JP4728089B2 - シート状プラズマ発生装置および成膜装置 - Google Patents
シート状プラズマ発生装置および成膜装置 Download PDFInfo
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- JP4728089B2 JP4728089B2 JP2005309810A JP2005309810A JP4728089B2 JP 4728089 B2 JP4728089 B2 JP 4728089B2 JP 2005309810 A JP2005309810 A JP 2005309810A JP 2005309810 A JP2005309810 A JP 2005309810A JP 4728089 B2 JP4728089 B2 JP 4728089B2
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- 238000001704 evaporation Methods 0.000 claims description 36
- 239000000463 material Substances 0.000 claims description 35
- 239000000758 substrate Substances 0.000 claims description 30
- 230000004907 flux Effects 0.000 claims description 23
- 230000001846 repelling effect Effects 0.000 claims description 16
- 239000010408 film Substances 0.000 description 87
- 238000009826 distribution Methods 0.000 description 32
- 230000008020 evaporation Effects 0.000 description 19
- 230000015572 biosynthetic process Effects 0.000 description 11
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 6
- 239000000395 magnesium oxide Substances 0.000 description 6
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 6
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000007733 ion plating Methods 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 238000003892 spreading Methods 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 229910001172 neodymium magnet Inorganic materials 0.000 description 2
- 229910052772 Samarium Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- KZUNJOHGWZRPMI-UHFFFAOYSA-N samarium atom Chemical compound [Sm] KZUNJOHGWZRPMI-UHFFFAOYSA-N 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/081—Oxides of aluminium, magnesium or beryllium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32623—Mechanical discharge control means
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3293—Tin oxides, stannates or oxide forming salts thereof, e.g. indium tin oxide [ITO]
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Plasma Technology (AREA)
Description
膜厚(目標):12000Å
放電圧力:0.1Pa
基板温度:200℃
Ar流量:30sccm(0.5ml/sec)
O2流量:400sccm(6.7ml/sec)
成膜速度:175Å/sec
20 プラズマガン
21 ホローカソード
22 電極マグネット
23 電極コイル
25 プラズマビーム
26 収束コイル
27 本発明のシート状プラズマ発生装置に採用されるシート化マグネット
27a、27b、・・・ 分割された永久磁石
28 シート状プラズマビーム
29 従来のシート状プラズマ発生装置に採用されるシート化マグネット
30 成膜室
31 蒸発材料
32 蒸発材料受け皿
33 基板
34 アノードマグネット
100 従来の成膜装置
Claims (4)
- プラズマガンから収束コイルにより引き出した円形ビーム断面を有するプラズマビームを、当該プラズマビームの進行方向に対して直交する方向に延び、対向して配置されて対になっている永久磁石からなるシート化マグネットによって形成される磁場の中に通過させてシート状に変形させるシート状プラズマ発生装置において、
前記シート化マグネットは、該ビームを挟んで対向して配置された対の磁石から各々がなる第1のシート化マグネットと第2のシート化マグネットからなり、該第1と第2のシート化マグネットはビーム進行方向に並置され、該第1のシート化マグネットはプラズマビームの中心側に対応する部分における反発磁場強度とプラズマビームの外縁側に対応する部分における反発磁場強度とが同じ反発磁場を形成しており、該第2のシート化マグネットはプラズマビームの中心側に対応する部分における反発磁場強度の方が、プラズマビームの外縁側に対応する部分における反発磁場強度より強い反発磁場を形成しており、
前記第2のシート化マグネットは、プラズマビームに対して直交する方向において複数に分割されていることを特徴とするシート状プラズマ発生装置。 - 複数に分割されている該第2のシート化マグネットは、プラズマビームの中心側に対応する部分における永久磁石が、プラズマビームの外縁側に対応する部分における永久磁石よりもプラズマビームに対して近接して配置され、前記中心側に対応する部分で互いに対向する永久磁石同士の間隔の方が、前記外縁側に対応する部分において互いに対向する永久磁石同士の間隔よりも狭いことを特徴とする請求項1記載のシート状プラズマ発生装置。
- 複数に分割されている該第2のシート化マグネットは、プラズマビームの中心側に対応する部分における永久磁石の残留磁束密度の方が、プラズマビームの外縁側に対応する部分における永久磁石の残留磁束密度よりも大きく、前記中心側に対応する部分で互いに対向する永久磁石同士による反発磁場強度の方が、前記外縁側に対応する部分において互いに対向する永久磁石同士による反発磁場強度よりも強いことを特徴とする請求項1記載のシート状プラズマ発生装置。
- 請求項1乃至3のいずれか一項記載のシート状プラズマ発生装置で生成されたシート状プラズマを成膜室に配置された蒸発材料に入射させて成膜室で基板上に成膜することを特徴とする成膜装置。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005309810A JP4728089B2 (ja) | 2005-10-25 | 2005-10-25 | シート状プラズマ発生装置および成膜装置 |
CN2006800399087A CN101297060B (zh) | 2005-10-25 | 2006-10-10 | 片状等离子体发生装置及使用它的成膜方法和成膜装置 |
KR1020087009644A KR20080049135A (ko) | 2005-10-25 | 2006-10-10 | 시트상 플라즈마 발생 장치 및 이를 이용한 성막 방법 및성막 장치 |
US12/091,505 US20090238995A1 (en) | 2005-10-25 | 2006-10-10 | Sheet-like plasma generator and film deposition method and equipment employing such sheet-like plasma generator |
PCT/JP2006/320180 WO2007049454A1 (ja) | 2005-10-25 | 2006-10-10 | シート状プラズマ発生装置およびこれを用いた成膜方法並びに成膜装置 |
TW095138586A TW200746930A (en) | 2005-10-25 | 2006-10-19 | Sheet-like plasma generator, and film deposition apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005309810A JP4728089B2 (ja) | 2005-10-25 | 2005-10-25 | シート状プラズマ発生装置および成膜装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007119804A JP2007119804A (ja) | 2007-05-17 |
JP4728089B2 true JP4728089B2 (ja) | 2011-07-20 |
Family
ID=37967570
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005309810A Active JP4728089B2 (ja) | 2005-10-25 | 2005-10-25 | シート状プラズマ発生装置および成膜装置 |
Country Status (6)
Country | Link |
---|---|
US (1) | US20090238995A1 (ja) |
JP (1) | JP4728089B2 (ja) |
KR (1) | KR20080049135A (ja) |
CN (1) | CN101297060B (ja) |
TW (1) | TW200746930A (ja) |
WO (1) | WO2007049454A1 (ja) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1296565C (zh) * | 2004-03-16 | 2007-01-24 | 陈法根 | 框架式组合堤坝 |
WO2007066606A1 (ja) * | 2005-12-06 | 2007-06-14 | Shinmaywa Industries, Ltd. | プラズマ成膜装置 |
JP4368417B2 (ja) * | 2007-04-24 | 2009-11-18 | キヤノンアネルバ株式会社 | プラズマ発生装置およびこれを用いた成膜方法並びに成膜装置 |
JP4660570B2 (ja) * | 2008-04-15 | 2011-03-30 | キヤノンアネルバ株式会社 | 真空成膜装置及び成膜方法 |
CN101530777B (zh) * | 2009-03-06 | 2012-02-01 | 西安交通大学 | 一种等离子体化学反应装置 |
JP5819768B2 (ja) * | 2012-04-10 | 2015-11-24 | 小島プレス工業株式会社 | プラズマcvd装置 |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185966A (ja) * | 1989-01-12 | 1990-07-20 | Kawasaki Steel Corp | 幅方向に均一なシートプラズマ流の発生方法 |
JPH04268073A (ja) * | 1991-02-21 | 1992-09-24 | Chugai Ro Co Ltd | 圧力勾配型プラズマガンによるプラズマ発生装置 |
JPH06349593A (ja) * | 1993-06-07 | 1994-12-22 | Sumitomo Heavy Ind Ltd | シートプラズマ生成方法及びその装置 |
JPH0978230A (ja) * | 1995-09-19 | 1997-03-25 | Chugai Ro Co Ltd | シート状プラズマ発生装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5400661A (en) * | 1993-05-20 | 1995-03-28 | Advanced Mechanical Technology, Inc. | Multi-axis force platform |
-
2005
- 2005-10-25 JP JP2005309810A patent/JP4728089B2/ja active Active
-
2006
- 2006-10-10 CN CN2006800399087A patent/CN101297060B/zh active Active
- 2006-10-10 US US12/091,505 patent/US20090238995A1/en not_active Abandoned
- 2006-10-10 WO PCT/JP2006/320180 patent/WO2007049454A1/ja active Application Filing
- 2006-10-10 KR KR1020087009644A patent/KR20080049135A/ko not_active Application Discontinuation
- 2006-10-19 TW TW095138586A patent/TW200746930A/zh unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02185966A (ja) * | 1989-01-12 | 1990-07-20 | Kawasaki Steel Corp | 幅方向に均一なシートプラズマ流の発生方法 |
JPH04268073A (ja) * | 1991-02-21 | 1992-09-24 | Chugai Ro Co Ltd | 圧力勾配型プラズマガンによるプラズマ発生装置 |
JPH06349593A (ja) * | 1993-06-07 | 1994-12-22 | Sumitomo Heavy Ind Ltd | シートプラズマ生成方法及びその装置 |
JPH0978230A (ja) * | 1995-09-19 | 1997-03-25 | Chugai Ro Co Ltd | シート状プラズマ発生装置 |
Also Published As
Publication number | Publication date |
---|---|
JP2007119804A (ja) | 2007-05-17 |
TW200746930A (en) | 2007-12-16 |
CN101297060B (zh) | 2011-08-17 |
US20090238995A1 (en) | 2009-09-24 |
TWI336217B (ja) | 2011-01-11 |
KR20080049135A (ko) | 2008-06-03 |
CN101297060A (zh) | 2008-10-29 |
WO2007049454A1 (ja) | 2007-05-03 |
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