JP4479453B2 - 電力半導体装置 - Google Patents
電力半導体装置 Download PDFInfo
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- JP4479453B2 JP4479453B2 JP2004290573A JP2004290573A JP4479453B2 JP 4479453 B2 JP4479453 B2 JP 4479453B2 JP 2004290573 A JP2004290573 A JP 2004290573A JP 2004290573 A JP2004290573 A JP 2004290573A JP 4479453 B2 JP4479453 B2 JP 4479453B2
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 55
- 238000001514 detection method Methods 0.000 claims abstract description 16
- 230000005540 biological transmission Effects 0.000 claims abstract description 3
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- 239000002184 metal Substances 0.000 claims description 2
- 229910052782 aluminium Inorganic materials 0.000 description 9
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- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
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- 229910000679 solder Inorganic materials 0.000 description 1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
- H01L2224/06—Structure, shape, material or disposition of the bonding areas prior to the connecting process of a plurality of bonding areas
- H01L2224/0601—Structure
- H01L2224/0603—Bonding areas having different sizes, e.g. different heights or widths
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- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/481—Disposition
- H01L2224/48135—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
- H01L2224/48137—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate
- H01L2224/48139—Connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being arranged next to each other, e.g. on a common substrate with an intermediate bond, e.g. continuous wire daisy chain
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
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- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4912—Layout
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- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73251—Location after the connecting process on different surfaces
- H01L2224/73265—Layer and wire connectors
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
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- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
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- H—ELECTRICITY
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- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1306—Field-effect transistor [FET]
- H01L2924/13091—Metal-Oxide-Semiconductor Field-Effect Transistor [MOSFET]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/19—Details of hybrid assemblies other than the semiconductor or other solid state devices to be connected
- H01L2924/191—Disposition
- H01L2924/19101—Disposition of discrete passive components
- H01L2924/19107—Disposition of discrete passive components off-chip wires
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- Semiconductor Integrated Circuits (AREA)
Description
以下、本発明の実施の形態1を図に基づいて説明する。図1は本発明に係る電力半導体装置の実施の形態1を示す平面図及びそのA−A断面図である。説明の便宜上、上部を覆っている蓋は省略してある。この電力半導体装置は具体的には、直列に接続された2つのIGBTチップをフリーホイーリングダイオードチップと共に封入したIGBTモジュール100である。
IGBTチップの温度を、より短い時間遅れでより正確に測定するには、無線タグをよりIGBTチップの近傍に設置する必要がある。実施の形態2はそのような要請に沿うためのものであり、実施の形態2に係るIGBTモジュール100においては、無線タグ24を配線パターン3の上ではなくIGBTチップ6の表面上に設置し、それ以外の構造は図1と同様である。図5はそのIGBTチップ6の平面図を示しており、図6はそのB−B断面図を示している。
図8は本発明に係る電力半導体装置の実施の形態3を示す平面図及びそのC−C断面図である。この図では無線タグ24は1チップ化されてIGBTチップ6の上に戴置されており、図9にこの無線タグ24の平面図を示す。図9においてアンテナ26はICチップ27の表面上に一体化されて形成されており、無線タグ24を1チップで構成している。この無線タグ24は、図8に示されるように、エミッタパッド6aとゲートパッド6bとの間に適当な接着剤でアンテナ面を上にして固定されている。無線タグ24以外の構成は図1に示されたIGBTモジュール100と同じであるので説明を省略する。
Claims (6)
- 同一パッケージ内に、直列に接続された複数の電力半導体チップと、前記複数の電力半導体チップの各々の近傍に設けられた複数の無線タグとを備え、前記無線タグは温度検出手段と前記温度検出手段により得られた温度情報を無線送信する送信手段とを備えたことを特徴とする電力半導体装置。
- 前記無線タグは前記電力半導体チップの表面に戴置されたことを特徴とする請求項1記載の電力半導体装置。
- 前記無線タグはICチップと前記ICチップに接続されたアンテナとを備え、前記アンテナは前記電力半導体チップの表面上に形成されていることを特徴とする請求項2記載の電力半導体装置。
- 前記無線タグは、アンテナが内蔵されたICチップであることを特徴とする請求項2記載の電力半導体装置。
- 前記電力半導体チップは表面に主電極パッドを有し、前記無線タグの上方を避けつつ前記主電極パッドと内部配線電極とを電気的に接続する金属細線を備えたことを特徴とする請求項2記載の電力半導体装置。
- 前記無線タグより送信された温度情報を受信する手段と、受信した温度情報により前記電力半導体チップの通電を遮断する手段と、前記電力半導体チップが通電を遮断された状態であることを外部に知らせる手段とを有する前記電力半導体チップを制御する制御回路を備えたことを特徴とする請求項2記載の電力半導体装置。
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JP2004290573A JP4479453B2 (ja) | 2004-10-01 | 2004-10-01 | 電力半導体装置 |
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JP2004290573A JP4479453B2 (ja) | 2004-10-01 | 2004-10-01 | 電力半導体装置 |
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JP2006108256A JP2006108256A (ja) | 2006-04-20 |
JP4479453B2 true JP4479453B2 (ja) | 2010-06-09 |
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Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5420461B2 (ja) * | 2010-03-25 | 2014-02-19 | 本田技研工業株式会社 | 温度センサ接合部検査装置、及び、温度センサ接合部検査方法 |
US9490003B2 (en) | 2011-03-31 | 2016-11-08 | Intel Corporation | Induced thermal gradients |
US9658678B2 (en) | 2011-03-31 | 2017-05-23 | Intel Corporation | Induced thermal gradients |
DE112011105998T5 (de) | 2011-12-23 | 2014-09-18 | Intel Corporation | Speicheroperationen unter Verwendung von Systemtemperatursensordaten |
CN103000536B (zh) * | 2012-12-07 | 2016-01-20 | 天水华天微电子股份有限公司 | 一种智能功率模块的制备工艺 |
KR102162186B1 (ko) * | 2013-04-26 | 2020-10-07 | 에이비비 슈바이쯔 아게 | 전력 반도체 모듈 |
JP6130238B2 (ja) * | 2013-06-14 | 2017-05-17 | ルネサスエレクトロニクス株式会社 | 半導体装置および電子装置 |
CN105207449B (zh) * | 2015-09-29 | 2019-01-29 | 广东美的制冷设备有限公司 | 智能功率模块 |
JP6468984B2 (ja) | 2015-10-22 | 2019-02-13 | 三菱電機株式会社 | 半導体装置 |
EP3879556A1 (en) * | 2020-03-11 | 2021-09-15 | ABB Schweiz AG | Power component including a main component and a sensor and emitter unit and system with the power component |
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