JP4593969B2 - 配線の作製方法及び表示装置の作製方法 - Google Patents

配線の作製方法及び表示装置の作製方法 Download PDF

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Publication number
JP4593969B2
JP4593969B2 JP2004147036A JP2004147036A JP4593969B2 JP 4593969 B2 JP4593969 B2 JP 4593969B2 JP 2004147036 A JP2004147036 A JP 2004147036A JP 2004147036 A JP2004147036 A JP 2004147036A JP 4593969 B2 JP4593969 B2 JP 4593969B2
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Japan
Prior art keywords
wiring
substrate
film
manufacturing
droplet discharge
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Expired - Fee Related
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JP2004147036A
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Japanese (ja)
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JP2005005694A (ja
JP2005005694A5 (https=
Inventor
舜平 山崎
徹 高山
哲司 山口
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication of JP2005005694A5 publication Critical patent/JP2005005694A5/ja
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  • Liquid Crystal (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Devices For Indicating Variable Information By Combining Individual Elements (AREA)
  • Electroluminescent Light Sources (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2004147036A 2003-05-16 2004-05-17 配線の作製方法及び表示装置の作製方法 Expired - Fee Related JP4593969B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004147036A JP4593969B2 (ja) 2003-05-16 2004-05-17 配線の作製方法及び表示装置の作製方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003139680 2003-05-16
JP2004147036A JP4593969B2 (ja) 2003-05-16 2004-05-17 配線の作製方法及び表示装置の作製方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009189868A Division JP5238641B2 (ja) 2003-05-16 2009-08-19 半導体装置の作製方法

Publications (3)

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JP2005005694A JP2005005694A (ja) 2005-01-06
JP2005005694A5 JP2005005694A5 (https=) 2007-06-14
JP4593969B2 true JP4593969B2 (ja) 2010-12-08

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JP2004147036A Expired - Fee Related JP4593969B2 (ja) 2003-05-16 2004-05-17 配線の作製方法及び表示装置の作製方法

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JP (1) JP4593969B2 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160105205A (ko) * 2015-02-27 2016-09-06 엘지디스플레이 주식회사 표시 패널 및 표시 패널의 제조 방법

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7494923B2 (en) 2004-06-14 2009-02-24 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of wiring substrate and semiconductor device
JP4536601B2 (ja) * 2004-06-14 2010-09-01 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP4380552B2 (ja) 2005-02-04 2009-12-09 セイコーエプソン株式会社 アクティブマトリクス基板の製造方法、アクティブマトリクス基板、電気光学装置並びに電子機器
JP4696616B2 (ja) * 2005-03-17 2011-06-08 カシオ計算機株式会社 ディスプレイパネル及びその製造方法
JP4542527B2 (ja) * 2006-06-30 2010-09-15 株式会社フューチャービジョン 白色の色度差を低減した表示装置とその製造方法
CN104024996B (zh) 2011-12-28 2016-10-05 夏普株式会社 触摸面板和带触摸面板的显示装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0536683A (ja) * 1991-08-01 1993-02-12 Hitachi Ltd 配線装置の製造方法
JPH10270442A (ja) * 1997-03-27 1998-10-09 Seiko Epson Corp 半導体集積装置の製造方法、および半導体集積装置
JP4003273B2 (ja) * 1998-01-19 2007-11-07 セイコーエプソン株式会社 パターン形成方法および基板製造装置
JPH11340129A (ja) * 1998-05-28 1999-12-10 Seiko Epson Corp パターン製造方法およびパターン製造装置
JP3896770B2 (ja) * 2000-07-07 2007-03-22 セイコーエプソン株式会社 配線間接続孔の形成方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160105205A (ko) * 2015-02-27 2016-09-06 엘지디스플레이 주식회사 표시 패널 및 표시 패널의 제조 방법
KR102335564B1 (ko) * 2015-02-27 2021-12-03 엘지디스플레이 주식회사 표시 패널 및 표시 패널의 제조 방법

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JP2005005694A (ja) 2005-01-06

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