JP4681849B2 - 除去装置、当該除去装置を有する露光装置、デバイス製造方法 - Google Patents

除去装置、当該除去装置を有する露光装置、デバイス製造方法 Download PDF

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Publication number
JP4681849B2
JP4681849B2 JP2004307860A JP2004307860A JP4681849B2 JP 4681849 B2 JP4681849 B2 JP 4681849B2 JP 2004307860 A JP2004307860 A JP 2004307860A JP 2004307860 A JP2004307860 A JP 2004307860A JP 4681849 B2 JP4681849 B2 JP 4681849B2
Authority
JP
Japan
Prior art keywords
light
reticle
fine particles
irradiation
removal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004307860A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006120895A5 (enExample
JP2006120895A (ja
Inventor
彰律 大久保
賢治 山添
大 大沢
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004307860A priority Critical patent/JP4681849B2/ja
Priority to US11/255,530 priority patent/US7414240B2/en
Publication of JP2006120895A publication Critical patent/JP2006120895A/ja
Publication of JP2006120895A5 publication Critical patent/JP2006120895A5/ja
Application granted granted Critical
Publication of JP4681849B2 publication Critical patent/JP4681849B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
    • B08B7/0042—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by laser
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925—Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2004307860A 2004-10-22 2004-10-22 除去装置、当該除去装置を有する露光装置、デバイス製造方法 Expired - Fee Related JP4681849B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004307860A JP4681849B2 (ja) 2004-10-22 2004-10-22 除去装置、当該除去装置を有する露光装置、デバイス製造方法
US11/255,530 US7414240B2 (en) 2004-10-22 2005-10-20 Particle remover, exposure apparatus having the same, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004307860A JP4681849B2 (ja) 2004-10-22 2004-10-22 除去装置、当該除去装置を有する露光装置、デバイス製造方法

Publications (3)

Publication Number Publication Date
JP2006120895A JP2006120895A (ja) 2006-05-11
JP2006120895A5 JP2006120895A5 (enExample) 2007-12-06
JP4681849B2 true JP4681849B2 (ja) 2011-05-11

Family

ID=36205070

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004307860A Expired - Fee Related JP4681849B2 (ja) 2004-10-22 2004-10-22 除去装置、当該除去装置を有する露光装置、デバイス製造方法

Country Status (2)

Country Link
US (1) US7414240B2 (enExample)
JP (1) JP4681849B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7628865B2 (en) * 2006-04-28 2009-12-08 Asml Netherlands B.V. Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
US7993464B2 (en) * 2007-08-09 2011-08-09 Rave, Llc Apparatus and method for indirect surface cleaning
US9140415B2 (en) * 2010-12-21 2015-09-22 Koninklijke Philips N.V. Lighting device with polymer containing matrices
WO2014051121A1 (ja) * 2012-09-28 2014-04-03 株式会社ニコン 露光方法及び装置、並びにデバイス製造方法
US11145427B2 (en) * 2019-07-31 2021-10-12 Taiwan Semiconductor Manufacturing Company, Ltd. Tool and method for particle removal
US11822231B2 (en) 2021-03-30 2023-11-21 Taiwan Semiconductor Manufacturing Company Ltd. Method for removing particles from pellicle and photomask
US11687012B2 (en) * 2021-06-25 2023-06-27 Taiwan Semiconductor Manufacturing Company, Ltd. Reduce mask defect impact by contamination decompose

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05100182A (ja) 1991-10-11 1993-04-23 Nikon Corp レーザトラツプ集塵装置及び集塵方法
JPH0671164A (ja) * 1992-08-31 1994-03-15 Hitachi Ltd 浮遊粒子の流動制御方法及び装置
JPH10223512A (ja) * 1997-02-10 1998-08-21 Nikon Corp 電子ビーム投影露光装置
JPH1126411A (ja) * 1997-06-30 1999-01-29 Nikon Corp 洗浄装置
JP2001269636A (ja) * 2000-03-27 2001-10-02 Japan Steel Works Ltd:The レーザクリーニング方法および装置
JP2001300450A (ja) * 2000-04-21 2001-10-30 Toshiba Corp 洗浄装置および洗浄方法、レチクルの製造方法
US20020029956A1 (en) * 2000-07-24 2002-03-14 Allen Susan Davis Method and apparatus for removing minute particles from a surface
JP2002273592A (ja) * 2001-03-19 2002-09-25 Matsushita Electric Ind Co Ltd レーザ加工方法及び加工装置
JP2002343761A (ja) * 2001-05-16 2002-11-29 Kubota Corp レーザクリーニング装置およびレーザクリーニング方法
JP2003303800A (ja) * 2002-04-11 2003-10-24 Sony Corp 表面洗浄装置および表面洗浄方法
US20060077361A1 (en) * 2004-10-12 2006-04-13 Michael Sogard Means of removing particles from a membrane mask in a vacuum

Also Published As

Publication number Publication date
US20060086371A1 (en) 2006-04-27
US7414240B2 (en) 2008-08-19
JP2006120895A (ja) 2006-05-11

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