JP4413035B2 - パターン形成体およびパターン形成方法 - Google Patents

パターン形成体およびパターン形成方法 Download PDF

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Publication number
JP4413035B2
JP4413035B2 JP2004044381A JP2004044381A JP4413035B2 JP 4413035 B2 JP4413035 B2 JP 4413035B2 JP 2004044381 A JP2004044381 A JP 2004044381A JP 2004044381 A JP2004044381 A JP 2004044381A JP 4413035 B2 JP4413035 B2 JP 4413035B2
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Japan
Prior art keywords
photocatalyst
pattern
layer
containing layer
forming body
Prior art date
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Expired - Fee Related
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JP2004044381A
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English (en)
Japanese (ja)
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JP2004199086A (ja
JP2004199086A5 (https=
Inventor
弘典 小林
弘徳 上山
眞一 彦坂
学 山本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP2004044381A priority Critical patent/JP4413035B2/ja
Publication of JP2004199086A publication Critical patent/JP2004199086A/ja
Publication of JP2004199086A5 publication Critical patent/JP2004199086A5/ja
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Publication of JP4413035B2 publication Critical patent/JP4413035B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Printing Plates And Materials Therefor (AREA)
  • Optical Filters (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
JP2004044381A 1997-08-08 2004-02-20 パターン形成体およびパターン形成方法 Expired - Fee Related JP4413035B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004044381A JP4413035B2 (ja) 1997-08-08 2004-02-20 パターン形成体およびパターン形成方法

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP21484597 1997-08-08
JP30029597 1997-10-31
JP31304197 1997-11-14
JP8629398 1998-03-31
JP8595598 1998-03-31
JP2004044381A JP4413035B2 (ja) 1997-08-08 2004-02-20 パターン形成体およびパターン形成方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2001395028A Division JP2002274077A (ja) 1997-08-08 2001-12-26 パターン形成体およびパターン形成方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2009185762A Division JP4495777B2 (ja) 1997-08-08 2009-08-10 パターン形成体およびパターン形成方法

Publications (3)

Publication Number Publication Date
JP2004199086A JP2004199086A (ja) 2004-07-15
JP2004199086A5 JP2004199086A5 (https=) 2008-05-08
JP4413035B2 true JP4413035B2 (ja) 2010-02-10

Family

ID=32777344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004044381A Expired - Fee Related JP4413035B2 (ja) 1997-08-08 2004-02-20 パターン形成体およびパターン形成方法

Country Status (1)

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JP (1) JP4413035B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8124172B2 (en) * 2006-03-02 2012-02-28 E.I. Du Pont De Nemours And Company Process for making contained layers and devices made with same
EP1989818A4 (en) * 2006-03-02 2011-05-18 Du Pont PROCESS FOR MANUFACTURING INCLUDED LAYERS AND EQUIPMENT MADE THEREFOR
JP2008117965A (ja) * 2006-11-06 2008-05-22 Tokyo Electron Ltd リフロー方法、パターン形成方法およびtftの製造方法
KR20100094475A (ko) 2007-10-26 2010-08-26 이 아이 듀폰 디 네모아 앤드 캄파니 격납된 층을 제조하기 위한 방법 및 재료, 및 이를 사용하여 제조된 소자
KR100904251B1 (ko) * 2008-01-28 2009-06-25 한국생산기술연구원 폴리머 표면에 귀금속촉매의 선택적 흡착방법
JP5149083B2 (ja) 2008-06-16 2013-02-20 富士フイルム株式会社 パターン形成方法、並びに基板加工方法、モールド構造体の複製方法、及びモールド構造体
JP5363856B2 (ja) * 2009-03-30 2013-12-11 富士フイルム株式会社 パターン形成方法
US8592239B2 (en) 2009-07-27 2013-11-26 E I Du Pont De Nemours And Company Process and materials for making contained layers and devices made with same

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Publication number Publication date
JP2004199086A (ja) 2004-07-15

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