JP2005057222A5 - - Google Patents
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- Publication number
- JP2005057222A5 JP2005057222A5 JP2003289427A JP2003289427A JP2005057222A5 JP 2005057222 A5 JP2005057222 A5 JP 2005057222A5 JP 2003289427 A JP2003289427 A JP 2003289427A JP 2003289427 A JP2003289427 A JP 2003289427A JP 2005057222 A5 JP2005057222 A5 JP 2005057222A5
- Authority
- JP
- Japan
- Prior art keywords
- detection
- mark
- detector
- processed
- position detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000001514 detection method Methods 0.000 claims 23
- 238000005286 illumination Methods 0.000 claims 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 229910052710 silicon Inorganic materials 0.000 claims 1
- 239000010703 silicon Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003289427A JP2005057222A (ja) | 2003-08-07 | 2003-08-07 | マーク検出装置、マーク検出方法、マーク検出プログラム、露光装置、デバイスの製造方法、及び、デバイス |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2003289427A JP2005057222A (ja) | 2003-08-07 | 2003-08-07 | マーク検出装置、マーク検出方法、マーク検出プログラム、露光装置、デバイスの製造方法、及び、デバイス |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2005057222A JP2005057222A (ja) | 2005-03-03 |
| JP2005057222A5 true JP2005057222A5 (https=) | 2006-09-14 |
Family
ID=34367751
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003289427A Withdrawn JP2005057222A (ja) | 2003-08-07 | 2003-08-07 | マーク検出装置、マーク検出方法、マーク検出プログラム、露光装置、デバイスの製造方法、及び、デバイス |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2005057222A (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL1036179A1 (nl) * | 2007-11-20 | 2009-05-25 | Asml Netherlands Bv | Lithographic apparatus and method. |
| TW201243278A (en) | 2011-03-30 | 2012-11-01 | Mapper Lithography Ip Bv | Interferometer module |
| WO2012144905A2 (en) | 2011-04-22 | 2012-10-26 | Mapper Lithography Ip B.V. | Lithography system for processing a target, such as a wafer, and a method for operating a lithography system for processing a target, such as a wafer |
| NL2008679C2 (en) | 2011-04-22 | 2013-06-26 | Mapper Lithography Ip Bv | Position determination in a lithography system using a substrate having a partially reflective position mark. |
| WO2012158025A2 (en) | 2011-05-13 | 2012-11-22 | Mapper Lithography Ip B.V. | Lithography system for processing at least a part of a target |
| JP5743958B2 (ja) * | 2012-05-30 | 2015-07-01 | キヤノン株式会社 | 計測方法、露光方法および装置 |
| NL2011504C2 (en) | 2012-09-27 | 2015-01-05 | Mapper Lithography Ip Bv | Multi-axis differential interferometer. |
| JP6302185B2 (ja) * | 2013-07-18 | 2018-03-28 | キヤノン株式会社 | 検出装置、露光装置及び物品の製造方法 |
| JP6061912B2 (ja) * | 2014-12-08 | 2017-01-18 | キヤノン株式会社 | 計測方法、露光方法および装置 |
| JP6521637B2 (ja) * | 2015-01-09 | 2019-05-29 | キヤノン株式会社 | 計測装置、リソグラフィ装置及び物品の製造方法 |
| CN113035734B (zh) * | 2021-02-25 | 2024-03-08 | 北京华卓精科科技股份有限公司 | 一种硅片偏移量确定方法及硅片交接精度检测方法 |
-
2003
- 2003-08-07 JP JP2003289427A patent/JP2005057222A/ja not_active Withdrawn
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