JP4378485B2 - 太陽電池の製造方法 - Google Patents
太陽電池の製造方法 Download PDFInfo
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- JP4378485B2 JP4378485B2 JP2004012244A JP2004012244A JP4378485B2 JP 4378485 B2 JP4378485 B2 JP 4378485B2 JP 2004012244 A JP2004012244 A JP 2004012244A JP 2004012244 A JP2004012244 A JP 2004012244A JP 4378485 B2 JP4378485 B2 JP 4378485B2
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- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000000758 substrate Substances 0.000 claims description 43
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 31
- 229910052710 silicon Inorganic materials 0.000 claims description 30
- 239000010703 silicon Substances 0.000 claims description 30
- 238000005530 etching Methods 0.000 claims description 26
- 239000013078 crystal Substances 0.000 claims description 25
- 238000000034 method Methods 0.000 claims description 25
- 238000005422 blasting Methods 0.000 claims description 12
- 238000005247 gettering Methods 0.000 claims description 10
- 239000012535 impurity Substances 0.000 claims description 6
- 239000012670 alkaline solution Substances 0.000 claims description 5
- 238000005498 polishing Methods 0.000 claims description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 16
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 12
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 12
- 230000000694 effects Effects 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 10
- 238000006243 chemical reaction Methods 0.000 description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- 238000010586 diagram Methods 0.000 description 5
- 238000009792 diffusion process Methods 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 4
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052709 silver Inorganic materials 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- UIIMBOGNXHQVGW-UHFFFAOYSA-M Sodium bicarbonate Chemical compound [Na+].OC([O-])=O UIIMBOGNXHQVGW-UHFFFAOYSA-M 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000006061 abrasive grain Substances 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- RKTYLMNFRDHKIL-UHFFFAOYSA-N copper;5,10,15,20-tetraphenylporphyrin-22,24-diide Chemical compound [Cu+2].C1=CC(C(=C2C=CC([N-]2)=C(C=2C=CC=CC=2)C=2C=CC(N=2)=C(C=2C=CC=CC=2)C2=CC=C3[N-]2)C=2C=CC=CC=2)=NC1=C3C1=CC=CC=C1 RKTYLMNFRDHKIL-UHFFFAOYSA-N 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 229910000029 sodium carbonate Inorganic materials 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- 238000012935 Averaging Methods 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- UIIMBOGNXHQVGW-DEQYMQKBSA-M Sodium bicarbonate-14C Chemical compound [Na+].O[14C]([O-])=O UIIMBOGNXHQVGW-DEQYMQKBSA-M 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 1
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000005121 nitriding Methods 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000011863 silicon-based powder Substances 0.000 description 1
- 229910000030 sodium bicarbonate Inorganic materials 0.000 description 1
- 235000017557 sodium bicarbonate Nutrition 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 229910001936 tantalum oxide Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 238000007740 vapor deposition Methods 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000004857 zone melting Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0236—Special surface textures
- H01L31/02363—Special surface textures of the semiconductor body itself, e.g. textured active layers
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Weting (AREA)
- Photovoltaic Devices (AREA)
Description
まず、厚さ300μm、比抵抗0.5Ω・cmのホウ素ドープのp型シリコン基板(主表面{100}面、スライス上がり)8枚を用意し、濃水酸化カリウム水溶液により一次ダメージ層を除去した。次に、その8枚中の4枚を用いて受光面にショットブラストを行って二次ダメージ層(推定深さ:0.4μm以上0.7μm以下)を形成した。次に、これらの試料を同時に水酸化カリウム/2−プロパノール混合溶液に浸漬した。10、20、30及び40分後に順次試料を取出し、水洗、乾燥後、分光光度計を用いて、試料の中央部の分光反射率を測定した。AM1.5Gの入射スペクトルを仮定し、波長390〜1080nmの範囲で反射率を加重平均した結果を表1に示す。ショットブラストの有無によらず、40分間テクスチャ処理することで、約13%(シリコンと空気との屈折率差に基づいて理論的に算出される下限値に近い)の反射率が得られており、均一なテクスチャが形成されたものと考えられる。ショットブラストを使用しない場合はテクスチャ形成に30〜40分を要するのに対し、テクスチャ前にショットブラストを使用することで、約20分で良質なテクスチャが得られている。
2 二次ダメージ層
3 テクスチャ構造
5 受光面側電極
Claims (6)
- シリコン単結晶インゴットのスライスにより得られるシリコン単結晶基板の第一主表面側に形成されているスライス時の一次ダメージ層を機械的もしくは化学的に除去する一方、前記スライスとは別の機械的加工履歴に基づく新たなダメージを導入することにより、一次ダメージ層よりも薄く、かつ前記シリコン単結晶基板内の不純物をゲッタリングするゲッタリングサイトとして機能する二次ダメージ層を形成し、該二次ダメージ層に異方性エッチングを施すことによりテクスチャ構造を形成し、該テクスチャ構造上に受光面側電極を形成するとともに、
前記二次ダメージ層を形成する機械的加工履歴は、前記シリコン単結晶基板の第一主表面への研磨、研削及びショットブラストのいずれか又はそれらの組み合わせに基づく履歴であることを特徴とする太陽電池の製造方法。 - 前記二次ダメージ層を0.5μm以上5μm以下の厚さに形成することを特徴とする請求項1記載の太陽電池の製造方法。
- 前記シリコン単結晶基板は主表面が{100}面であり、前記異方性エッチングをアルカリ溶液を用いて行なうことにより、前記テクスチャ構造を4つの{111}面に囲まれた正四角錐状の突起の集合体として形成することを特徴とする請求項1又は請求項2に記載の太陽電池の製造方法。
- 前記二次ダメージ層を形成する機械的加工履歴は、前記スライス時のダメージ層除去に兼用される溝入れダイシング加工に基づく履歴であることを特徴とする請求項1ないし請求項3のいずれか1項に記載の太陽電池の製造方法。
- 前記溝入れダイシング加工は、各溝の深さが10μm以上150μm以下となるように複数本の互いに平行な溝を前記シリコン単結晶基板の第一主表面に形成する形で行なわれることを特徴とする請求項4記載の太陽電池の製造方法。
- 前記シリコン単結晶基板の第一主表面全面がダイシングによる二次ダメージ層領域となるように、前記溝入れダイシング加工を繰り返し行なうことを特徴とする請求項4又は請求項5に記載の太陽電池の製造方法。
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JP2004012244A JP4378485B2 (ja) | 2004-01-20 | 2004-01-20 | 太陽電池の製造方法 |
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JP2004012244A JP4378485B2 (ja) | 2004-01-20 | 2004-01-20 | 太陽電池の製造方法 |
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JP2005209726A JP2005209726A (ja) | 2005-08-04 |
JP4378485B2 true JP4378485B2 (ja) | 2009-12-09 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2013074066A (ja) * | 2011-09-27 | 2013-04-22 | Pv Crystalox Solar Plc | 半導体ウェハの製造方法及び半導体ウェハ |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2012049424A (ja) * | 2010-08-30 | 2012-03-08 | Shin Etsu Chem Co Ltd | 太陽電池及びその製造方法 |
WO2012036002A1 (ja) | 2010-09-14 | 2012-03-22 | 信越化学工業株式会社 | 太陽電池及びその製造方法 |
JP5109048B2 (ja) * | 2010-11-21 | 2012-12-26 | Ftb研究所株式会社 | 半導体材料表面加工方法及び半導体材料 |
JP5881053B2 (ja) * | 2011-01-31 | 2016-03-09 | 国立研究開発法人産業技術総合研究所 | 太陽電池用基板の作製方法および太陽電池 |
CN111106185A (zh) * | 2019-12-30 | 2020-05-05 | 江苏祺创光电集团有限公司 | 一种环保型太阳能光伏组件 |
CN114883450B (zh) * | 2022-05-21 | 2023-06-27 | 一道新能源科技(衢州)有限公司 | 一种perc电池的制绒工艺 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2013074066A (ja) * | 2011-09-27 | 2013-04-22 | Pv Crystalox Solar Plc | 半導体ウェハの製造方法及び半導体ウェハ |
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LAPS | Cancellation because of no payment of annual fees |