JP4531923B2 - 半導体装置 - Google Patents

半導体装置 Download PDF

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Publication number
JP4531923B2
JP4531923B2 JP2000123774A JP2000123774A JP4531923B2 JP 4531923 B2 JP4531923 B2 JP 4531923B2 JP 2000123774 A JP2000123774 A JP 2000123774A JP 2000123774 A JP2000123774 A JP 2000123774A JP 4531923 B2 JP4531923 B2 JP 4531923B2
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Japan
Prior art keywords
film
insulating film
region
tft
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000123774A
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English (en)
Japanese (ja)
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JP2001305584A5 (enExample
JP2001305584A (ja
Inventor
舜平 山崎
潤 小山
康行 荒井
清 加藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Publication date
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Priority to JP2000123774A priority Critical patent/JP4531923B2/ja
Publication of JP2001305584A publication Critical patent/JP2001305584A/ja
Publication of JP2001305584A5 publication Critical patent/JP2001305584A5/ja
Application granted granted Critical
Publication of JP4531923B2 publication Critical patent/JP4531923B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Liquid Crystal (AREA)
  • Formation Of Insulating Films (AREA)
  • Thin Film Transistor (AREA)
JP2000123774A 2000-04-25 2000-04-25 半導体装置 Expired - Fee Related JP4531923B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000123774A JP4531923B2 (ja) 2000-04-25 2000-04-25 半導体装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000123774A JP4531923B2 (ja) 2000-04-25 2000-04-25 半導体装置

Publications (3)

Publication Number Publication Date
JP2001305584A JP2001305584A (ja) 2001-10-31
JP2001305584A5 JP2001305584A5 (enExample) 2007-06-07
JP4531923B2 true JP4531923B2 (ja) 2010-08-25

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ID=18634012

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000123774A Expired - Fee Related JP4531923B2 (ja) 2000-04-25 2000-04-25 半導体装置

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JP (1) JP4531923B2 (enExample)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100940342B1 (ko) 2001-11-13 2010-02-04 가부시키가이샤 한도오따이 에네루기 켄큐쇼 표시장치 및 그 구동방법
US7749818B2 (en) * 2002-01-28 2010-07-06 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of manufacturing the same
TWI269248B (en) 2002-05-13 2006-12-21 Semiconductor Energy Lab Display device
JP2004296963A (ja) 2003-03-28 2004-10-21 Semiconductor Energy Lab Co Ltd 半導体装置及び半導体装置の作製方法
US7123332B2 (en) 2003-05-12 2006-10-17 Semiconductor Energy Laboratory Co., Ltd. Liquid crystal display device, electronic device having the same, and semiconductor device
JP2004361937A (ja) * 2003-05-12 2004-12-24 Semiconductor Energy Lab Co Ltd 液晶表示装置及びその作製方法
JP4556404B2 (ja) * 2003-09-11 2010-10-06 セイコーエプソン株式会社 表示装置及び電子機器
US7453531B2 (en) 2003-11-22 2008-11-18 Lg Display Co., Ltd. LCD driving device having plural TFT channels connected in parallel with either increasing channel widths or decreasing channel distances from central part to edges of the device
JP5352045B2 (ja) * 2005-06-03 2013-11-27 株式会社半導体エネルギー研究所 集積回路装置の作製方法
US7972910B2 (en) 2005-06-03 2011-07-05 Semiconductor Energy Laboratory Co., Ltd. Manufacturing method of integrated circuit device including thin film transistor
JP5167580B2 (ja) * 2005-08-23 2013-03-21 日本電気株式会社 電子デバイス
EP1998374A3 (en) * 2005-09-29 2012-01-18 Semiconductor Energy Laboratory Co, Ltd. Semiconductor device having oxide semiconductor layer and manufacturing method thereof
JP2009289837A (ja) * 2008-05-27 2009-12-10 Oki Semiconductor Co Ltd 半導体装置
KR101002666B1 (ko) * 2008-07-14 2010-12-21 삼성모바일디스플레이주식회사 박막트랜지스터, 그의 제조방법, 및 이를 포함하는유기전계발광표시장치
KR101893236B1 (ko) * 2011-04-01 2018-08-29 르네사스 일렉트로닉스 가부시키가이샤 반도체 장치 및 그 제조 방법과 휴대 전화기

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10268360A (ja) * 1997-03-26 1998-10-09 Semiconductor Energy Lab Co Ltd 表示装置
JP3837951B2 (ja) * 1998-02-09 2006-10-25 セイコーエプソン株式会社 電気光学パネル及び電子機器
JP4030193B2 (ja) * 1998-07-16 2008-01-09 株式会社半導体エネルギー研究所 半導体装置の作製方法

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Publication number Publication date
JP2001305584A (ja) 2001-10-31

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