JP4500031B2 - 液状部材の滴下装置及び液状部材の滴下方法 - Google Patents

液状部材の滴下装置及び液状部材の滴下方法 Download PDF

Info

Publication number
JP4500031B2
JP4500031B2 JP2003341311A JP2003341311A JP4500031B2 JP 4500031 B2 JP4500031 B2 JP 4500031B2 JP 2003341311 A JP2003341311 A JP 2003341311A JP 2003341311 A JP2003341311 A JP 2003341311A JP 4500031 B2 JP4500031 B2 JP 4500031B2
Authority
JP
Japan
Prior art keywords
dropping
discharge port
substrate
liquid member
liquid crystal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2003341311A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005103463A (ja
JP2005103463A5 (https=
Inventor
眞一 荻本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shibaura Mechatronics Corp
Original Assignee
Shibaura Mechatronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shibaura Mechatronics Corp filed Critical Shibaura Mechatronics Corp
Priority to JP2003341311A priority Critical patent/JP4500031B2/ja
Publication of JP2005103463A publication Critical patent/JP2005103463A/ja
Publication of JP2005103463A5 publication Critical patent/JP2005103463A5/ja
Application granted granted Critical
Publication of JP4500031B2 publication Critical patent/JP4500031B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Landscapes

  • Coating Apparatus (AREA)
  • Liquid Crystal (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2003341311A 2003-09-30 2003-09-30 液状部材の滴下装置及び液状部材の滴下方法 Expired - Fee Related JP4500031B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003341311A JP4500031B2 (ja) 2003-09-30 2003-09-30 液状部材の滴下装置及び液状部材の滴下方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003341311A JP4500031B2 (ja) 2003-09-30 2003-09-30 液状部材の滴下装置及び液状部材の滴下方法

Publications (3)

Publication Number Publication Date
JP2005103463A JP2005103463A (ja) 2005-04-21
JP2005103463A5 JP2005103463A5 (https=) 2006-11-16
JP4500031B2 true JP4500031B2 (ja) 2010-07-14

Family

ID=34535950

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003341311A Expired - Fee Related JP4500031B2 (ja) 2003-09-30 2003-09-30 液状部材の滴下装置及び液状部材の滴下方法

Country Status (1)

Country Link
JP (1) JP4500031B2 (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010104861A (ja) * 2008-10-28 2010-05-13 Seiko Epson Corp 液状体の吐出方法、カラーフィルタの製造方法および有機ｅｌ装置の製造方法
KR101550361B1 (ko) 2009-02-17 2015-09-04 주식회사 탑 엔지니어링 스테이지를 구비한 디스펜서 제어방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05281562A (ja) * 1992-04-01 1993-10-29 Matsushita Electric Ind Co Ltd 液晶パネルの製造方法
JPH05285434A (ja) * 1992-04-14 1993-11-02 Omron Corp 液体吐出装置
JP3113212B2 (ja) * 1996-05-09 2000-11-27 富士通株式会社 プラズマディスプレイパネルの蛍光体層形成装置および蛍光体塗布方法
JP3886211B2 (ja) * 1997-06-06 2007-02-28 松下電器産業株式会社 部品装着用接着剤塗布ヘッド、部品装着用接着剤塗布装置、及び部品装着用接着剤塗布方法
JP2000288450A (ja) * 1999-04-07 2000-10-17 Tokyo Electron Ltd 塗布膜形成方法および塗布装置
JP2000301042A (ja) * 1999-04-19 2000-10-31 Nec Corp 樹脂塗布装置
JP2001044609A (ja) * 1999-07-29 2001-02-16 Matsushita Electric Ind Co Ltd 粘性流体塗布装置および方法
JP4206660B2 (ja) * 2001-11-13 2009-01-14 株式会社日立プラントテクノロジー シール印刷・液晶滴下装置と液晶表示パネル組立装置
JP4082910B2 (ja) * 2002-01-31 2008-04-30 東芝松下ディスプレイテクノロジー株式会社 液晶表示素子の製造方法
JP2003241208A (ja) * 2002-02-19 2003-08-27 Shibaura Mechatronics Corp 液晶滴下装置及び方法並びに液晶表示パネル製造装置

Also Published As

Publication number Publication date
JP2005103463A (ja) 2005-04-21

Similar Documents

Publication Publication Date Title
US20100087945A1 (en) Substrate reworking system, substrate reworking method, computer program, and computer-readable storage medium
WO2007132705A1 (ja) 液滴吐出描画装置
KR100553495B1 (ko) 워크 처리 장치의 처리 정밀도 검사 장치, 액체 방울 토출장치의 묘화 정밀도 검사 장치, 액체 방울 토출 장치 및워크, 전기 광학 장치, 전기 광학 장치의 제조 방법 및전자 기기
KR101116135B1 (ko) 액정 적하 제어장치
KR100578617B1 (ko) 액정적하장치 및 방법 및 액정표시패널 제조장치
JP4500031B2 (ja) 液状部材の滴下装置及び液状部材の滴下方法
CN102460289B (zh) 液晶滴下装置和液晶滴下的监视方法
KR101523671B1 (ko) 원료 토출 장치 및 이를 이용한 원료 토출 방법
JP3973209B2 (ja) 液状物質滴下装置及び方法
KR101986892B1 (ko) 기능액 토출 장치 및 기능액 토출 위치 보정 방법
KR102026891B1 (ko) 도포 장치
US8226204B2 (en) Fluid ejecting apparatus
EP3539774A1 (en) Three-dimensional fabricating apparatus and three-dimensional fabricating method
US11766860B2 (en) Method of controlling inkjet printing process
CN1977214A (zh) 液滴喷射方法、液滴喷射装置及电光面板的制造方法
TW200800619A (en) Method for forming pattern, method for forming alignment film, droplet ejection apparatus, apparatus for forming alignment film, electro-optic device, and liquid crystal display
JP2007245033A (ja) ペースト塗布設備
JP4541321B2 (ja) 液滴塗布装置、液滴塗布方法、プログラム及びコンピュータ読み取り可能な記録媒体
KR101116136B1 (ko) 액정 적하방법
JP4589267B2 (ja) 液状物質滴下装置
JP5200905B2 (ja) 液滴吐出ヘッドによる直線の描画方法
CN100586718C (zh) 图案形成方法、液滴喷出装置、电光装置及液晶显示装置
JP2005279628A (ja) 液滴塗布方法および液滴塗布装置
JP2006126784A (ja) 基板製造装置
JP2006126790A (ja) 液晶塗布装置

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20060928

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20060928

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20090520

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20090526

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090727

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20100119

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100315

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100406

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100416

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130423

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Ref document number: 4500031

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140423

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees