JP4350630B2 - ガスセンサの製造方法 - Google Patents
ガスセンサの製造方法 Download PDFInfo
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- JP4350630B2 JP4350630B2 JP2004288645A JP2004288645A JP4350630B2 JP 4350630 B2 JP4350630 B2 JP 4350630B2 JP 2004288645 A JP2004288645 A JP 2004288645A JP 2004288645 A JP2004288645 A JP 2004288645A JP 4350630 B2 JP4350630 B2 JP 4350630B2
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- solid electrolyte
- gas sensor
- cell
- electrolyte body
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- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000007789 gas Substances 0.000 claims description 92
- 239000007784 solid electrolyte Substances 0.000 claims description 86
- 239000011229 interlayer Substances 0.000 claims description 42
- 239000010410 layer Substances 0.000 claims description 41
- 238000005259 measurement Methods 0.000 claims description 30
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 26
- 238000010304 firing Methods 0.000 claims description 20
- 239000000919 ceramic Substances 0.000 claims description 18
- 238000002844 melting Methods 0.000 claims description 16
- 230000008018 melting Effects 0.000 claims description 14
- 238000010030 laminating Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 4
- 229910052760 oxygen Inorganic materials 0.000 claims description 4
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 52
- DOIRQSBPFJWKBE-UHFFFAOYSA-N dibutyl phthalate Chemical compound CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 32
- GOQYKNQRPGWPLP-UHFFFAOYSA-N n-heptadecyl alcohol Natural products CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 26
- 238000001514 detection method Methods 0.000 description 14
- 239000000463 material Substances 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 12
- 238000009413 insulation Methods 0.000 description 7
- 150000002500 ions Chemical class 0.000 description 7
- 238000000034 method Methods 0.000 description 7
- 239000000758 substrate Substances 0.000 description 7
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- LXVSANCQXSSLPA-UHFFFAOYSA-N 2-Ethyl-2-hydroxy-butyric acid Chemical compound CCC(O)(CC)C(O)=O LXVSANCQXSSLPA-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 239000004014 plasticizer Substances 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- CBFCDTFDPHXCNY-UHFFFAOYSA-N icosane Chemical compound CCCCCCCCCCCCCCCCCCCC CBFCDTFDPHXCNY-UHFFFAOYSA-N 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 239000012188 paraffin wax Substances 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 239000002002 slurry Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 3
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 3
- -1 oxygen ion Chemical class 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 235000021355 Stearic acid Nutrition 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 238000002485 combustion reaction Methods 0.000 description 2
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 2
- 238000002788 crimping Methods 0.000 description 2
- KZHJGOXRZJKJNY-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Si]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O.O=[Al]O[Al]=O KZHJGOXRZJKJNY-UHFFFAOYSA-N 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- YWWHKOHZGJFMIE-UHFFFAOYSA-N monoethyl phthalate Chemical compound CCOC(=O)C1=CC=CC=C1C(O)=O YWWHKOHZGJFMIE-UHFFFAOYSA-N 0.000 description 2
- 229910052863 mullite Inorganic materials 0.000 description 2
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 2
- 150000002894 organic compounds Chemical class 0.000 description 2
- 229910052763 palladium Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- 239000008117 stearic acid Substances 0.000 description 2
- RUDFQVOCFDJEEF-UHFFFAOYSA-N yttrium(III) oxide Inorganic materials [O-2].[O-2].[O-2].[Y+3].[Y+3] RUDFQVOCFDJEEF-UHFFFAOYSA-N 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- FPAFDBFIGPHWGO-UHFFFAOYSA-N dioxosilane;oxomagnesium;hydrate Chemical compound O.[Mg]=O.[Mg]=O.[Mg]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O.O=[Si]=O FPAFDBFIGPHWGO-UHFFFAOYSA-N 0.000 description 1
- 238000007606 doctor blade method Methods 0.000 description 1
- 238000004043 dyeing Methods 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000011133 lead Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 description 1
- 230000001012 protector Effects 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 230000026683 transduction Effects 0.000 description 1
- 238000010361 transduction Methods 0.000 description 1
- 229910001233 yttria-stabilized zirconia Inorganic materials 0.000 description 1
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Description
このような積層型ガスセンサ素子1において、可塑剤及び圧着溶剤の含有量の異なる層間調整層用シート123(焼成前の層間調整層123)を用いて圧着を行い、第1セル部用電極111の変形の防止に効果が現れるか否かの評価試験を行った。尚、以下では解りやすさのために、各部の符号を焼成前と焼成後とで同じとした。本評価試験では、サンプル番号A〜Lの12種類の層間調整層用シート123を用い、電極の変形を調べた。表1は、サンプルA〜Lのステアリルアルコール量(圧着溶剤)及びDBP(フタル酸ジブチル)(可塑剤)の添加量と、電極の変形状態を示した表である。
2 ガスセンサ
10 第1絶縁性シート
10 第1絶縁性基部
11 未焼成第1セル
11 第1セル部
13 未焼成第2セル
13 第2セル部
14 第2絶縁性基シート
14 第2絶縁性基部
15 測定室
111 第1セル部用電極
123 層間調整層
123 層間調整層用シート
131 第2セル部用電極
Claims (2)
- 酸素イオン電導性を有するジルコニアを主成分とする板状の固体電解質体と、
絶縁性セラミックを主成分とし、該固体電解質体に接するように積層された板状の基体とを有し、
該基体の少なくとも一部に、該基体の積層方向に開空間が形成されたガスセンサ素子を有するガスセンサの製造方法において、
絶縁性セラミックを主成分とし、40℃以上80℃以下の融点をもつ有機物を1質量%以上20質量%以下含有し、焼成後に基体となる基体シートを作製するシート作製工程と、
焼成後に固体電解質体となる固体電解質シートに前記基体シートを積層し、圧着する圧着工程と
を有するガスセンサの製造方法。 - 前記ガスセンサ素子は第1固体電解質体と第2固体電解質体とを有し、前記基体が、該第1固体電解質体と該第2固体電解質体とに挟まれた層間調整層であり、前記開空間が該第1固体電解質体、該第2固体電解質体及び該層間調整層により形成された測定室であることを特徴とする請求項1に記載のガスセンサ製造方法。
Priority Applications (1)
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JP2004288645A JP4350630B2 (ja) | 2004-09-30 | 2004-09-30 | ガスセンサの製造方法 |
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JP2004288645A JP4350630B2 (ja) | 2004-09-30 | 2004-09-30 | ガスセンサの製造方法 |
Publications (2)
Publication Number | Publication Date |
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JP2006105613A JP2006105613A (ja) | 2006-04-20 |
JP4350630B2 true JP4350630B2 (ja) | 2009-10-21 |
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JP2004288645A Expired - Fee Related JP4350630B2 (ja) | 2004-09-30 | 2004-09-30 | ガスセンサの製造方法 |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102313762A (zh) * | 2010-07-09 | 2012-01-11 | 株式会社电装 | 气体传感器元件和气体传感器 |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4703777B2 (ja) * | 2010-08-18 | 2011-06-15 | 日本碍子株式会社 | センサ素子およびガスセンサ |
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2004
- 2004-09-30 JP JP2004288645A patent/JP4350630B2/ja not_active Expired - Fee Related
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102313762A (zh) * | 2010-07-09 | 2012-01-11 | 株式会社电装 | 气体传感器元件和气体传感器 |
CN102313762B (zh) * | 2010-07-09 | 2014-09-17 | 株式会社电装 | 气体传感器元件和气体传感器 |
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JP2006105613A (ja) | 2006-04-20 |
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