JP4732359B2 - ウエハーキャリアドア - Google Patents
ウエハーキャリアドア Download PDFInfo
- Publication number
- JP4732359B2 JP4732359B2 JP2006539705A JP2006539705A JP4732359B2 JP 4732359 B2 JP4732359 B2 JP 4732359B2 JP 2006539705 A JP2006539705 A JP 2006539705A JP 2006539705 A JP2006539705 A JP 2006539705A JP 4732359 B2 JP4732359 B2 JP 4732359B2
- Authority
- JP
- Japan
- Prior art keywords
- wafer carrier
- door
- door portion
- outer door
- group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67373—Closed carriers characterised by locking systems
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67386—Closed carriers characterised by the construction of the closed carrier
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
- H01L21/6735—Closed carriers
- H01L21/67389—Closed carriers characterised by atmosphere control
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67772—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving removal of lid, door, cover
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67775—Docking arrangements
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Packaging Frangible Articles (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)
Description
この処理の一部として、ウエハーは、一時的に容器に保管されたり、容器に入れて他のプラントまたはエンドユーザーへ運ばれたりすることがある。これらの段階の間、ウエハーは、ウエハーに損傷を与える汚染物質に晒されることがある。
リアは再使用に先立って徹底的な洗浄を必要とする。最適な洗浄は、ウエハーキャリアの外面および内面上からだけでなく、内部空洞からも汚染物質を除去する。
中で開示されているようなウエハークッション(図示せず)を受容するような形状に形成されていることが好ましい。
が好ましい。
Claims (19)
- ほぼ連続した内面を有する内側ドア部と、前記内側ドア部の少なくとも一部分の上に拡がる外側ドア部とを備える、ウエハーキャリアドアであって、
前記外側ドア部はその中に形成された複数の細長形状の開口部を有し、前記外側ドア部は前記内側ドア部に取り付けられて、それらの間に空洞を形成し、
前記複数の開口部は第1側面群、中央群、及び第2側面群に配列され、前記第1側面群は前記外側ドア部の第1側面に近接して配置され、前記第2側面群は前記第1側面と反対側の前記外側ドア部の第2側面に近接して配置され、前記中央群は前記第1側面群と前記第2側面群との中間に配置され、同中央群がグリッドを備えることを特徴とするウエハーキャリアドア。 - 請求項1に記載のウエハーキャリアドアであって、前記開口部は前記外側ドア部の表面積の少なくとも50パーセント以上に及ぶことを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記開口部は、少なくとも一つの行と少なくとも一つの列とを有する配列で配置されることを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記開口部はそれぞれ、第1方向における長さと、同第1方向を横断する方向における幅とを有し、長さが幅より大きいことを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記開口部は複数の横桟部と複数の縦桟部によって画定されることを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記内側ドア部および前記外側ドア部の少なくとも一方に取り付けられ、少なくとも一部分が前記内側ドア部と前記外側ドア部との間に位置するロック機構を更に備えることを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記外側ドア部の少なくとも一部分
は非透明材料から形成されることを特徴とするウエハーキャリアドア。 - 請求項1に記載のウエハーキャリアドアであって、前記外側ドア部の少なくとも一部分は静電気消散材料から形成されることを特徴とするウエハーキャリアドア。
- 請求項1に記載のウエハーキャリアドアであって、前記内側ドア部および前記外側ドア部の少なくとも一方に取り付けられ、少なくとも一部分が前記内側ドア部と前記外側ドア部との間に位置するロック機構を更に備えることを特徴とするウエハーキャリアドア。
- 複数のウエハーを収容するために内部に形成された凹部と該凹部のほぼ周囲に延びるドア開口部とを有するウエハーキャリア筐体と、
ほぼ連続した内面を有し、透明材料から形成された内側ドア部と、前記内側ドア部を実質的に覆うように同内側ドア部の少なくとも一部分の上に拡がる外側ドア部とを有するウエハーキャリアドアとを備え、
前記外側ドア部は静電気消散非透明材料から形成されると共に、アレイ状をなし且つ前記外側ドア部の中央に配置される複数の開口部を有し、それによって、前記ウエハーキャリアの内部の物体を視認できるように構成されたことを特徴とするウエハーキャリア。 - 請求項10に記載のウエハーキャリアであって、前記開口部は前記外側ドア部の表面積の少なくとも50パーセント以上に及ぶことを特徴とするウエハーキャリア。
- 請求項10に記載のウエハーキャリアであって、前記開口部は、少なくとも一つの行と少なくとも一つの列を有する配列で配置されることを特徴とするウエハーキャリア。
- 請求項10に記載のウエハーキャリアであって、前記開口部はそれぞれ、第1方向における長さと、同第1方向を横断する方向における幅とを有し、長さが幅より大きいことを特徴とするウエハーキャリア。
- 請求項10に記載のウエハーキャリアであって、前記開口部は複数の横桟部と複数の縦桟部によって画定されることを特徴とするウエハーキャリア。
- 請求項10に記載のウエハーキャリアであって、前記開口部は第1側面群、中央群、および第2側面群に配列され、前記第1側面群は前記外側ドア部の第1側面に近接して配置され、前記第2側面群は前記第1側面と反対側の前記外側ドア部の第2側面に近接して配置され、前記中央群は前記第1側面群と前記第2側面群との中間に配置されることを特徴とするウエハーキャリア。
- 請求項10に記載のウエハーキャリアであって、前記内側ドア部および前記外側ドア部の少なくとも一方に取り付けられ、少なくとも一部分が前記内側ドア部と前記外側ドア部との間に位置するロック機構を更に備えることを特徴とするウエハーキャリア。
- 透明材料から形成された内部ドアと、静電気消散非透明材料から形成された外側ドア部とを備える、ウエハーキャリアドアであって、
前記外側ドア部はその中に形成され且つ同外側ドア部の中央に配置された一連の開口部を有し、前記外側ドア部は前記ウエハーキャリアドアを通した視界を提供するように前記内側ドア部と組み合わされることを特徴とするウエハーキャリアドア。 - 請求項17に記載のウエハーキャリアドアであって、前記開口部は前記外側ドア部の表面積の少なくとも50パーセント以上に及ぶことを特徴とするウエハーキャリアドア。
- 請求項17に記載のウエハーキャリアドアであって、前記開口部は、少なくとも一つの行と少なくとも一つの列を有する配列で配置されることを特徴とするウエハーキャリアドア。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51823803P | 2003-11-07 | 2003-11-07 | |
US60/518,238 | 2003-11-07 | ||
US10/983,107 US7344030B2 (en) | 2003-11-07 | 2004-11-05 | Wafer carrier with apertured door for cleaning |
US10/983,107 | 2004-11-05 | ||
PCT/US2004/037163 WO2005048306A2 (en) | 2003-11-07 | 2004-11-08 | Wafer carrier door |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007525020A JP2007525020A (ja) | 2007-08-30 |
JP4732359B2 true JP4732359B2 (ja) | 2011-07-27 |
Family
ID=34594899
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006539705A Expired - Fee Related JP4732359B2 (ja) | 2003-11-07 | 2004-11-08 | ウエハーキャリアドア |
Country Status (5)
Country | Link |
---|---|
US (1) | US7344030B2 (ja) |
EP (1) | EP1680805A4 (ja) |
JP (1) | JP4732359B2 (ja) |
KR (1) | KR100818380B1 (ja) |
WO (1) | WO2005048306A2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI251858B (en) * | 2004-09-17 | 2006-03-21 | Ind Tech Res Inst | Six-linkage positioning mechanism |
KR100702844B1 (ko) * | 2005-11-14 | 2007-04-03 | 삼성전자주식회사 | 로드락 챔버 및 그를 이용한 반도체 제조설비 |
KR100805823B1 (ko) * | 2006-10-16 | 2008-02-21 | 한국표준과학연구원 | 광학요소 표면 측정 시스템 및 그 방법 |
TWI358379B (en) * | 2008-08-14 | 2012-02-21 | Gudeng Prec Industral Co Ltd | A wafer container with at least one latch |
TWM565877U (zh) * | 2017-08-25 | 2018-08-21 | 中勤實業股份有限公司 | Wafer box |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000306988A (ja) * | 1999-04-20 | 2000-11-02 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
JP2001512288A (ja) * | 1997-08-01 | 2001-08-21 | フルオロウェア・インコーポレーテッド | ドア付きウェハーエンクロージャ |
JP2001298077A (ja) * | 2000-04-14 | 2001-10-26 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
JP2001354249A (ja) * | 2000-06-12 | 2001-12-25 | Shin Etsu Polymer Co Ltd | 基板収納容器の蓋体 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5173273A (en) * | 1990-10-11 | 1992-12-22 | Brewer Charles A | Cassette for dental instruments |
US5785186A (en) * | 1994-10-11 | 1998-07-28 | Progressive System Technologies, Inc. | Substrate housing and docking system |
US5713711A (en) * | 1995-01-17 | 1998-02-03 | Bye/Oasis | Multiple interface door for wafer storage and handling container |
US5711427A (en) * | 1996-07-12 | 1998-01-27 | Fluoroware, Inc. | Wafer carrier with door |
US5915562A (en) * | 1996-07-12 | 1999-06-29 | Fluoroware, Inc. | Transport module with latching door |
WO1999034939A1 (en) | 1998-01-09 | 1999-07-15 | Fluoroware, Inc. | Wafer container washing apparatus |
US6267245B1 (en) * | 1998-07-10 | 2001-07-31 | Fluoroware, Inc. | Cushioned wafer container |
US6945405B1 (en) | 1999-07-08 | 2005-09-20 | Entegris, Inc. | Transport module with latching door |
US6412502B1 (en) | 1999-07-28 | 2002-07-02 | Semitool, Inc. | Wafer container cleaning system |
JP2003092345A (ja) * | 2001-07-13 | 2003-03-28 | Semiconductor Leading Edge Technologies Inc | 基板収納容器、基板搬送システム、保管装置及びガス置換方法 |
JP3697478B2 (ja) * | 2001-08-20 | 2005-09-21 | ソニー株式会社 | 基板の移送方法及びロードポート装置並びに基板移送システム |
US6880718B2 (en) | 2002-01-15 | 2005-04-19 | Entegris, Inc. | Wafer carrier door and spring biased latching mechanism |
US6749067B2 (en) | 2002-01-16 | 2004-06-15 | Entegris, Inc. | Wafer carrier door with form fitting mechanism cover |
KR100583726B1 (ko) * | 2003-11-12 | 2006-05-25 | 삼성전자주식회사 | 기판 처리 장치 및 기판 처리 방법 |
-
2004
- 2004-11-05 US US10/983,107 patent/US7344030B2/en active Active
- 2004-11-08 WO PCT/US2004/037163 patent/WO2005048306A2/en active Application Filing
- 2004-11-08 JP JP2006539705A patent/JP4732359B2/ja not_active Expired - Fee Related
- 2004-11-08 EP EP04810521A patent/EP1680805A4/en not_active Withdrawn
- 2004-11-08 KR KR1020067008914A patent/KR100818380B1/ko not_active IP Right Cessation
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001512288A (ja) * | 1997-08-01 | 2001-08-21 | フルオロウェア・インコーポレーテッド | ドア付きウェハーエンクロージャ |
JP2000306988A (ja) * | 1999-04-20 | 2000-11-02 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
JP2001298077A (ja) * | 2000-04-14 | 2001-10-26 | Shin Etsu Polymer Co Ltd | 基板収納容器 |
JP2001354249A (ja) * | 2000-06-12 | 2001-12-25 | Shin Etsu Polymer Co Ltd | 基板収納容器の蓋体 |
Also Published As
Publication number | Publication date |
---|---|
KR20060088902A (ko) | 2006-08-07 |
JP2007525020A (ja) | 2007-08-30 |
US20050115591A1 (en) | 2005-06-02 |
EP1680805A4 (en) | 2009-01-14 |
WO2005048306A2 (en) | 2005-05-26 |
US7344030B2 (en) | 2008-03-18 |
KR100818380B1 (ko) | 2008-04-02 |
EP1680805A2 (en) | 2006-07-19 |
WO2005048306A3 (en) | 2007-04-19 |
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Free format text: JAPANESE INTERMEDIATE CODE: R250 |
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LAPS | Cancellation because of no payment of annual fees |