JP4700903B2 - 含水粉末化粧料基材および化粧料 - Google Patents
含水粉末化粧料基材および化粧料 Download PDFInfo
- Publication number
- JP4700903B2 JP4700903B2 JP2003393691A JP2003393691A JP4700903B2 JP 4700903 B2 JP4700903 B2 JP 4700903B2 JP 2003393691 A JP2003393691 A JP 2003393691A JP 2003393691 A JP2003393691 A JP 2003393691A JP 4700903 B2 JP4700903 B2 JP 4700903B2
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- Prior art keywords
- water
- cosmetic
- extract
- oil
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Landscapes
- Cosmetics (AREA)
Description
(A)疎水性微細シリカ 0.1〜5.0質量%
(B)水 50〜99.9質量%
(但し上記(A)成分は、目開き45μmの篩残が0.1質量%以下であり、単位表面積当たりの表面のOH基の数が0.3個/nm2以下であり、かつ、炭素量が2.8〜4.6質量%である、修飾疎水度が60%以上、比表面積が150〜300m 2 /gの疎水性微細シリカである。)
本発明の主たる特徴は、含水粉末化粧料基材の水または水溶液のパウダー化に、特定の疎水性微細シリカ、すなわち、単位表面積当たりの表面のOH基の数が0.3個/nm2以下であり、かつ修飾疎水度が60%以上の疎水性微細シリカを使用した点にある。このような疎水性微細シリカを使用することによって、少ない疎水性微細シリカの使用量で微細かつ粒度分布の狭く、化粧料として使用した場合に液化速度が速く塗布感が良好で、塗布後に粉残りが少なく、きしみ感のない化粧料となる。
が挙げられるが、これら例示に限定されるものでない。油状成分は1種または2種以上を用いることができる。
下記表1に示す組成の含水粉末化粧料を下記方法により各々調製し、粉末化可否並びに使用感触などについて評価を行った。
「疎水性微細シリカA」:比表面積200m2/g、炭素量3.5質量%、OH基数0.26個/nm2、修飾疎水度63%
「疎水性微細シリカB」:比表面積192m2/g、炭素量2.8質量%、OH基数0.15個/nm2、修飾疎水度62%
「疎水性微細シリカC」:比表面積253m2/g、炭素量4.6質量%、OH基数0.25個/nm2、修飾疎水度63%
A:表1の成分3〜6の何れかを室温下にて、ヘンシェルミキサーを用いて撹拌する。
B:表1の成分1〜2および7〜8を室温下にて、混合溶解する。
C:Aを撹拌しているところへ、Bをゆっくりと添加し、美肌パウダーを得た。
1.粉末化可否
得られた美肌パウダーの製造直後の状態を目視によって観察し、下記の基準により評価を行った。
[評価基準]
◎:非常に均質に粉末化されている。
○:やや不均質な部分はあるものの、粉末化されている。
△:下部に、粉末化されない水性成分が認められる。
×:疎水性微細シリカまたは疎水化無水ケイ酸が水性成分中に分散しないで、
表面に浮いた状態となり、粉末化が全くできていない。
20名の女性に、毎日1回、連続10日間の使用テストを行った。サンプルを適量掌にとり、塗擦して液化した後、それを顔面に塗布した。塗擦した際の「液化性」、使用中の「のびの滑らかさ」および使用後の「しっとり感」について下記基準より5段階評価し、さらにそれを平均して判定した。これらの総合評価を美肌効果とした。
5点:非常に良好
4点:良好
3点:普通
2点:やや不良
1点:不良
◎:平均点4.5点以上。
○:平均点3.5点以上4.5点未満。
△:平均点2.5点以上3.5点未満。
×:平均点2.5点未満。
上記評価方法により得られた結果を前記表1に併せて示す。
<美肌パウダー>(しっとりタイプ):(成分)(%)
1.アロエエキス 37.5
2.1,3−ブチレングリコール 1.0
3.グリセリン 1.0
4.ピロリドンカルボン酸ナトリウム塩水溶液(50
%溶液) 2.00
5.トリメチルグリシン 1.0
6.防腐剤 0.30
7.疎水性微細シリカA 1.0
8.精製水 56.20
A:成分1〜6および8を室温下にて、混合溶解する。
B:ヘンシェルミキサーを用いて成分7を撹拌し、それにAをゆっくりと添加注入して美肌パウダーを得た。
得られた化粧料は、優れた美肌効果を示し、均質な粉末形態を有し、塗擦時の液化性も良好で、使用感に優れ、特に使用後のしっとり感、保湿効果に優れた美肌パウダーであった。
<美肌パウダー>(さっぱりタイプ):(成分)(%)
1.プラセタンエキス 13.0
2.1,3−ブチレングリコール 20.0
3.防腐剤 0.3
4.酸化防止剤 0.05
5.キレート剤 0.1
6.疎水性微細シリカB 2.0
7.精製水 64.55
A:成分1〜5および7を70℃にて撹拌混合した後、冷却する。
B:ヘンシェルミキサーを用いて成分6を撹拌し、それにAをゆっくりと添加注入して美肌パウダーを得た。
得られた化粧料は、優れた美肌効果を有し、均質な粉末形態を有し、塗擦時の液化性も良好で、使用感に優れ、特に使用後に肌を柔軟化させるエモリエント効果に優れた美肌パウダーであった。
Claims (4)
- 下記成分(A)および(B)を必須成分として含むことを特徴とする含水粉末化粧料基材。
(A)疎水性微細シリカ 0.1〜5.0質量%
(B)水 50〜99.9質量%
(但し上記(A)成分は、目開き45μmの篩残が0.1質量%以下であり、単位表面積当たりの表面のOH基の数が0.3個/nm2以下であり、かつ、炭素量が2.8〜4.6質量%である、修飾疎水度が60%以上、比表面積が150〜300m 2 /gの疎水性微細シリカである。) - 請求項1に記載の含水粉末化粧料基材に、さらに水溶性または水不溶性の化粧料原料を含むことを特徴とする含水粉末化粧料。
- 前記水不溶性化粧料原料が油状物であり、該油状物が前記水に乳化している請求項2に記載の含水粉末化粧料。
- 前記化粧料原料が、水溶性物質であり、該水溶性物質が前記水に溶解している請求項2に記載の含水粉末化粧料。
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CN113662865A (zh) * | 2021-08-26 | 2021-11-19 | 上海家化联合股份有限公司 | 包含亲水性粉末的水性分散液 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0710524A (ja) * | 1993-06-23 | 1995-01-13 | Tokuyama Corp | 疎水性微細シリカおよびその製造方法 |
JP2000247823A (ja) * | 1999-02-26 | 2000-09-12 | Shiseido Co Ltd | 粉末化粧料 |
JP2000309505A (ja) * | 1999-02-26 | 2000-11-07 | Shiseido Co Ltd | 粉末化粧料 |
JP2002326904A (ja) * | 2001-05-08 | 2002-11-15 | Shiseido Co Ltd | 粉末状化粧料 |
JP2003267826A (ja) * | 2002-03-14 | 2003-09-25 | Shiseido Co Ltd | 粉末状化粧料 |
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Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0710524A (ja) * | 1993-06-23 | 1995-01-13 | Tokuyama Corp | 疎水性微細シリカおよびその製造方法 |
JP2000247823A (ja) * | 1999-02-26 | 2000-09-12 | Shiseido Co Ltd | 粉末化粧料 |
JP2000309505A (ja) * | 1999-02-26 | 2000-11-07 | Shiseido Co Ltd | 粉末化粧料 |
JP2002326904A (ja) * | 2001-05-08 | 2002-11-15 | Shiseido Co Ltd | 粉末状化粧料 |
JP2003267826A (ja) * | 2002-03-14 | 2003-09-25 | Shiseido Co Ltd | 粉末状化粧料 |
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