JP4746581B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP4746581B2
JP4746581B2 JP2007104727A JP2007104727A JP4746581B2 JP 4746581 B2 JP4746581 B2 JP 4746581B2 JP 2007104727 A JP2007104727 A JP 2007104727A JP 2007104727 A JP2007104727 A JP 2007104727A JP 4746581 B2 JP4746581 B2 JP 4746581B2
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Japan
Prior art keywords
gas
buffer chamber
reaction tube
wafer
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2007104727A
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English (en)
Japanese (ja)
Other versions
JP2007194668A (ja
JP2007194668A5 (enExample
Inventor
忠司 紺谷
一行 豊田
武敏 佐藤
徹 加賀谷
信人 嶋
信雄 石丸
正憲 境
和幸 奥田
泰志 八木
誠治 渡辺
泰夫 国井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2007104727A priority Critical patent/JP4746581B2/ja
Publication of JP2007194668A publication Critical patent/JP2007194668A/ja
Publication of JP2007194668A5 publication Critical patent/JP2007194668A5/ja
Application granted granted Critical
Publication of JP4746581B2 publication Critical patent/JP4746581B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2007104727A 2007-04-12 2007-04-12 基板処理装置 Expired - Lifetime JP4746581B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007104727A JP4746581B2 (ja) 2007-04-12 2007-04-12 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007104727A JP4746581B2 (ja) 2007-04-12 2007-04-12 基板処理装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2002104011A Division JP3957549B2 (ja) 2002-04-05 2002-04-05 基板処埋装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2011086587A Division JP2011142347A (ja) 2011-04-08 2011-04-08 基板処理装置

Publications (3)

Publication Number Publication Date
JP2007194668A JP2007194668A (ja) 2007-08-02
JP2007194668A5 JP2007194668A5 (enExample) 2008-11-20
JP4746581B2 true JP4746581B2 (ja) 2011-08-10

Family

ID=38450050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007104727A Expired - Lifetime JP4746581B2 (ja) 2007-04-12 2007-04-12 基板処理装置

Country Status (1)

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JP (1) JP4746581B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101487408B1 (ko) * 2013-07-09 2015-01-29 주식회사 엘지실트론 도펀트 반응 장치

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62159433A (ja) * 1986-01-08 1987-07-15 Hitachi Ltd レジスト除去方法及び装置
JP2752235B2 (ja) * 1990-06-26 1998-05-18 株式会社東芝 半導体基板の製造方法
JPH05251391A (ja) * 1992-03-04 1993-09-28 Tokyo Electron Tohoku Kk 半導体ウエハーのプラズマ処理装置
JP3225694B2 (ja) * 1993-05-31 2001-11-05 ソニー株式会社 窒化シリコン膜の形成方法およびｃｖｄ装置
JPH11195647A (ja) * 1997-12-26 1999-07-21 Kokusai Electric Co Ltd 薄膜形成装置及び反応副生成物除去方法
JP2001284307A (ja) * 2000-03-29 2001-10-12 Ftl:Kk 半導体の表面処理方法
JP2001332546A (ja) * 2000-05-24 2001-11-30 Rohm Co Ltd 酸化方法、シリコン酸化膜の製造方法および酸化装置
JP3794243B2 (ja) * 2000-05-31 2006-07-05 東京エレクトロン株式会社 酸化処理方法及びその装置
JP3957549B2 (ja) * 2002-04-05 2007-08-15 株式会社日立国際電気 基板処埋装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101487408B1 (ko) * 2013-07-09 2015-01-29 주식회사 엘지실트론 도펀트 반응 장치

Also Published As

Publication number Publication date
JP2007194668A (ja) 2007-08-02

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