JP4625375B2 - 検査装置 - Google Patents
検査装置 Download PDFInfo
- Publication number
- JP4625375B2 JP4625375B2 JP2005176062A JP2005176062A JP4625375B2 JP 4625375 B2 JP4625375 B2 JP 4625375B2 JP 2005176062 A JP2005176062 A JP 2005176062A JP 2005176062 A JP2005176062 A JP 2005176062A JP 4625375 B2 JP4625375 B2 JP 4625375B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- image
- inspection
- resistance
- inspected
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Landscapes
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005176062A JP4625375B2 (ja) | 2000-02-22 | 2005-06-16 | 検査装置 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000050501 | 2000-02-22 | ||
JP2005176062A JP4625375B2 (ja) | 2000-02-22 | 2005-06-16 | 検査装置 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000276640A Division JP4015352B2 (ja) | 2000-02-22 | 2000-09-07 | 荷電粒子ビームを用いた検査方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006024921A JP2006024921A (ja) | 2006-01-26 |
JP2006024921A5 JP2006024921A5 (enrdf_load_stackoverflow) | 2007-01-25 |
JP4625375B2 true JP4625375B2 (ja) | 2011-02-02 |
Family
ID=35797943
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005176062A Expired - Fee Related JP4625375B2 (ja) | 2000-02-22 | 2005-06-16 | 検査装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4625375B2 (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12169208B2 (en) | 2021-11-30 | 2024-12-17 | Innovatum Instruments Inc. | Probe tip X-Y location identification using a charged particle beam |
US12306241B2 (en) | 2022-02-14 | 2025-05-20 | Innovatum Instruments Inc. | Automated probe landing |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4978065B2 (ja) * | 2006-06-12 | 2012-07-18 | 株式会社日立製作所 | 電子顕微鏡応用装置 |
JP5171101B2 (ja) * | 2007-05-01 | 2013-03-27 | 株式会社日立ハイテクノロジーズ | 電子線照射条件決定支援ユニット、および電子線式試料検査装置 |
JP5497980B2 (ja) * | 2007-06-29 | 2014-05-21 | 株式会社日立ハイテクノロジーズ | 荷電粒子線応用装置、及び試料検査方法 |
JP7189103B2 (ja) * | 2019-08-30 | 2022-12-13 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3724949B2 (ja) * | 1998-05-15 | 2005-12-07 | 株式会社東芝 | 基板検査装置およびこれを備えた基板検査システム並びに基板検査方法 |
-
2005
- 2005-06-16 JP JP2005176062A patent/JP4625375B2/ja not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12169208B2 (en) | 2021-11-30 | 2024-12-17 | Innovatum Instruments Inc. | Probe tip X-Y location identification using a charged particle beam |
US12306241B2 (en) | 2022-02-14 | 2025-05-20 | Innovatum Instruments Inc. | Automated probe landing |
Also Published As
Publication number | Publication date |
---|---|
JP2006024921A (ja) | 2006-01-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4015352B2 (ja) | 荷電粒子ビームを用いた検査方法 | |
US7521679B2 (en) | Inspection method and inspection system using charged particle beam | |
JP3955450B2 (ja) | 試料検査方法 | |
JP4248382B2 (ja) | 荷電粒子ビームによる検査方法および検査装置 | |
JP3973372B2 (ja) | 荷電粒子線を用いた基板検査装置および基板検査方法 | |
JP3791095B2 (ja) | 回路パターンの検査方法及び検査装置 | |
JP3823073B2 (ja) | 電子線を用いた検査方法及び検査装置 | |
JP2000314710A (ja) | 回路パターンの検査方法及び検査装置 | |
JP4006119B2 (ja) | 回路パターン検査装置、および回路パターン検査方法 | |
JP2009032445A (ja) | 走査電子顕微鏡を備えた外観検査装置及び走査電子顕微鏡を用いた画像生成方法 | |
US7910884B2 (en) | Apparatus and method for inspection and measurement | |
JP4625375B2 (ja) | 検査装置 | |
JP4625376B2 (ja) | 電子ビームによる検査方法 | |
JP3751841B2 (ja) | 電子線を用いた検査装置及び電子線を用いた検査方法 | |
US20090261251A1 (en) | Inspection apparatus and inspection method | |
JP4274247B2 (ja) | 回路パターンの検査方法及び検査装置 | |
JP5016799B2 (ja) | 荷電粒子ビームを用いた検査装置 | |
JP2003133379A (ja) | 半導体装置の検査装置及び半導体装置の製造方法 | |
JP2004157135A (ja) | 回路パターンの検査方法及び検査装置 | |
JP4090173B2 (ja) | 回路パターン検査装置 | |
JP3608451B2 (ja) | 走査電子顕微鏡を用いた検査装置および検査方法 | |
JP2004347483A (ja) | 電子線を用いたパターン検査装置、及び、電子線を用いたパターン検査方法 | |
JP2003100248A (ja) | 荷電粒子線を用いたパターン検査装置 | |
JP2008166635A (ja) | 回路パターンの検査装置、および、回路パターンの検査方法 | |
JP2000164657A (ja) | 回路パターンの検査装置及び検査方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061003 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20061003 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20061205 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20090915 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091109 |
|
A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100608 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100903 |
|
A911 | Transfer to examiner for re-examination before appeal (zenchi) |
Free format text: JAPANESE INTERMEDIATE CODE: A911 Effective date: 20100914 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20101019 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20101105 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20131112 Year of fee payment: 3 |
|
LAPS | Cancellation because of no payment of annual fees |