JP4676542B2 - ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 - Google Patents

ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 Download PDF

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JP4676542B2
JP4676542B2 JP2009082005A JP2009082005A JP4676542B2 JP 4676542 B2 JP4676542 B2 JP 4676542B2 JP 2009082005 A JP2009082005 A JP 2009082005A JP 2009082005 A JP2009082005 A JP 2009082005A JP 4676542 B2 JP4676542 B2 JP 4676542B2
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photosensitive resin
resin composition
positive photosensitive
methacrylate
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JP2009258722A (ja
JP2009258722A5 (enExample
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敏 滝田
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Fujifilm Corp
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Fujifilm Corp
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  • Materials For Photolithography (AREA)
  • Epoxy Resins (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2009082005A 2008-03-28 2009-03-30 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法 Active JP4676542B2 (ja)

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JP2009082005A JP4676542B2 (ja) 2008-03-28 2009-03-30 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法

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JP2008088537 2008-03-28
JP2009082005A JP4676542B2 (ja) 2008-03-28 2009-03-30 ポジ型感光性樹脂組成物及びそれを用いた硬化膜形成方法

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JP2009258722A JP2009258722A (ja) 2009-11-05
JP2009258722A5 JP2009258722A5 (enExample) 2010-12-24
JP4676542B2 true JP4676542B2 (ja) 2011-04-27

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Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5452102B2 (ja) * 2009-07-02 2014-03-26 東京応化工業株式会社 レジスト組成物及びレジストパターン形成方法
JP5623896B2 (ja) * 2010-01-15 2014-11-12 富士フイルム株式会社 感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5524037B2 (ja) * 2010-01-19 2014-06-18 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置
JP5623897B2 (ja) * 2010-01-22 2014-11-12 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP5524036B2 (ja) * 2010-01-25 2014-06-18 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、液晶表示装置、及び、有機ｅｌ表示装置
JP5486521B2 (ja) * 2010-03-15 2014-05-07 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
JP4844695B2 (ja) * 2010-04-28 2011-12-28 Ｊｓｒ株式会社 吐出ノズル式塗布法用ポジ型感放射線性組成物、表示素子用層間絶縁膜及びその形成方法
JP5676179B2 (ja) 2010-08-20 2015-02-25 富士フイルム株式会社 ポジ型感光性樹脂組成物、硬化膜の形成方法、硬化膜、有機ｅｌ表示装置、及び、液晶表示装置
KR101693182B1 (ko) 2010-08-30 2017-01-05 후지필름 가부시키가이샤 감광성 수지 조성물, 옥심술포네이트 화합물, 경화막의 형성 방법, 경화막, 유기 ｅｌ 표시 장치, 및 액정 표시 장치
JP5771377B2 (ja) * 2010-10-05 2015-08-26 株式会社ジャパンディスプレイ 表示装置の製造方法
EP2447773B1 (en) * 2010-11-02 2013-07-10 Fujifilm Corporation Method for producing a pattern, method for producing a MEMS structure, use of a cured film of a photosensitive composition as a sacrificial layer or as a component of a MEMS structure
JP5174124B2 (ja) * 2010-11-02 2013-04-03 富士フイルム株式会社 Ｍｅｍｓ構造部材用感光性樹脂組成物、パターン作製方法、並びに、ｍｅｍｓ構造体及びその作製方法
JP5291744B2 (ja) * 2010-11-02 2013-09-18 富士フイルム株式会社 エッチングレジスト用感光性樹脂組成物、パターン作製方法、ｍｅｍｓ構造体及びその作製方法、ドライエッチング方法、ウェットエッチング方法、ｍｅｍｓシャッターデバイス、並びに、画像表示装置
JP5772184B2 (ja) * 2011-04-22 2015-09-02 Jsr株式会社 感放射線性樹脂組成物、表示素子用層間絶縁膜及びその形成方法
JP5433654B2 (ja) * 2011-08-31 2014-03-05 富士フイルム株式会社 感光性樹脂組成物、硬化膜、硬化膜の形成方法、有機ｅｌ表示装置、及び、液晶表示装置
KR101909072B1 (ko) * 2011-08-31 2018-10-18 후지필름 가부시키가이샤 감광성 수지 조성물, 경화막, 경화막의 형성 방법, 유기 ｅｌ 표시 장치, 및, 액정 표시 장치
JP5468650B2 (ja) * 2011-09-29 2014-04-09 富士フイルム株式会社 感光性樹脂組成物、硬化膜並びにその製造方法
KR101629780B1 (ko) * 2011-12-12 2016-06-13 후지필름 가부시키가이샤 전자부재용 포지티브형 감광성 수지 조성물, 경화막 및 표시 장치
JP5550693B2 (ja) * 2011-12-12 2014-07-16 富士フイルム株式会社 電子部材用ポジ型感光性樹脂組成物、硬化膜および表示装置
JP5889704B2 (ja) 2012-04-18 2016-03-22 株式会社ジャパンディスプレイ 液晶表示装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4207604B2 (ja) * 2003-03-03 2009-01-14 Ｊｓｒ株式会社 感放射線性樹脂組成物、層間絶縁膜およびマイクロレンズ、ならびにそれらの形成方法
JP4623311B2 (ja) * 2006-06-14 2011-02-02 信越化学工業株式会社 化学増幅レジスト材料用光酸発生剤、及び該光酸発生剤を含有するレジスト材料、並びにこれを用いたパターン形成方法

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