JP4382708B2 - 真空計 - Google Patents
真空計 Download PDFInfo
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- JP4382708B2 JP4382708B2 JP2005182484A JP2005182484A JP4382708B2 JP 4382708 B2 JP4382708 B2 JP 4382708B2 JP 2005182484 A JP2005182484 A JP 2005182484A JP 2005182484 A JP2005182484 A JP 2005182484A JP 4382708 B2 JP4382708 B2 JP 4382708B2
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- electrode
- vacuum gauge
- ion
- collector
- ion extraction
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- 238000000605 extraction Methods 0.000 claims description 62
- 150000002500 ions Chemical class 0.000 description 62
- 239000002184 metal Substances 0.000 description 11
- 230000035945 sensitivity Effects 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 6
- 230000006698 induction Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000003795 desorption Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000034 method Methods 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 2
- 238000005265 energy consumption Methods 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000005452 bending Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000005686 electrostatic field Effects 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
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- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Measuring Fluid Pressure (AREA)
Description
1.遮蔽極とイオン引出し極は半密閉の円筒形に構成される。アナログ計算の結果により、電子はこのような領域において発振しやすいので、高い感度を実現できる。
2.イオン反射極を増設して、より多くのイオンがコレクタに達して、さらに高感度を実現するようにする。
3.イオン引出し極は大部分のX線と電子誘導脱離によるイオンを遮蔽するので、真空計の測定の下限を、より高い真空度を実現するように延伸することができる。
1.遮蔽極とイオン引出し極は半密閉の円筒形に構成される。アナログ計算の結果により、電子はこのような領域において発振しやすいので、高感度を実現できる。
2.イオン反射極を増設して、より多くのイオンがコレクタに達して、さらに高感度を実現するようにする。
3.イオン引出し極は大部分のX線と電子誘導脱離のイオンを遮蔽するので、真空計の測定の下限がをより高い真空度を実現するように延伸することができる。
4.陰極ユニット素子を冷陰極ユニット電子源とすると、さらに真空計の電子誘導による排気及びエネルギーの消耗を低下する。
32、42 遮蔽極
34、44 イオン引出し極
36、46 コレクタ
31 熱陰極ユニット
33、43 陽極環
35、45 反射極
37、47 電子引出し穴
41 冷陰極ユニット
312 フィラメント
314 フィラメントの支持棒
341、441 イオン引出し穴
Claims (4)
- 第一開口及び第二開口を備える遮蔽極と、
前記第一開口に対向する陰極ユニットと、
前記第二開口に対応する円形のイオン引出し極と、
前記イオン引出し極の中央に設置されたイオン引出し穴と、
前記遮蔽極の第二開口を囲んで設置された反射極と、
前記イオン引出し穴に対向して、前記反射極の中心に設置されたコレクタと、
前記遮蔽極の内部に設置されている陽極環と、
を含み、
前記陰極ユニットから発射させた電子を、前記遮蔽極に入射させ、前記陽極環を高電圧に接続して前記遮蔽極の内部に対称のサドルフィールドを形成し、前記サドルフィールドによって前記電子を発振させてガス分子にぶつけて電離させることでイオン流を形成し、前記イオン流を前記コレクタで捕集して電流信号に変換することを特徴とする真空計。 - 更に、陰極ユニットと遮蔽極の間に設置された電子引出し極を含むことを特徴とする請求項1に記載の真空計。
- 前記電子引出し極の中心に電子引出し穴を設置することを特徴とする請求項2に記載の真空計。
- 前記遮蔽極は円筒形に形成されることを特徴とする請求項1に記載の真空計。
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CNB2004100509770A CN100555552C (zh) | 2004-07-30 | 2004-07-30 | 真空规管 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009147814A Division JP5038361B2 (ja) | 2004-07-30 | 2009-06-22 | 真空計 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006047288A JP2006047288A (ja) | 2006-02-16 |
JP4382708B2 true JP4382708B2 (ja) | 2009-12-16 |
Family
ID=35927506
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2005182484A Active JP4382708B2 (ja) | 2004-07-30 | 2005-06-22 | 真空計 |
JP2009147814A Active JP5038361B2 (ja) | 2004-07-30 | 2009-06-22 | 真空計 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009147814A Active JP5038361B2 (ja) | 2004-07-30 | 2009-06-22 | 真空計 |
Country Status (3)
Country | Link |
---|---|
US (1) | US7129708B1 (ja) |
JP (2) | JP4382708B2 (ja) |
CN (1) | CN100555552C (ja) |
Families Citing this family (23)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100555552C (zh) * | 2004-07-30 | 2009-10-28 | 清华大学 | 真空规管 |
JP3920904B1 (ja) | 2006-02-23 | 2007-05-30 | 株式会社コナミデジタルエンタテインメント | 通信ゲームシステム、通信ゲーム制御方法、ならびに、プログラム |
US7456634B2 (en) * | 2006-10-26 | 2008-11-25 | Brooks Automation, Inc. | Method and apparatus for shielding feedthrough pin insulators in an ionization gauge operating in harsh environments |
CN101266180A (zh) * | 2007-03-16 | 2008-09-17 | 清华大学 | 电离规 |
US7768267B2 (en) * | 2007-07-11 | 2010-08-03 | Brooks Automation, Inc. | Ionization gauge with a cold electron source |
EP2232224A4 (en) * | 2007-12-19 | 2015-07-01 | Mks Instr Inc | IONIZATION GAUGE HAVING A COLD EMISSION SOURCE WITH ELECTRON MULTIPLIER |
EP2252869B1 (en) * | 2008-02-21 | 2018-12-12 | MKS Instruments, Inc. | Ionization gauge with operational parameters and geometry designed for high pressure operation |
US8093883B2 (en) * | 2008-10-07 | 2012-01-10 | United Microelectronics Corp. | Ion current measurement device |
WO2011040625A1 (ja) * | 2009-09-29 | 2011-04-07 | 有限会社真空実験室 | イオン源を有する真空計測装置 |
CN102087949B (zh) * | 2010-12-31 | 2012-11-21 | 清华大学 | 真空规管 |
CN103094049B (zh) * | 2011-10-28 | 2015-11-25 | 清华大学 | 电离规 |
EP3100020B1 (en) * | 2014-01-31 | 2019-01-02 | Nanotech Analysis S.r.l. | Miniaturized device for measurements of very low pressure and of gas concentrations |
TW201634219A (zh) | 2015-01-15 | 2016-10-01 | Mks儀器公司 | 聚合物複合物真空組件 |
CN104735898A (zh) * | 2015-03-30 | 2015-06-24 | 同方威视技术股份有限公司 | 电子帘加速器、反射极以及电子加速方法 |
CN107527786A (zh) * | 2017-08-22 | 2017-12-29 | 兰州空间技术物理研究所 | 一种测量下限较低的碳纳米管阴极电离规 |
CN107993908B (zh) * | 2017-11-27 | 2019-11-15 | 温州大学 | 一种基于场发射阴极电子源的电离真空计及其应用方法 |
CN108091529B (zh) * | 2017-11-27 | 2020-06-23 | 温州大学 | 一种场发射阴极电子源及其应用 |
US10928265B2 (en) | 2018-05-29 | 2021-02-23 | Mks Instruments, Inc. | Gas analysis with an inverted magnetron source |
CN109767970B (zh) * | 2018-12-05 | 2021-05-28 | 兰州空间技术物理研究所 | 一种微型封装式电离规 |
TWI705235B (zh) | 2019-07-19 | 2020-09-21 | 財團法人工業技術研究院 | 感測裝置 |
US11976992B2 (en) * | 2019-09-20 | 2024-05-07 | Inficon ag | Vacuum-tight electrical feedthrough |
US10948456B1 (en) | 2019-11-27 | 2021-03-16 | Mks Instruments, Inc. | Gas analyzer system with ion source |
CN112629746A (zh) * | 2020-12-04 | 2021-04-09 | 合肥工业大学 | 一种可用于强磁场环境下的对称式热阴极电离真空计 |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5958751A (ja) * | 1983-05-13 | 1984-04-04 | Fumio Watanabe | イオン電流制御電極付きエクストラクタ−型電離真空計 |
JP2772687B2 (ja) * | 1989-10-20 | 1998-07-02 | 日本真空技術株式会社 | 電離真空計 |
WO1998050768A1 (en) * | 1997-05-09 | 1998-11-12 | The Fredericks Company | Bayard-alpert vacuum gauge with neutralization of x-ray effect |
JPH11307040A (ja) * | 1998-04-23 | 1999-11-05 | Jeol Ltd | イオンガイド |
JP3746376B2 (ja) * | 1998-07-22 | 2006-02-15 | 助川電気工業株式会社 | イオン源によるイオン発生方法 |
JP2000315474A (ja) * | 1999-04-30 | 2000-11-14 | Shimadzu Corp | 質量分析計 |
ITTO20030626A1 (it) * | 2003-08-08 | 2005-02-09 | Varian Spa | Vacuometro a ionizzazione. |
CN100555552C (zh) * | 2004-07-30 | 2009-10-28 | 清华大学 | 真空规管 |
-
2004
- 2004-07-30 CN CNB2004100509770A patent/CN100555552C/zh not_active Expired - Lifetime
-
2005
- 2005-06-22 JP JP2005182484A patent/JP4382708B2/ja active Active
- 2005-07-22 US US11/187,738 patent/US7129708B1/en active Active
-
2009
- 2009-06-22 JP JP2009147814A patent/JP5038361B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
US7129708B1 (en) | 2006-10-31 |
JP2009210587A (ja) | 2009-09-17 |
US20060261819A1 (en) | 2006-11-23 |
JP2006047288A (ja) | 2006-02-16 |
CN1728327A (zh) | 2006-02-01 |
CN100555552C (zh) | 2009-10-28 |
JP5038361B2 (ja) | 2012-10-03 |
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