DE10122788A1 - Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren - Google Patents
Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines MonomerenInfo
- Publication number
- DE10122788A1 DE10122788A1 DE10122788A DE10122788A DE10122788A1 DE 10122788 A1 DE10122788 A1 DE 10122788A1 DE 10122788 A DE10122788 A DE 10122788A DE 10122788 A DE10122788 A DE 10122788A DE 10122788 A1 DE10122788 A1 DE 10122788A1
- Authority
- DE
- Germany
- Prior art keywords
- monomer
- melt
- crystallization
- crystals
- crystallizing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D207/00—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom
- C07D207/02—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom
- C07D207/18—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member
- C07D207/22—Heterocyclic compounds containing five-membered rings not condensed with other rings, with one nitrogen atom as the only ring hetero atom with only hydrogen or carbon atoms directly attached to the ring nitrogen atom having one double bond between ring members or between a ring member and a non-ring member with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
- C07D207/24—Oxygen or sulfur atoms
- C07D207/26—2-Pyrrolidones
- C07D207/263—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms
- C07D207/267—2-Pyrrolidones with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to other ring carbon atoms with only hydrogen atoms or radicals containing only hydrogen and carbon atoms directly attached to the ring nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C51/00—Preparation of carboxylic acids or their salts, halides or anhydrides
- C07C51/42—Separation; Purification; Stabilisation; Use of additives
- C07C51/43—Separation; Purification; Stabilisation; Use of additives by change of the physical state, e.g. crystallisation
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Pyrrole Compounds (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10122788A DE10122788A1 (de) | 2001-05-10 | 2001-05-10 | Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren |
| EP02735324A EP1387824B1 (de) | 2001-05-10 | 2002-05-02 | Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren |
| DE50210277T DE50210277D1 (de) | 2001-05-10 | 2002-05-02 | Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren |
| CN02809592.8A CN1234661C (zh) | 2001-05-10 | 2002-05-02 | 通过结晶纯化至少一种单体的粗熔化物的方法 |
| JP2002587393A JP4520698B2 (ja) | 2001-05-10 | 2002-05-02 | 少なくとも1種のモノマーの粗製溶融物の結晶化による精製のための方法 |
| PCT/EP2002/004783 WO2002090310A1 (de) | 2001-05-10 | 2002-05-02 | Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren |
| US10/476,187 US7319166B2 (en) | 2001-05-10 | 2002-05-02 | Method of purifying a raw melt of at least one monomer by crystallization |
| JP2010056941A JP2010132711A (ja) | 2001-05-10 | 2010-03-15 | 少なくとも1種のモノマーの粗製溶融物の結晶化による精製のための方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10122788A DE10122788A1 (de) | 2001-05-10 | 2001-05-10 | Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE10122788A1 true DE10122788A1 (de) | 2002-06-06 |
Family
ID=7684328
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE10122788A Withdrawn DE10122788A1 (de) | 2001-05-10 | 2001-05-10 | Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren |
| DE50210277T Expired - Lifetime DE50210277D1 (de) | 2001-05-10 | 2002-05-02 | Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE50210277T Expired - Lifetime DE50210277D1 (de) | 2001-05-10 | 2002-05-02 | Verfahren der kristallisativen reinigung einer roh-schmelze wenigstens eines monomeren |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7319166B2 (enExample) |
| EP (1) | EP1387824B1 (enExample) |
| JP (2) | JP4520698B2 (enExample) |
| CN (1) | CN1234661C (enExample) |
| DE (2) | DE10122788A1 (enExample) |
| WO (1) | WO2002090310A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012163931A1 (de) | 2011-06-03 | 2012-12-06 | Basf Se | Wässrige lösung, enthaltend acrylsäure und deren konjugierte base |
Families Citing this family (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE10122788A1 (de) * | 2001-05-10 | 2002-06-06 | Basf Ag | Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren |
| US8194770B2 (en) | 2002-08-27 | 2012-06-05 | Qualcomm Incorporated | Coded MIMO systems with selective channel inversion applied per eigenmode |
| US8320301B2 (en) | 2002-10-25 | 2012-11-27 | Qualcomm Incorporated | MIMO WLAN system |
| US8170513B2 (en) | 2002-10-25 | 2012-05-01 | Qualcomm Incorporated | Data detection and demodulation for wireless communication systems |
| US8218609B2 (en) | 2002-10-25 | 2012-07-10 | Qualcomm Incorporated | Closed-loop rate control for a multi-channel communication system |
| US8208364B2 (en) | 2002-10-25 | 2012-06-26 | Qualcomm Incorporated | MIMO system with multiple spatial multiplexing modes |
| US8169944B2 (en) | 2002-10-25 | 2012-05-01 | Qualcomm Incorporated | Random access for wireless multiple-access communication systems |
| US20040081131A1 (en) | 2002-10-25 | 2004-04-29 | Walton Jay Rod | OFDM communication system with multiple OFDM symbol sizes |
| US7002900B2 (en) | 2002-10-25 | 2006-02-21 | Qualcomm Incorporated | Transmit diversity processing for a multi-antenna communication system |
| US8134976B2 (en) | 2002-10-25 | 2012-03-13 | Qualcomm Incorporated | Channel calibration for a time division duplexed communication system |
| US7324429B2 (en) | 2002-10-25 | 2008-01-29 | Qualcomm, Incorporated | Multi-mode terminal in a wireless MIMO system |
| US8570988B2 (en) | 2002-10-25 | 2013-10-29 | Qualcomm Incorporated | Channel calibration for a time division duplexed communication system |
| US7986742B2 (en) | 2002-10-25 | 2011-07-26 | Qualcomm Incorporated | Pilots for MIMO communication system |
| US9473269B2 (en) | 2003-12-01 | 2016-10-18 | Qualcomm Incorporated | Method and apparatus for providing an efficient control channel structure in a wireless communication system |
| DE102004058071A1 (de) * | 2004-12-01 | 2006-06-08 | Basf Ag | Verfahren zur Reinigung von polaren Vinylverbindungen |
| US7705181B2 (en) | 2005-03-01 | 2010-04-27 | Basf Akiengesellschaft | Process for removing methacrylic acid from liquid phase comprising acrylic acid as a main constituent and target product, and methacrylic acid as a secondary component |
| US7601866B2 (en) | 2005-03-01 | 2009-10-13 | Basf Aktiengesellschaft | Process for removing methacrolein from liquid phase comprising acrylic acid as a main constituent and target product, and methacrolein as a secondary component |
| JP4976311B2 (ja) * | 2005-04-11 | 2012-07-18 | 株式会社日本触媒 | N−ビニル−2−ピロリドンの製造方法 |
| US7466749B2 (en) | 2005-05-12 | 2008-12-16 | Qualcomm Incorporated | Rate selection with margin sharing |
| US8358714B2 (en) | 2005-06-16 | 2013-01-22 | Qualcomm Incorporated | Coding and modulation for multiple data streams in a communication system |
| JP2007191449A (ja) | 2006-01-20 | 2007-08-02 | Nippon Shokubai Co Ltd | アクリル酸の製造方法 |
| DE602007005288D1 (de) | 2006-01-20 | 2010-04-29 | Nippon Catalytic Chem Ind | Verfahren zur Reinigung von Acrylsäure |
| JP5274005B2 (ja) * | 2007-12-25 | 2013-08-28 | 三菱レイヨン株式会社 | 易重合性化合物の晶析方法、および晶析装置 |
| JP5112898B2 (ja) * | 2008-02-07 | 2013-01-09 | 三菱レイヨン株式会社 | (メタ)アクリル酸の晶析方法およびその晶析システム |
| DE102008040799A1 (de) | 2008-07-28 | 2008-12-11 | Basf Se | Verfahren zur Auftrennung von in einem Produktgasgemisch einer partiellen heterogen katalysierten Gasphasenoxidation einer C3-Vorläuferverbindung der Acrylsäure als Hauptbestandteil enthaltener Acrylsäure und als Nebenprodukt enthaltenem Glyoxal |
| DE102008041573A1 (de) | 2008-08-26 | 2010-03-04 | Basf Se | Verfahren zur Auftrennung von in einem Produktgasgemisch einer partiellen heterogen katalysierten Gasphasenoxidation einer C3-Vorläuferverbindung der Acrylsäure als Hauptbestandteil enhaltener Acrylsäure und als Nebenprodukt enthaltenem Glyoxal |
| KR101861855B1 (ko) | 2008-07-28 | 2018-05-28 | 바스프 에스이 | 탄소원자 수가 3개인 아크릴산의 전구체 화합물의 기체상 생성물 혼합물로부터 주성분으로서 함유된 아크릴산과 부산물로서 함유된 글리옥살을 분리시키는 방법 |
| WO2010134434A1 (ja) * | 2009-05-19 | 2010-11-25 | 株式会社日本触媒 | (メタ)アクリル酸の製造方法 |
| WO2014108285A1 (en) * | 2013-01-14 | 2014-07-17 | Sulzer Chemtech Ag | Multi-stage crystallisation process and apparatus to purify a compound |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2606364C3 (de) | 1976-02-18 | 1988-05-26 | Basf Ag, 6700 Ludwigshafen | Verfahren zur Stofftrennung aus einem flüssigen Gemisch durch fraktionierte Kristallisation |
| US4656651A (en) | 1985-09-09 | 1987-04-07 | Itt Corporation | System for providing remote services |
| CH667816A5 (de) | 1985-10-09 | 1988-11-15 | Sulzer Ag | Kristallisationsvorrichtung und deren verwendung. |
| US5329021A (en) * | 1993-02-04 | 1994-07-12 | Isp Investments Inc. | Process for the production of pure vinyl pyrrolidone |
| TW305830B (enExample) * | 1993-03-26 | 1997-05-21 | Sulzer Chemtech Ag | |
| US5523480A (en) * | 1994-03-28 | 1996-06-04 | Rohm And Haas Company | Process for purifying unsaturated carboxylic acids using distillation and melt crystallization |
| DE19501326A1 (de) | 1995-01-18 | 1996-07-25 | Basf Ag | Verfahren der rektifikativen Abtrennung von (Meth)acrylsäure aus einem (Meth)acrylsäure als Hauptbestandteil und niedere Aldehyde als Nebenbestandteile enthaltenden Gemisch in einer aus Abtriebsteil und Verstärkerteil bestehenden Rektifiaktionskolonne |
| DE19627679A1 (de) * | 1996-07-10 | 1998-01-15 | Basf Ag | Verfahren zur Reinigung von Roh-Acrylsäure durch Kristallisation |
| DE19740252A1 (de) * | 1997-09-12 | 1999-03-18 | Basf Ag | Verfahren zur Herstellung von Acrylsäure und Methacrylsäure |
| DE19904820A1 (de) | 1999-02-05 | 2000-08-10 | Stockhausen Chem Fab Gmbh | Verfahren und Vorrichtung zur Reinigung von Stoffen mittels Kristallisation |
| JP2000290220A (ja) * | 1999-04-09 | 2000-10-17 | Mitsubishi Chemicals Corp | アクリル酸の精製方法 |
| DE19926082A1 (de) | 1999-06-08 | 2000-12-14 | Basf Ag | Verfahren zur Reinigung und Herstellung von Acrylsäure oder Methacrylsäure |
| DE19938841A1 (de) | 1999-08-17 | 2001-02-22 | Basf Ag | Inhibitorkomposition zur Stabilisierung von radikalisch polymerisierbaren Substanzen |
| DE10003497A1 (de) * | 2000-01-27 | 2001-04-12 | Basf Ag | Reinigungsverfahren für (Meth)acrylsäure |
| DE10003498A1 (de) | 2000-01-27 | 2001-08-02 | Basf Ag | Reinigungsverfahren für (Meth)acrylsäure |
| DE10039025A1 (de) | 2000-08-10 | 2002-02-21 | Basf Ag | Verfahren zur Reinigung einer Rohacrylsäureschmelze |
| DE10026407A1 (de) | 2000-05-29 | 2001-12-06 | Basf Ag | Verfahren der diskontinuierlichen kristallisativen Reinigung von Roh-Acrylsäure |
| DE10122788A1 (de) * | 2001-05-10 | 2002-06-06 | Basf Ag | Verfahren der kristallisativen Reinigung einer Roh-Schmelze wenigstens eines Monomeren |
-
2001
- 2001-05-10 DE DE10122788A patent/DE10122788A1/de not_active Withdrawn
-
2002
- 2002-05-02 CN CN02809592.8A patent/CN1234661C/zh not_active Expired - Lifetime
- 2002-05-02 EP EP02735324A patent/EP1387824B1/de not_active Expired - Lifetime
- 2002-05-02 WO PCT/EP2002/004783 patent/WO2002090310A1/de not_active Ceased
- 2002-05-02 US US10/476,187 patent/US7319166B2/en not_active Expired - Lifetime
- 2002-05-02 JP JP2002587393A patent/JP4520698B2/ja not_active Expired - Lifetime
- 2002-05-02 DE DE50210277T patent/DE50210277D1/de not_active Expired - Lifetime
-
2010
- 2010-03-15 JP JP2010056941A patent/JP2010132711A/ja not_active Withdrawn
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2012163931A1 (de) | 2011-06-03 | 2012-12-06 | Basf Se | Wässrige lösung, enthaltend acrylsäure und deren konjugierte base |
| DE102011076931A1 (de) | 2011-06-03 | 2012-12-06 | Basf Se | Wässrige Lösung, enthaltend Acrylsäure und deren konjugierte Base |
| US9150483B2 (en) | 2011-06-03 | 2015-10-06 | Basf Se | Aqueous solution comprising acrylic acid and the conjugate base thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| US20040133015A1 (en) | 2004-07-08 |
| CN1234661C (zh) | 2006-01-04 |
| EP1387824B1 (de) | 2007-06-06 |
| JP2004528371A (ja) | 2004-09-16 |
| JP2010132711A (ja) | 2010-06-17 |
| US7319166B2 (en) | 2008-01-15 |
| DE50210277D1 (de) | 2007-07-19 |
| JP4520698B2 (ja) | 2010-08-11 |
| WO2002090310A1 (de) | 2002-11-14 |
| EP1387824A1 (de) | 2004-02-11 |
| CN1518530A (zh) | 2004-08-04 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| OAV | Publication of unexamined application with consent of applicant | ||
| 8130 | Withdrawal |