JP4491445B2 - 周辺露光装置およびその方法 - Google Patents

周辺露光装置およびその方法 Download PDF

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Publication number
JP4491445B2
JP4491445B2 JP2006246267A JP2006246267A JP4491445B2 JP 4491445 B2 JP4491445 B2 JP 4491445B2 JP 2006246267 A JP2006246267 A JP 2006246267A JP 2006246267 A JP2006246267 A JP 2006246267A JP 4491445 B2 JP4491445 B2 JP 4491445B2
Authority
JP
Japan
Prior art keywords
substrate
irradiation
moving
unit
laser beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006246267A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007148360A (ja
Inventor
晴康 劔持
博明 佐藤
泰人 池田
昌人 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Orc Manufacturing Co Ltd
Original Assignee
Orc Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Manufacturing Co Ltd filed Critical Orc Manufacturing Co Ltd
Priority to JP2006246267A priority Critical patent/JP4491445B2/ja
Priority to TW095137669A priority patent/TW200719092A/zh
Priority to KR1020060108025A priority patent/KR100931713B1/ko
Publication of JP2007148360A publication Critical patent/JP2007148360A/ja
Application granted granted Critical
Publication of JP4491445B2 publication Critical patent/JP4491445B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2006246267A 2005-11-04 2006-09-12 周辺露光装置およびその方法 Expired - Fee Related JP4491445B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2006246267A JP4491445B2 (ja) 2005-11-04 2006-09-12 周辺露光装置およびその方法
TW095137669A TW200719092A (en) 2005-11-04 2006-10-13 Peripheral exposure apparatus and method therefor
KR1020060108025A KR100931713B1 (ko) 2005-11-04 2006-11-02 주변노광장치 및 그 방법

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005321256 2005-11-04
JP2006246267A JP4491445B2 (ja) 2005-11-04 2006-09-12 周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
JP2007148360A JP2007148360A (ja) 2007-06-14
JP4491445B2 true JP4491445B2 (ja) 2010-06-30

Family

ID=38209774

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006246267A Expired - Fee Related JP4491445B2 (ja) 2005-11-04 2006-09-12 周辺露光装置およびその方法

Country Status (3)

Country Link
JP (1) JP4491445B2 (https=)
KR (1) KR100931713B1 (https=)
TW (1) TW200719092A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6206945B2 (ja) * 2013-03-07 2017-10-04 株式会社ブイ・テクノロジー 走査露光装置及び走査露光方法
JP6768561B2 (ja) * 2017-03-01 2020-10-14 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3377320B2 (ja) * 1995-01-13 2003-02-17 大日本スクリーン製造株式会社 基板周辺露光装置
JPH08321463A (ja) * 1995-03-17 1996-12-03 Dainippon Screen Mfg Co Ltd 不要レジスト露光装置
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000299273A (ja) * 1999-04-14 2000-10-24 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3340720B2 (ja) * 2000-06-06 2002-11-05 東レエンジニアリング株式会社 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
JP2003347191A (ja) * 2002-05-24 2003-12-05 Dainippon Screen Mfg Co Ltd 基板処理装置および膜厚測定方法
JP4083100B2 (ja) 2003-09-22 2008-04-30 株式会社Ｓｏｋｕｄｏ 周縁部露光装置
KR100836504B1 (ko) * 2003-12-31 2008-06-09 동부일렉트로닉스 주식회사 웨이퍼 에지부 노광 장치 및 그를 이용한 노광 방법
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法
JP4495019B2 (ja) * 2005-03-28 2010-06-30 東レエンジニアリング株式会社 周辺露光装置

Also Published As

Publication number Publication date
KR20070048614A (ko) 2007-05-09
JP2007148360A (ja) 2007-06-14
TWI354187B (https=) 2011-12-11
KR100931713B1 (ko) 2009-12-14
TW200719092A (en) 2007-05-16

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