JP4339126B2 - Hidランプの石英バーナーの被覆方法 - Google Patents
Hidランプの石英バーナーの被覆方法 Download PDFInfo
- Publication number
- JP4339126B2 JP4339126B2 JP2003565920A JP2003565920A JP4339126B2 JP 4339126 B2 JP4339126 B2 JP 4339126B2 JP 2003565920 A JP2003565920 A JP 2003565920A JP 2003565920 A JP2003565920 A JP 2003565920A JP 4339126 B2 JP4339126 B2 JP 4339126B2
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- Prior art keywords
- layer
- quartz burner
- layer system
- thickness
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 33
- 239000010453 quartz Substances 0.000 title claims description 26
- 238000000576 coating method Methods 0.000 title claims description 18
- 238000000034 method Methods 0.000 claims description 37
- 239000011248 coating agent Substances 0.000 claims description 16
- 239000000758 substrate Substances 0.000 claims description 16
- 238000000151 deposition Methods 0.000 claims description 15
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 10
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 10
- 230000008021 deposition Effects 0.000 claims description 10
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 claims description 9
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 7
- 230000007547 defect Effects 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 2
- 239000007789 gas Substances 0.000 description 6
- 239000010936 titanium Substances 0.000 description 6
- 238000007740 vapor deposition Methods 0.000 description 5
- 238000010521 absorption reaction Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- 230000004888 barrier function Effects 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000003475 lamination Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 230000006750 UV protection Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000005274 electronic transitions Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 150000002926 oxygen Chemical class 0.000 description 1
- 230000004224 protection Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- 230000002459 sustained effect Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
- C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
- C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J61/00—Gas-discharge or vapour-discharge lamps
- H01J61/02—Details
- H01J61/30—Vessels; Containers
- H01J61/35—Vessels; Containers provided with coatings on the walls thereof; Selection of materials for the coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
- Surface Treatment Of Glass (AREA)
- Laminated Bodies (AREA)
Description
欠陥スポットの発生率が極めて低いので、干渉被膜のUV吸収を極めて低くすることができる。ここで意味することは構造欠陥スポット、即ち異元素包有が非常に低いことである。本発明のより的確な理解のため、下記に言及する。
a.約40%が可視光。この収量は高いほど良い。
b.UV光。この部の光は本発明による被膜により反射し、その結果加わって得られる光子が可視域の光波長の光収量を高める。その結果、電流の節約と共に、同一の光収量が可能となる。
c.赤外光。これも反射可能である。
Claims (9)
- UV反射層系でHIDランプの石英バーナーを被覆する方法であって、一般的化学量論組成を少なくともTiOy及びSiOxとする酸化チタン及び酸化ケイ素から成る非晶質の薄層を、高出力密度及び100〜400℃の範囲の高い基体温度とし、1nm/sec〜100nm/secの低成長速度で行うPICVD法により、石英バーナーのジャケットの内側に交互に付着させることにより、厚みが1200nmより薄く、UV活性欠陥スポット率を最小にする反射層系を形成して成る方法。
- 厚みが<1200nmの層系を付着させて成る請求項1に記載の方法。
- 付着させる層系が層厚み5nm〜100nmであるTiO2層とSiO2層が交互する50個別層から成る請求項2に記載の方法。
- 層系内の個々の層の厚みが同じでなく、様々に分布するようにして成る請求項3に記載の方法。
- プラズマ発生のために、基本周波数を2.45GHzとするパルスマイクロ波法を用いる請求項1〜4の何れか一つに記載のPICVD法による方法。
- 石英バーナーの形成する基体を一定の付着温度に維持して成る請求項5に記載の方法。
- 一定の温度を維持する基体加熱のためにO2プラズマを走らせ、基体面を測定して温度を光学的に監視して成る請求項6に記載の方法。
- 石英バーナーをそのジャケットの外側においても被覆して成る請求項1〜7の何れか一つに記載の方法。
- 付着速度を一定に稼動し、且つ層厚みの測定を、マイクロ波パルスを計数して行う請求項5〜8の何れか一つに記載の方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10204363A DE10204363A1 (de) | 2002-02-02 | 2002-02-02 | Interferenzbeschichtung zur Verbesserung des Energiehaushaltes von HID-Lampen |
PCT/EP2003/000827 WO2003066540A1 (de) | 2002-02-02 | 2003-01-28 | Verfahren zum beschichten eines quarzbrenners einer hid-lampe |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005526904A JP2005526904A (ja) | 2005-09-08 |
JP4339126B2 true JP4339126B2 (ja) | 2009-10-07 |
Family
ID=27588312
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003565920A Expired - Fee Related JP4339126B2 (ja) | 2002-02-02 | 2003-01-28 | Hidランプの石英バーナーの被覆方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US7306830B2 (ja) |
EP (1) | EP1472195B1 (ja) |
JP (1) | JP4339126B2 (ja) |
CN (1) | CN100374389C (ja) |
AU (1) | AU2003206788A1 (ja) |
DE (2) | DE10204363A1 (ja) |
HK (1) | HK1076798A1 (ja) |
WO (1) | WO2003066540A1 (ja) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN101027747A (zh) * | 2003-05-12 | 2007-08-29 | 皇家飞利浦电子股份有限公司 | 高压放电灯 |
EP2297377B1 (en) | 2008-05-30 | 2017-12-27 | Colorado State University Research Foundation | Plasma-based chemical source device and method of use thereof |
US9532826B2 (en) | 2013-03-06 | 2017-01-03 | Covidien Lp | System and method for sinus surgery |
US9555145B2 (en) | 2013-03-13 | 2017-01-31 | Covidien Lp | System and method for biofilm remediation |
GB201409692D0 (en) * | 2014-05-31 | 2014-07-16 | Element Six Gmbh | Thermal spray assembly and method for using it |
WO2016022103A1 (en) | 2014-08-05 | 2016-02-11 | Amitabha Kumar | Filled polymeric composites including short length fibers |
US9988512B2 (en) | 2015-01-22 | 2018-06-05 | Boral Ip Holdings (Australia) Pty Limited | Highly filled polyurethane composites |
US10030126B2 (en) | 2015-06-05 | 2018-07-24 | Boral Ip Holdings (Australia) Pty Limited | Filled polyurethane composites with lightweight fillers |
US20170267585A1 (en) | 2015-11-12 | 2017-09-21 | Amitabha Kumar | Filled polyurethane composites with size-graded fillers |
Family Cites Families (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL7511581A (nl) * | 1975-10-02 | 1977-04-05 | Philips Nv | Reflektor. |
JPH06100687B2 (ja) | 1983-08-22 | 1994-12-12 | 東芝ライテック株式会社 | 管 球 |
FI882687A (fi) * | 1988-06-10 | 1989-12-08 | Vsesojuzny Nauchno-Issledovatelsky Proektno/-Konstruktorsky I Tekhnologichesky Svetotekhnichesky/Institut | Gasurladdningslampa. |
DE3830089A1 (de) | 1988-09-03 | 1990-03-15 | Schott Glaswerke | Verfahren zur herstellung von planaren, mit dielektrischen schichtsystemen versehenen glassubstraten |
US5034719A (en) | 1989-04-04 | 1991-07-23 | Prestolite Wire Corporation | Radio frequency interference suppression ignition cable having a semiconductive polyolefin conductive core |
US5147125A (en) * | 1989-08-24 | 1992-09-15 | Viratec Thin Films, Inc. | Multilayer anti-reflection coating using zinc oxide to provide ultraviolet blocking |
DE4008405C1 (ja) * | 1990-03-16 | 1991-07-11 | Schott Glaswerke, 6500 Mainz, De | |
JP2512204B2 (ja) * | 1990-05-09 | 1996-07-03 | 三菱電機株式会社 | 投写型陰極線管 |
US5270615A (en) * | 1991-11-22 | 1993-12-14 | General Electric Company | Multi-layer oxide coating for high intensity metal halide discharge lamps |
RU2024988C1 (ru) * | 1992-02-18 | 1994-12-15 | Акционерное общество "Лисма" - завод специальных источников света и электровакуумного стекла | Металлогалогенная лампа |
JPH0668850A (ja) * | 1992-08-20 | 1994-03-11 | Hitachi Ltd | メタルハライドランプ |
JP2788412B2 (ja) * | 1994-08-11 | 1998-08-20 | 麒麟麦酒株式会社 | 炭素膜コーティングプラスチック容器の製造装置および製造方法 |
DE4432315A1 (de) * | 1994-09-12 | 1996-03-14 | Patent Treuhand Ges Fuer Elektrische Gluehlampen Mbh | Quecksilberdampf-Kurzbogenlampe |
DE4438359C2 (de) * | 1994-10-27 | 2001-10-04 | Schott Glas | Behälter aus Kunststoff mit einer Sperrbeschichtung |
DE19530797A1 (de) * | 1995-08-22 | 1997-02-27 | Hyplast Nv | Kompositmaterial zur Abschirmung von Strahlung |
US5702770A (en) * | 1996-01-30 | 1997-12-30 | Becton, Dickinson And Company | Method for plasma processing |
US6001429A (en) * | 1997-08-07 | 1999-12-14 | Becton Dickinson And Company | Apparatus and method for plasma processing |
DE19962144A1 (de) * | 1999-12-22 | 2001-06-28 | Schott Desag Ag | UV-reflektierendes Interferenzschichtsystem |
DE10016108C2 (de) * | 2000-03-31 | 2002-09-26 | Schott Glas | Heißformgebungsverfahren und Vorrichtung zur Herstellung eines Glaskörpers sowie dessen Verwendung |
EP1158566A1 (de) * | 2000-05-26 | 2001-11-28 | Schott Glas | Leuchtkörper für eine Lampe, insbesondere Entladungslampen |
-
2002
- 2002-02-02 DE DE10204363A patent/DE10204363A1/de not_active Ceased
-
2003
- 2003-01-28 DE DE50311708T patent/DE50311708D1/de not_active Expired - Lifetime
- 2003-01-28 CN CNB038031337A patent/CN100374389C/zh not_active Expired - Fee Related
- 2003-01-28 AU AU2003206788A patent/AU2003206788A1/en not_active Abandoned
- 2003-01-28 JP JP2003565920A patent/JP4339126B2/ja not_active Expired - Fee Related
- 2003-01-28 US US10/502,408 patent/US7306830B2/en not_active Expired - Fee Related
- 2003-01-28 WO PCT/EP2003/000827 patent/WO2003066540A1/de active Application Filing
- 2003-01-28 EP EP03704480A patent/EP1472195B1/de not_active Expired - Lifetime
-
2005
- 2005-10-06 HK HK05108873A patent/HK1076798A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP2005526904A (ja) | 2005-09-08 |
US7306830B2 (en) | 2007-12-11 |
WO2003066540A1 (de) | 2003-08-14 |
EP1472195B1 (de) | 2009-07-15 |
DE10204363A1 (de) | 2003-08-14 |
CN100374389C (zh) | 2008-03-12 |
CN1625535A (zh) | 2005-06-08 |
EP1472195A1 (de) | 2004-11-03 |
US20050163939A1 (en) | 2005-07-28 |
AU2003206788A1 (en) | 2003-09-02 |
HK1076798A1 (en) | 2006-01-27 |
DE50311708D1 (de) | 2009-08-27 |
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