-propyl ester, isopropyl butyrate, n-butyl butyrate, C-43-2 00811598 (40) Methyl ketone, ethyl pyruvate, n-propyl pyruvate, methyl acetoxyacetate, ethyl acetoxyacetate and ethyl 2-oxybutyrate; aromatic hydrocarbons such as toluene And xylene; and decylamine and indoleamine such as N,N-dimethylformamidine: amine, N,N-dimethylacetamide and N-methylpyrrolidinone. : Solubility, pigment dispersion From the viewpoints of properties and coatability, among these solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate , diethylene glycol dimethyl ether, bisethylene glycol methyl ethyl ether, cyclohexanone, 2-heptanone, 3-heptanone, ethyl lactate, ethyl 3-methoxypropionate, 3- Methyl ethoxypropionate, ethyl 3-ethoxypropionate, 3-methyl-3-methoxybutylpropionate, n-butyl acetate, isobutyl acetate, n-amyl formate, acetic acid Isoamyl ester, n-butyl propionate, ethyl butyrate, isopropyl butyrate, n-butyl butyrate and ethyl pyruvate are particularly preferred. The foregoing solvents may be used singly or in combination of two or more. In addition, high boiling solvents such as benzyl ethyl ether, di-n-hexyl ether, acetone acetone, isophorone, caproic acid, octanoic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl b Acid ester, ethyl benzoate, diethyl oxalate, diethyl cis-butenedioate, γ-butyrolactone, ethyl carbonate, propyl carbonate or *. ethylene glycol monophenyl ether The acetate can be used in combination with the aforementioned solvent. These high boiling solvents may be used singly or in combination of two or more. The amount of the solvent is not particularly limited, but from the viewpoint of the coatability and stability of the resulting radiation-sensitive composition, it is desirable to determine that the total amount of all components other than the solvent of the composition becomes preferably 5 to 50% by weight, particularly preferably 10 to 40% by weight. -44- 200811598 (41) Color filter The color filter of the present invention has a dyed layer formed by the present invention for forming a dye-sensitive composition. The following description forms a dyed layer in the color filter of the present invention, as appropriate, to form a light-shielding layer on the surface of the substrate to define a portion for applying a liquid radiation-sensitive composition (which includes, for example, a red pigment, for example) to the substrate. On the top, prebaking to form a coating film by evaporation. The coating film is then exposed to radiation via a reticle, developed with a base, dissolved and removed from the unexposed portions of the coating film, and post-baked with an array of pixels of a predetermined red pixel pattern. Thereafter, the same method is applied to apply, pre-bake, expose, and bake the green and blue liquid radiation-sensitive composition dispersed therein to form a green pixel array and array on the same substrate sequentially to obtain the substrate. It has red, green and blue color filters. The order in which the present invention forms a color pixel is not limited to the black matrix and can be formed using a liquid radiation-sensitive composition such as a black pigment dispersed therein. The substrate used to form the pixel and/or black matrix is made of glass polycarbonate, polyester, aromatic polyamine, polyamidamine-imine amine. The substrate may be suitably pretreated as appropriate, such as chemical treatment of the coupling agent, plasma treatment, ion plating, sputtering, or vacuum deposition. The method of the spokes of the color layer. A pixel is formed in which the solvent is dispersed, and the developer is baked to form a developing of the color pigment and the latter of the rear blue pixel array. It comprises glaze, sand, or poly phthalene using decane, gas opposite -45- 200811598 (42). When applying the liquid radiation-sensitive composition to the substrate, suitable coating techniques such as spraying, roll coating may be employed. , spin coating (spin coating), slit extrusion coating, rod coating or inkjet coating. Among these methods, spin coating and slit extrusion coating are preferred. The thickness of the coating film after drying is preferably from 0.1 to 10 μm, more preferably from 0.2 to 8.0 μm, particularly preferably from 0.2 to 6.0 μm. The radiation used to form the pixel and/or black matrix is selected from the group consisting of visible light radiation, ultraviolet radiation, far ultraviolet radiation, electron beams, and X-rays. Among such radiations, radiation having a wavelength of 190 to 450 nm is preferred. The radiation dose is preferably from 10 to 10,000 J/m2. The alkali developer is preferably sodium carbonate, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide, choline, 1,8-diazabicyclo-[5.4.0]-7-undecene or An aqueous solution of 1,5-diazabicyclo-[4.3.0]-5-pinene. A suitable amount of a water-soluble organic solvent such as methanol or ethanol, or an interfacial active agent may be added to the aforementioned alkali developer. The coating film is preferably washed with water after alkali development. It can be developed by spray development, spray development, dipping (soaking) or smelting. As the developing conditions, the coating film is preferably developed at room temperature for 5 ·. to 300 seconds. The obtained color filter of the present invention can be extremely effectively used for a color liquid crystal display device such as a transmissive and reflective type color liquid crystal display device, a color photographing device, a color sensor, etc. - 46 - 200811598 (43) The color liquid crystal display device of the present invention The color filter of the present invention is included. As an example of the color liquid crystal display device of the present invention, the radiation-sensitive composition for forming a dye layer of the present invention can be used to form a pixel and/or a black matrix on a thin film electric: crystal substrate array as described above, and the manufacturing is excellent* A characteristic color liquid crystal display device. The radiation-sensitive composition for forming a dye layer of the present invention comprises the above components (A) to (D) as a basic component. Particularly preferred examples of compositions (i) through (i v) are described below. (i) a radiation-sensitive composition for forming a dye layer comprising an esterification reaction between a diol compound containing a di(meth)acrylonitrile group and a tetracarboxylic dianhydride (8) and having 3,000 to 1 00,000 Mw of the polyester (1) as the alkali-soluble resin (B) (ϋ) is used to form a dye-sensitive layer of the radiation-sensitive composition (i), which is selected from trimethylolpropane triacrylate, isoprene Tetraol triacrylate and diisopentaerythritol hexaacrylate as polyfunctional monomer (C) (iii) to form a dye-sensitive layer of the radiation-sensitive composition (i) or (ii), " 1-[9-Ethyl-6-(2-methylbenzhydrazide) \ oxazol-3-yl]-ethane-1-one oxime-indole-acetate as a carbazole-based compound (D1), which is a photo-sensitive radical generator (D) (iv) a radiation-sensitive composition (i), (ii) or (iii) for forming a dye layer, which comprises an organic pigment and/or carbon black As a coloring agent (A). -47- 200811598 (44) Preferably, the color filter (v) of the present invention has a pixel made from the radiation-sensitive composition (i), (ii), (iii) or (iv) used to form the dye layer and/or Or black matrix. Preferably, the color liquid crystal display device (vi) of the present invention comprises the aforementioned color filter (v), and more preferably, the color liquid crystal display device (vii) of the present invention comprises the aforementioned color filter (on the thin film transistor substrate array) ( v) As described above, the radiation-sensitive composition of the present invention for forming a dyed layer can form an excellent pixel pattern and a black matrix pattern at a low exposure dose even when a high concentration pigment is contained, without being developed. An insoluble product is left on the substrate or the light-shielding layer of the unexposed portion, and a floating film is formed on the edge of the pixel pattern and the black matrix pattern. Further, the pixel and the black matrix obtained by the radiation-sensitive composition for forming a dye layer of the present invention have high surface smoothness and are excellent in adhesion to a substrate. Thus, the radiation-sensitive composition of the present invention for forming a dyed layer is highly advantageous for the manufacture of various types of color filters, such as color filters for use in color liquid crystal display devices in the electronics industry. EXAMPLES The following examples are intended to further illustrate the invention but are not to be construed as limiting. The "parts" used in the present invention means parts by weight. -48- 200811598 (45) <Production of alkali-soluble resin> Synthesis Example 1 (Synthesis of diglycidyl etherified product of diphenol) 1,070 g of diphenol (9) and diphenol (10) were weighed a mixture of 70:30: (trademark: YP-90, manufactured by Yasuhara Chemical Co., Ltd.), 1,520 g of epichlorohydrin, and 1,700 g of dimethyl hydrazine feeding device having a cooling tube and a stirrer The flask was heated to dissolve at 50 ° C under agitation, and 290 g of caustic soda was added to carry out a reaction at 65 to 90 ° C for 10 hours. The progress and the end of the reaction were confirmed by measuring the epoxy equivalent. After the epoxy group equivalent reached the target enthalpy, the solvent was distilled off under reduced pressure at 90 to 100 °C. Thereafter, the reaction product was again dissolved in toluene at 50 to 70 ° C, distilled water was added to rinse the reaction product, and the mixture was separated, and then the solvent was removed from the organic layer under reduced pressure to obtain 1,260 g of a reaction product. The resulting reaction product had 260 epoxy equivalents. When the 1H-NMR spectrum of the reaction product was measured (solvent: CDC13, based on tetramethylnonane, the same applies hereinafter), the peak was found at the following chemical shift: 5 (ppm) 6.8 to 7.3 (from the benzene bonded to the cyclohexane skeleton) Derivatized by a ring; 8H), 3.3 and 3.9 to 4.2 (derived from an epoxy group; 6H) and 0.7 to 0.9 (derived from a dimethyl group bonded to an isopropyl group of a cyclohexyl skeleton). • When measuring the infrared absorption spectrum (IR), the absorption was found as follows: 1,241 cnT1 (derived from an aromatic ether structure and an epoxy group) and 1, 〇36 and 828 cnT1 (derived from an aromatic ether structure). From the above results, it was confirmed that the reaction product was a mixture of the diglycidyl etherified product represented by the above formula (1 1 ) and the diglycidyl etherified product represented by the above formula (1 2 ). -49- 200811598 (46) Synthesis Example 2 (Synthesis of a diol compound containing a dimethyl methacrylate group) 1,000 g of a mixture of the diglycidyl etherified product obtained in Synthesis Example 1 : 1,350 Glyceric acid and 1.0 g of hydroquinone monomethyl ether were fed; the flask was equipped with a cooling tube and a stirrer, heated to dissolve at 60 ° C under agitation, and 8 g of tetraethylammonium bromide was added to 70 The reaction was carried out at 90 ° C with stirring until the acid oxime and epoxy equivalent of the reaction product became 8 mg KOH/g and 1 7,000 each. After 15 hours, the reaction was confirmed with the acid hydrazine and the epoxy equivalent, and then the reaction was completed. By cooling to room temperature, 1,3 g of the reaction product was obtained. The resulting reaction product had 8 mg KOH/g bismuth acid, 165 mg KOH/g hydroxy hydrazine and 17,000 epoxy equivalent. When the 1H-NMR spectrum of the reaction product was measured, peaks were found at the following chemical shifts: 5 (ppm) 5.6 and 6.1 (derived from the double bond of methacrylic acid; 4H), and 3 · 9 to 4 · 4 (diglycidyl ether) The mixture of the product is located at a peak of 3_3 and 3.9 to 4.2 due to the ring opening of the epoxy group; 10H). When measuring the infrared absorption spectrum (IR), the absorption was found as follows: * 1,720 cnT1 (derived from an aliphatic ester structure). From the results of the above, it was confirmed that the reaction product was an alcohol compound containing one of the 'methyl propyl fine bases' represented by the following formula (6-1) and dimethyl propylene represented by the following formula (7-1) A mixture of thiol diol compounds. -50- 200811598 (47)

(7-1) Synthesis Example 3 (Synthesis of Dipropylene-Based Diol Compound) 1,200 g of a dipropylene-based diol compound represented by the following formula (6-2) and the following formula (7-2) The mixture of the dipropylene-containing diol compounds shown was prepared in the same manner as in Synthesis Example 2 except that 293 g of acrylic acid was used instead of methacrylic acid. The resulting mixture had 6 mg K〇H/g acid 値' 171 mg KOH/g hydroxy hydrazine and 16,5 环 epoxy equivalent. -51 - 200811598 (48)

(6-2) (7-2) Synthesis Example 4 (Production of Polyester (1)) 670 g of a mixture containing a dimethyl propylene decyl diol compound obtained in Synthesis Example 2 and 1,300 gram of methyl The butyl ketone feeding device was placed in a flask equipped with a cooling tube and a stirrer, heated to dissolve at 60 ° C with stirring, and 220 g of benzenetetracarboxylic anhydride represented by the former formula (8-1) was added (Daicel Chemical Industries, Ltd. The reaction was carried out at 80 ° C with stirring until the average acid enthalpy of the obtained reaction product became 67.9 mg KOH / g and the change in the acid hydrazine became 2 mg KOH / gram or less. After the completion of the reaction, -52-200811598 (49), distilled water was added to the reaction solution for rinsing, and the mixture was allowed to stand for separation, and then the solvent was distilled off from the organic layer under reduced pressure at 50 to 70 ° C to obtain 860 g of a resin. The obtained resin had a Mw of 18,000 and a strontium of 61.2 mgKOH/g. When measuring the iH-NMR spectrum of this resin, the peak was found at the following chemical shift: 5 (ppm) 6.9 to 7.6 (derived from the benzene ring bonded to the benzene ring of the cyclohexane skeleton and the benzene ring of the pyromellitic acid), 5.8 and 6.2. (derived from the double bond of methacrylic acid), from 1.1 to 2.2 (derived from the cyclohexane skeleton) and from 〇·7 to 〇·9 (from the 2,2-extended propyl group bonded to the cyclohexyl skeleton) Dimethyl derivative: 6Η). When measuring the infrared absorption spectrum (IR), the absorption is as follows: 1,73 5 cm·1 (derived from an aliphatic ester structure) and 1,73 5 cnT1 ' 1,241 cnT1 and 1,102 cnT1 (自芳Derived from the ester structure). From the foregoing results, it was confirmed that the resin was represented by the following formula (1-1) m t @ _ (1 ). This polyester (1) is called alkali-soluble resin (1) °

[In the formula (1-1), X is a synthesis example 5 as defined in the above formula (1) (manufacture of polyester (1)) -53- 200811598 (50) 84 0 g as shown in the following formula (1-2) The polyester (1) was obtained in the same manner as in Synthesis Example 4, except that a mixture of the propylene compound containing the dipropylene fluorenyl group obtained in Synthesis Example 3 was used instead of the methacryl-containing product obtained in Synthesis Example 2. : A mixture of thiol diol compounds. The obtained polyester (1) had a Mw of 1,5,0 0: and a yttrium of 60.9 mgKOH/g. This polyester (1) is referred to as an alkali-soluble resin (B-2).

[In the formula (1-2), the X system is as defined in the above formula (1). Synthesis Example 6 (Production of Carboxyl terminated polyester (1)) 275 g of the polyester (1) obtained in Synthesis Example 4 and 275 g of propylene glycol monomethyl ether acetate were placed in a cooling tube and The flask of the stirrer was heated to dissolve at 60 ° C with stirring, and 1.5 g of tetraethylammonium bromide and 30 g of phenyl glycidyl ether (Epiol P, NOF Corporation) (as a carboxyl endcapping agent) were added. The reaction was carried out under stirring at 80 to 90 ° C until the change in the acidity of the acid became 2 mg KOH/g or less. After the reaction was completed, the reaction product was cooled to room temperature to obtain 300 g of a resin. The resulting resin had a Mw of 21,000 and a strontium of 52.1 mg KOH/g. When the 1H-NMR spectrum of this resin was measured, in addition to the peak of the polyester (1) obtained in Synthesis Example 4, peaks were also found at the following chemical shifts: (ppm) 6.9 to 7.6 (from phenyl glycidol) Benzene ring derived) ° -54- 200811598 (51) When measuring the infrared absorption spectrum (IR), the absorption was found as follows: 1,047 cnT1 (derived from an aromatic ester structure). This absorption was stronger than the polyester (1) obtained in Synthesis Example 4 because of the blocking of the carboxyl group. From the above results, it was confirmed that the resin was a polyester (1) having a structure of the former formula; 78% of the hydrogen atoms of the carboxyl group in (1_1) were substituted by a blocking residue (-CH2CH(OH)CH2OC6H5). This polyester (1) is referred to as an alkali-soluble resin (B-3). Synthesis Example 7 (Production of Carboxyl terminated polyester (1)) 3 40 g of a resin was obtained in the same manner as in Synthesis Example 6, except that 300 g of the polyester (1) obtained in Synthesis Example 5 was used. The polyester (1) obtained in Synthesis Example 4 was replaced. The resin obtained from the obtained resin had an Mw of 25,000 and a strontium of 50.0 mgKOH/g. This polyester (1) is referred to as an alkali-soluble resin (B-4). Synthesis Example 8 (Production of Polyester (1)) 6 70 g of the dimethyl propylene decyl diol compound obtained in Synthesis Example 2, a mixture, and 1,470 g of methyl isobutyl ketone feeding device having a cooling tube In a stirred flask, it was heated to dissolve at 60 ° C with stirring, and 313 g of diphenyl ether tetracarboxylic anhydride (manac Co., Ltd.) of the former formula (8-2) was added to give The reaction was carried out under stirring at 80 ° C until the acid mash became 53.3 mg KOH / gram or less. After the completion of the reaction, distilled water was added to the reaction solution to carry out rinsing, and the mixture was allowed to stand for separation. Then, the solvent was distilled off from the organic layer under reduced pressure at 50 to 70 ° C to obtain 80 g of a resin. The obtained resin had a Mw of -55-200811598 (52) 18,000 and a strontium of 61.2 mg of ruthenium/gram. This polyester (1) is called an alkali-soluble resin (Β-5).

In the formula (1-3), X is as defined in the above formula (1), and oxime 1 is a residue obtained by removing four carboxyl groups from diphenyl ether tetracarboxylic acid. Synthesis Example 9 (Production of Polyester (1)) 670 g of a mixture containing a dimethyl propylene decyl diol compound obtained in Synthesis Example 2 and a 1,660 gram methyl isobutyl ketone feeding device having a cooling tube and The flask of the stirrer was heated to dissolve at 60 ° C with stirring, and 434 g of ethylene glycol bis(trimellitic acid) dianhydride (Nippon Rika Co., Ltd.) represented by the former formula (8-3) was added. The reaction was carried out at 80 ° C with stirring until the acid mash became 46.2 mg KOH / g. After the completion of the reaction, distilled water was added to the reaction solution for rinsing, and the mixture was allowed to stand for separation. Then, the solvent was distilled off from the organic layer under reduced pressure at 50 to 70 ° C to obtain 900 g of a resin. The obtained resin has a Mw of 13,000 and is a polyester (1) represented by the following formula (1-4). This polyester (1) is referred to as an alkali-soluble resin (B-6). -56- 200811598 (53)

(1-4) [In the formula (1_4), X is as defined in the above formula (1), and Y2 is a residue obtained by removing four fluorenyl groups from ethylene glycol bis(trimellitic acid ester). Synthesis Example 1 〇 (Production of Control Alkali Soluble Resin) 4 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts of propylene glycol monomethyl ether acetate feeding device In the flask of the cooling tube and the stirrer, 12 parts of methacrylic acid, 18 parts of styrene, 24 parts of benzyl methacrylate, 30 parts of decyl-phenyl-butyleneimine, and 16 parts of A were fed into the flask. 2-hydroxyethyl acrylate and 6.5 parts of α-methylstyrene dimer (as chain transfer agent), the inside of the flask is ventilated with nitrogen, the mixture is gently stirred, and the resulting reaction solution is heated at 80 ° C to maintain the temperature. The polymerization was carried out for 3 hours. After the completion of the polymerization, the reaction solution was heated at 10 ° C, 0.5 part of 2,2'-azobis(2,4-dimethylvaleronitrile) was added, and polymerization was further carried out for 1 hour to obtain a solution of an alkali-soluble resin. (solid content 3 3.2% by weight). The obtained alkali-soluble resin has M W of 8,500 and Μη 4 of 4,500. The alkali-soluble resin is referred to as an alkali-soluble resin (Β-7). Synthesis Example 1 1 (Production of Control Alkali Soluble Resin) 2 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) and 200 parts of propylene-57-200811598 (54) Alcohol monomethyl The ether acetate feeding device is equipped with a cooling tube and a stirrer flask, and 10 parts of methacrylic acid, 15 parts of styrene, 3 parts of benzyl methacrylate, and 25 parts of N-phenyl are fed into the flask. Maleimide, 20 parts of ω-carboxyl: polycaprolactone mono(meth)acrylate and 2 parts of α-methylstyrene dimer (as chain transfer agent), nitrogen inside the flask The mixture was gently ventilated, and the resulting reaction solution was heated at 80 ° C, and the temperature was maintained for 3 hours. After the completion of the polymerization, the reaction solution was heated at 1 Torr, and 5 parts of 2,2·-azobis(2,4-dimethylvaleronitrile) was added thereto, followed by polymerization for 1 hour to obtain an alkali-soluble resin. Solution (solid content: 33. 1% by weight) The alkali-soluble resin obtained by hydrazine has Mw of 20,000 and Μη of 9000. The alkali-soluble resin is called an alkali-soluble resin (Β-8). Synthesis Example 1 2 (Production of Control Alkali Soluble Resin) 4 parts of 2,2·-azobis(2,4-dimethylvaleronitrile) and 200 parts of propylene glycol monomethyl ether acetate feeding device were cooled In the flask of the tube and the agitator, * 10 parts of methacrylic acid, 15 parts of styrene, 40 parts of methyl 'benzyl acrylate, 25 parts of fluorene-phenyl maleimide, 1 part of 2-hydroxyethyl methacrylate and 6.5 parts of α-methylstyrene dimer (as a chain transfer agent), the inside of the flask was ventilated with nitrogen, and the mixture was gently stirred, and the resulting reaction solution was at 80 ° C. Heating was carried out while maintaining the temperature for 3 hours. After the completion of the polymerization, the reaction solution was heated at 10 ° C, and 5 parts of 2,2'-azobis(2,4-dimethylvaleronitrile) was added thereto, followed by polymerization for 1 hour to obtain a base - 58- 200811598 (55) A solution of a soluble resin (solid content: 33.3% by weight). The resulting alkali-soluble resin has a Mw of 7,800 and a pressure of 4,500. The alkali-soluble resin is referred to as an alkali-soluble resin (Β-9). Example 1 &lt;Preparation of liquid composition&gt; 8 parts C · I · Pigment Red 2 5 4 and C. I. Pigment Red 1.7 7 in a weight ratio of 80:20 (as a coloring agent (Α)), 4 parts ( Solid content) EFKA-46 (as a dispersant) and 75 parts of propylene glycol monomethyl ether acetate (as a solvent) were mixed by a bead mill to prepare a pigment dispersion. 87 parts of the obtained pigment dispersion, 8 parts of an alkali-soluble resin (Β-1) (as an alkali-soluble resin), 2 parts of diisopentyltetraol hexaacrylate, and 4 parts of isopenic alcohol tetraacrylate (as polyfunctionality) Monomer (C)), 3 parts of 1-[9-ethyl-6-(2-methylbenzhydrazide)-9.Η.-oxazol-3-yl]-ethane-1-one oxime- 〇-acetate (trademark: CGI-242, Chiba Specialty Chemicals Holding Inc., hereinafter the same) (as photo-sensitive radical generator (D)) and 70 parts of methoxybutyl acetate and 96 parts of ethyl-3 Ethoxypropionate (as a solvent) is mixed to prepare a liquid composition (R1). &lt;Formation of Dye Layer&gt; The liquid composition (R 1 ) was applied to the surface of the soda lime glass by a spin coater (the surface had a film of cerium oxide (SiO 2 ) to prevent sodium ion dissociation on the surface) at 90°. The C hot plate was prebaked for 2 minutes to form a 1.2 micron thick -59-200811598 (56) coating film. Thereafter, the substrate was cooled to room temperature, and the coating film was exposed to ultraviolet radiation having a wavelength of 365 nm, 405 nm, and 436 nm through a reticle (slit width: 30 μm) with a high pressure mercury lamp. The exposure amount at this time is 100 J/m2. The substrate was then immersed in a 0.04% by weight aqueous potassium hydroxide solution at 23 ° C for 45 seconds to develop, rinsed with ultrapure water and air dried. The coating film was then baked in a 23 ° C cleaning furnace for 30 minutes to form a red strip-like pixel pattern on the substrate. &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm was formed. The results are not shown in Table 1-1. Examples 2 to 5 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (R2) to (R5) were prepared in the same manner as in Example i except that the dispersant was changed as shown in Table 1-1. Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (R2) were replaced with liquid compositions (R2) to (R5). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, development residue was not found on the substrate of the unexposed portion of -60-200811598 (57), and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 8 or 6 μm was formed. • The above results are shown in Table 1-1. Example 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (R6) was prepared in the same manner as in Example 1, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-2). Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R6) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 1-1. Examples 7 to 10 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (R 7 ) to (R 1 〇) are prepared as in the formula -61 - 200811598 (58), and the different parts are as shown in the table. The dispersant was changed as shown in 1-1. Thereafter, a red strip pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (R1) to (R10) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm, 8 μm or 6 μm was formed. The foregoing results are shown in Table 1-1. Example 1 1 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (R11) was prepared in the same manner as in Example 1, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-3). Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R11) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. -62- 200811598 (59) When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 1-2. Example 1 2 to 1 5 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (R 1 2 ) to (R 1 5 ) were prepared in the same manner as in Example 1 1, and the difference was as shown in Table 1-2. Change the dispersant. Thereafter, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (R 1 2 ) to (R 1 5 ) were used instead of the liquid composition (R 1 ). <Evaluation> When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side uranium was not observed, and a pattern having a line width of 6 μm or 8 μm was formed. 前述 The foregoing results are shown in Table 1-2. Example 1 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (R 16 ) was prepared in the same manner as in Example 1 except that the alkali-soluble resin (B) became an alkali-soluble resin (B-4). . -63- 200811598 (60) Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R 1 6 ) was used instead of the liquid composition (R1). - &lt;Evaluation&gt; • When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side contact was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 1-2. Example 1 7 to 2 0 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (R17) to (R20) were prepared in the same manner as in Example 16 except that the dispersant was changed as shown in Table 1-2. Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (R17) to (R20) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side defects were not observed, and a pattern having a line width of 5 μm, 8 μm, or 6 μm -64 to 200811598 (61) meters was formed. The foregoing results are shown in Table 1-2. Example 2 1 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (R2 1 ) was prepared in the same manner as in Example 1, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-5). Thereafter, a red stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R2 1 ) was used instead of the liquid composition (R1 ). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (S EM ), no side etching was observed, and a pattern having a line width of 8 μm was formed. The foregoing results are shown in Tables 1-3. Examples 22 to 25 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (R22) to (R25) were prepared in the same manner as in Example 21 except that the dispersant was changed as shown in Table 1-3. Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R22) to (R25) was used instead of the -65-200811598 (62) bulk composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion. The edge portion of the pixel pattern was not found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm, 8 μm or 6 μm was formed. The foregoing results are shown in Tables 1-3. Example 26 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (R26) was prepared in the same manner as in Example 1, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-6). Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R26) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Tables 1-3. -66- 200811598 (63) Examples 27 to 30 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (R27) to (R30) were prepared in the same manner as in Example 26 except that the dispersant was changed as shown in Table 1-3. Thereafter, a red strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (R27) to (R30) were used instead of the liquid composition (R 1 ). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm, 8 μm or 6 μm was formed. The foregoing results are shown in Tables 1-3. Example 3 1 &lt;Preparation of liquid composition&gt; 1 1 part C · I · Pigment Green 3 6 and C · I · Pigment Yellow 1 500 Mixture in a weight ratio of 60: 40 (as coloring agent (A)), 4 parts ( Solid content) EFKA-46 (as a dispersant) and 75 parts of propylene glycol monomethyl ether acetate (as a solvent) were mixed by a bead mill to prepare a pigment dispersion. 9 parts of the obtained pigment dispersion, 8 parts of alkali-soluble resin (b-1), 67 - 200811598 (64) (as alkali-soluble resin (B)), 2 parts of diisoamyltetraol hexaacrylate and 4 parts Pentaerythritol tetraacrylate (as polyfunctional monomer (C)), 3 parts of 1-[9-ethyl-6-(2-methylbenzhydrazide)-9.11.-oxazol-3-yl] -: Ethyl-1-ketooxime-oxime-acetate (as photo-sensitizing agent (D)): and 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxypropionate (as a solvent) was mixed to prepare a liquid composition (G1). &lt;Formation of Dyeing Layer&gt; A green stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R-1) was replaced by the liquid composition (G-1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 2-1. Examples 32 to 35 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (G2) to (G5) were prepared in the same manner as in Example 31 except that the dispersant was changed as shown in Table 2-1. . Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (G2) to (G5) were used instead of the liquid composition (R1). -68- 200811598 (65) &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 8 μm or 6 μm was formed. 前述 The foregoing results are shown in Table 2-1. Example 36 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (G6) was prepared in the same manner as in Example 31, and the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-2). Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G6) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side etching was not observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 2-1. -69- 200811598 (66) Examples 37 to 40 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (G7) to (G10) were prepared in the same manner as in Example 36 except that the dispersant was changed as shown in Table 2-1. . • Thereafter, a green strip pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G7) to (G 1 0 ) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm, 8 μm or 5 μm was formed. The foregoing results are shown in Table 2-1. Example 4 1 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (G 1 1 ) was prepared in the same manner as in Example 31, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-3). After the crucible, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G 1 1 ) was used instead of the liquid composition (R1). -70- 200811598 (67) &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side etching was not observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 2-2. Examples 42 to 45 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (G 1 2 ) to (G 1 5 ) were prepared in the same manner as in Example 41, and the difference was as shown in Table 2-2. Change the dispersant. Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (G12) to (G15) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (S EM ), no side etching was observed, and a pattern having a line width of 5 μm or 6 μm was formed. 前述 The foregoing results are shown in Table 2-2. -71 - 200811598 (68) Example 46 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (G16) was prepared in the same manner as in Example 31: the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-4). After the crucible, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G1 6 ) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side defects were observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 2-2. Examples 47 to 50 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (G17) to (G20) were prepared in the same manner as in Example 46 except that the dispersant was changed as shown in Table 2-2. Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (G17) to (G20) were used instead of the liquid composition (R1). &lt;Evaluation&gt; -72 - 200811598 (69) When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. : When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm, 5 μm or 8 μm was formed. The foregoing results are shown in Table 2-2. Example 51 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (G2 1 ) was prepared in the same manner as in Example 31, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-5). After the crucible, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G2 1 ) was used instead of the liquid composition ( R1 ). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 2-3. -73- 200811598 (70) Example 5 2 to 5 5 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (G22) to (G25) were prepared in the same manner as in Example 51 except that the dispersant was changed as shown in Table 2-3. . / Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (G22) to (G25) were used instead of the liquid composition (R 1 ). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm, 8 μm or 5 μm was formed. The foregoing results are shown in Table 2-3. Example 5 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (G26) was prepared in the same manner as in Example 31, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-6). Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (G2 6 ) was used instead of the liquid composition ( R1 ). -74- 200811598 (71) &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side etching was not observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 2-3. Examples 57 to 60 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (G27) to (G30) were prepared in the same manner as in Example 56 except that the dispersant was changed as shown in Table 2-3. Thereafter, a green strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (G27) to (G30) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side etching was not observed, and a pattern having a line width of 5 μm, 6 μm or 8 μm was formed. The foregoing results are shown in Table 2-3. -75- 200811598 (72) Example 6 1 &lt;Preparation of liquid composition&gt; 9 parts of CI·Pigment Blue 15:6 and CI Pigment Violet 23 in a weight ratio of a mixture (as a coloring agent (A)), 4 parts (solid content • EFKA-46 (as a dispersion) a pigment dispersion prepared by mixing with 75 parts of propylene glycol monomethyl ether B (as a solvent) by a bead mill. 88 parts of the obtained pigment dispersion, 8 parts of an alkali-soluble resin (E (as an alkali-soluble resin (B)), 2 parts of hexapropyl diisopentaerythritol and 4 parts of isoamyltetraol tetraacrylate (as polyfunctional monomer ( ), 3 parts of 1-[9-ethyl-6-(2-methylbenzamide) )-9.11.-carbazole-3 ethane-1-ketooxime-indole-acetate (as a photoradical generator (D and 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxylate) The propylpropionic acid is mixed as a solvent to prepare a liquid composition (B 1 ). &lt;Formation of Dyeing Layer&gt; A blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1. The liquid composition (B1) was substituted for the liquid composition (R1) c. &lt;Evaluation&gt;&quot;&lt;&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the unexposed substrate, and no pixel pattern edge was found to be missing. When the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 3-1. 95:5 amount) acid ester |-1) enoic acid: C) -yl]·)) ester (case, light part partial profile -76- 200811598 (73) Examples 62 to 65 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid compositions (B 2 ) to (B 5 ) are prepared as in the formula 6: Formula, and the difference is as shown in Table 3-1. Change the dispersant. / Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B1) to (B5) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side defects were not observed, and a pattern having a line width of 5 μm or 6 μm was formed. 前述 The foregoing results are shown in Table 3-1. Example 6 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (B6) was prepared in the same manner as in Example 61, and the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-2). Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B6) was used instead of the liquid composition (R1). &lt;Evaluation&gt; • 77-200811598 (74) When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side uranium was not found, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 3-1. Examples 67 to 70 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (B7) to (B10) were prepared in the same manner as in Example 66 except that the dispersant was changed as shown in Table 3-1. Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B1) to (B1 0) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side defects were observed, and a pattern having a line width of 8 μm or 5 μm was formed. 前述 The foregoing results are shown in Table 3-1. Example 7 1 -78- 200811598 (75) &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (B 1 1 ) was prepared in the same manner as in Example 61, and the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-3). ). After that, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B 1 1 ) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 3-2. Examples 72 to 75 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (B 1 2 ) to (B 15 ) were prepared in the same manner as in Example 71, and the difference was as shown in Table 3-2. Change the dispersant. Thereafter, a blue stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B 1 2 ) to (B 1 5 ) were used instead of the liquid composition (R 1 ). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no pixel pattern edge portion -79-200811598 (76) was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side defects were not found, and a pattern having a line width of 5 μm, 6 μm or 8 μm was formed. / The above results are shown in Table 3-2. Example 76 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (B 16 ) was prepared in the same manner as in Example 61, and the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-4). ). Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B 1 6 ) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side uranium was not found, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 3-2. Examples 77 to 80 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (B17) to (B20) were prepared in the same manner as in Example 76-80-200811598 (77), and the difference was as shown in Table 3-2. The dispersant is changed as usual. Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B17) to (B20) were used instead of the bulk composition (R1). ; &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm or 8 μm was formed. 前述 The foregoing results are shown in Table 3-2. Example 81 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (B2 1 ) was prepared in the same manner as in Example 61, and the alkali-soluble resin (B) was changed to an alkali-soluble resin (B-5). . Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B2 1 ) was used instead of the liquid composition (R1 ). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. -81 - 200811598 (78) When the cross section of the pixel pattern was observed by a scanning electron microscope (SEM), side etching was not observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 3-4. Examples 82 to 85 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (B22) to (B25) were prepared in the same manner as in Example 81 except that the dispersant was changed as shown in Table 3-3. Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B22) to (B25) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm or 8 μm was formed. 前述 The foregoing results are shown in Table 3-4. Example 8 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (B26) was prepared in the same manner as in Example 61, and the soluble resin (B) was changed to a soluble resin (B-6). -82- 200811598 (79) Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B26) was used instead of the liquid composition (R1). : &lt;Evaluation&gt;; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 8 μm was formed. The foregoing results are shown in Table 3-4. Examples 87 to 90 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (B27) to (B30) were prepared in the same manner as in Example 86 except that the dispersant was changed as shown in Table 3-4. Thereafter, a blue strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (B27) to (B30) were used instead of the liquid composition (R 1 ). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (S EM ), no side etching was observed, and a pattern having a line width of 8 μm or 5 μm was formed - 83 - 200811598 (80) The foregoing results are shown in Table 3-3. Example 9 1 &lt;Preparation of liquid composition&gt; 20 parts of carbon black (as coloring agent (A)), 4 parts (solid content) of EFKA-46 (as a dispersing agent), and 75 parts of propylene glycol monomethyl ether acetate (as a solvent) The pigment dispersion was prepared by mixing with a bead mill. 99 parts of the obtained pigment dispersion, 8 parts of an alkali-soluble resin (B-1) (as an alkali-soluble resin (B)), 2 parts of diisoamyltetraol hexaacrylate, and 4 parts of isopenic alcohol tetraacrylate (as Polyfunctional monomer (C)), 3 parts of 1-[9-ethyl-6-(2-methylbenzhydrazide)-9.11.-oxazol-3-yl]-ethane-1-one oxime A hydrazine-acetate (as a photoradical generating agent (D)) and 150 parts of propylene glycol monomethyl ether acetate (as a solvent) were mixed to prepare a liquid composition (BK1). &lt;Formation of Dyeing Layer&gt; A black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B1) was substituted for the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), side defects were not observed, and a pattern having a line width of 8 μm was formed. -84- 200811598 (81) The above results are shown in Table 4-1. Examples 92 to 95 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK2) to (BK5) were prepared in the same manner as in Example 91 except that the dispersant was changed as shown in Table 4-1. Thereafter, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (BK2) to (BK5) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm or 6 μm was formed. 前述 The foregoing results are shown in Table 4-1. Example 96 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (BK6) was prepared in the same manner as in Example 91, except that the alkali-soluble resin (B) became an alkali-soluble resin (B), The method of Example 1 forms a black strip-shaped pixel on a substrate, as shown in Fig. 85-200811598 (82), in which a liquid composition (BK6) is used in place of the liquid composition (R1). &lt;Evaluation&gt;: When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the unexposed portion of the substrate, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 4-1. Example 9 7 to 1 0 0 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK7) to (BK10) were prepared in the same manner as in Example 96 except that the dispersant was changed as shown in Table 4-1. Thereafter, a black strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (BK7) to (BK10) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side uranium was not observed, and a pattern having a line width of 6 μm or 5 μm was formed. -86 - 200811598 (83) The foregoing results are shown in Table 4-1. Example 10 1 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (BK11) was prepared in the same manner as in Example 91, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-3). A black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B1 1 ) was used instead of the liquid composition (R1 ). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 4-2. Examples 102 to 105 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK 1 2 ) to (BK 15) were prepared in the same manner as in Example 1 ,1, and the difference was as shown in Table 4-2. After changing the dispersant 〇, the method of forming a black strip pixel on the substrate according to the embodiment 1 is shown in the case of -87-200811598 (84), and the liquid composition (BK12) to (BK15) is used in place of the liquid composition. (R1). &lt;Evaluation&gt; "When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate on which the * portion was not exposed." The edge portion of the pixel pattern was not found to be missing. Observation by scanning electron microscope (SEM) In the cross section of each pixel pattern, no side hung was observed, and a pattern having a line width of 5 μm, 8 μm or 6 μm was formed. The foregoing results are shown in Table 4-2. &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (BK16) was prepared in the same manner as in Example 91, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-4). A black strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (BK 16 ) was used instead of the liquid composition, (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed by a scanning electron microscope (S EM ) -88-200811598 (85), no side etching was observed, and a pattern having a line width of 8 μm was formed. The foregoing results are shown in Table 4-2. Example 1〇 7 to 1 1 0 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK17) to (BK20) were prepared in the same manner as in Example 106 except that the dispersant was changed as shown in Table 4-2. Thereafter, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (BK 1 7 ) to (BK 2 0 ) was used instead of the liquid composition (R1). &lt;Evaluation> When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side uranium was not observed, and a pattern having a line width of 6 μm or 5 μm was formed. 前述 The foregoing results are shown in Table 4-2. Example 1 1 1 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (BK21) was prepared in the same manner as in Example 91, except that the alkali-soluble resin (B) became an alkali-soluble resin (B_5) -89 - 200811598 (86) Thereafter, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B1) was used instead of the liquid composition (R1). &lt;Evaluation&gt; No development residue was observed on the substrate of the unexposed portion when the pixel array on the substrate was observed through an optical microscope, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 6 μm was formed. The foregoing results are shown in Table 4-3. Example 1 1 2 to 1 1 5 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK22) to (BK25) were prepared in the same manner as in Example 111, and the dispersant was changed as shown in Table 4-3. Thereafter, a black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (BK22) to (BK25) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. -90-200811598 (87) When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side defects were not observed, and a pattern having a line width of 8 μm, 6 μm or 5 μm was formed. The foregoing results are shown in Table 4-3. Example 1 1 6 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (BK26) was prepared in the same manner as in Example 91, except that the alkali-soluble resin (B) became an alkali-soluble resin (B-6). A black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (B1) was used instead of the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), no side etching was observed, and a pattern having a line width of 5 μm was formed. The foregoing results are shown in Table 4-3. Example 1 17 to 120 &lt;Preparation of liquid composition and formation of dye layer&gt; Liquid compositions (BK27) to (BK30) were prepared in the same manner as in Example-91 - 200811598 (88) 1 16 , and the difference was as shown in Table 4 The dispersant was changed as indicated in 3. Thereafter, a black strip-shaped pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid compositions (BK27) to (BK30) were used instead of the liquid composition (R1). &lt;Evaluation&gt; When each pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion, and no edge portion of the pixel pattern was found to be missing. When the cross-section of each pixel pattern was observed by a scanning electron microscope (SEM), side defects were not observed, and a pattern having a line width of 8 μm or 5 μm was formed. 前述 The foregoing results are shown in Table 4-3. Comparative Example 1 &lt;Preparation of liquid composition&gt; 8 parts of CI·Pigment Red 254 and CI·Pigment Red 177 in a weight ratio of 80:20 (as coloring agent (A)), 4 parts (solid content) EFKA-46 (as A dispersant) and 75 parts of propylene glycol monomethyl ether acetate (as a solvent) were mixed by a bead mill to prepare a pigment dispersion. 8 7 parts of the obtained pigment dispersion, 2 parts of the alkali-soluble resin (B-7), 3 parts of the alkali-soluble resin (B-8), and 4 parts of the alkali-soluble resin (B-9) (as an alkali-soluble resin (B) )), 2 parts of diisoamyltetraol hexaacrylate and 4 parts of isopentaerythritol tetraacrylate (as polyfunctional monomer (C)), 3 parts of 1-[9-ethyl-6-(2- Methyl benzoate)-9.11.-味-92- 200811598 (89) Zyridin-3-yl]-ethane-1-one oxime-indole-acetate (as photoreceptive free (D)) and 70 parts of acetic acid Mixing methoxybutyl ester and 96 parts of ethyl-3-ester (as solvent) to prepare a liquid composition (CR1: &lt;Formation of Dyeing Layer&gt; A red strip image was formed on the substrate in the same manner as in Example 1 except that the liquid composition (CR-1) was substituted for the liquid composition ( &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, development residue was found on the substrate. When the pixmap was observed via a scanning electron microscope (SEM), side etching was found, and only a pattern having a line width of 35 μm was formed. The foregoing results are shown in Table 5. Comparative Example 2 &lt;Preparation of liquid composition&gt; 1 1 part C · I. Pigment green 3 6 and C · I · Pigment yellow 1 5 0 60: 40 mixture (as coloring agent (a )), 4 parts (solid BYK- 20 00 (as a dispersant) and 75 parts of propylene glycol monomethyl (as a solvent) were mixed by a bead mill to prepare a pigment dispersion. 90 parts of the obtained pigment dispersion, 2 parts of alkali-soluble tree, and 3 parts of alkali-soluble resin (B) - 8 ) and 4 parts of a mixture of alkali-soluble tree (as alkali-soluble resin (B)), 2 parts of dihexaacrylate and 4 parts of isopentenyl tetraacrylate (as multi-body (c)), 3 parts 1 -[9-Ethyl-6-(2-methylbenzhydrazide)-based generator ethoxypropyl) phenolic pattern, R1). The cross-section of the unexposed part is in the weight ratio. Ether acetate is intended to be (B-7). (B-9) Isopentanol functional monoterpene-93- 200811598 (90) Zyrid-3-yl] - Ethyl-1-ketooxime-oxime-acetate (as photo-sensitizing agent (D)) and 70 parts of methoxybutyl acetate and 96 parts of ethyl-3-ethoxypropionate (as The solvent is mixed to prepare a liquid composition (CG1). : &lt;Formation of Dyeing Layer&gt; / A green stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (CG1) was substituted for the liquid composition (R1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, no development residue was observed on the substrate of the unexposed portion. However, when the cross section of the pixel pattern was observed through the scanning electron microscope (S ΕΜ ), the side feed was found, and only a pattern having a line width of 45 μm was formed. The foregoing results are shown in Table 5. Comparative Example 3 &lt;Preparation of liquid composition&gt; 9 parts of CI·Pigment Blue 15:6 and CI·Pigment Violet 23 in a weight ratio of 95:5 (as coloring agent (A)), 4 parts (solid content): 8丫^: - 2 0 0 1 (as a dispersing agent) and 75 parts of propylene glycol monomethyl ether acetate (as a solvent) were mixed by a bead mill to prepare a pigment dispersion. 8 8 parts of the obtained pigment dispersion, 2 parts of the alkali-soluble resin (B-7), 3 parts of the alkali-soluble resin (B-8), and 4 parts of the soluble resin (B-9) (as an alkali-soluble resin (B) )), 2 parts of diisoamyltetraol hexaacrylate and 4 parts of isopentaerythritol tetraacrylate (as polyfunctional monomer (C)), 3 parts of 1-[9-ethyl-6-(2- Methyl benzamidine)-9.11.-咔-94- 200811598 (91) Zin-3-yl]-ethane-1-one oxime-indole-acetate (as sensation (D)) and 70 parts of acetic acid Mixing oxybutyl ester and 96 parts of an acid ester (as a solvent) to prepare a liquid composition* &lt;Formation of Dyeing Layer&gt; / Blue color formation on the substrate in the same manner as in Example 1 The liquid portion (CB 1 ) was substituted for the liquid; &lt;Evaluation&gt; No development residue was observed on the substrate on which the pixel array on the substrate was observed by an optical microscope. However, when the cross section of the pixel pattern was observed by a micro mirror (SEM), a pattern having a line width of 40 μm was formed. The foregoing results are shown in Table 5. Comparative Example 4 &lt;Preparation of liquid composition&gt; 20 parts of carbon black (as coloring agent (a)), 4 BYK-164 (as a dispersing agent), and 75 parts of propylene glycol (as a solvent) were mixed by a bead mill to prepare a pigment dispersion '99 parts The obtained pigment dispersion, 8 parts of the test} (as alkali-soluble resin (B)), 2 parts of diisoester and 4 parts of isoamyltetraol tetraacrylate (as multi-^), 3 parts 1-[9_B Base_6_(2-methylbenzhydrazide)_ethane-1-one oxime-0-acetate (as photo-sensitive radical and 150 parts of propylene glycol monomethyl ether acetate (as photolysis free radical generator) Ethyl-3-ethoxypropane (CB1). Strip-shaped pixel pattern, composition (R1). When columned, the unexposed part is laterally etched by scanning electrons, and only part (solid content) monomethyl ether B Acid ester (B-1) pentaerythritol hexaacrylic acid monomer (C) 9.H.-carbazol-3-yl]-: generator (D)) -95_ 200811598 (92) Liquid composition (CBK1). &lt;Formation of Dyeing Layer&gt; A black stripe pixel pattern was formed on the substrate in the same manner as in Example 1, and the liquid composition (R1) was replaced by a liquid composition (CBK-1). &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, development residue was found on the substrate of the unexposed portion. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), side etching was observed, and only a pattern having a line width of 50 μm was formed. The foregoing results are shown in Table 5. Comparative Example 5 &lt;Preparation of liquid composition and formation of dye layer&gt; The liquid composition (CR2) was prepared in the same manner as in Comparative Example 1, except that the dispersant was changed to BYK-182. &lt;Formation of Dyeing Layer&gt; A red stripe pixel pattern was formed on the substrate in the same manner as in Example 1, except that the liquid composition (R1) was replaced by the liquid composition (CR2). ' &lt;Evaluation&gt; When the pixel array on the substrate was observed through an optical microscope, development residue was found on the substrate of the unexposed portion. When the cross section of the pixel pattern was observed through a scanning electron microscope (SEM), side defects were found, and only a pattern having a line width of 45 μm was formed. The foregoing results are shown in Table 5. -96- 200811598 ι-ι漱I^l) ο OO iiii inch 1 〇〇1 1 Qian 1 Nothing found 6 On 00 iii inch il 00 1 1 1 1 1 Nothing found No found 8 00 OO iii Word 1 00 1 1 I l Not found 5 Bu OO i inch iiil 00 1 1 1 1 Not found 5 v〇OO -^-1111 1 〇〇1 1 1 1 Not found 6 OO iiii inch OO 1 1 Not Found that no 8 inch OO iii inch i OO 1 1 1 1 No found 6 cn 〇〇ii^ii OO 1 1 1 1 1 No found 6 CN OO i inch iii 〇〇1 1 1 1 1 Not found No 8 rH was found. iiii OO 1 1 1 1 1 No 5 / ^ S g /sr - 1 * ^ Ο TH - 17 was found. . . Inch (N Ο Ο Ο Ό OO ^ w ^ ^ ^ ^ W pq PQ cq PQ (B) Alkali Soluble Resin (Parts) Bl B-2 B-3 B-4 B-5 B-6 w 验猛W 鼷宸鹱13⁄4 击 &lt;ns§^or.oooi5__^r&gt;l&gt;Iyi 骚τοϋ S inch (NISI 骝Ίϋ:Γ -97- 200811598 (94) (Ν—Ι 嗽ΟΟ ι ι ι ι 寸 1 1 1 00 II Nothing found Found 6 as ΟΟ ι ι ι inch inch 垂 1 1 00 II Nothing found 6 〇〇ΟΟ ι ι 寸ι ι 1 1 1 〇〇1 1 Nothing found S ΟΟ ι 寸 ι ι 睡 1 1 〇 〇1 1 Nothing found 5 VO 11 1 1 I 1 1 1 〇〇1 1 Nothing found 6 13⁄4 ΟΟ ι ι ι ι 寸 1 1 〇〇1 1 1 No found 6 inch ΟΟ ι ι ι ιι 1 1 〇〇1 1 1 Nothing found 8 ΟΟ ι ι 寸 ι ι I ι OO 1 1 瞧1 Nothing found 6 (N ΟΟ ι ι ι ι 1 1 〇〇 1 Painting 1 Not It was found that 6 r - Η 1 1 1 1 1 1 1 OO 喔 1 1 I was not found 5 s tH * OT-1 7% O inch (N Φ inch OO VO oo w &lt; ^ ^ v -r 骚薇¥ ^ ^ ^ ^ Tibetan PQ PQ PQ PQ y Φ (B) Alkali Soluble Resin (Parts) Bl B-2 B-3 B-4 B-5 B-6 Pine Rice® E藜 w w 松 鹤 crane ^ 03: 08 ugly __ ^ 匕 iyil 働 Ιϋ 鄢 s17 (Nyi 骢Ίϋ: Γ -98- 200811598 2 撇 Example OO iiii inch 1 1 stupid 1 〇〇 did not find 8 G not found \ (N OO iii inch i 1 1 1 1 OO Nothing found 6 OO (N OO i · inch ii 1 1 1 1 1 OO not found 8 OO i inch iii 1 1 1 1 1 OO not found not found 5 CN OO 寸 · iii 1 1 I 1 1 OO No found 6 found (N OO iiii inch 1 1 1 1 OO 1 No found 6 found OO iii iii inch i 1 1 1 1 OO 1 No found 8 found m CN OO ii inch ii 1 1 1 1 OO 1 not found 8 found &lt;N (N OO i ^ i i i I 1 1 1 OO 1 ! Not found Not found 5 OO rj- i i i i 1 1 1 1 OO 1 Not found 8 s * o not found &lt; one seven VO Ο O inch &lt;N 杂 inch Ο O v〇 〇〇 ® w &lt; ^ ^ VT 'Hidden wm CQ PQ CQ y Φ (B) Alkali-soluble resin (parts) Bl B-2 B-3 B-4 B-5 B-6 Fine 窫 鼷 鼷 5 yi.-ϋ 0 s yi.-ϋ - Γ -99 - 200811598 ICN漱Example〇2 1 · ·.inch1 〇〇1 1 1 礆i π 伥1 m 2 1 1 ·inch· 1 〇〇1 1 1 1 No Found 8 00 m II i 1 inch·· 1 〇〇1 1 1 ancestors found no 8 found; 2• inch “. · 1 〇〇1 1 1 Fen 1 Nothing found 6 VD cn 2 inches · · 1 1 1 〇〇till Nothing found 5 ^T) m II I · · inch 〇〇iiii Nothing found 6 Art 2 · ·, inch · 00 1 1 1 1 1 No 6 mm 2 found寸·· 〇〇1 1 1 1 ancestors found no 6 found &lt;N m 二•寸· i 〇〇 earn 1 1 1 1 No found but not found 8 2 inch 1 1 1 〇〇1 1 1 1 1 No found 6 g * Ο T-Η 七 VO Ο 〇 inch (N 0 inch OO v〇〇〇 Gong W 4. 7 spoons: • έ έ) wm pq PQ CQ M &lt;R (B) alkali soluble resin (parts) Bl B-2 B-3 B-4 B-5 B-6 gffl _ mwm ^ mm Ife 啪鹧 啪鹧 wo inch: 09 late __ to 0^_$魃.10 Zhao Xiaoyu Gong Sao 10:. -100- 200811598 (97) &lt;Ν·(Ν撇二1·寸1 1 1 〇〇· No found 8 Os 2 1 1 inch 1 1 1 1 OO 1 1 Distillation π 伥1 2 1 · inch ·, 1 1 1 00 1 1 No discovery No found 5 2•inch.· · 1 1 1 00 1 1 1 Nothing found 6 2 inches 1 _ · 1 1 1 00 1 1 Nothing found 6 ΙΚ 2 · · · _ inch 1 1 OO 1 « « Nothing found 6 2 1 1 · inch · 1 1 〇〇 1 1 1 Not found i Not found 6 2••inch 1 · 1 1 OO 1 1 1 Nothing found 5 Οί 2 inch. _ 1 1 1 OO i 1 1 Nothing found 5 τ-Η 2 inch II · · 1 1 OO 1 1 1 Nothing found 5 /^\ S Ό Ό Ο 寸 inch (N pose OO VO 〇〇 Gong W 4. ^7 m CQ PQ PQ PQ (B) alkali soluble resin (part) B-1 B-2 B-3 B-4 B-5 B-6 pine rice gffi 藜mw 鼷 _ _ -101 - 200811598 Example § 2 · · , · inch 1 1 1 1 1 〇〇 not found 5 found 2, · inch · 1 1 1 1 window 00 not found 8 found 〇〇 2···· 1 1 1 1 1 〇〇 Nothing found 6 2 1 -- * « « 1 1 1 1 00 Nothing found No found 5 Two inches. · · i 垂1 1 1 祖 00 Nothing found 5 2 · · · inch iiii DO i Nothing found 5 2 · · inch · 1 1 1 1 〇〇1 Not found 6 m not found二••寸_ 喔1 1 1 OO 1 No discovery No found 8 CN 2•inch i · 祖III 〇〇I Nothing found 6 ί=; 2 1 inch 1 till 〇〇1 Nothing found 6 / ^ SS r? * fN Ο — w Φ ^ § § ss Gong w 4 ^ ^7 ^ pq PQ PQ PQ CQ Μ Φ (B) Alkali-soluble resin (parts) Bl B-2 B-3 B-4 B-5 B -6 松米钿藜mw 论段w 鼷 _ _ 13⁄4 -102- 200811598 (99) I丨ε漱Μ 〇Q\ 1 1 1 i inch 1 00 1 1 1 1 Nothing found 5 〇\ ν〇 Os iii inch il OO lll not found 8 〇〇 vo OS ii inch ii 1 OO 1 1 1 1 1 not found 8 Q\ i inch iii I OO 1 1 II not found 8 νο α inch 1 1 1 1 1 00 1 1 1 1 Not found 6 * v〇0\ iiii inch 00 1 1 1 1 I Not found 6 s ON iii inch · OO 1 1 1 1 1 No found 6 cn v〇 0\ ii inch ii OO 1 1 1 not found unsent Now 5 CN 0\ i inch i i i OO 1 · 1 I I not found 5 α inch 1 1 1 1 OO 1 1 1 1 not found 5 g /^\ m * O rH A ◦ 〇 inch &lt;N 右寸OO v〇00 v^ ^ CN CN---1 ® ^ ^ ^ &gt;h Cl ^ PQ PQ PQ PQ PQ (B) Alkali Soluble Resin (Parts) Bl B-2 B-3 B- 4 B-5 B-6 §Β 藜mw 鼷 _ _ 仞鹧 ς ς: ς 6 ugly __ to 3 铼 Gong Qian 10 Zhao 9^1_ Gong 魃. 10: £* -103- 200811598

(N-cn撇Example § G\ 1 1 1 1 inch ι ι ι 00 ι ι Not found 5 On OS iii inch i 1 1 1 〇〇1 I 1伥OO OS ii inch ii ι ι 瞧00 ι ι ! Nothing found 8 r- Q\ i inch iii ι Sleeping ι I 00 I 1 Nothing found 5 O inch 1 · 1 1 1 1 1 〇〇1 1 Nothing found 5 Os iiii inch ι ι 0〇 ι ι ι Not found 8 0\ iii inch · 1 I 00 1 I 1 Not found 8 rn 0\ ii inch ii 1 1 〇〇1 1 1 Distillation 伥 Zhang CN 0\ i inch iii Sun 1 0〇1 II Distillation π rH α Inch 1 1 1 1 ι ι 00 1 1 1 Distillation π /^N gm * o — 七αα ο 〇 inch&lt;N Φ inch oo vo 〇〇 pen' (N CN rH KS s&gt; ^ ^ ώ ώ ^ ^ ^ ^ ^ W PQ CQ PQ PQ Μ Φ (B) Alkali-soluble resin (part) Β·1 Β-2 Β-3 Β-4 Β-5 Β-6 击¥蕤 W W W W W W W W W W W W W W W W 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 9 As oo G\ iii inch i 1 1 1 1 1 〇〇 not found 8 OO 00 0\ ii inch ii 1 1 1 1 1 00 Not found 8 0\ i inch iii 1 1 1 1 1 00 Not found 8 OO α inch 1 1 1 1 1 1 1 1 1 00 Not found 8 in oo Os 1 1 1 1 inch 1 1 1 Lips 1 Distillation π 伥伥0\ ii 1 inch iiii OO io i Not found 5 m oo 0\ 1 i inch i 1 ce 1 1 1 〇〇1 Not found 8 CN OO ON i inch iiii Ii 00 i Distillation π 伥伥 ON Inch iiii 1 1 瞧 OO 1 No 5 s Γ Ί Ί Ί Ί Ί Ί Ί Ί O O O O O O oo oo oo oo oo oo oo oo oo oo oo oo oo oo. OO $ w ^ ^ V ^ ^ S PQ PQ PQ PQ (B) Alkali Soluble Resin (Parts) Bl B-2 B-3 B-4 B-5 B-6 Hair Meter® 义 惩 w w 担 鹱 鹱 鹱鹧鹧^$6 丑__^3魏龚鼹10^9^1_龚魆.1.0:^ -105- (102)200811598 1^1 〇〇rH 宕i · · inch 1 〇〇1 1 1 艺未Found no found 6 〇 \ 宕 · · · inch · 1 〇〇 1 1 1 No found No found 5 00 On 宕• inch· · 1 〇〇1 1 1 1 1 Nothing found 5 宕•inch· · 1 〇〇1111 Nothing found 6 V〇ON S inch 1 1 · · 1 〇〇1 1 1 1 Not found 5 found in 〇 〇 宕 '1 * * 〇〇1 1 1 1 1 No found 6 found : 宕· · · inch · 00 1 1 1 Face I Not found 5 cn On S • Inch · 1 〇〇雠 1 1 1 1 1 Nothing found 6 CN ON 宕•inch_ · · 〇〇瞧1雇佣1 Sun did not find 5 宕 inch · _ · · 〇〇1 1 1 1 1 I Nothing found 8 /^N 〇 - Ο Ο 寸 inch CN 々 inch Ο O VO OO φ w &lt; ^ ^ V w ® ^ ^ ^ ^ ^ S| Collection S CQ PQ PQ CQ li Φ (B) Alkali Soluble Resin (Parts) B-1 B-2 B-3 B-4 B-5 B-6 Killing m g punish w _ _ following Ife -106- (103)200811598

Uil ο rH rH 宕_ · | inch 1 1 1 〇〇1 1 not found 5 found § rH 宕· · inch · 1 1 1 00 1 1 not found 5 00 ot-1 宕•• inch | 1 1 1 〇〇1 1 Nothing found 5 宕•inch· · | 1 1 1 〇〇1 1 No found 6 VO or—H 宕 inch · _ · I 1 1 1 00 1 1 No 8 found In O TH 宕| | · _ inch sleep I 00 I 1 1 Nothing found 5 g TH 宕1 · · inch · 1 1 OO 1 1 1 Nothing found 6 mot-H 宕· _ inch · 1 1 1 〇〇1 1 1 No found 8 s rH S • inch · · 1 1 〇〇1 1 1 No 5 rH O rH 宕 inch found | · 1 1 1 0 〇艺1 1 No 6 found 〇一Ο Ο 寸 inch CN Φ inch 〇〇ν〇00 Φ W &lt; ^ ^ ^ ^ w S ^ Ϊ ^ ^ ^ Compensation: via pq PQ PQ PQ PQ Drug Φ (B) Alkali Soluble Resin (Parts) B -1 B-2 B-3 B-4 B-5 B-6 Sense of Destruction -107- (104)200811598

Example ο (Ν Η O · · | · inch 1 1 1 1 1 00 Nothing found 5 τ-Η τ-^ 〇· • inch _ 1 1 1 1 1 00 Nothing found 5 οο rH 宕 inch· · Face stupid 1 1 1 00 Nothing found 8 Buddhism τ-Η s · inch · · · 1 1 1 1 1 00 Nothing found 8 ν〇τ-Η ι—Η 宕 inch 1 1 1 1 1 1 1 1 0 〇 〇 未 未 未 未 未 未 未 未 Η 11 11 11 11 11 11 未 11 未 11 未 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 11 未 未 11 未 未 未 11 11 11 S ..inch·· 1 1 1 Cocoon 1 Nothing found 6 (N rH 宕•inch i · · 1111 〇〇1 Not found 8 rH rH rH 宕 inch · · · Window 1 1 〇〇1 Nothing found. No. 6 〇〇. 〇〇 inch (N 办 inch 〇〇 MD 〇〇 φ ^ ^ ^ w ® ^ g ^ ^ ^ Bji ^ pq PQ PQ PQ PQ grinding Φ (B) alkali soluble resin (parts) B -1 B-2 B-3 B-4 B-5 B-6 Retrieving fine 藜 w W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W W 8 - - - 8 Green Pigment (*2)(Parts) - 11 - Building - Blue Pigment (*3) (parts) - - 9 - - Carbon black (parts) - - - 20 - Dispersant (parts) EFKA-46 4 - - - - BYK-2000 - 4 - - - BYK-2001 - - 4 - - BYK-164 - - - 4 - BYK-182 - - - - 4 (B) Alkali-soluble resin (parts) B-7 2 2 2 2 2 B-8 3 3 3 3 3 B-9 4 4 4 4 4 Evaluation of development residue found that no found no side eclips found found line width (micron) 35 45 40 50 45 *1 : CI Pigment Red 245 and CI Pigment Red 177 in a weight ratio of 80:20 mixture * 2 : CI Pigment Green 36 and CI Pigment Yellow 150 in a mixture of weight ratio 60:40 *3: CI Pigment Blue 15:6 and CI Pigment Violet 23 in a mixture of weight ratio 95:5 -109-

Claims (1)

200811598 X. Patent Application No. 1 · A radiation-sensitive composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, and (D) a photoradical generator, wherein the base The soluble resin (B) is a polyester having an alicyclic hydrocarbon skeleton in a main chain and a polymerizable unsaturated bond in a side chain, and the radiation-sensitive composition is used to form a dye layer. 2. The radiation-sensitive composition of claim 1, wherein the component (B) is a polyester represented by the following formula (1): Wherein each of X is independently a divalent group represented by the following formula (2) or (3), and each of Y is independently a residue obtained by removing four carboxyl groups from the organic tetracarboxylic acid, and each of R1 is Independently a hydrogen atom or a methyl group, each of R 2 is independently a residue of a hydrogen atom or a carboxyl blocking agent, and η is an integer of 1 to 40, -110- 200811598 (2) 3. The radiation-sensitive composition according to claim 1 or 2, wherein the photo-radical generating agent (D) is a compound represented by the following formula (4) or (5): Wherein each R 3 is independently a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms or a phenyl group, and each R 4 is independently a hydrogen atom, a straight chain having 1 to 12 carbon atoms, A branched or cyclic alkyl group or a phenyl group, each R5 is independently a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 12 carbon atoms, and each of R6, R7 and R8 is independently a hydrogen atom or a linear, branched or cyclic alkyl group having 1 to 6 carbon atoms, which is limited to -111 - 200811598 (3) is an alkyl group represented by each of R3, R4, R5, R6, R7 and R8 Substituted by a substituent selected from a linear, branched or cyclic alkoxy group having 1 to 6 carbon atoms, a phenyl group and a halogen atom, and the phenyl group represented by R3 and R4 may be selected from having 1 Substituted to a linear, branched or cyclic alkyl group of 6 carbon atoms, a linear, branched or cyclic alkoxy group having 1 to 6 carbon atoms, a substituent of a phenyl group and a halogen atom. A color filter having a dyed layer obtained by the radiation-sensitive composition of any one of claims 1 to 3. A color liquid crystal display device comprising a color filter as in item 4 of the patent application. -112 200811598 无• · 明 说 单 单 单 单 单 单 单 单 单 单 单 单 单 单 单 单 单 单 单 • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • • Chemical formula of the feature: none