KR100931713B1 - 주변노광장치 및 그 방법 - Google Patents

주변노광장치 및 그 방법 Download PDF

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Publication number
KR100931713B1
KR100931713B1 KR1020060108025A KR20060108025A KR100931713B1 KR 100931713 B1 KR100931713 B1 KR 100931713B1 KR 1020060108025 A KR1020060108025 A KR 1020060108025A KR 20060108025 A KR20060108025 A KR 20060108025A KR 100931713 B1 KR100931713 B1 KR 100931713B1
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South Korea
Prior art keywords
substrate
irradiation
moving
laser beam
unit
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English (en)
Korean (ko)
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KR20070048614A (ko
Inventor
하루야스 켄모츠
히로아키 사토
야스히토 이케다
마사토 모리
Original Assignee
가부시키가이샤 오크세이사쿠쇼
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Publication of KR20070048614A publication Critical patent/KR20070048614A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020060108025A 2005-11-04 2006-11-02 주변노광장치 및 그 방법 Expired - Fee Related KR100931713B1 (ko)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JPJP-P-2005-00321256 2005-11-04
JP2005321256 2005-11-04
JPJP-P-2006-00246267 2006-09-12
JP2006246267A JP4491445B2 (ja) 2005-11-04 2006-09-12 周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
KR20070048614A KR20070048614A (ko) 2007-05-09
KR100931713B1 true KR100931713B1 (ko) 2009-12-14

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ID=38209774

Family Applications (1)

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KR1020060108025A Expired - Fee Related KR100931713B1 (ko) 2005-11-04 2006-11-02 주변노광장치 및 그 방법

Country Status (3)

Country Link
JP (1) JP4491445B2 (https=)
KR (1) KR100931713B1 (https=)
TW (1) TW200719092A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6206945B2 (ja) * 2013-03-07 2017-10-04 株式会社ブイ・テクノロジー 走査露光装置及び走査露光方法
JP6768561B2 (ja) * 2017-03-01 2020-10-14 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001176785A (ja) 1999-12-20 2001-06-29 Orc Mfg Co Ltd 周辺露光装置
JP2005101060A (ja) 2003-09-22 2005-04-14 Dainippon Screen Mfg Co Ltd 周縁部露光装置
KR20050070996A (ko) * 2003-12-31 2005-07-07 동부아남반도체 주식회사 웨이퍼 에지부 노광 장치 및 그를 이용한 노광 방법

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3377320B2 (ja) * 1995-01-13 2003-02-17 大日本スクリーン製造株式会社 基板周辺露光装置
JPH08321463A (ja) * 1995-03-17 1996-12-03 Dainippon Screen Mfg Co Ltd 不要レジスト露光装置
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000299273A (ja) * 1999-04-14 2000-10-24 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3340720B2 (ja) * 2000-06-06 2002-11-05 東レエンジニアリング株式会社 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
JP2003347191A (ja) * 2002-05-24 2003-12-05 Dainippon Screen Mfg Co Ltd 基板処理装置および膜厚測定方法
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法
JP4495019B2 (ja) * 2005-03-28 2010-06-30 東レエンジニアリング株式会社 周辺露光装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001176785A (ja) 1999-12-20 2001-06-29 Orc Mfg Co Ltd 周辺露光装置
JP2005101060A (ja) 2003-09-22 2005-04-14 Dainippon Screen Mfg Co Ltd 周縁部露光装置
KR20050070996A (ko) * 2003-12-31 2005-07-07 동부아남반도체 주식회사 웨이퍼 에지부 노광 장치 및 그를 이용한 노광 방법

Also Published As

Publication number Publication date
KR20070048614A (ko) 2007-05-09
JP2007148360A (ja) 2007-06-14
TWI354187B (https=) 2011-12-11
JP4491445B2 (ja) 2010-06-30
TW200719092A (en) 2007-05-16

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