JP4602710B2 - 形状形成方法 - Google Patents
形状形成方法 Download PDFInfo
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- JP4602710B2 JP4602710B2 JP2004226837A JP2004226837A JP4602710B2 JP 4602710 B2 JP4602710 B2 JP 4602710B2 JP 2004226837 A JP2004226837 A JP 2004226837A JP 2004226837 A JP2004226837 A JP 2004226837A JP 4602710 B2 JP4602710 B2 JP 4602710B2
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- light
- aqueous solution
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- photocatalyst
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- 238000000034 method Methods 0.000 title claims description 33
- 230000015572 biosynthetic process Effects 0.000 title description 3
- 239000007864 aqueous solution Substances 0.000 claims description 58
- 230000003287 optical effect Effects 0.000 claims description 37
- 239000011941 photocatalyst Substances 0.000 claims description 35
- 238000013032 photocatalytic reaction Methods 0.000 claims description 16
- 229910021645 metal ion Inorganic materials 0.000 claims description 12
- 239000002105 nanoparticle Substances 0.000 claims description 12
- 229910052751 metal Inorganic materials 0.000 claims description 7
- 239000002184 metal Substances 0.000 claims description 7
- 230000001699 photocatalysis Effects 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 description 19
- 239000004332 silver Substances 0.000 description 19
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 16
- 239000000463 material Substances 0.000 description 12
- 230000005284 excitation Effects 0.000 description 9
- 238000001459 lithography Methods 0.000 description 9
- 238000010521 absorption reaction Methods 0.000 description 7
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 6
- 230000001678 irradiating effect Effects 0.000 description 6
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 5
- 239000007788 liquid Substances 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- 239000002245 particle Substances 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- FOIXSVOLVBLSDH-UHFFFAOYSA-N Silver ion Chemical compound [Ag+] FOIXSVOLVBLSDH-UHFFFAOYSA-N 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- 238000006722 reduction reaction Methods 0.000 description 3
- -1 silver ions Chemical class 0.000 description 3
- 101710134784 Agnoprotein Proteins 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 238000002845 discoloration Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000005286 illumination Methods 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
- 229910052753 mercury Inorganic materials 0.000 description 2
- 239000002985 plastic film Substances 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 238000012356 Product development Methods 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229920006020 amorphous polyamide Polymers 0.000 description 1
- 230000000844 anti-bacterial effect Effects 0.000 description 1
- 230000003373 anti-fouling effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 230000001877 deodorizing effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
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- 238000000465 moulding Methods 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006149 polyester-amide block copolymer Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Catalysts (AREA)
- Chemically Coating (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Micromachines (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Description
2 照射する紫外線
3 ウエハ
4 水溶液中に照射した光が集光して銀に変化する特定点
5 レーザー
6,7 ビームエキスパンダーの光学系
8 11 ガルバノミラー
9,10 光学系
12 対物レンズ
13 円筒ホルダー
23 円筒ホルダーの外のウエハ部
14 照明光 15 スリット 16 投影光学系
17 検出光学系 18 拡大光学系 19 CCDセンサー
20 チャック 21 Z駆動系 22 XYステージ
Claims (3)
- 光触媒ナノ粒子と金属イオンを含む水溶液の層に、光源手段からの紫外線光束を光学手段を介して該層内に光進行方向に沿って光強度分布が形成されるように照射させ、該層と、該層内の光との相対的位置を三次元的に変化させて、該層内における該金属イオンを光触媒反応により金属とし、該金属が該光触媒ナノ粒子の表面に固定するようにして、他のステップを介さずに該金属により三次元形状を形成することを特徴とする形状形成方法。
- 前記光触媒ナノ粒子の直径は5nm以上200nm以下であることを特徴とする請求項1記載の形状形成方法。
- 前記水溶液の表面を計測して、前記水溶液の層を支持するウエハの厚さばらつきに影響されずに前記三次元形状を形成することを特徴とする請求項1又は2に記載の形状形成方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004226837A JP4602710B2 (ja) | 2004-08-03 | 2004-08-03 | 形状形成方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004226837A JP4602710B2 (ja) | 2004-08-03 | 2004-08-03 | 形状形成方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006043560A JP2006043560A (ja) | 2006-02-16 |
JP4602710B2 true JP4602710B2 (ja) | 2010-12-22 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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JP2004226837A Expired - Lifetime JP4602710B2 (ja) | 2004-08-03 | 2004-08-03 | 形状形成方法 |
Country Status (1)
Country | Link |
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JP (1) | JP4602710B2 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5420584B2 (ja) * | 2011-04-21 | 2014-02-19 | キヤノンマシナリー株式会社 | 二酸化チタン光触媒層のパターン形成方法 |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10237689A (ja) * | 1997-02-25 | 1998-09-08 | Kagaku Gijutsu Shinko Jigyodan | 電解液ジェット加工による金属部品のラピッドプロトタイピング法 |
JPH10317185A (ja) * | 1997-05-15 | 1998-12-02 | Toyoda Gosei Co Ltd | 立体物の製造方法 |
JPH11170377A (ja) * | 1997-12-05 | 1999-06-29 | Koji Ikuta | 光造形加工法、該加工法を用いた可動装置および光造形加工装置 |
JP2001081006A (ja) * | 1994-10-05 | 2001-03-27 | Toto Ltd | 抗菌性固形物並びにその製造方法及びその利用方法 |
JP2002331028A (ja) * | 2001-05-10 | 2002-11-19 | Japan Science & Technology Corp | 医療用チューブおよびその製造方法 |
JP2003201149A (ja) * | 2001-05-30 | 2003-07-15 | Central Glass Co Ltd | ガラスの着色方法 |
JP2003248184A (ja) * | 2002-02-26 | 2003-09-05 | Sigma Koki Kk | ビームモード整形光学系、及び露光装置 |
-
2004
- 2004-08-03 JP JP2004226837A patent/JP4602710B2/ja not_active Expired - Lifetime
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001081006A (ja) * | 1994-10-05 | 2001-03-27 | Toto Ltd | 抗菌性固形物並びにその製造方法及びその利用方法 |
JPH10237689A (ja) * | 1997-02-25 | 1998-09-08 | Kagaku Gijutsu Shinko Jigyodan | 電解液ジェット加工による金属部品のラピッドプロトタイピング法 |
JPH10317185A (ja) * | 1997-05-15 | 1998-12-02 | Toyoda Gosei Co Ltd | 立体物の製造方法 |
JPH11170377A (ja) * | 1997-12-05 | 1999-06-29 | Koji Ikuta | 光造形加工法、該加工法を用いた可動装置および光造形加工装置 |
JP2002331028A (ja) * | 2001-05-10 | 2002-11-19 | Japan Science & Technology Corp | 医療用チューブおよびその製造方法 |
JP2003201149A (ja) * | 2001-05-30 | 2003-07-15 | Central Glass Co Ltd | ガラスの着色方法 |
JP2003248184A (ja) * | 2002-02-26 | 2003-09-05 | Sigma Koki Kk | ビームモード整形光学系、及び露光装置 |
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JP2006043560A (ja) | 2006-02-16 |
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