JP2002093723A5 - - Google Patents

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Publication number
JP2002093723A5
JP2002093723A5 JP2000280221A JP2000280221A JP2002093723A5 JP 2002093723 A5 JP2002093723 A5 JP 2002093723A5 JP 2000280221 A JP2000280221 A JP 2000280221A JP 2000280221 A JP2000280221 A JP 2000280221A JP 2002093723 A5 JP2002093723 A5 JP 2002093723A5
Authority
JP
Japan
Prior art keywords
heating element
insertion port
metal
elastic body
source gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000280221A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002093723A (ja
JP4435395B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000280221A priority Critical patent/JP4435395B2/ja
Priority claimed from JP2000280221A external-priority patent/JP4435395B2/ja
Publication of JP2002093723A publication Critical patent/JP2002093723A/ja
Publication of JP2002093723A5 publication Critical patent/JP2002093723A5/ja
Application granted granted Critical
Publication of JP4435395B2 publication Critical patent/JP4435395B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000280221A 2000-09-14 2000-09-14 発熱体ｃｖｄ装置 Expired - Fee Related JP4435395B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000280221A JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000280221A JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

Related Child Applications (5)

Application Number Title Priority Date Filing Date
JP2007303090A Division JP4714208B2 (ja) 2007-11-22 2007-11-22 発熱体ｃｖｄ装置及び成膜方法
JP2008283250A Division JP2009111397A (ja) 2008-11-04 2008-11-04 付着膜のエッチング法
JP2008283110A Division JP2009038398A (ja) 2008-11-04 2008-11-04 シリコン膜及びシリコン窒化膜の製造法
JP2008286894A Division JP2009044190A (ja) 2008-11-07 2008-11-07 付着膜のエッチング法
JP2008286883A Division JP2009065192A (ja) 2008-11-07 2008-11-07 シリコン膜及びシリコン窒化膜の製造法

Publications (3)

Publication Number Publication Date
JP2002093723A JP2002093723A (ja) 2002-03-29
JP2002093723A5 true JP2002093723A5 (enExample) 2008-01-17
JP4435395B2 JP4435395B2 (ja) 2010-03-17

Family

ID=18765103

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000280221A Expired - Fee Related JP4435395B2 (ja) 2000-09-14 2000-09-14 発熱体ｃｖｄ装置

Country Status (1)

Country Link
JP (1) JP4435395B2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200533780A (en) * 2004-03-10 2005-10-16 Ulvac Inc Self-cleaning catalyst chemical vapor deposition device and cleaning method therefor
KR100825250B1 (ko) * 2004-03-10 2008-04-25 가부시키가이샤 알박 자가-클리닝 촉매 화학 증착 장치 및 그 클리닝 방법
JP2007027485A (ja) * 2005-07-19 2007-02-01 Ulvac Japan Ltd 成膜方法および成膜装置
JP4948021B2 (ja) 2006-04-13 2012-06-06 株式会社アルバック 触媒体化学気相成長装置
KR101333530B1 (ko) * 2006-06-30 2013-11-28 삼성디스플레이 주식회사 촉매재 화학기상증착 장치
JP5008420B2 (ja) * 2007-02-23 2012-08-22 三井化学東セロ株式会社 薄膜、及びその薄膜製造方法
JP5321069B2 (ja) * 2009-01-07 2013-10-23 株式会社石川製作所 触媒化学気相成長装置の触媒体支持構造
JP5460080B2 (ja) * 2009-03-10 2014-04-02 京セラ株式会社 薄膜形成装置のクリーニング方法
DE102009023467B4 (de) * 2009-06-02 2011-05-12 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtungsanlage und -verfahren
DE102009023471B4 (de) * 2009-06-02 2012-08-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Beschichtungsanlage und -verfahren
JP7369656B2 (ja) * 2020-03-30 2023-10-26 三菱重工機械システム株式会社 熱触媒ｃｖｄ用の触媒線支持部材、挿抜用治具、熱触媒ｃｖｄ用ユニット、および成膜装置

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