JP4527449B2 - 熱処理チャンバの為のシリンダ - Google Patents
熱処理チャンバの為のシリンダ Download PDFInfo
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- JP4527449B2 JP4527449B2 JP2004173034A JP2004173034A JP4527449B2 JP 4527449 B2 JP4527449 B2 JP 4527449B2 JP 2004173034 A JP2004173034 A JP 2004173034A JP 2004173034 A JP2004173034 A JP 2004173034A JP 4527449 B2 JP4527449 B2 JP 4527449B2
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- 238000010438 heat treatment Methods 0.000 title claims description 21
- 238000000576 coating method Methods 0.000 claims description 49
- 239000011248 coating agent Substances 0.000 claims description 47
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 32
- 229920005591 polysilicon Polymers 0.000 claims description 31
- 238000006243 chemical reaction Methods 0.000 claims description 22
- 239000004065 semiconductor Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 claims description 19
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 15
- 239000000758 substrate Substances 0.000 claims description 15
- 239000010453 quartz Substances 0.000 claims description 14
- 230000008021 deposition Effects 0.000 claims description 12
- 230000001186 cumulative effect Effects 0.000 claims description 9
- 238000009413 insulation Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- 241000287463 Phalacrocorax Species 0.000 claims 1
- 241000287462 Phalacrocorax carbo Species 0.000 claims 1
- 238000007789 sealing Methods 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 26
- 238000009529 body temperature measurement Methods 0.000 description 13
- 238000012545 processing Methods 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 12
- 239000013078 crystal Substances 0.000 description 10
- 230000005855 radiation Effects 0.000 description 10
- 239000007789 gas Substances 0.000 description 7
- 230000017525 heat dissipation Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 239000000919 ceramic Substances 0.000 description 6
- 238000005229 chemical vapour deposition Methods 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000002950 deficient Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 238000005336 cracking Methods 0.000 description 2
- 238000001289 rapid thermal chemical vapour deposition Methods 0.000 description 2
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 2
- 239000005052 trichlorosilane Substances 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- 238000000137 annealing Methods 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 238000005234 chemical deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000295 complement effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 238000005339 levitation Methods 0.000 description 1
- 238000005461 lubrication Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 238000000059 patterning Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 238000009751 slip forming Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- -1 tungsten halogen Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/324—Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68735—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by edge profile or support profile
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/04—Coating on selected surface areas, e.g. using masks
- C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/24—Deposition of silicon only
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68757—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a coating or a hardness or a material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67115—Apparatus for thermal treatment mainly by radiation
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Computer Hardware Design (AREA)
- General Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Physics & Mathematics (AREA)
- Organic Chemistry (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Resistance Heating (AREA)
- Muffle Furnaces And Rotary Kilns (AREA)
Description
[0001]本発明は、半導体処理に関し、特に、急速加熱処理(RTP)用チャンバのような熱処理チャンバ内で使用される支持用シリンダに関する。
[0002]集積回路(IC)市場は、より大きなメモリ容量、より速いスイッチング速度、より小さな特徴部サイズを絶えず必要とする。これらの要求に着手する為に業界が採った主要ステップの一つは、シリコンウエハのような複数基板の、大きな炉内のバッチ処理から、小さな反応チャンバ内で単一基板を処理することへの変更である。
Claims (14)
- 半導体熱処理装置内で使用する為のシリンダにおいて、
石英で形成されている耐熱性筒状コアであって、該コアは、内側側壁および外側側壁、対向する第1端部および第2端部を有しており、前記第1端部は、半導体基板を支持するエッジリングに接触するように構成されており、前記内側側壁は少なくとも部分的に前記外側側壁に向かってテーパが付けられており、前記第1端部の面積は前記第2端部の面積より小さい、前記コアと、
赤外線に対して不透過性の被覆であって、前記第1端部の表面を除いて前記コアの外部表面の全てを覆う前記被覆と、
を備える、前記シリンダ。 - 前記被覆の累積厚みは、60μmから100μmの間である、請求項1記載のシリンダ。
- 前記被覆の累積厚みは、70μmから90μmの間である、請求項1記載のシリンダ。
- 前記被覆の累積厚みは、75μmから85μmの間である、請求項1記載のシリンダ。
- 前記被覆の厚みは、均一である、請求項1記載のシリンダ。
- 前記内側側壁および前記外側側壁は、前記第1端部に第1領域、前記第2端部に第2領域を有し、前記外側側壁は、同一直線上に第1領域および第2領域を有し、前記内側側壁の前記第2領域は、前記第1端部において前記外側側壁に向かってテーパが付けられている、請求項1記載のシリンダ。
- 熱処理装置内で使用されるシリンダにおいて、
その断熱特性の為に選択された筒状コアであって、該筒状コアは、石英で形成されており、内側側壁と外側側壁、対向する第1端部および第2端部を有し、前記第1端部はエッジリングを支持するように構成されており、前記内側側壁は少なくとも部分的に前記外側側壁に向かってテーパが付けられており、前記第1端部の面積は前記第2端部の面積より小さい、前記コアと、
前記第1端部を除いて前記コアの外部表面の全てを覆うポリシリコン製被覆であって、赤外線に対して不透過性であり、前記第1端部を除き、前記コアの外部表面の全てを覆う、前記被覆と、
を備える、前記シリンダ。 - 前記被覆の累積厚みは、60μmから100μmの間である、請求項7記載のシリンダ。
- 前記被覆の累積厚みは、70μmから90μmの間である、請求項7記載のシリンダ。
- 前記被覆の累積厚みは、75μmから85μmの間である、請求項7記載のシリンダ。
- 前記被覆の厚みは、均一である、請求項7記載のシリンダ。
- 熱処理装置内で使用されるシリンダを作る方法において、
耐熱性筒状石英コアを提供するステップであって、該コアは、内側側壁および外側側壁、対向する第1端部および第2端部を有しており、前記内側側壁は、少なくとも部分的に前記外側側壁に向かってテーパが付けられており、前記第1端部が、半導体基板を支持するエッジリングに接触するように構成されており、前記第1端部の面積は前記第2端部の面積より小さい、ステップと、
前記コアを反応チャンバ内のリング上に配置するステップであって、前記第1端部は前記リングと接触している、前記ステップと、
前記反応チャンバを密閉するステップと、
前記反応チャンバを加熱するステップと、
前記反応チャンバ内にガスを噴射するステップと、
前記第1端部を除いて前記コアの外部表面の全てを覆うポリシリコンの被覆を堆積するステップであって、前記被覆は赤外線に対して不透過性である、前記ステップと、を備える、前記方法。 - 前記加熱するステップは、前記反応チャンバを1100℃から1250℃の間で加熱する工程を備える、請求項12記載の方法。
- 前記加熱するステップと前記噴射するステップは、前記被覆が1.6μm/分から1.8μm/分の間で前記被覆の堆積が生じるように制御される、請求項12記載の方法。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/463,129 US7241345B2 (en) | 2003-06-16 | 2003-06-16 | Cylinder for thermal processing chamber |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005051206A JP2005051206A (ja) | 2005-02-24 |
JP4527449B2 true JP4527449B2 (ja) | 2010-08-18 |
Family
ID=33511531
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Application Number | Title | Priority Date | Filing Date |
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JP2004173034A Expired - Lifetime JP4527449B2 (ja) | 2003-06-16 | 2004-06-10 | 熱処理チャンバの為のシリンダ |
Country Status (5)
Country | Link |
---|---|
US (1) | US7241345B2 (ja) |
JP (1) | JP4527449B2 (ja) |
KR (1) | KR101086152B1 (ja) |
CN (1) | CN100378904C (ja) |
TW (1) | TWI338317B (ja) |
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US8349128B2 (en) | 2004-06-30 | 2013-01-08 | Applied Materials, Inc. | Method and apparatus for stable plasma processing |
US20060000802A1 (en) * | 2004-06-30 | 2006-01-05 | Ajay Kumar | Method and apparatus for photomask plasma etching |
US7943005B2 (en) | 2006-10-30 | 2011-05-17 | Applied Materials, Inc. | Method and apparatus for photomask plasma etching |
US7909961B2 (en) * | 2006-10-30 | 2011-03-22 | Applied Materials, Inc. | Method and apparatus for photomask plasma etching |
CN102184840B (zh) * | 2011-05-11 | 2012-07-25 | 苏州凯西石英电子有限公司 | 一种双层石英筒的制作方法 |
US10727092B2 (en) * | 2012-10-17 | 2020-07-28 | Applied Materials, Inc. | Heated substrate support ring |
FR3000416B1 (fr) * | 2012-12-28 | 2021-04-30 | Inst Nat Polytechnique Toulouse | Procede et dispositif pour la formation d'une couche de surface dans une piece creuse et piece ainsi obtenue |
CN111952149A (zh) * | 2013-05-23 | 2020-11-17 | 应用材料公司 | 用于半导体处理腔室的经涂布的衬里组件 |
US9385004B2 (en) * | 2013-08-15 | 2016-07-05 | Applied Materials, Inc. | Support cylinder for thermal processing chamber |
KR102257567B1 (ko) * | 2013-09-30 | 2021-05-31 | 어플라이드 머티어리얼스, 인코포레이티드 | 캡슐화된 광 배리어를 갖는 지지체 링 |
US9330955B2 (en) | 2013-12-31 | 2016-05-03 | Applied Materials, Inc. | Support ring with masked edge |
WO2019177837A1 (en) * | 2018-03-13 | 2019-09-19 | Applied Materials, Inc | Support ring with plasma spray coating |
CN115351020B (zh) * | 2022-08-17 | 2024-05-17 | 长鑫存储技术有限公司 | 一种半导体设备自清洁方法、系统及装置 |
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2003
- 2003-06-16 US US10/463,129 patent/US7241345B2/en active Active
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2004
- 2004-06-09 TW TW093116575A patent/TWI338317B/zh active
- 2004-06-10 JP JP2004173034A patent/JP4527449B2/ja not_active Expired - Lifetime
- 2004-06-15 KR KR1020040044023A patent/KR101086152B1/ko active IP Right Grant
- 2004-06-16 CN CNB2004100481544A patent/CN100378904C/zh not_active Expired - Lifetime
Patent Citations (3)
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JPH10173032A (ja) * | 1996-11-05 | 1998-06-26 | Applied Materials Inc | 傾斜付き基板支持具 |
JP2000515331A (ja) * | 1997-05-16 | 2000-11-14 | アプライド マテリアルズ インコーポレイテッド | Rtpチャンバのための磁気的浮上型回転装置 |
JP2002231791A (ja) * | 2001-01-30 | 2002-08-16 | Toshiba Ceramics Co Ltd | 半導体熱処理用部材およびその搬送方法 |
Also Published As
Publication number | Publication date |
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US20040250772A1 (en) | 2004-12-16 |
KR101086152B1 (ko) | 2011-11-25 |
CN1574208A (zh) | 2005-02-02 |
KR20040111061A (ko) | 2004-12-31 |
CN100378904C (zh) | 2008-04-02 |
TW200504807A (en) | 2005-02-01 |
US7241345B2 (en) | 2007-07-10 |
TWI338317B (en) | 2011-03-01 |
JP2005051206A (ja) | 2005-02-24 |
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