JP4485910B2 - 外観検査装置 - Google Patents

外観検査装置 Download PDF

Info

Publication number
JP4485910B2
JP4485910B2 JP2004320771A JP2004320771A JP4485910B2 JP 4485910 B2 JP4485910 B2 JP 4485910B2 JP 2004320771 A JP2004320771 A JP 2004320771A JP 2004320771 A JP2004320771 A JP 2004320771A JP 4485910 B2 JP4485910 B2 JP 4485910B2
Authority
JP
Japan
Prior art keywords
beam splitter
image sensor
light source
sample
plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004320771A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006133026A (ja
JP2006133026A5 (enExample
Inventor
光浩 亀井
啓 志村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp filed Critical Hitachi High Technologies Corp
Priority to JP2004320771A priority Critical patent/JP4485910B2/ja
Priority to US11/262,826 priority patent/US7821644B2/en
Publication of JP2006133026A publication Critical patent/JP2006133026A/ja
Publication of JP2006133026A5 publication Critical patent/JP2006133026A5/ja
Application granted granted Critical
Publication of JP4485910B2 publication Critical patent/JP4485910B2/ja
Priority to US12/898,255 priority patent/US20110019200A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2004320771A 2004-11-04 2004-11-04 外観検査装置 Expired - Fee Related JP4485910B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004320771A JP4485910B2 (ja) 2004-11-04 2004-11-04 外観検査装置
US11/262,826 US7821644B2 (en) 2004-11-04 2005-11-01 Apparatus for visual inspection
US12/898,255 US20110019200A1 (en) 2004-11-04 2010-10-05 Apparatus for visual inspection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004320771A JP4485910B2 (ja) 2004-11-04 2004-11-04 外観検査装置

Publications (3)

Publication Number Publication Date
JP2006133026A JP2006133026A (ja) 2006-05-25
JP2006133026A5 JP2006133026A5 (enExample) 2007-07-19
JP4485910B2 true JP4485910B2 (ja) 2010-06-23

Family

ID=36261419

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004320771A Expired - Fee Related JP4485910B2 (ja) 2004-11-04 2004-11-04 外観検査装置

Country Status (2)

Country Link
US (2) US7821644B2 (enExample)
JP (1) JP4485910B2 (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8804111B2 (en) * 2007-10-04 2014-08-12 Kla-Tencor Corporation Multichip CCD camera inspection system
USD786935S1 (en) 2015-11-20 2017-05-16 Baldwin Filters, Inc. Filter element
CN105334230A (zh) * 2015-11-26 2016-02-17 凌云光技术集团有限责任公司 用于高纵深比pcb板孔缺陷检测的光源装置
JP6587264B1 (ja) * 2018-12-11 2019-10-09 レーザーテック株式会社 マスク検査装置、切り替え方法及びマスク検査方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61104243A (ja) * 1984-10-29 1986-05-22 Hitachi Ltd 異物検出方法及びその装置
JPS6220313A (ja) * 1985-07-19 1987-01-28 Hitachi Ltd パタ−ン検出方法及びその装置
JPH11237344A (ja) * 1998-02-19 1999-08-31 Hitachi Ltd 欠陥検査方法およびその装置
US6690469B1 (en) * 1998-09-18 2004-02-10 Hitachi, Ltd. Method and apparatus for observing and inspecting defects
JP3610837B2 (ja) * 1998-09-18 2005-01-19 株式会社日立製作所 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
US6999183B2 (en) * 1998-11-18 2006-02-14 Kla-Tencor Corporation Detection system for nanometer scale topographic measurements of reflective surfaces
JP3858571B2 (ja) * 2000-07-27 2006-12-13 株式会社日立製作所 パターン欠陥検査方法及びその装置
US6673637B2 (en) * 2000-09-20 2004-01-06 Kla-Tencor Technologies Methods and systems for determining a presence of macro defects and overlay of a specimen
JP3965325B2 (ja) * 2002-05-29 2007-08-29 株式会社日立ハイテクノロジーズ 微細構造観察方法、および欠陥検査装置
US7145661B2 (en) * 2003-12-31 2006-12-05 Carl Zeiss Meditec, Inc. Efficient optical coherence tomography (OCT) system and method for rapid imaging in three dimensions
JP4494160B2 (ja) * 2004-10-14 2010-06-30 株式会社トプコン 光画像計測装置

Also Published As

Publication number Publication date
US7821644B2 (en) 2010-10-26
JP2006133026A (ja) 2006-05-25
US20060092426A1 (en) 2006-05-04
US20110019200A1 (en) 2011-01-27

Similar Documents

Publication Publication Date Title
JP5201350B2 (ja) 表面検査装置
US11428642B2 (en) Scanning scatterometry overlay measurement
US8446578B2 (en) Defect inspection apparatus, defect inspection method and method of inspecting hole pattern
TWI443327B (zh) Defect detection device and defect detection method
JP4529366B2 (ja) 欠陥検査装置、欠陥検査方法及びホールパターンの検査方法
JP3610837B2 (ja) 試料表面の観察方法及びその装置並びに欠陥検査方法及びその装置
KR102518212B1 (ko) 입자 검출을 위한 방사형 편광자
JP5022959B2 (ja) 反射屈折型対物レンズを用いた欠陥検査装置
JP2010190722A (ja) 欠陥検査方法及び欠陥検査装置
US9157870B2 (en) Pattern test apparatus
JP2014081227A (ja) 検査装置、検査方法、パターン基板の製造方法
JP5068422B2 (ja) 微細構造観察方法および欠陥検査装置
JP5297930B2 (ja) 欠陥検査装置およびその方法
JP6587264B1 (ja) マスク検査装置、切り替え方法及びマスク検査方法
JP3956942B2 (ja) 欠陥検査方法及びその装置
JP3965325B2 (ja) 微細構造観察方法、および欠陥検査装置
JP7296296B2 (ja) 検査装置及び検査方法
JP4485910B2 (ja) 外観検査装置
JP6067083B2 (ja) 欠陥検査方法及びその装置
JP3918840B2 (ja) 欠陥検査方法及びその装置
JP2001289794A (ja) 欠陥検査装置
KR102804831B1 (ko) Tgv용 유리기판 검사장치
JP4462222B2 (ja) 表面検査装置
JP5201443B2 (ja) 表面検査装置および表面検査方法

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070426

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070426

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070523

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20091027

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20091124

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100120

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20100323

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20100325

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130402

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140402

Year of fee payment: 4

LAPS Cancellation because of no payment of annual fees