JP4520698B2 - 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法 - Google Patents

少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法 Download PDF

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JP4520698B2
JP4520698B2 JP2002587393A JP2002587393A JP4520698B2 JP 4520698 B2 JP4520698 B2 JP 4520698B2 JP 2002587393 A JP2002587393 A JP 2002587393A JP 2002587393 A JP2002587393 A JP 2002587393A JP 4520698 B2 JP4520698 B2 JP 4520698B2
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crystallization
melt
monomer
suspension
crude
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JP2004528371A5 (enExample
JP2004528371A (ja
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ハモン ウルリヒ
エック ベルント
バウマン ディーター
ハイレク イェルク
ヨアヒム ミュラー−エンゲル クラウス
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BASF SE
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BASF SE
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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
    • C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
    • C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
    • C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D207/24—Oxygen or sulfur atoms
    • C07D207/26—2-Pyrrolidones
    • C07D207/263—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms
    • C07D207/267—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to the ring nitrogen atom
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/42—Separation; Purification; Stabilisation; Use of additives
    • C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Pyrrole Compounds (AREA)
JP2002587393A 2001-05-10 2002-05-02 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法 Expired - Lifetime JP4520698B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10122788A DE10122788A1 (de) 2001-05-10 2001-05-10 Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren
PCT/EP2002/004783 WO2002090310A1 (de) 2001-05-10 2002-05-02 Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren

Related Child Applications (1)

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JP2010056941A Division JP2010132711A (ja) 2001-05-10 2010-03-15 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法

Publications (3)

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JP2004528371A JP2004528371A (ja) 2004-09-16
JP2004528371A5 JP2004528371A5 (enExample) 2010-05-20
JP4520698B2 true JP4520698B2 (ja) 2010-08-11

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JP2002587393A Expired - Lifetime JP4520698B2 (ja) 2001-05-10 2002-05-02 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法
JP2010056941A Withdrawn JP2010132711A (ja) 2001-05-10 2010-03-15 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法

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JP2010056941A Withdrawn JP2010132711A (ja) 2001-05-10 2010-03-15 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法

Country Status (6)

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US (1) US7319166B2 (enExample)
EP (1) EP1387824B1 (enExample)
JP (2) JP4520698B2 (enExample)
CN (1) CN1234661C (enExample)
DE (2) DE10122788A1 (enExample)
WO (1) WO2002090310A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010132711A (ja) * 2001-05-10 2010-06-17 Basf Se 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法

Families Citing this family (29)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8194770B2 (en) 2002-08-27 2012-06-05 Qualcomm Incorporated Coded MIMO systems with selective channel inversion applied per eigenmode
US8320301B2 (en) 2002-10-25 2012-11-27 Qualcomm Incorporated MIMO WLAN system
US8170513B2 (en) 2002-10-25 2012-05-01 Qualcomm Incorporated Data detection and demodulation for wireless communication systems
US8218609B2 (en) 2002-10-25 2012-07-10 Qualcomm Incorporated Closed-loop rate control for a multi-channel communication system
US8208364B2 (en) 2002-10-25 2012-06-26 Qualcomm Incorporated MIMO system with multiple spatial multiplexing modes
US8169944B2 (en) 2002-10-25 2012-05-01 Qualcomm Incorporated Random access for wireless multiple-access communication systems
US20040081131A1 (en) 2002-10-25 2004-04-29 Walton Jay Rod OFDM communication system with multiple OFDM symbol sizes
US7002900B2 (en) 2002-10-25 2006-02-21 Qualcomm Incorporated Transmit diversity processing for a multi-antenna communication system
US8134976B2 (en) 2002-10-25 2012-03-13 Qualcomm Incorporated Channel calibration for a time division duplexed communication system
US7324429B2 (en) 2002-10-25 2008-01-29 Qualcomm, Incorporated Multi-mode terminal in a wireless MIMO system
US8570988B2 (en) 2002-10-25 2013-10-29 Qualcomm Incorporated Channel calibration for a time division duplexed communication system
US7986742B2 (en) 2002-10-25 2011-07-26 Qualcomm Incorporated Pilots for MIMO communication system
US9473269B2 (en) 2003-12-01 2016-10-18 Qualcomm Incorporated Method and apparatus for providing an efficient control channel structure in a wireless communication system
DE102004058071A1 (de) * 2004-12-01 2006-06-08 Basf Ag Verfahren zur Reinigung von polaren Vinylverbindungen
US7705181B2 (en) 2005-03-01 2010-04-27 Basf Akiengesellschaft Process for removing methacrylic acid from liquid phase comprising acrylic acid as a main constituent and target product, and methacrylic acid as a secondary component
US7601866B2 (en) 2005-03-01 2009-10-13 Basf Aktiengesellschaft Process for removing methacrolein from liquid phase comprising acrylic acid as a main constituent and target product, and methacrolein as a secondary component
JP4976311B2 (ja) * 2005-04-11 2012-07-18 株式会社日本触媒 Ｎ−ビニル−２−ピロリドンの製造方法
US7466749B2 (en) 2005-05-12 2008-12-16 Qualcomm Incorporated Rate selection with margin sharing
US8358714B2 (en) 2005-06-16 2013-01-22 Qualcomm Incorporated Coding and modulation for multiple data streams in a communication system
JP2007191449A (ja) 2006-01-20 2007-08-02 Nippon Shokubai Co Ltd アクリル酸の製造方法
DE602007005288D1 (de) 2006-01-20 2010-04-29 Nippon Catalytic Chem Ind Verfahren zur Reinigung von Acrylsäure
JP5274005B2 (ja) * 2007-12-25 2013-08-28 三菱レイヨン株式会社 易重合性化合物の晶析方法、および晶析装置
JP5112898B2 (ja) * 2008-02-07 2013-01-09 三菱レイヨン株式会社 （メタ）アクリル酸の晶析方法およびその晶析システム
DE102008040799A1 (de) 2008-07-28 2008-12-11 Basf Se Verfahren zur Auftrennung von in einem Produktgasgemisch einer partiellen heterogen katalysierten Gasphasenoxidation einer C3-Vorläuferverbindung der Acrylsäure als Hauptbestandteil enthaltener Acrylsäure und als Nebenprodukt enthaltenem Glyoxal
DE102008041573A1 (de) 2008-08-26 2010-03-04 Basf Se Verfahren zur Auftrennung von in einem Produktgasgemisch einer partiellen heterogen katalysierten Gasphasenoxidation einer C3-Vorläuferverbindung der Acrylsäure als Hauptbestandteil enhaltener Acrylsäure und als Nebenprodukt enthaltenem Glyoxal
KR101861855B1 (ko) 2008-07-28 2018-05-28 바스프 에스이 탄소원자 수가 ３개인 아크릴산의 전구체 화합물의 기체상 생성물 혼합물로부터 주성분으로서 함유된 아크릴산과 부산물로서 함유된 글리옥살을 분리시키는 방법
WO2010134434A1 (ja) * 2009-05-19 2010-11-25 株式会社日本触媒 (メタ)アクリル酸の製造方法
DE102011076931A1 (de) 2011-06-03 2012-12-06 Basf Se Wässrige Lösung, enthaltend Acrylsäure und deren konjugierte Base
WO2014108285A1 (en) * 2013-01-14 2014-07-17 Sulzer Chemtech Ag Multi-stage crystallisation process and apparatus to purify a compound

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2606364C3 (de) 1976-02-18 1988-05-26 Basf Ag, 6700 Ludwigshafen Verfahren zur Stofftrennung aus einem flüssigen Gemisch durch fraktionierte Kristallisation
US4656651A (en) 1985-09-09 1987-04-07 Itt Corporation System for providing remote services
CH667816A5 (de) 1985-10-09 1988-11-15 Sulzer Ag Kristallisationsvorrichtung und deren verwendung.
US5329021A (en) * 1993-02-04 1994-07-12 Isp Investments Inc. Process for the production of pure vinyl pyrrolidone
TW305830B (enExample) * 1993-03-26 1997-05-21 Sulzer Chemtech Ag
US5523480A (en) * 1994-03-28 1996-06-04 Rohm And Haas Company Process for purifying unsaturated carboxylic acids using distillation and melt crystallization
DE19501326A1 (de) 1995-01-18 1996-07-25 Basf Ag Verfahren der rektifikativen Abtrennung von (Meth)acrylsäure aus einem (Meth)acrylsäure als Hauptbestandteil und niedere Aldehyde als Nebenbestandteile enthaltenden Gemisch in einer aus Abtriebsteil und Verstärkerteil bestehenden Rektifiaktionskolonne
DE19627679A1 (de) * 1996-07-10 1998-01-15 Basf Ag Verfahren zur Reinigung von Roh-Acrylsäure durch Kristallisation
DE19740252A1 (de) * 1997-09-12 1999-03-18 Basf Ag Verfahren zur Herstellung von Acrylsäure und Methacrylsäure
DE19904820A1 (de) 1999-02-05 2000-08-10 Stockhausen Chem Fab Gmbh Verfahren und Vorrichtung zur Reinigung von Stoffen mittels Kristallisation
JP2000290220A (ja) * 1999-04-09 2000-10-17 Mitsubishi Chemicals Corp アクリル酸の精製方法
DE19926082A1 (de) 1999-06-08 2000-12-14 Basf Ag Verfahren zur Reinigung und Herstellung von Acrylsäure oder Methacrylsäure
DE19938841A1 (de) 1999-08-17 2001-02-22 Basf Ag Inhibitorkomposition zur Stabilisierung von radikalisch polymerisierbaren Substanzen
DE10003497A1 (de) * 2000-01-27 2001-04-12 Basf Ag Reinigungsverfahren für (Meth)acrylsäure
DE10003498A1 (de) 2000-01-27 2001-08-02 Basf Ag Reinigungsverfahren für (Meth)acrylsäure
DE10039025A1 (de) 2000-08-10 2002-02-21 Basf Ag Verfahren zur Reinigung einer Rohacrylsäureschmelze
DE10026407A1 (de) 2000-05-29 2001-12-06 Basf Ag Verfahren der diskontinuierlichen kristallisativen Reinigung von Roh-Acrylsäure
DE10122788A1 (de) * 2001-05-10 2002-06-06 Basf Ag Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010132711A (ja) * 2001-05-10 2010-06-17 Basf Se 少なくとも１種のモノマーの粗製溶融物の結晶化による精製のための方法

Also Published As

Publication number Publication date
US20040133015A1 (en) 2004-07-08
CN1234661C (zh) 2006-01-04
EP1387824B1 (de) 2007-06-06
JP2004528371A (ja) 2004-09-16
JP2010132711A (ja) 2010-06-17
US7319166B2 (en) 2008-01-15
DE10122788A1 (de) 2002-06-06
DE50210277D1 (de) 2007-07-19
WO2002090310A1 (de) 2002-11-14
EP1387824A1 (de) 2004-02-11
CN1518530A (zh) 2004-08-04

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