JP4614538B2 - 真空処理遊星システム工作物キャリヤ - Google Patents

真空処理遊星システム工作物キャリヤ Download PDF

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Publication number
JP4614538B2
JP4614538B2 JP2000588422A JP2000588422A JP4614538B2 JP 4614538 B2 JP4614538 B2 JP 4614538B2 JP 2000588422 A JP2000588422 A JP 2000588422A JP 2000588422 A JP2000588422 A JP 2000588422A JP 4614538 B2 JP4614538 B2 JP 4614538B2
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JP
Japan
Prior art keywords
planetary
lunar
solar
gear
transmission
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2000588422A
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English (en)
Japanese (ja)
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JP2002532626A5 (enExample
JP2002532626A (ja
Inventor
ツェッヘ，マルティーン
クンツ，アントン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oerlikon Surface Solutions AG Pfaeffikon
Original Assignee
Oerlikon Trading AG Truebbach
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Publication date
Application filed by Oerlikon Trading AG Truebbach filed Critical Oerlikon Trading AG Truebbach
Publication of JP2002532626A publication Critical patent/JP2002532626A/ja
Publication of JP2002532626A5 publication Critical patent/JP2002532626A5/ja
Application granted granted Critical
Publication of JP4614538B2 publication Critical patent/JP4614538B2/ja
Anticipated expiration legal-status Critical
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/50—Substrate holders
    • C23C14/505—Substrate holders for rotation of the substrates

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2000588422A 1998-12-15 1999-12-15 真空処理遊星システム工作物キャリヤ Expired - Lifetime JP4614538B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
CH2477/98 1998-12-15
CH247798 1998-12-15
PCT/CH1999/000602 WO2000036178A1 (de) 1998-12-15 1999-12-15 Planetensystem-werkstückträger und verfahren zur oberflächenbehandlung von werkstücken

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010195868A Division JP5268076B2 (ja) 1998-12-15 2010-09-01 真空処理遊星システム工作物キャリヤ

Publications (3)

Publication Number Publication Date
JP2002532626A JP2002532626A (ja) 2002-10-02
JP2002532626A5 JP2002532626A5 (enExample) 2007-02-22
JP4614538B2 true JP4614538B2 (ja) 2011-01-19

Family

ID=4234683

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2000588422A Expired - Lifetime JP4614538B2 (ja) 1998-12-15 1999-12-15 真空処理遊星システム工作物キャリヤ
JP2010195868A Expired - Fee Related JP5268076B2 (ja) 1998-12-15 2010-09-01 真空処理遊星システム工作物キャリヤ

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2010195868A Expired - Fee Related JP5268076B2 (ja) 1998-12-15 2010-09-01 真空処理遊星システム工作物キャリヤ

Country Status (5)

Country Link
US (1) US6620254B2 (enExample)
EP (1) EP1153155B1 (enExample)
JP (2) JP4614538B2 (enExample)
DE (1) DE59911507D1 (enExample)
WO (1) WO2000036178A1 (enExample)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7081166B2 (en) * 1999-12-15 2006-07-25 Unaxis Balzers Aktiengesellschaft Planetary system workpiece support and method for surface treatment of workpieces
EP1256637B1 (de) * 2001-05-08 2005-11-30 Unaxis Balzers Aktiengesellschaft Werkstückträger
DE10308471B4 (de) * 2003-02-20 2005-03-24 Hensoldt Ag Beschichtungsanlage zum Beschichten von Substraten für optische Komponenten
DE102004027989B4 (de) * 2004-06-09 2007-05-10 Esser, Stefan, Dr.-Ing. Werkstückträgervorrichtung zum Halten von Werkstücken
CN100358098C (zh) * 2005-08-05 2007-12-26 中微半导体设备(上海)有限公司 半导体工艺件处理装置
ES2324493T3 (es) * 2005-08-29 2009-08-07 Oerlikon Trading Ag, Trubbach Dispositivo portador de piezas de trabajo.
CH698143B1 (de) * 2006-01-25 2009-05-29 Oerlikon Trading Ag Werkstückträgereinrichtung.
US7431098B2 (en) * 2006-01-05 2008-10-07 Schlumberger Technology Corporation System and method for isolating a wellbore region
DE502007006849D1 (de) 2007-10-08 2011-05-12 Oerlikon Trading Ag Werkstückträgereinrichtung
US9109289B2 (en) 2011-06-27 2015-08-18 United Technologies Corporation Manipulator for coating application
RU2507306C1 (ru) * 2012-09-04 2014-02-20 Открытое акционерное общество "Концерн "Центральный научно-исследовательский институт "Электроприбор" Установка для напыления покрытий на прецизионные детали узлов гироприборов
DE102018126862A1 (de) 2018-10-26 2020-04-30 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung und Beschichtungsanordnung
JP6845877B2 (ja) * 2019-02-14 2021-03-24 Ｔｏｗａ株式会社 ワーク保持部回転ユニット及び真空処理装置
DE102019110158A1 (de) 2019-04-17 2020-10-22 Oerlikon Surface Solutions Ag, Pfäffikon Werkstückträgereinrichtung
CN114008757B (zh) 2019-05-07 2025-08-12 欧瑞康表面处理解决方案股份公司普费菲孔 用于保持待处理工件的移动式工件承载装置
US12447491B2 (en) 2019-07-26 2025-10-21 Oerlikon Surface Solutions Ag, Pfäffikon Fixture to be used in PVD processes for cylindrical, elongated substrates
CN110760810B (zh) * 2019-11-27 2022-04-08 中山凯旋真空科技股份有限公司 转架及具有其的镀膜设备
JPWO2024209529A1 (enExample) * 2023-04-04 2024-10-10

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3598083A (en) * 1969-10-27 1971-08-10 Varian Associates Complex motion mechanism for thin film coating apparatuses
US3853091A (en) * 1973-12-03 1974-12-10 Ibm Thin film coating apparatus
US4284033A (en) * 1979-10-31 1981-08-18 Rca Corporation Means to orbit and rotate target wafers supported on planet member
JPH01133320A (ja) * 1987-11-18 1989-05-25 Toshiba Mach Co Ltd 薄膜処理装置
JPH01133318A (ja) * 1987-11-18 1989-05-25 Toshiba Mach Co Ltd 薄膜処理装置
JPH01309967A (ja) * 1988-06-07 1989-12-14 Ishikawajima Harima Heavy Ind Co Ltd スパッタリング用基板ホルダの駆動装置
US5558721A (en) * 1993-11-15 1996-09-24 The Furukawa Electric Co., Ltd. Vapor phase growth system and a gas-drive motor

Also Published As

Publication number Publication date
US20020094383A1 (en) 2002-07-18
EP1153155A1 (de) 2001-11-14
DE59911507D1 (de) 2005-02-24
JP2010265552A (ja) 2010-11-25
EP1153155B1 (de) 2005-01-19
WO2000036178A1 (de) 2000-06-22
US6620254B2 (en) 2003-09-16
JP2002532626A (ja) 2002-10-02
JP5268076B2 (ja) 2013-08-21

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