JP4625375B2 - 検査装置 - Google Patents

検査装置 Download PDF

Info

Publication number
JP4625375B2
JP4625375B2 JP2005176062A JP2005176062A JP4625375B2 JP 4625375 B2 JP4625375 B2 JP 4625375B2 JP 2005176062 A JP2005176062 A JP 2005176062A JP 2005176062 A JP2005176062 A JP 2005176062A JP 4625375 B2 JP4625375 B2 JP 4625375B2
Authority
JP
Japan
Prior art keywords
electron beam
image
inspection
resistance
inspected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2005176062A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006024921A5 (enrdf_load_stackoverflow
JP2006024921A (ja
Inventor
英利 西山
真理 野副
博之 品田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2005176062A priority Critical patent/JP4625375B2/ja
Publication of JP2006024921A publication Critical patent/JP2006024921A/ja
Publication of JP2006024921A5 publication Critical patent/JP2006024921A5/ja
Application granted granted Critical
Publication of JP4625375B2 publication Critical patent/JP4625375B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Tests Of Electronic Circuits (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2005176062A 2000-02-22 2005-06-16 検査装置 Expired - Fee Related JP4625375B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2000050501 2000-02-22
JP2005176062A JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000276640A Division JP4015352B2 (ja) 2000-02-22 2000-09-07 荷電粒子ビームを用いた検査方法

Publications (3)

Publication Number Publication Date
JP2006024921A JP2006024921A (ja) 2006-01-26
JP2006024921A5 JP2006024921A5 (enrdf_load_stackoverflow) 2007-01-25
JP4625375B2 true JP4625375B2 (ja) 2011-02-02

Family

ID=35797943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005176062A Expired - Fee Related JP4625375B2 (ja) 2000-02-22 2005-06-16 検査装置

Country Status (1)

Country Link
JP (1) JP4625375B2 (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12169208B2 (en) 2021-11-30 2024-12-17 Innovatum Instruments Inc. Probe tip X-Y location identification using a charged particle beam
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4978065B2 (ja) * 2006-06-12 2012-07-18 株式会社日立製作所 電子顕微鏡応用装置
JP5171101B2 (ja) * 2007-05-01 2013-03-27 株式会社日立ハイテクノロジーズ 電子線照射条件決定支援ユニット、および電子線式試料検査装置
JP5497980B2 (ja) * 2007-06-29 2014-05-21 株式会社日立ハイテクノロジーズ 荷電粒子線応用装置、及び試料検査方法
JP7189103B2 (ja) * 2019-08-30 2022-12-13 株式会社日立ハイテク 荷電粒子線装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3724949B2 (ja) * 1998-05-15 2005-12-07 株式会社東芝 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US12169208B2 (en) 2021-11-30 2024-12-17 Innovatum Instruments Inc. Probe tip X-Y location identification using a charged particle beam
US12306241B2 (en) 2022-02-14 2025-05-20 Innovatum Instruments Inc. Automated probe landing

Also Published As

Publication number Publication date
JP2006024921A (ja) 2006-01-26

Similar Documents

Publication Publication Date Title
JP4015352B2 (ja) 荷電粒子ビームを用いた検査方法
US7521679B2 (en) Inspection method and inspection system using charged particle beam
JP3955450B2 (ja) 試料検査方法
JP4248382B2 (ja) 荷電粒子ビームによる検査方法および検査装置
JP3973372B2 (ja) 荷電粒子線を用いた基板検査装置および基板検査方法
JP3791095B2 (ja) 回路パターンの検査方法及び検査装置
JP3823073B2 (ja) 電子線を用いた検査方法及び検査装置
JP2000314710A (ja) 回路パターンの検査方法及び検査装置
JP4006119B2 (ja) 回路パターン検査装置、および回路パターン検査方法
JP2009032445A (ja) 走査電子顕微鏡を備えた外観検査装置及び走査電子顕微鏡を用いた画像生成方法
US7910884B2 (en) Apparatus and method for inspection and measurement
JP4625375B2 (ja) 検査装置
JP4625376B2 (ja) 電子ビームによる検査方法
JP3751841B2 (ja) 電子線を用いた検査装置及び電子線を用いた検査方法
US20090261251A1 (en) Inspection apparatus and inspection method
JP4274247B2 (ja) 回路パターンの検査方法及び検査装置
JP5016799B2 (ja) 荷電粒子ビームを用いた検査装置
JP2003133379A (ja) 半導体装置の検査装置及び半導体装置の製造方法
JP2004157135A (ja) 回路パターンの検査方法及び検査装置
JP4090173B2 (ja) 回路パターン検査装置
JP3608451B2 (ja) 走査電子顕微鏡を用いた検査装置および検査方法
JP2004347483A (ja) 電子線を用いたパターン検査装置、及び、電子線を用いたパターン検査方法
JP2003100248A (ja) 荷電粒子線を用いたパターン検査装置
JP2008166635A (ja) 回路パターンの検査装置、および、回路パターンの検査方法
JP2000164657A (ja) 回路パターンの検査装置及び検査方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061003

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20061003

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20061205

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090915

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20091109

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20100608

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100903

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20100914

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20101019

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20101105

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20131112

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees