JP4559736B2 - 無水フタル酸の製造法 - Google Patents
無水フタル酸の製造法 Download PDFInfo
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- JP4559736B2 JP4559736B2 JP2003569590A JP2003569590A JP4559736B2 JP 4559736 B2 JP4559736 B2 JP 4559736B2 JP 2003569590 A JP2003569590 A JP 2003569590A JP 2003569590 A JP2003569590 A JP 2003569590A JP 4559736 B2 JP4559736 B2 JP 4559736B2
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- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 title claims abstract description 22
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 14
- 239000003054 catalyst Substances 0.000 claims abstract description 132
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical group CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims abstract description 33
- UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 claims abstract description 32
- 238000000034 method Methods 0.000 claims abstract description 24
- 239000008096 xylene Substances 0.000 claims abstract description 14
- 230000003647 oxidation Effects 0.000 claims abstract description 11
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 11
- 239000000203 mixture Substances 0.000 claims description 14
- 239000002253 acid Substances 0.000 claims description 4
- 238000011068 loading method Methods 0.000 claims description 4
- 229940078552 o-xylene Drugs 0.000 abstract description 9
- 150000003839 salts Chemical class 0.000 description 32
- 239000007789 gas Substances 0.000 description 23
- 238000006243 chemical reaction Methods 0.000 description 21
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N titanium dioxide Inorganic materials O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 19
- GNTDGMZSJNCJKK-UHFFFAOYSA-N divanadium pentaoxide Chemical compound O=[V](=O)O[V](=O)=O GNTDGMZSJNCJKK-UHFFFAOYSA-N 0.000 description 10
- 230000007423 decrease Effects 0.000 description 9
- WNZQDUSMALZDQF-UHFFFAOYSA-N 2-benzofuran-1(3H)-one Chemical compound C1=CC=C2C(=O)OCC2=C1 WNZQDUSMALZDQF-UHFFFAOYSA-N 0.000 description 8
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 8
- 230000000694 effects Effects 0.000 description 7
- 239000012495 reaction gas Substances 0.000 description 7
- 239000004408 titanium dioxide Substances 0.000 description 7
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 6
- QQONPFPTGQHPMA-UHFFFAOYSA-N Propene Chemical compound CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 6
- -1 air Chemical compound 0.000 description 6
- FLJPGEWQYJVDPF-UHFFFAOYSA-L caesium sulfate Chemical compound [Cs+].[Cs+].[O-]S([O-])(=O)=O FLJPGEWQYJVDPF-UHFFFAOYSA-L 0.000 description 6
- 239000011149 active material Substances 0.000 description 5
- 230000004087 circulation Effects 0.000 description 5
- 239000012043 crude product Substances 0.000 description 5
- YWEUIGNSBFLMFL-UHFFFAOYSA-N diphosphonate Chemical compound O=P(=O)OP(=O)=O YWEUIGNSBFLMFL-UHFFFAOYSA-N 0.000 description 5
- DLYUQMMRRRQYAE-UHFFFAOYSA-N phosphorus pentoxide Inorganic materials O1P(O2)(=O)OP3(=O)OP1(=O)OP2(=O)O3 DLYUQMMRRRQYAE-UHFFFAOYSA-N 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical compound CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 4
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 4
- 229910052698 phosphorus Inorganic materials 0.000 description 4
- 239000011574 phosphorus Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 229910052792 caesium Inorganic materials 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 3
- KOPBYBDAPCDYFK-UHFFFAOYSA-N caesium oxide Chemical compound [O-2].[Cs+].[Cs+] KOPBYBDAPCDYFK-UHFFFAOYSA-N 0.000 description 3
- 229910001942 caesium oxide Inorganic materials 0.000 description 3
- 230000003197 catalytic effect Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000012071 phase Substances 0.000 description 3
- 239000000047 product Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 3
- 125000005287 vanadyl group Chemical group 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- HGINCPLSRVDWNT-UHFFFAOYSA-N Acrolein Chemical compound C=CC=O HGINCPLSRVDWNT-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- URLKBWYHVLBVBO-UHFFFAOYSA-N Para-Xylene Chemical group CC1=CC=C(C)C=C1 URLKBWYHVLBVBO-UHFFFAOYSA-N 0.000 description 2
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- LFVGISIMTYGQHF-UHFFFAOYSA-N ammonium dihydrogen phosphate Chemical compound [NH4+].OP(O)([O-])=O LFVGISIMTYGQHF-UHFFFAOYSA-N 0.000 description 2
- 229910000387 ammonium dihydrogen phosphate Inorganic materials 0.000 description 2
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 2
- 229910052787 antimony Inorganic materials 0.000 description 2
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- 239000006227 byproduct Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- 229910001882 dioxygen Inorganic materials 0.000 description 2
- SQNZJJAZBFDUTD-UHFFFAOYSA-N durene Chemical compound CC1=CC(C)=C(C)C=C1C SQNZJJAZBFDUTD-UHFFFAOYSA-N 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- IVSZLXZYQVIEFR-UHFFFAOYSA-N m-xylene Chemical group CC1=CC=CC(C)=C1 IVSZLXZYQVIEFR-UHFFFAOYSA-N 0.000 description 2
- 235000019837 monoammonium phosphate Nutrition 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- NDVLTYZPCACLMA-UHFFFAOYSA-N silver oxide Chemical compound [O-2].[Ag+].[Ag+] NDVLTYZPCACLMA-UHFFFAOYSA-N 0.000 description 2
- 239000012808 vapor phase Substances 0.000 description 2
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical compound CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- GYCMBHHDWRMZGG-UHFFFAOYSA-N Methylacrylonitrile Chemical compound CC(=C)C#N GYCMBHHDWRMZGG-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 229930192627 Naphthoquinone Natural products 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 1
- YKTSYUJCYHOUJP-UHFFFAOYSA-N [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] Chemical compound [O--].[Al+3].[Al+3].[O-][Si]([O-])([O-])[O-] YKTSYUJCYHOUJP-UHFFFAOYSA-N 0.000 description 1
- IKWTVSLWAPBBKU-UHFFFAOYSA-N a1010_sial Chemical compound O=[As]O[As]=O IKWTVSLWAPBBKU-UHFFFAOYSA-N 0.000 description 1
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 1
- 150000004056 anthraquinones Chemical class 0.000 description 1
- 229910000410 antimony oxide Inorganic materials 0.000 description 1
- 229910000413 arsenic oxide Inorganic materials 0.000 description 1
- 229960002594 arsenic trioxide Drugs 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- IAQRGUVFOMOMEM-UHFFFAOYSA-N butene Natural products CC=CC IAQRGUVFOMOMEM-UHFFFAOYSA-N 0.000 description 1
- 238000001354 calcination Methods 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- JIHMVMRETUQLFD-UHFFFAOYSA-N cerium(3+);dioxido(oxo)silane Chemical compound [Ce+3].[Ce+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O.[O-][Si]([O-])=O JIHMVMRETUQLFD-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000001143 conditioned effect Effects 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- HTXDPTMKBJXEOW-UHFFFAOYSA-N dioxoiridium Chemical compound O=[Ir]=O HTXDPTMKBJXEOW-UHFFFAOYSA-N 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- 229910000457 iridium oxide Inorganic materials 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- 239000000391 magnesium silicate Substances 0.000 description 1
- 229910052919 magnesium silicate Inorganic materials 0.000 description 1
- 235000019792 magnesium silicate Nutrition 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000002791 naphthoquinones Chemical class 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910000484 niobium oxide Inorganic materials 0.000 description 1
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000010412 oxide-supported catalyst Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- VTRUBDSFZJNXHI-UHFFFAOYSA-N oxoantimony Chemical compound [Sb]=O VTRUBDSFZJNXHI-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- LFGREXWGYUGZLY-UHFFFAOYSA-N phosphoryl Chemical class [P]=O LFGREXWGYUGZLY-UHFFFAOYSA-N 0.000 description 1
- 125000005506 phthalide group Chemical group 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 239000011541 reaction mixture Substances 0.000 description 1
- 238000007086 side reaction Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910001923 silver oxide Inorganic materials 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- KFAIYPBIFILLEZ-UHFFFAOYSA-N thallium(i) oxide Chemical compound [Tl]O[Tl] KFAIYPBIFILLEZ-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
- GFQYVLUOOAAOGM-UHFFFAOYSA-N zirconium(iv) silicate Chemical compound [Zr+4].[O-][Si]([O-])([O-])[O-] GFQYVLUOOAAOGM-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/21—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen
- C07C51/255—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting
- C07C51/265—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation with molecular oxygen of compounds containing six-membered aromatic rings without ring-splitting having alkyl side chains which are oxidised to carboxyl groups
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J23/00—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00
- B01J23/16—Catalysts comprising metals or metal oxides or hydroxides, not provided for in group B01J21/00 of arsenic, antimony, bismuth, vanadium, niobium, tantalum, polonium, chromium, molybdenum, tungsten, manganese, technetium or rhenium
- B01J23/20—Vanadium, niobium or tantalum
- B01J23/22—Vanadium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/19—Catalysts containing parts with different compositions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/31—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/16—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
- C07C51/31—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting
- C07C51/313—Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation of cyclic compounds with ring-splitting with molecular oxygen
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Furan Compounds (AREA)
- Catalysts (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Description
−第一の層に関して:
五酸化バナジウム 3〜5質量%
アルカリ金属酸化物、例えば酸化セシウム 0.1〜1質量%
二酸化チタン 94〜96.9質量%
−第二の層に関して:
五酸化バナジウム 4〜7質量%
アルカリ金属酸化物、例えば酸化セシウム 0〜0.5質量%
五酸化リン(Pとして算出されたもの) 0.05〜0.4質量%
二酸化チタン 100質量%までの残分
−三番目の層に関して:
五酸化バナジウム 6〜9質量%
アルカリ金属酸化物、例えば酸化セシウム 0〜0.3質量%
五酸化リン(Pとして算出されたもの) 0.05〜0.4質量%
場合によりもう1種の促進剤、殊にSb2O3 1〜5質量%
二酸化チタン 85.3〜93.95質量%。
五酸化バナジウム 6〜9質量%
活性促進剤、殊にSb2O3 1〜5質量%
五酸化リン(Pとして算出されたもの) 0.1〜0.5質量%
二酸化チタン 85.5〜92.9質量%。
1)触媒I〜IVの製造
触媒I:
外径8mm、長さ6mm及び肉厚1.5mmのステアタイト(ケイ酸マグネシウム)リング50kgを、コーティングドラム中で160℃に加熱し、かつBET表面積20m2/gを有するアナターゼ28.6kg、シュウ酸バナジル2.19kg、硫酸セシウム0.176kg、水44.1kg及びホルムアミド9.14kgからなる懸濁液で、施与した層の質量が完成触媒の全質量の10.5%(450℃での焼成後)になるまで噴霧した。
触媒Iの製造と同様に処理したが、但し、硫酸セシウム0.155kgを使用し、これはセシウム0.35質量%(Csとして計算)の含分をもたらした。
外径8mm、長さ6mm及び肉厚1.5mmのステアタイト(ケイ酸マグネシウム)リング50kgを、コーティングドラム中で160℃に加熱し、かつBET表面積20m2/gを有するアナターゼ28.6kg、シュウ酸バナジル4.11kg、三酸化アンチモン1.03kg、リン酸二水素アンモニウム0.179kg、硫酸セシウム0.045kg、水44.1kg及びホルムアミド9.14kgからなる懸濁液で、施与した層の質量が完成触媒の全質量の10.5%(450℃での焼成後)になるまで噴霧した。
外径8mm、長さ6mm及び肉厚1.5mmのステアタイト(ケイ酸マグネシウム)リング50kgを、コーティングドラム中で160℃に加熱し、かつBET表面積11m2/gを有するアナターゼ28.6kg、シュウ酸バナジル3.84kg、三酸化アンチモン0.80kg、リン酸二水素アンモニウム0.239kg、水44.1kg及びホルムアミド9.14kgからなる懸濁液で、施与した層の質量が完成触媒の全質量の12.5%(450℃での焼成後)になるまで噴霧した。
2a)本発明によるPAの製造及び比較(堆積物の長さを変化させることによるホットスポット温度差の調節)
下方から上方に向かって、10 lの管型反応器(標準管99本及び熱電対を備えた管2本)において、それぞれ触媒III(比較:1.30m;本発明による:0.70m)、触媒II(本発明による:0.80m)及び引き続き触媒I(1.70m(比較);本発明による1.50m)を、長さ3.60m、内径25mmの各鉄管(熱電対シース内径10mm及び取り付けられた30個の熱電対(全て10cm)を有する熱電対を備えた管29mm)中に充填した。圧力調節により、各管の入口の圧力が同一となるように留意した。場合により、少量の触媒Iを99本の標準管に添加するか又は吸引により取り出した;熱電対を備えた2つの管の場合、ステアタイト球もしくは石英球の形の不活性材料を添加することにより圧力調節を達成した。鉄管は、温度調節のために、2つの別個の塩浴中に存在する塩溶融物により包囲されていた。下方の塩浴は管を下方の管板から1.30mの高さまで包囲しており、上方の塩浴は管を高さ1.30m〜上方の管板まで包囲していた。(約2ヶ月の運転時間後に)98.5質量%のo−キシレン100g/空気標準m3を負荷させた空気を、管1つ当たり4.0標準m3/hの流動速度で上方から下方へと、管に導通させた。主反応器を去った後、粗生成物ガス流を280〜290℃に冷却し、触媒IV 100kgを充填した断熱式仕上げ反応器(内径:0.45m、高さ0.99m)に導通させた。
2a)で比較試験として操作した触媒の組合せにおいて、運転時間250日後に、温度構造化(SBT bottomを低下させる、又はSBT topを高める)又は温度変化(SBT bottom及びtopを高める)を用いて温度差を>40℃に調節した。その他の全ての試験条件は、試験2a)に対して変化させなかった。
Claims (9)
- キシレン、ナフタレン又はこれらの混合物を、伝熱媒体を用いてサーモスタット調温された管束型反応器中で、層状に配置された3種以上の異なる環状の固定床担持触媒上で気相酸化させることにより無水フタル酸を製造する方法において、流れ方向の第二の触媒層における最高温度が第一の触媒層における最高温度よりも10〜40℃低く、かつ、ガス入口から見て三番目の層における最高温度が第一の触媒層における最高温度よりも40〜80℃低く、かつ第一の触媒層における最高温度が470℃未満となるように前記方法を実施することを特徴とする無水フタル酸の製造法。
- 第一の触媒層における最高温度と第二の触媒層における最高温度及び三番目の触媒層における最高温度との間の温度差を、触媒層の堆積物長さの割合により制御する、請求項1記載の方法。
- 第一の触媒層の堆積物長さが全ての触媒堆積物の長さの30%を上回る、請求項2記載の方法。
- 第一の触媒層の堆積物長さが全ての触媒堆積物の長さの40%を上回る、請求項2記載の方法。
- 第一の触媒層における最高温度と第二の触媒層における最高温度との間の温度差を伝熱媒体の温度により制御する、請求項1記載の方法。
- 第一の触媒層における最高温度が450℃未満である、請求項1から5までのいずれか1項記載の方法。
- 気相1標準m3当たりo−キシレン及び/又はナフタレン80〜140gの負荷を有する気相を使用する、請求項1から6までのいずれか1項記載の方法。
- 伝熱媒体の温度が≦360℃である、請求項1から7までのいずれか1項記載の方法。
- 気体混合物の空間速度が≧2000h−1である、請求項1から8までのいずれか1項記載の方法。
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DE10206989A DE10206989A1 (de) | 2002-02-19 | 2002-02-19 | Verfahren zur Herstellung von Phthalsäureanhydrid |
PCT/EP2003/001066 WO2003070680A1 (de) | 2002-02-19 | 2003-02-04 | Verfahren zur herstellung von phthalsäureanhydrid |
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AU (1) | AU2003208789A1 (ja) |
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DE10323817A1 (de) | 2003-05-23 | 2004-12-09 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid |
DE10323818A1 (de) | 2003-05-23 | 2004-12-09 | Basf Ag | Katalysatorsysteme zur Herstellung von Phthalsäureanhydrid |
WO2005115615A1 (de) * | 2004-05-29 | 2005-12-08 | Süd-Chemie AG | Katalysator sowie verfahren zur herstellung von phthalsäureanhydrid |
DE102004026472A1 (de) | 2004-05-29 | 2005-12-22 | Süd-Chemie AG | Mehrlagen-Katalysator zur Herstellung von Phthalsäureanhydrid |
CN100496740C (zh) * | 2004-05-29 | 2009-06-10 | 苏德-化学股份公司 | 用于制备邻苯二甲酸酐的多层催化剂 |
KR100850857B1 (ko) | 2005-02-01 | 2008-08-06 | 주식회사 엘지화학 | 불포화 지방산의 제조방법 |
PL1853381T3 (pl) * | 2005-03-02 | 2012-08-31 | Clariant Int Ltd | Sposób produkcji wielowarstwowego katalizatora do produkcji bezwodnika kwasu ftalowego |
DE102005009473A1 (de) * | 2005-03-02 | 2006-09-07 | Süd-Chemie AG | Mehrlagen-Katalysator zur Herstellung von Phthalsäureanhydrid |
ZA200708804B (en) * | 2005-05-22 | 2009-01-28 | Sued Chemie Ag | Multi-layered catalyst for producing phthalic anhydride |
DE102005031465A1 (de) * | 2005-07-04 | 2007-01-11 | Basf Ag | Verfahren zum Anfahren von Oxidationskatalysatoren |
MY145445A (en) * | 2006-05-19 | 2012-02-15 | Basf Se | Production of phthalic anhydride by gas phase oxidation of o-xylol in a primary and a secondary reactor |
JP5114475B2 (ja) | 2006-05-19 | 2013-01-09 | ビーエーエスエフ ソシエタス・ヨーロピア | o−キシロールの気相酸化による無水フタル酸の製造 |
US20090163726A1 (en) * | 2006-05-19 | 2009-06-25 | Basf Se | Catalyst system for preparing carboxylic acids and/or carboxylic anhydrides |
JP6050224B2 (ja) * | 2010-04-13 | 2016-12-21 | ビーエーエスエフ ソシエタス・ヨーロピアBasf Se | 無水フタル酸を製造するための気相酸化反応器の制御方法 |
TW201206896A (en) | 2010-04-13 | 2012-02-16 | Basf Se | Process for controlling a gas phase oxidation reactor for preparation of phthalic anhydride |
EP3013783B1 (de) * | 2013-06-26 | 2018-10-17 | Basf Se | Verfahren zur herstellung von phthalsäureanhydrid |
WO2022013048A1 (de) * | 2020-07-14 | 2022-01-20 | Clariant International Ltd | Verfahren zur inbetriebnahme eines reaktors zur herstellung von phthalsäureanhydrid |
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US3565829A (en) | 1967-10-04 | 1971-02-23 | Basf Ag | Supported catalysts containing vanadium pentoxide and titanium dioxide |
DE1769998B2 (de) | 1968-08-20 | 1977-01-27 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von phthalsaeureanhydrid |
DE2510994B2 (de) | 1975-03-13 | 1977-04-14 | Basf Ag, 6700 Ludwigshafen | Vanadium- und titanhaltiger traegerkatalysator |
DE2546268C3 (de) | 1975-10-16 | 1983-11-24 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Herstellung von Phthalsäureanhydrid aus o-Xylol oder Naphthalin |
DE2547624C2 (de) | 1975-10-24 | 1981-10-08 | Basf Ag, 6700 Ludwigshafen | Vanadinpentoxid, Titandioxid, Antimon und Rubidium enthaltende Trägerkatalysatoren |
AU529228B2 (en) | 1977-07-13 | 1983-06-02 | Nippon Shokubai Kagaku Kogyo Co. Ltd. | Catalytic vapour phase oxidation |
JPS603307B2 (ja) | 1978-11-29 | 1985-01-26 | 株式会社日本触媒 | 無水フタル酸の製造方法 |
DE2914683A1 (de) | 1979-04-11 | 1980-10-16 | Basf Ag | Vanadium- und titan- und/oder zirkonhaltiger traegerkatalysator |
CA1145902A (en) | 1979-11-20 | 1983-05-10 | Hydrochem Industrial Services, Inc. | Gelled pigs for cleaning and sanitizing pipelines |
JPS591378B2 (ja) | 1979-12-03 | 1984-01-11 | 株式会社日本触媒 | 無水フタル酸製造用触媒 |
CA1261860A (en) | 1984-05-21 | 1989-09-26 | Yoshiyuki Nakanishi | Method for the preparation of pyromellitic acid or its anhydride |
JPS63253080A (ja) | 1987-04-10 | 1988-10-20 | Nippon Steel Chem Co Ltd | 無水フタル酸の製造方法 |
DE4013051A1 (de) | 1990-04-24 | 1991-11-07 | Basf Ag | Verfahren zur herstellung von phthalsaeureanhydrid aus o-xylol |
SE9700655L (sv) | 1997-02-25 | 1998-05-11 | Neste Oy | Förfarande för framställning av ftalsyraanhydrid |
US6288273B1 (en) | 1997-02-27 | 2001-09-11 | Basf Aktiengesellschaft | Method for producing shell catalysts for catalytic gas-phase oxidation of aromatic hydrocarbons |
DE19707943C2 (de) | 1997-02-27 | 1999-07-08 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid und Katalysator hierfür |
JP4557378B2 (ja) * | 1999-06-24 | 2010-10-06 | 株式会社日本触媒 | 無水フタル酸の製造方法 |
CN1280979A (zh) | 1999-06-24 | 2001-01-24 | 株式会社日本触媒 | 用于生产邻苯二甲酸酐的方法 |
DE10040827A1 (de) * | 2000-08-21 | 2002-03-07 | Basf Ag | Verfahren zur Herstellung von Phthalsäureanhydrid |
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MXPA04007388A (es) | 2004-10-11 |
DE10206989A1 (de) | 2003-08-21 |
KR100934519B1 (ko) | 2009-12-29 |
AU2003208789A1 (en) | 2003-09-09 |
CN1281568C (zh) | 2006-10-25 |
EP1478614A1 (de) | 2004-11-24 |
US20050148782A1 (en) | 2005-07-07 |
DE50306580D1 (de) | 2007-04-05 |
CN1635989A (zh) | 2005-07-06 |
ATE354559T1 (de) | 2007-03-15 |
KR20040086396A (ko) | 2004-10-08 |
WO2003070680A1 (de) | 2003-08-28 |
US7151184B2 (en) | 2006-12-19 |
ES2280728T3 (es) | 2007-09-16 |
JP2005529075A (ja) | 2005-09-29 |
EP1478614B1 (de) | 2007-02-21 |
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