JP4343911B2 - 欠陥検査装置 - Google Patents

欠陥検査装置 Download PDF

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Publication number
JP4343911B2
JP4343911B2 JP2006028261A JP2006028261A JP4343911B2 JP 4343911 B2 JP4343911 B2 JP 4343911B2 JP 2006028261 A JP2006028261 A JP 2006028261A JP 2006028261 A JP2006028261 A JP 2006028261A JP 4343911 B2 JP4343911 B2 JP 4343911B2
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JP
Japan
Prior art keywords
light
illumination
optical system
scratch
scattered light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2006028261A
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English (en)
Japanese (ja)
Other versions
JP2006201179A5 (enrdf_load_stackoverflow
JP2006201179A (ja
Inventor
伊知郎 石丸
稔 野口
一郎 盛山
義和 田辺
保夫 八掛
行雄 見坊
健二 渡辺
洋史 土山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
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Priority to JP2006028261A priority Critical patent/JP4343911B2/ja
Publication of JP2006201179A publication Critical patent/JP2006201179A/ja
Publication of JP2006201179A5 publication Critical patent/JP2006201179A5/ja
Application granted granted Critical
Publication of JP4343911B2 publication Critical patent/JP4343911B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2006028261A 2006-02-06 2006-02-06 欠陥検査装置 Expired - Fee Related JP4343911B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006028261A JP4343911B2 (ja) 2006-02-06 2006-02-06 欠陥検査装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006028261A JP4343911B2 (ja) 2006-02-06 2006-02-06 欠陥検査装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2000068593A Division JP3996728B2 (ja) 2000-03-08 2000-03-08 表面検査装置およびその方法

Related Child Applications (2)

Application Number Title Priority Date Filing Date
JP2008205955A Division JP4648435B2 (ja) 2008-08-08 2008-08-08 検査装置
JP2009125763A Division JP5506243B2 (ja) 2009-05-25 2009-05-25 欠陥検査装置

Publications (3)

Publication Number Publication Date
JP2006201179A JP2006201179A (ja) 2006-08-03
JP2006201179A5 JP2006201179A5 (enrdf_load_stackoverflow) 2008-11-13
JP4343911B2 true JP4343911B2 (ja) 2009-10-14

Family

ID=36959274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006028261A Expired - Fee Related JP4343911B2 (ja) 2006-02-06 2006-02-06 欠陥検査装置

Country Status (1)

Country Link
JP (1) JP4343911B2 (enrdf_load_stackoverflow)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008261790A (ja) * 2007-04-13 2008-10-30 Hitachi High-Technologies Corp 欠陥検査装置
US7869025B2 (en) 2007-06-28 2011-01-11 Hitachi-High-Technologies Corporation Optical inspection method and optical inspection system
JP2009031251A (ja) * 2007-06-28 2009-02-12 Hitachi High-Technologies Corp 光学式検査方法、および光学式検査装置
JP2009156651A (ja) * 2007-12-26 2009-07-16 Gunze Ltd フィルムの欠陥検査装置
JP4898713B2 (ja) * 2008-01-17 2012-03-21 株式会社日立ハイテクノロジーズ 表面検査装置および表面検査方法
JP5355922B2 (ja) * 2008-03-31 2013-11-27 株式会社日立ハイテクノロジーズ 欠陥検査装置
JP5331586B2 (ja) 2009-06-18 2013-10-30 株式会社日立ハイテクノロジーズ 欠陥検査装置および検査方法
JP5450161B2 (ja) 2010-02-26 2014-03-26 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
JP5538072B2 (ja) 2010-06-03 2014-07-02 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
JP5520737B2 (ja) 2010-07-30 2014-06-11 株式会社日立ハイテクノロジーズ 欠陥検査装置および欠陥検査方法
JP2012137350A (ja) 2010-12-27 2012-07-19 Hitachi High-Technologies Corp 欠陥検査方法および欠陥検査装置
JP5659048B2 (ja) 2011-03-02 2015-01-28 株式会社日立製作所 光検査方法及びその装置
JP5676419B2 (ja) 2011-11-24 2015-02-25 株式会社日立ハイテクノロジーズ 欠陥検査方法およびその装置
JP2013205015A (ja) 2012-03-27 2013-10-07 Hitachi Ltd 光検査装置およびその方法
JP2012177714A (ja) * 2012-06-20 2012-09-13 Hitachi High-Technologies Corp 検査装置
JP5655045B2 (ja) * 2012-09-11 2015-01-14 株式会社日立ハイテクノロジーズ 光学式表面欠陥検査装置及び光学式表面欠陥検査方法
JP6493136B2 (ja) * 2015-10-06 2019-04-03 株式会社Sumco ウェーハ検査方法およびウェーハ検査装置
WO2019159334A1 (ja) 2018-02-16 2019-08-22 株式会社日立ハイテクノロジーズ 欠陥検査装置

Also Published As

Publication number Publication date
JP2006201179A (ja) 2006-08-03

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