JP4507026B2 - ハレーション防止用組成物およびそれを用いた感光性樹脂積層体 - Google Patents

ハレーション防止用組成物およびそれを用いた感光性樹脂積層体 Download PDF

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Publication number
JP4507026B2
JP4507026B2 JP09925999A JP9925999A JP4507026B2 JP 4507026 B2 JP4507026 B2 JP 4507026B2 JP 09925999 A JP09925999 A JP 09925999A JP 9925999 A JP9925999 A JP 9925999A JP 4507026 B2 JP4507026 B2 JP 4507026B2
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Japan
Prior art keywords
photosensitive resin
adhesive layer
composition
antihalation
absorbance
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Expired - Lifetime
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JP09925999A
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Japanese (ja)
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JP2000292930A5 (enExample
JP2000292930A (ja
Inventor
浩二 小木
敏 高橋
祐二 田口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyobo Co Ltd
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Toyobo Co Ltd
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Publication date
Application filed by Toyobo Co Ltd filed Critical Toyobo Co Ltd
Priority to JP09925999A priority Critical patent/JP4507026B2/ja
Publication of JP2000292930A publication Critical patent/JP2000292930A/ja
Publication of JP2000292930A5 publication Critical patent/JP2000292930A5/ja
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Publication of JP4507026B2 publication Critical patent/JP4507026B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP09925999A 1999-04-06 1999-04-06 ハレーション防止用組成物およびそれを用いた感光性樹脂積層体 Expired - Lifetime JP4507026B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP09925999A JP4507026B2 (ja) 1999-04-06 1999-04-06 ハレーション防止用組成物およびそれを用いた感光性樹脂積層体

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09925999A JP4507026B2 (ja) 1999-04-06 1999-04-06 ハレーション防止用組成物およびそれを用いた感光性樹脂積層体

Publications (3)

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JP2000292930A JP2000292930A (ja) 2000-10-20
JP2000292930A5 JP2000292930A5 (enExample) 2006-05-25
JP4507026B2 true JP4507026B2 (ja) 2010-07-21

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ID=14242725

Family Applications (1)

Application Number Title Priority Date Filing Date
JP09925999A Expired - Lifetime JP4507026B2 (ja) 1999-04-06 1999-04-06 ハレーション防止用組成物およびそれを用いた感光性樹脂積層体

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JP (1) JP4507026B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG100772A1 (en) 2000-12-06 2003-12-26 Sumitomo Chemical Co Polymeric fluorescent substance and polymer light-emiting device using the same
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
GB201506660D0 (en) 2015-04-20 2015-06-03 Cellcentric Ltd Pharmaceutical compounds
GB201506658D0 (en) 2015-04-20 2015-06-03 Cellcentric Ltd Pharmaceutical compounds
CN114436971A (zh) * 2022-02-25 2022-05-06 陕西维世诺新材料有限公司 二(4-(苯并杂唑-2-基)苯基)甲胺衍生物及制备方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60260948A (ja) * 1984-06-07 1985-12-24 Toyobo Co Ltd 感光性樹脂積層体
JPH0246675B2 (ja) * 1986-07-04 1990-10-16 Nippon Kagaku Sangyo Kk Sanseidometsukyoku
DE3827245A1 (de) * 1988-08-11 1990-02-15 Hoechst Ag Photopolymerisierbares aufzeichnungsmaterial
JPH0364753A (ja) * 1989-08-03 1991-03-20 Nippon Kagaku Kogyosho:Kk 感光性樹脂用及び感光性樹脂下地材用添加物
JP2923345B2 (ja) * 1990-10-18 1999-07-26 株式会社日本化学工業所 光線遮蔽剤

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Publication number Publication date
JP2000292930A (ja) 2000-10-20

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