JP4380326B2 - 有機ｅｌ用蒸着マスク - Google Patents

有機ｅｌ用蒸着マスク Download PDF

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Publication number
JP4380326B2
JP4380326B2 JP2004000942A JP2004000942A JP4380326B2 JP 4380326 B2 JP4380326 B2 JP 4380326B2 JP 2004000942 A JP2004000942 A JP 2004000942A JP 2004000942 A JP2004000942 A JP 2004000942A JP 4380326 B2 JP4380326 B2 JP 4380326B2
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JP
Japan
Prior art keywords
metal mask
original fabric
metal
frame
mask
Prior art date
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Expired - Fee Related
Application number
JP2004000942A
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English (en)
Japanese (ja)
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JP2005197043A5 (enExample
JP2005197043A (ja
Inventor
剛広 西
範文 井手吉
宏史 土居
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Toppan Inc
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Toppan Inc
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Priority to JP2004000942A priority Critical patent/JP4380326B2/ja
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Publication of JP2005197043A5 publication Critical patent/JP2005197043A5/ja
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Publication of JP4380326B2 publication Critical patent/JP4380326B2/ja
Anticipated expiration legal-status Critical
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  • Electroluminescent Light Sources (AREA)
JP2004000942A 2004-01-06 2004-01-06 有機ｅｌ用蒸着マスク Expired - Fee Related JP4380326B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004000942A JP4380326B2 (ja) 2004-01-06 2004-01-06 有機ｅｌ用蒸着マスク

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004000942A JP4380326B2 (ja) 2004-01-06 2004-01-06 有機ｅｌ用蒸着マスク

Publications (3)

Publication Number Publication Date
JP2005197043A JP2005197043A (ja) 2005-07-21
JP2005197043A5 JP2005197043A5 (enExample) 2007-02-22
JP4380326B2 true JP4380326B2 (ja) 2009-12-09

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ID=34816596

Family Applications (1)

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JP2004000942A Expired - Fee Related JP4380326B2 (ja) 2004-01-06 2004-01-06 有機ｅｌ用蒸着マスク

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JP (1) JP4380326B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017190537A1 (zh) * 2016-05-05 2017-11-09 京东方科技集团股份有限公司 掩膜板、母板、掩膜板制造设备和方法及显示基板蒸镀系统

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6142196B2 (ja) * 2013-03-15 2017-06-07 株式会社ブイ・テクノロジー 蒸着マスクの製造方法
KR102618083B1 (ko) * 2020-10-30 2023-12-27 에이피에스머티리얼즈(주) 증착 마스크 스틱 중간체

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4147610B2 (ja) * 1997-03-28 2008-09-10 凸版印刷株式会社 スクリーン印刷版の製造方法
JP2001185350A (ja) * 1999-12-24 2001-07-06 Sanyo Electric Co Ltd 被着用マスク、その製造方法、エレクトロルミネッセンス表示装置及びその製造方法
JP2001247961A (ja) * 2000-03-06 2001-09-14 Casio Comput Co Ltd 蒸着用スクリーンマスク、蒸着方法及び有機ｅｌ素子の製造方法
JP2003064468A (ja) * 2001-08-23 2003-03-05 Fuchigami Micro:Kk コンビネーションマスク
JP2003332057A (ja) * 2002-05-16 2003-11-21 Dainippon Printing Co Ltd 有機ｅｌ素子製造に用いる真空蒸着用多面付けマスク装置
JP4862236B2 (ja) * 2001-08-24 2012-01-25 大日本印刷株式会社 有機ｅｌ素子製造に用いる真空蒸着用多面付けマスク装置
JP2003231964A (ja) * 2001-12-05 2003-08-19 Toray Ind Inc 蒸着マスクおよびその製造方法並びに有機電界発光装置およびその製造方法
US6878208B2 (en) * 2002-04-26 2005-04-12 Tohoku Pioneer Corporation Mask for vacuum deposition and organic EL display manufactured by using the same
JP3996439B2 (ja) * 2002-05-16 2007-10-24 大日本印刷株式会社 有機ｅｌ素子製造に用いる真空蒸着用マスク装置
JP4341382B2 (ja) * 2003-11-21 2009-10-07 凸版印刷株式会社 蒸着マスクの製造方法
JP4341385B2 (ja) * 2003-11-26 2009-10-07 凸版印刷株式会社 蒸着マスクの製造方法
JP2004336066A (ja) * 2004-06-17 2004-11-25 Mitsubishi Electric Corp Ｘ線マスクの製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017190537A1 (zh) * 2016-05-05 2017-11-09 京东方科技集团股份有限公司 掩膜板、母板、掩膜板制造设备和方法及显示基板蒸镀系统
US10131982B2 (en) 2016-05-05 2018-11-20 Boe Technology Group Co., Ltd. Mask, motherboard, device and method for manufacturing mask, and system for evaporating display substrate

Also Published As

Publication number Publication date
JP2005197043A (ja) 2005-07-21

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