JP4435395B2 - 発熱体ｃｖｄ装置 - Google Patents

発熱体ｃｖｄ装置 Download PDF

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Publication number
JP4435395B2
JP4435395B2 JP2000280221A JP2000280221A JP4435395B2 JP 4435395 B2 JP4435395 B2 JP 4435395B2 JP 2000280221 A JP2000280221 A JP 2000280221A JP 2000280221 A JP2000280221 A JP 2000280221A JP 4435395 B2 JP4435395 B2 JP 4435395B2
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JP
Japan
Prior art keywords
heating element
cvd apparatus
gas
insertion port
power supply
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Expired - Fee Related
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JP2000280221A
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English (en)
Japanese (ja)
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JP2002093723A (ja
JP2002093723A5 (enExample
Inventor
啓次 石橋
雅彦 田中
稔 柄澤
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Canon Anelva Corp
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Canon Anelva Corp
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Priority to JP2000280221A priority Critical patent/JP4435395B2/ja
Publication of JP2002093723A publication Critical patent/JP2002093723A/ja
Publication of JP2002093723A5 publication Critical patent/JP2002093723A5/ja
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Publication of JP4435395B2 publication Critical patent/JP4435395B2/ja
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JP2000280221A 2000-09-14 2000-09-14 発熱体ｃｖｄ装置 Expired - Fee Related JP4435395B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000280221A JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000280221A JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

Related Child Applications (5)

Application Number Title Priority Date Filing Date
JP2007303090A Division JP4714208B2 (ja) 2007-11-22 2007-11-22 発熱体ｃｖｄ装置及び成膜方法
JP2008283250A Division JP2009111397A (ja) 2008-11-04 2008-11-04 付着膜のエッチング法
JP2008283110A Division JP2009038398A (ja) 2008-11-04 2008-11-04 シリコン膜及びシリコン窒化膜の製造法
JP2008286894A Division JP2009044190A (ja) 2008-11-07 2008-11-07 付着膜のエッチング法
JP2008286883A Division JP2009065192A (ja) 2008-11-07 2008-11-07 シリコン膜及びシリコン窒化膜の製造法

Publications (3)

Publication Number Publication Date
JP2002093723A JP2002093723A (ja) 2002-03-29
JP2002093723A5 JP2002093723A5 (enExample) 2008-01-17
JP4435395B2 true JP4435395B2 (ja) 2010-03-17

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ID=18765103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000280221A Expired - Fee Related JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

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JP (1) JP4435395B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200533780A (en) * 2004-03-10 2005-10-16 Ulvac Inc Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor
KR100825250B1 (ko) * 2004-03-10 2008-04-25 가부시키가이샤 알박 자가-클리닝 촉매 화학 증착 장치 및 그 클리닝 방법
JP2007027485A (ja) * 2005-07-19 2007-02-01 Ulvac Japan Ltd 成膜方法および成膜装置
JP4948021B2 (ja) 2006-04-13 2012-06-06 株式会社アルバック 触媒体化学気相成長装置
KR101333530B1 (ko) * 2006-06-30 2013-11-28 삼성디스플레이 주식회사 촉매재 화학기상증착 장치
JP5008420B2 (ja) * 2007-02-23 2012-08-22 三井化学東セロ株式会社 薄膜、及びその薄膜製造方法
JP5321069B2 (ja) * 2009-01-07 2013-10-23 株式会社石川製作所 触媒化学気相成長装置の触媒体支持構造
JP5460080B2 (ja) * 2009-03-10 2014-04-02 京セラ株式会社 薄膜形成装置のクリーニング方法
DE102009023467B4 (de) * 2009-06-02 2011-05-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtungsanlage und -verfahren
DE102009023471B4 (de) * 2009-06-02 2012-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtungsanlage und -verfahren
JP7369656B2 (ja) * 2020-03-30 2023-10-26 三菱重工機械システム株式会社 熱触媒ｃｖｄ用の触媒線支持部材、挿抜用治具、熱触媒ｃｖｄ用ユニット、および成膜装置

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JP2002093723A (ja) 2002-03-29

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