JP2002134390A5 - - Google Patents
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- JP2002134390A5 JP2002134390A5 JP2000323095A JP2000323095A JP2002134390A5 JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5 JP 2000323095 A JP2000323095 A JP 2000323095A JP 2000323095 A JP2000323095 A JP 2000323095A JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000323095A JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000323095A JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002134390A JP2002134390A (ja) | 2002-05-10 |
| JP2002134390A5 true JP2002134390A5 (enExample) | 2006-06-01 |
| JP4405071B2 JP4405071B2 (ja) | 2010-01-27 |
Family
ID=18800849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000323095A Expired - Fee Related JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4405071B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101861493B1 (ko) | 2003-04-11 | 2018-05-28 | 가부시키가이샤 니콘 | 액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법 |
| TWI515769B (zh) | 2003-06-19 | 2016-01-01 | 尼康股份有限公司 | An exposure apparatus, an exposure method, and an element manufacturing method |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| WO2005122242A1 (ja) * | 2004-06-07 | 2005-12-22 | Nikon Corporation | ステージ装置、露光装置及び露光方法 |
| USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| EP2128703A1 (en) | 2008-05-28 | 2009-12-02 | ASML Netherlands BV | Lithographic Apparatus and a Method of Operating the Apparatus |
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2000
- 2000-10-23 JP JP2000323095A patent/JP4405071B2/ja not_active Expired - Fee Related