TW200719092A - Peripheral exposure apparatus and method therefor - Google Patents

Peripheral exposure apparatus and method therefor

Info

Publication number
TW200719092A
TW200719092A TW095137669A TW95137669A TW200719092A TW 200719092 A TW200719092 A TW 200719092A TW 095137669 A TW095137669 A TW 095137669A TW 95137669 A TW95137669 A TW 95137669A TW 200719092 A TW200719092 A TW 200719092A
Authority
TW
Taiwan
Prior art keywords
substrate
illuminance
exposure apparatus
peripheral exposure
rays
Prior art date
Application number
TW095137669A
Other languages
English (en)
Chinese (zh)
Other versions
TWI354187B (https=
Inventor
Haruyasu Kenmotsu
Hiroaki Sato
Yasuhito Ikeda
Masato Mori
Original Assignee
Orc Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Orc Mfg Co Ltd filed Critical Orc Mfg Co Ltd
Publication of TW200719092A publication Critical patent/TW200719092A/zh
Application granted granted Critical
Publication of TWI354187B publication Critical patent/TWI354187B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2026—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction
    • G03F7/2028—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure for the removal of unwanted material, e.g. image or background correction of an edge bead on wafers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW095137669A 2005-11-04 2006-10-13 Peripheral exposure apparatus and method therefor TW200719092A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005321256 2005-11-04
JP2006246267A JP4491445B2 (ja) 2005-11-04 2006-09-12 周辺露光装置およびその方法

Publications (2)

Publication Number Publication Date
TW200719092A true TW200719092A (en) 2007-05-16
TWI354187B TWI354187B (https=) 2011-12-11

Family

ID=38209774

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095137669A TW200719092A (en) 2005-11-04 2006-10-13 Peripheral exposure apparatus and method therefor

Country Status (3)

Country Link
JP (1) JP4491445B2 (https=)
KR (1) KR100931713B1 (https=)
TW (1) TW200719092A (https=)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6206945B2 (ja) * 2013-03-07 2017-10-04 株式会社ブイ・テクノロジー 走査露光装置及び走査露光方法
JP6768561B2 (ja) * 2017-03-01 2020-10-14 株式会社Ｓｃｒｅｅｎホールディングス 露光装置、基板処理装置、基板の露光方法および基板処理方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3377320B2 (ja) * 1995-01-13 2003-02-17 大日本スクリーン製造株式会社 基板周辺露光装置
JPH08321463A (ja) * 1995-03-17 1996-12-03 Dainippon Screen Mfg Co Ltd 不要レジスト露光装置
JP2000294500A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000294501A (ja) * 1999-04-09 2000-10-20 Nikon Corp 周辺露光装置及び方法
JP2000299273A (ja) * 1999-04-14 2000-10-24 Nikon Corp 周辺露光装置及び方法
JP3091460B1 (ja) * 1999-12-10 2000-09-25 東レエンジニアリング株式会社 露光装置
JP4342663B2 (ja) * 1999-12-20 2009-10-14 株式会社オーク製作所 周辺露光装置
JP2001201862A (ja) * 2000-01-19 2001-07-27 Nikon Corp 周辺露光装置
JP3340720B2 (ja) * 2000-06-06 2002-11-05 東レエンジニアリング株式会社 周辺露光装置
JP3321733B2 (ja) * 2000-09-20 2002-09-09 東レエンジニアリング株式会社 露光装置
JP2002365811A (ja) * 2001-06-08 2002-12-18 Mitsubishi Corp フォトレジスト塗布基板の露光方法及び装置
JP3547418B2 (ja) * 2001-10-25 2004-07-28 三菱商事株式会社 レーザビームによる液晶パネルのマーキング方法及び装置
JP2003347191A (ja) * 2002-05-24 2003-12-05 Dainippon Screen Mfg Co Ltd 基板処理装置および膜厚測定方法
JP4083100B2 (ja) 2003-09-22 2008-04-30 株式会社Ｓｏｋｕｄｏ 周縁部露光装置
KR100836504B1 (ko) * 2003-12-31 2008-06-09 동부일렉트로닉스 주식회사 웨이퍼 에지부 노광 장치 및 그를 이용한 노광 방법
JP4664102B2 (ja) * 2005-03-18 2011-04-06 東レエンジニアリング株式会社 露光装置及び露光方法
JP4495019B2 (ja) * 2005-03-28 2010-06-30 東レエンジニアリング株式会社 周辺露光装置

Also Published As

Publication number Publication date
KR20070048614A (ko) 2007-05-09
JP2007148360A (ja) 2007-06-14
TWI354187B (https=) 2011-12-11
JP4491445B2 (ja) 2010-06-30
KR100931713B1 (ko) 2009-12-14

Similar Documents

Publication Publication Date Title
ATE547234T1 (de) Optische formungsvorrichtung und optisches formungsverfahren
TW200710615A (en) Addressable irradiation of images
JP2013510332A5 (https=)
SG103890A1 (en) Lithographic projection apparatus, device manufacturing method, device manufactured thereby, cleaning unit and method for cleaning contaminated objects
TW200628777A (en) Lithographic apparatus and device manufacturing method
TW200707122A (en) Exposure method and apparatus
ATE476686T1 (de) Bestrahlungsverfahren
TW200615705A (en) Method and system for contamination detection and monitoring in a lithographic exposure tool and operating method for the same under controlled atmospheric conditions
EP1672681B8 (en) Exposure apparatus, substrate carrying method, exposure method, and method for producing device
EP1854121A4 (en) METHOD AND DEVICE FOR EUV LIGHT SOURCES TARGET MATERIAL HANDLING
TW200625445A (en) Substrate processing method
JP2009194335A (ja) 露光装置の基板支持機構
TW200700926A (en) Optical element, exposure apparatus, and device manufacturing method
JP2005109304A5 (https=)
EP1717638A3 (en) Extreme UV radiation exposure apparatus and extreme UV radiation source
TW200746278A (en) Semiconductor wafer treating apparatus
TW200719092A (en) Peripheral exposure apparatus and method therefor
TW200715065A (en) Exposure apparatus and exposure method, and method of manufacturing electrical wiring board
GB0305753D0 (en) Exposure apparatus for irradiating a sensitized substrate
KR20120100985A (ko) 노광 장치 및 포토 마스크
TW200715070A (en) A method and apparatus for immersion lithography
JP5311006B2 (ja) 周辺露光装置および周辺露光方法
JP2005057222A5 (https=)
JP2008162184A5 (https=)
TW200719102A (en) Laser beam/uv irradiation peripheral exposure apparatus, and method therefor

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees