JP4563698B2 - 真空蒸着装置 - Google Patents
真空蒸着装置 Download PDFInfo
- Publication number
- JP4563698B2 JP4563698B2 JP2004070993A JP2004070993A JP4563698B2 JP 4563698 B2 JP4563698 B2 JP 4563698B2 JP 2004070993 A JP2004070993 A JP 2004070993A JP 2004070993 A JP2004070993 A JP 2004070993A JP 4563698 B2 JP4563698 B2 JP 4563698B2
- Authority
- JP
- Japan
- Prior art keywords
- hollow shaft
- evaporation
- evaporation source
- vacuum chamber
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001771 vacuum deposition Methods 0.000 title claims description 7
- 238000001704 evaporation Methods 0.000 claims description 82
- 230000008020 evaporation Effects 0.000 claims description 81
- 230000007246 mechanism Effects 0.000 claims description 31
- 239000000498 cooling water Substances 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 13
- 230000015572 biosynthetic process Effects 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 10
- 238000007740 vapor deposition Methods 0.000 claims description 8
- 238000007738 vacuum evaporation Methods 0.000 claims description 6
- 238000003780 insertion Methods 0.000 claims description 5
- 230000037431 insertion Effects 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 3
- 230000008021 deposition Effects 0.000 claims description 3
- 238000004891 communication Methods 0.000 claims description 2
- 238000005192 partition Methods 0.000 description 11
- 239000002245 particle Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 3
- 238000005566 electron beam evaporation Methods 0.000 description 2
- 238000011109 contamination Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Description
2 成膜室
3 真空チャンバの隔壁
4 蒸発源
5 中空軸
5a 中空軸の閉塞端
5b 中空軸の開放端
6 ベローズ
7 供給系統
10 ガイドレール
12 スライドガイド
15 駆動部
Claims (5)
- 真空チャンバ内に、蒸着材料の蒸発源を備えた真空蒸着装置において、
一端が閉塞し他端が開放された中空軸と、この中空軸の一端側を前記真空チャンバの内部に挿通し前記中空軸を軸方向に移動させる移動機構とを有し、
前記蒸発源は、前記中空軸の一端側に取り付けられ、前記蒸発源に導入される電力及び冷却水が前記中空軸の内部を介して供給されると共に、
前記移動機構は、前記真空チャンバの外部に設けられ、前記蒸発材料が蒸発しているときに前記真空チャンバ内にある被処理基板に前記蒸着材料を蒸着させない待機位置と前記被処理基板に対する成膜が可能な位置との間にわたって前記蒸発源を移動させることができ、
前記蒸発材料は、前記蒸発源が前記待機位置にあるときに蒸発していることを特徴とする真空蒸着装置。 - 前記中空軸が挿通される前記真空チャンバの挿通部と前記中空軸の他端側との間には、前記真空チャンバの内外の連通を遮断するベローズが設けられている請求項1に記載の真空蒸着装置。
- 前記移動機構は、前記真空チャンバの外部に突出する前記中空軸の軸方向に沿って延在するスライドガイドと、前記中空軸を前記スライドガイドに沿って移動させる駆動部とを含んでなる請求項1に記載の真空蒸着装置。
- 前記中空軸は複数本配置されており、前記蒸発源は前記複数本の中空軸に対してそれぞれ取り付けられている請求項1に記載の真空蒸着装置。
- 前記蒸発源は、前記移動機構によって前記チャンバ内をそれぞれ移動自在である請求項4に記載の真空蒸着装置。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004070993A JP4563698B2 (ja) | 2004-03-12 | 2004-03-12 | 真空蒸着装置 |
PCT/JP2005/003174 WO2005087970A1 (ja) | 2004-03-12 | 2005-02-25 | 真空蒸着装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004070993A JP4563698B2 (ja) | 2004-03-12 | 2004-03-12 | 真空蒸着装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005256113A JP2005256113A (ja) | 2005-09-22 |
JP4563698B2 true JP4563698B2 (ja) | 2010-10-13 |
Family
ID=34975607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004070993A Expired - Lifetime JP4563698B2 (ja) | 2004-03-12 | 2004-03-12 | 真空蒸着装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4563698B2 (ja) |
WO (1) | WO2005087970A1 (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5277060B2 (ja) * | 2009-04-16 | 2013-08-28 | 株式会社日立ハイテクノロジーズ | 真空蒸着装置 |
CN101824596B (zh) * | 2010-03-30 | 2011-12-14 | 东莞宏威数码机械有限公司 | 自动冷却式供电装置 |
JP2012169168A (ja) * | 2011-02-15 | 2012-09-06 | Hitachi High-Technologies Corp | 水晶発振式膜厚モニタ装置、及び、これを用いたel材料の蒸発源装置と薄膜形成装置 |
JP2013122923A (ja) * | 2013-01-17 | 2013-06-20 | Hitachi High-Technologies Corp | 真空蒸着装置 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000286327A (ja) * | 1999-03-31 | 2000-10-13 | Sumitomo Heavy Ind Ltd | 成膜装置 |
JP2002348658A (ja) * | 2001-05-23 | 2002-12-04 | Anelva Corp | 蒸着源並びにそれを用いた薄膜形成方法及び形成装置 |
JP2003160857A (ja) * | 2001-11-27 | 2003-06-06 | Matsushita Electric Ind Co Ltd | 蒸着装置と薄膜形成方法およびそれらを用いた表示装置 |
JP2003257644A (ja) * | 2002-03-05 | 2003-09-12 | Sanyo Electric Co Ltd | 有機エレクトロルミネッセンス表示装置の製造方法 |
JP2004006282A (ja) * | 2002-03-29 | 2004-01-08 | Sanyo Electric Co Ltd | 蒸着方法及び表示装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2004323876A (ja) * | 2003-04-22 | 2004-11-18 | Nippon Hoso Kyokai <Nhk> | 電子ビーム蒸発源 |
-
2004
- 2004-03-12 JP JP2004070993A patent/JP4563698B2/ja not_active Expired - Lifetime
-
2005
- 2005-02-25 WO PCT/JP2005/003174 patent/WO2005087970A1/ja active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000286327A (ja) * | 1999-03-31 | 2000-10-13 | Sumitomo Heavy Ind Ltd | 成膜装置 |
JP2002348658A (ja) * | 2001-05-23 | 2002-12-04 | Anelva Corp | 蒸着源並びにそれを用いた薄膜形成方法及び形成装置 |
JP2003160857A (ja) * | 2001-11-27 | 2003-06-06 | Matsushita Electric Ind Co Ltd | 蒸着装置と薄膜形成方法およびそれらを用いた表示装置 |
JP2003257644A (ja) * | 2002-03-05 | 2003-09-12 | Sanyo Electric Co Ltd | 有機エレクトロルミネッセンス表示装置の製造方法 |
JP2004006282A (ja) * | 2002-03-29 | 2004-01-08 | Sanyo Electric Co Ltd | 蒸着方法及び表示装置の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2005087970A1 (ja) | 2005-09-22 |
JP2005256113A (ja) | 2005-09-22 |
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