JP4375110B2 - X線発生装置 - Google Patents
X線発生装置 Download PDFInfo
- Publication number
- JP4375110B2 JP4375110B2 JP2004142415A JP2004142415A JP4375110B2 JP 4375110 B2 JP4375110 B2 JP 4375110B2 JP 2004142415 A JP2004142415 A JP 2004142415A JP 2004142415 A JP2004142415 A JP 2004142415A JP 4375110 B2 JP4375110 B2 JP 4375110B2
- Authority
- JP
- Japan
- Prior art keywords
- aperture
- electron beam
- electron source
- ray
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 48
- 230000002093 peripheral effect Effects 0.000 claims description 8
- 238000003384 imaging method Methods 0.000 description 7
- 238000001514 detection method Methods 0.000 description 4
- 239000013078 crystal Substances 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- 229910052684 Cerium Inorganic materials 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 229910052746 lanthanum Inorganic materials 0.000 description 1
- FZLIPJUXYLNCLC-UHFFFAOYSA-N lanthanum atom Chemical compound [La] FZLIPJUXYLNCLC-UHFFFAOYSA-N 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Images
Landscapes
- X-Ray Techniques (AREA)
Description
2 … X線検出器
11 … 陰極
12 … ターゲット
13 … 絞り孔
14 … アパーチャ
23 … 第1軸
24 … 第2軸
B … 電子ビーム
Claims (1)
- 電子ビームを発生させる電子源と、前記電子源に対向配置され、電子源からの電子ビームの衝突によりX線を発生させるターゲットと、電子源と前記ターゲットとの間に配置され、電子ビームを絞る絞り孔を有したアパーチャとを備えたX線発生装置であって、前記絞り孔の内側面に属する全ての部分が、前記アパーチャの電子源側の面における前記絞り孔の周縁部と電子源とを結ぶ直線を境にして、前記絞り孔の中心と前記電子源とを結ぶ直線に対して反対側に位置するように前記アパーチャを構成することを特徴とするX線発生装置。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004142415A JP4375110B2 (ja) | 2004-05-12 | 2004-05-12 | X線発生装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004142415A JP4375110B2 (ja) | 2004-05-12 | 2004-05-12 | X線発生装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005327497A JP2005327497A (ja) | 2005-11-24 |
JP4375110B2 true JP4375110B2 (ja) | 2009-12-02 |
Family
ID=35473685
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004142415A Expired - Lifetime JP4375110B2 (ja) | 2004-05-12 | 2004-05-12 | X線発生装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4375110B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5074105B2 (ja) * | 2007-06-08 | 2012-11-14 | 株式会社島津製作所 | エネルギ分散型x線検出装置 |
JP5871528B2 (ja) | 2011-08-31 | 2016-03-01 | キヤノン株式会社 | 透過型x線発生装置及びそれを用いたx線撮影装置 |
EP2763156A1 (en) * | 2013-02-05 | 2014-08-06 | Nordson Corporation | X-ray source with improved target lifetime |
DE102016013747B4 (de) * | 2016-11-18 | 2018-05-30 | Yxlon International Gmbh | Blende für eine Röntgenröhre und Röntgenröhre mit einer solchen Blende |
CN117637417A (zh) * | 2024-01-24 | 2024-03-01 | 电子科技大学 | 一种使用光阑结构进行辅助聚焦的微焦点电子枪 |
-
2004
- 2004-05-12 JP JP2004142415A patent/JP4375110B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005327497A (ja) | 2005-11-24 |
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