JP2002134390A5 - - Google Patents
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- Publication number
- JP2002134390A5 JP2002134390A5 JP2000323095A JP2000323095A JP2002134390A5 JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5 JP 2000323095 A JP2000323095 A JP 2000323095A JP 2000323095 A JP2000323095 A JP 2000323095A JP 2002134390 A5 JP2002134390 A5 JP 2002134390A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000323095A JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000323095A JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002134390A JP2002134390A (ja) | 2002-05-10 |
| JP2002134390A5 true JP2002134390A5 (enExample) | 2006-06-01 |
| JP4405071B2 JP4405071B2 (ja) | 2010-01-27 |
Family
ID=18800849
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000323095A Expired - Fee Related JP4405071B2 (ja) | 2000-10-23 | 2000-10-23 | 送り装置及びそれを具備する光ディスク原盤記録装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4405071B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG10201504396VA (en) | 2003-04-11 | 2015-07-30 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
| CN101436003B (zh) * | 2003-06-19 | 2011-08-17 | 株式会社尼康 | 曝光装置及器件制造方法 |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| US20080192226A1 (en) * | 2004-06-07 | 2008-08-14 | Nikon Corporation | Stage Unit, Exposure Apparatus, and Exposure Method |
| USRE43576E1 (en) | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| JP5097166B2 (ja) | 2008-05-28 | 2012-12-12 | エーエスエムエル ネザーランズ ビー．ブイ． | リソグラフィ装置及び装置の動作方法 |
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2000
- 2000-10-23 JP JP2000323095A patent/JP4405071B2/ja not_active Expired - Fee Related