JP4405071B2 - 送り装置及びそれを具備する光ディスク原盤記録装置 - Google Patents

送り装置及びそれを具備する光ディスク原盤記録装置 Download PDF

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Publication number
JP4405071B2
JP4405071B2 JP2000323095A JP2000323095A JP4405071B2 JP 4405071 B2 JP4405071 B2 JP 4405071B2 JP 2000323095 A JP2000323095 A JP 2000323095A JP 2000323095 A JP2000323095 A JP 2000323095A JP 4405071 B2 JP4405071 B2 JP 4405071B2
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JP
Japan
Prior art keywords
bearing
moving
fluid
moving stage
feeding device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000323095A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002134390A (ja
JP2002134390A5 (enExample
Inventor
英博 吉田
一彦 佐野
英明 井上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Panasonic Corp, Matsushita Electric Industrial Co Ltd filed Critical Panasonic Corp
Priority to JP2000323095A priority Critical patent/JP4405071B2/ja
Publication of JP2002134390A publication Critical patent/JP2002134390A/ja
Publication of JP2002134390A5 publication Critical patent/JP2002134390A5/ja
Application granted granted Critical
Publication of JP4405071B2 publication Critical patent/JP4405071B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C29/00—Bearings for parts moving only linearly
    • F16C29/02—Sliding-contact bearings
    • F16C29/025—Hydrostatic or aerostatic
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16C—SHAFTS; FLEXIBLE SHAFTS; ELEMENTS OR CRANKSHAFT MECHANISMS; ROTARY BODIES OTHER THAN GEARING ELEMENTS; BEARINGS
    • F16C32/00—Bearings not otherwise provided for
    • F16C32/06—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings
    • F16C32/0603—Bearings not otherwise provided for with moving member supported by a fluid cushion formed, at least to a large extent, otherwise than by movement of the shaft, e.g. hydrostatic air-cushion bearings supported by a gas cushion, e.g. an air cushion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Computer Networks & Wireless Communication (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Linear Motors (AREA)
  • General Electrical Machinery Utilizing Piezoelectricity, Electrostriction Or Magnetostriction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Magnetic Bearings And Hydrostatic Bearings (AREA)
JP2000323095A 2000-10-23 2000-10-23 送り装置及びそれを具備する光ディスク原盤記録装置 Expired - Fee Related JP4405071B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000323095A JP4405071B2 (ja) 2000-10-23 2000-10-23 送り装置及びそれを具備する光ディスク原盤記録装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000323095A JP4405071B2 (ja) 2000-10-23 2000-10-23 送り装置及びそれを具備する光ディスク原盤記録装置

Publications (3)

Publication Number Publication Date
JP2002134390A JP2002134390A (ja) 2002-05-10
JP2002134390A5 JP2002134390A5 (enExample) 2006-06-01
JP4405071B2 true JP4405071B2 (ja) 2010-01-27

Family

ID=18800849

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000323095A Expired - Fee Related JP4405071B2 (ja) 2000-10-23 2000-10-23 送り装置及びそれを具備する光ディスク原盤記録装置

Country Status (1)

Country Link
JP (1) JP4405071B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101861493B1 (ko) 2003-04-11 2018-05-28 가부시키가이샤 니콘 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
TWI515769B (zh) 2003-06-19 2016-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
US7589822B2 (en) 2004-02-02 2009-09-15 Nikon Corporation Stage drive method and stage unit, exposure apparatus, and device manufacturing method
WO2005122242A1 (ja) * 2004-06-07 2005-12-22 Nikon Corporation ステージ装置、露光装置及び露光方法
USRE43576E1 (en) 2005-04-08 2012-08-14 Asml Netherlands B.V. Dual stage lithographic apparatus and device manufacturing method
EP2128703A1 (en) 2008-05-28 2009-12-02 ASML Netherlands BV Lithographic Apparatus and a Method of Operating the Apparatus

Also Published As

Publication number Publication date
JP2002134390A (ja) 2002-05-10

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