TWI356439B - An optical properties restoration apparatus, the r - Google Patents

An optical properties restoration apparatus, the r Download PDF

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Publication number
TWI356439B
TWI356439B TW93112330A TW93112330A TWI356439B TW I356439 B TWI356439 B TW I356439B TW 93112330 A TW93112330 A TW 93112330A TW 93112330 A TW93112330 A TW 93112330A TW I356439 B TWI356439 B TW I356439B
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light
optical
optical system
carbon
vacuum region
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TW93112330A
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Chinese (zh)
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TW200535903A (en
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Satoshi Sakai
Shigenori Tsuruga
Hideo Yamakoshi
Shizuma Kuribayashi
Minoru Danno
Hiroshi Futami
Noriko Yamazaki
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Mitsubishi Heavy Ind Ltd
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Description

1356439 九、發明說明: 【發明所屬之技術領域】 本發明係關於一種改良一光學系統之光學特性的可靠度 及哥命的裝置與方法,其方式係藉由防止、抑制、或改良 位於輸出光中或位於該輸出光之光路徑中之光學系統的光 學特性的劣化情形,其中該光學系統係位於一有機成份可 破分解的近真空區域内,該劣化係因沉積或累積在該光學 系統之光照射表面、光反射表面、光發射表面(通稱為「發 光表面」)上的碳所造成的,而且該等表面係面向該真空區 域。更明確地說,本發明係關於一種光學特性復原裝置以 及使用該裝置的方法,以及利用此光學特性復原裝置來改 良位於各種光學裝置之透光視窗外面的各種光學系統的光 子特丨生’該荨各種光學裝置會利用高光子能量光(例如慣用 的紫外光或真空紫外光)來產生透光、折射、反射.、頻譜生 成以及干涉等。 再者’本發明係關於各種光學裝置中的光學系統以及使 用該系統的方法。該等光學系統會改良位於各種光學裝置 之透光視窗裡面的光學特性’該等各種光學裝置會產生透 光、折射、反射、頻譜生成以及干涉等,而且該等光學系 統係位於高光子能量光(例如慣用的紫外光或真空紫外光) 的光路徑中。更明確地說’本發明可應用於配備有複數個 透鏡、視窗、干涉儀'稜鏡、主光罩、以及反射面鏡等的 光學系統中,以及應用於配備有此等光學系統的高光子能 量燈中。另外,本發明不僅可應用於光學測量儀器中(例如 92980.doc 1356439 光譜儀、螢光計、干涉計、繞射計),亦可應用於採用真空 紫外光的標準光源'採用用來激發化學反應的光源、採用 印刷板及照相應用所使用的光源、以及採用供實驗應用使 用的各種光源的各種光學儀器中。 【先前技術】 圖14將用來解釋作為可應用本發明之慣用光學輸出裝置 範例的微波受激氫氣紫外光燈的組成部件以友作業情形。 此裝置於非專利公開案4有說明,該公開案係由心“ a 及 R. Samson 撰寫,由位於 Nebraska,Unc〇in 的 Η" Publications 於 1967 年出版的「〇f ㈣以1356439 IX. Description of the Invention: [Technical Field] The present invention relates to an apparatus and method for improving the reliability and fate of optical characteristics of an optical system by preventing, suppressing, or improving the output light. a deterioration of the optical properties of the optical system in or in the light path of the output light, wherein the optical system is located in a near vacuum region in which the organic component can be decomposed, the degradation being deposited or accumulated in the optical system Light is caused by carbon on the surface, the light reflecting surface, and the light emitting surface (generally referred to as the "light emitting surface"), and the surfaces face the vacuum region. More specifically, the present invention relates to an optical property restoring device and a method of using the same, and the use of the optical property restoring device to improve photon characteristics of various optical systems located outside the light transmissive window of various optical devices.荨 Various optical devices use high photon energy light (such as conventional ultraviolet light or vacuum ultraviolet light) to generate light transmission, refraction, reflection, spectrum generation, and interference. Further, the present invention relates to an optical system in various optical devices and a method of using the same. These optical systems improve the optical properties of the light-transmissive windows located in various optical devices. These various optical devices produce light transmission, refraction, reflection, spectral generation, and interference, etc., and the optical systems are located in high photon energy light. In the light path (for example, conventional ultraviolet light or vacuum ultraviolet light). More specifically, the present invention can be applied to an optical system equipped with a plurality of lenses, windows, interferometers, primary masks, and reflecting mirrors, and to high photons equipped with such optical systems. In the energy lamp. In addition, the present invention can be applied not only to optical measuring instruments (for example, 92980.doc 1356439 spectrometer, fluorometer, interferometer, diffractometer) but also to a standard light source using vacuum ultraviolet light to excite chemical reactions. The light source, the light source used in printing plates and photographic applications, and various optical instruments using various light sources for experimental applications. [Prior Art] Fig. 14 is a view for explaining a case in which a component of a microwave excited hydrogen ultraviolet lamp as an example of a conventional optical output device to which the present invention is applicable is used. This device is described in Non-Patent Publication No. 4, which was written by "a and R. Samson, by 〇f (4), published in 1967 by Nebraska, Unc〇in".

Ultraviolet Spectrosc〇py」,第 159頁’圖 5 %。該微波振盪 器4具體實施例有―密封管狀的組件,其兩端係由相同的導 電材料所製成。該管的内徑及長度係取決於所使用之微波 的頻率以及該微波振盪器令欲被激發之電磁場分佈。 微波振盡器調諧器18係一管狀組件,其係該微波振盪器 的必要組件,其允許調整該微波振盪器的微波電磁場分 佈,而且其-内徑使其可包圍放電管卜另外,其會以與微波 振盪器4之末端表面同心的方式,沿著兩者的膛軸插入,而 且其結構使其在保持作為該微波振盪器4之電導管時可於 "亥軸方向中滑動。和微波振盪器4相同的係,用於形成調諧 益18的材料為銅或黃銅。藉由該調諧器18來調整該微波電 磁場分佈的功能的實施方式係藉由調整其插入深度,同時 產生放電電漿7,從而將微波濃度6置於預期的生成位置中。 另外,放電管1的安裝方式係使其穿過微波振盪器4的兩 92980.doc 波振^琴4的赔雖、通吊都係在放電管1的腫轴(其係位於微 此種^的膛軸中)中產生最大的電場,不過,並未必為Ultraviolet Spectrosc〇py", page 159' Figure 5 %. The microwave oscillator 4 embodiment has a "seal tubular assembly" having two ends made of the same electrically conductive material. The inner diameter and length of the tube depend on the frequency of the microwave used and the electromagnetic field distribution of the microwave oscillator to be excited. The microwave tuner tuner 18 is a tubular component which is an essential component of the microwave oscillator, which allows adjustment of the microwave electromagnetic field distribution of the microwave oscillator, and its inner diameter allows it to surround the discharge tube. Inserted in a manner concentric with the end surface of the microwave oscillator 4, along the x-axis of both, and structured to slide in the "heling axis direction while maintaining the electric conduit as the microwave oscillator 4. The same system as the microwave oscillator 4, the material used to form the tuning benefit 18 is copper or brass. An embodiment of the function of adjusting the microwave electromagnetic field distribution by the tuner 18 is to adjust the insertion depth while generating the discharge plasma 7, thereby placing the microwave concentration 6 in the desired generation position. In addition, the discharge tube 1 is mounted in such a manner that it passes through the two oscillators of the microwave oscillator 4, and the movement of the tube 4 is tied to the swelling axis of the discharge tube 1 (the system is located in the micro-^ The largest electric field is generated in the 膛 axis, but it does not necessarily

广雖然放電管i的剖面形狀為圓形,不 忐為正方形等。 j J & #力此係作為真空邊界’作為該放電氣體的流動 路徑,以及作為產生放電電聚的空間。於圖14的範例中, 為、制產生放電電漿的空間’該導體的内管會沿著放電管1 從微波振m之末端表面延伸至該微波㈣器的内部。據 匕便可於微波振盈器調譜器18之末端及前述内管之末端 間的空間中產生放電電漿7。 微波振盡器4會與微波供應連接器5相互連接,該微波供 應連接H會傳送料微波。此處,該連接㈣形狀為同轴 形,不過’其亦可能係波導管類型。不論係同軸魔線或同 轴管’都可作為連接至該同轴連接器的傳輸饋送路徑。 凸緣17會透過〇形環13附著,用以將該燈固定於微波振盪 态調諧器18侧處放電管丨的末端上的正確位置處。前述凸緣 17中心處有-一個開孔,其内徑對應於放電管}的内徑,從而 允許抽出從該放電管1之軸方向中的放電電漿7所發出的 光0 被安置於前述凸緣17之開孔卡的透光視窗8有兩項功 能。其中之一係作為放電管1内部與環境的真空邊界。第二 項功能係允許將放電電漿7所發出的光抽至該真空外面。前 述的微波振盪器詳述於非專利公開案2中,該公開案係由 E.L. Ginzton撰寫,由位於New York 的 McGraw-Hill 於 1957 92980.doc 1356439 年出版的「Microwave Measurements」。 具有上述構造的放電燈具有下面所述的問題,於說明之 前’將先明確說明所使用之術語的定義。 真空紫外光的波長範圍為0_2至200 nm。位於該範圍中的 光將被稱為紫外光或真空紫外光。慣用的紫外光波長係介 於200至380 nm之間(參見Baifukan所出版的「Dicti〇nary 〇fAlthough the cross section of the discharge tube i is circular, it is not square. j J &# force is used as a vacuum boundary ' as a flow path of the discharge gas, and as a space for generating discharge electricity. In the example of Fig. 14, the space for generating the discharge plasma 'the inner tube of the conductor extends along the discharge tube 1 from the end surface of the microwave vibration m to the inside of the microwave (four). According to the crucible, the discharge plasma 7 can be generated in the space between the end of the microwave vibrator spectrometer 18 and the end of the aforementioned inner tube. The microwave pulsator 4 is interconnected with a microwave supply connector 5 which supplies a microwave of material. Here, the connection (4) is coaxial in shape, but it may also be of the waveguide type. Whether it is a coaxial cord or a coaxial tube, it can serve as a transmission feed path to the coaxial connector. The flange 17 is attached through a beak ring 13 for securing the lamp to the correct position on the end of the discharge tube at the side of the microwave oscillating state tuner 18. The aforementioned flange 17 has an opening at the center thereof, the inner diameter of which corresponds to the inner diameter of the discharge tube, so that the light 0 emitted from the discharge plasma 7 in the axial direction of the discharge tube 1 is allowed to be placed in the foregoing. The light transmissive window 8 of the aperture card of the flange 17 has two functions. One of them serves as a vacuum boundary between the inside of the discharge tube 1 and the environment. The second function allows the light emitted by the discharge plasma 7 to be drawn outside the vacuum. The aforementioned microwave oscillator is described in detail in Non-Patent Publication 2, which is written by E. L. Ginzton, "Microwave Measurements" published by McGraw-Hill, New York, 1957 92980.doc, 1356439. The discharge lamp having the above configuration has the problems described below, and the definition of the terms used will be clearly explained before the explanation. Vacuum ultraviolet light has a wavelength range of 0-2 to 200 nm. Light in this range will be referred to as ultraviolet light or vacuum ultraviolet light. Conventional UV wavelengths range from 200 to 380 nm (see "Dicti〇nary 〇f" by Baifukan

Physics」’以及 National Observatory of Japan所出版的「RikaPhysics" and "Rika" published by National Observatory of Japan

Nenpyo」)。 圖14中’為區分透光視窗的各表面,面向放電電渡7的表 面應該稱為内表面10,而位於令一側上的表面則應該稱為 外面的外表面11。 透光視窗外面之光學特性劣化的問題 圖14中,當放電電漿7產生光時,尤其是紫外光與真空紫 外光,其便會穿過透光視窗8之内表面1〇來照射,穿過透光 視窗8 ’並且從透光視窗8之外表面U穿出。 ^田於該1 衣境中發出紫外光或真空紫外光致使光造 成嚴重吸收氧氣、二氧化碳、水蒸氣及類似氣體時,一般 來》兑如圖14所示,於凸緣17的左側上(即透光視窗8的外 面)會有種機制來幫助保持真空。下文中將保持真空的區 域稱為「真空區域」。 办身又來疣,可以使用各種真空幫浦中任何一者作為保持 真工的機制。雖然有各種適合的無油乾式幫浦(其幾乎不會 發出任何有機氣體)可以使用,不過,旋轉式幫浦卻是最常 斤以,真空區域14會含有因該幫浦中所使用之油之 92980.doc 1356439 蒸氣麼所產生的有機氣體β 另外,於真空區域14内亦含有不鏽鋼 或橡膝密封部件(例如〇形環),而且視應用而定,t Μ可能含有錢㈣學元件,例如縣 =域 Γ、遽光器、透光視窗、鏡臺、或其它定位元=Nenpyo"). In Fig. 14, 'is to distinguish the surfaces of the light-transmitting window, the surface facing the discharge electrode 7 should be referred to as the inner surface 10, and the surface on the side should be referred to as the outer surface 11. Problem of deterioration of optical characteristics outside the light-transmitting window In Fig. 14, when the discharge plasma 7 generates light, especially ultraviolet light and vacuum ultraviolet light, it will illuminate through the inner surface of the light-transmitting window 8 to wear The light transmissive window 8' passes through and exits from the outer surface U of the light transmission window 8. ^ When the field emits ultraviolet light or vacuum ultraviolet light in the clothing environment, causing the light to absorb oxygen, carbon dioxide, water vapor and the like, it is generally shown on the left side of the flange 17 as shown in FIG. There is a mechanism to help maintain the vacuum outside the light transmissive window 8. The area in which the vacuum is maintained is hereinafter referred to as the "vacuum area". If you are here, you can use any of the various vacuum pumps as a mechanism to maintain your true work. Although there are a variety of suitable oil-free dry pumps (which emit almost no organic gases), the rotary pump is the most common, and the vacuum zone 14 contains the oil used in the pump. 92980.doc 1356439 Organic gas produced by steam. In addition, stainless steel or rubber-knee seals (such as 〇-rings) are also included in the vacuum zone 14, and depending on the application, t Μ may contain money (4) components. For example, county = domain 遽, 遽 器, light transmission window, mirror table, or other positioning elements =

Sr上二真空區域14的所有材料(即該等不錯鋼容 紹…、0形環及其它密封材料、光學元件 ::二:調整機制、以及類似的材料)都應該係無油的(1音 明者本身應該幾乎不會發出任何有機氣體)。 〜 在半導體工業的情況中’因為處理尺寸(該等電路 度)越來越精細,所以用於製造該電路之曝光圖案 =的波長便已經㈣真空料光_。舉例來說,供此 :用作為光源的敦化氬準分子雷射的波長為193 被轉換成能量時為6.4ev),不過近年來,雷射步進器裝置 上的發展已能產生157 nm的波長。 不過實際上,很難避免在真空區域14内發出有機氣體, :、可月b導因於各種因素’例如作為機械傳動結構的潤滑 纟樣本的’亏染、氣體從該等〇形環㊅出、氣體從該等 塑膠部件洩出、該等部件的除油或清潔工作不足、或是人 ^錯A所&成的3染。因此’於實際應用巾,必須考慮到 前述的真空區域内會有有機氣體存在。 真空區域14内的有機氣體有一特定機率會在透光視窗8 卜面的外表面11上被吸收。此吸收機率會隨著材料(其包 括/透光視囪及6亥等有機氣體的類型)而改變,不過吸收現 92980.doc 1356439 象本身卻係絕對會出現的。 當有機氣體於外表面11上被吸收的同時,該電漿所產生 的紫外光(尤其是真空紫外光)便會照射該些有機氣體,導致 直接激發該等有機氣體分子,將其提昇至活性狀態。如此 便會產生反應,其會取出氫氣(於除氫反應中,其為該等有 機氣體的一種成份元素),最後’被吸收的有機氣體便會被 轉換成碳(石墨)。當到達此狀態時,便不再是氣體,而是固 體,其本身會附著及累積於透光視窗8之外面的外表面u 上。接著,碳累積物便會吸收新的有機氣體,而且它們被 紫外光(尤其是真空紫外光)照射後亦會被轉換成碳,如此便 會繼續不斷地增長》當此程序繼續時’透光視窗8的外表面 U便會被一碳膜覆蓋。因為碳係黑色的,所以其會吸收各 種波長的光’而且當碳繼續累積於外表面Η上時,穿過透 光視窗8的透射率便會越來越小。 此處,為方便解釋,吾人假設該等有機氣體為碳氫氣體, 而且除氮反應會使其被轉換成石墨’不過,實際上,該等 有機氣體T能包括碳氫元素以外的其它元素,例如氧、氣、 碘、氟、氯等,而且如同碳氫氣體般,此等有機氣體可在 透光視窗8之外表面11上被吸收,接著便會透過紫外光(尤 其是真空紫外光)的作用而被轉換,並且殘留非氣體的成 份。因此,嚴格地說,增長部份並非係石墨,而係以碳作 為其主成份的非晶固體。為達說明本發明的目的,此主要 由碳所組成的固體應該稱為「碳」。 碳增長現象需要吸收有機氣體,並且利用紫外光(尤其是 92980.doc -12- 1356439 真空紫外光)來對其進行照射。當碳繼續累積時,從已經有 碳累積的外表面11中發出的紫外光(尤其是真空紫外光)的 強度便會明顯地減弱。碳將會繼續增長,直到所有的光強 度消失為止。此時’便無法發生新的除氫反應,而且碳膜 的累積作用會停止。據此,此方法不是碳膜能夠無限制成 長的方法,一但該現象停止,便已經達到極限的膜厚度。 通則述透光視窗8之外表面11上的碳增長現象並不會 快速地進行。該項問題係經過一段長時間後穿過透光視窗8 的透射率越來越小所造成的其中一項問題。於光譜攝影應 用中,當源自該光源的光量減低時,其便會產生漂移,影 響該等測量的精確度,於牵涉到利用紫外光照射進行表面 處理的應用中,因為照射強度減弱所造成的處理不足的關 係,便會發生問題。 解決碳增長問題的其中一種方式係盡量取得一無油的真 空區域14 ’不過,一但有機物質已經污染真空區域14,清 理程序便非常地困難。據此,解決透光視窗8之外表面丨丨上 的碳累積所造成之透射率減低的慣用對策牽涉到使用清潔 劑或研磨處理來移除碳以便將透光視窗8復原至其原來的 狀態,或是完全地置換透光視窗8。 於先則技術中,透光視窗8之透光率下降(即劣化)係燈壽 命的決定因素。已經抵達其壽命盡頭的燈會清潔或置換其 透光視窗8,該項作業需要打破真空區域14或該燈内的真 空。此項作業需要進行數個小時,該燈於該期間便無法使 用0 92980.doc -13- 1356439 接著,將說明響應因碳增長而造成該透光視窗劣化的慣 用對策。 Γ文將說明的係該項揭示於日本專利公開申請案第 2〇〇1·3 19618號(專利公開案丨)中的技術。 _ 於此範例令,所討論的光源係一氫氣燈。當將氫氣引入 ' 該放電g中時’同時會將鹵素密封於其中,作為^長該燈 壽:的方心被密封在其中的^素係—有機_素化合物。 此意謂著有機鹵素物質已經被導入該放電區域中。接著, 當該燈進行運作時,該有機材料便會分解,並且造成一有鲁 機材料(主要為碳)膜黏著於該放電管的内護壁上。此内護壁 的功能係作為該透光視窗,而將材料黏著於其護壁上會導 致所生成之光量減少。就一對策而言,上述的專利公開案i 建4對該等燈進行裝運前處理,會強迫一碳膜黏著於作為 該透光視窗的區域之上,該處的碳係假想為燈運作期間的 增長物’接著’於該燈的正常運作期間便不會再發生任何 額外的碳增長物。此項技術考慮到有機材料的生成係妹鲁 限的而且此項對策可有效地產生一個於該燈的運作期間 不會發生任何新的增長物的環境。 不過,如上面針對真空區域14的說明般,如果所採用的 裝置必須反覆地對環境開放或是進行真空解除(例如在必 , 須置換樣本的光譜攝影應用中、在必須調整光學元件的應 . 用中、或是於表面處理期間必須更換工作件等),那麼即& ' 規格要求於組裝及調整過程期間不要造成任何的有機污 染,但是,實際上卻很難不造成此種污染,因此,便無法 92980.doc •14· 1356439 板處理的工具°不僅目的異於本發明,因為該基板表面必 須處於飽和條件下,所以’其假設水係處於該等反應條件 下的液體。因此’該方法僅能使用於近正常大氣壓力的環 境中’在真空條件下其無法實施透光視窗及類似元件的光 學7L件清潔作業,而且其亦不會解決必須打破真空時所產 生的問題。 雖然到目前為止的解釋都受限於發生在透光視窗8之外 表面11上的現象’但是此類碳增長現象卻不僅侷限於透光 視窗8之外表面丨丨。通常’碳增長現象會發生在位於真空區 域14中被透光視窗8所發出之紫外光(尤其是真空紫外光)照 射之物體的表面上。只要有機氣體出現的條件以及紫外光 (尤其疋真二I外光)出現的條件同時存在,此現象便無法避 免、,月ίι述解釋中所指的「物體」包括用以切換分光應用中 之光路徑的面鏡;濾光鏡;用以聚光透鏡;以及分光應用 中所使用的繞射it件;用以聚光透鏡;以及表面處理應用 中所使用的各種濾、光鏡,換言之,任何各種光學元件。下 文中’任何·此等物體將會統稱為「光學元件」。當碳累積於 該些光學元件上時,便會因為降低透光率及反光率而造成 嚴重的問題。實際上,其會降低或造成真空區域Μ所使用 之裝置的功能總損失。 從前,為解決此類透光及反光減弱的現象,必須以新的 光子元件來置換’但是此方式會導致非常高的維修成本, 而且在必須進行維修的時間中,該裝置便無法運作。 因透光視窗8遭到劣化所導致的燈壽命的問題並不揭限 92980.doc •16- 1356439 於前述範例所述的微波受激氫氣紫外光燈,下面各種燈亦 存在雷同的問題:使用He、Ne、Ar、Kr、Xe、02、N2、D2(重 虱分子)、Hg等的燈’於其放電模式中使用高頻放電、弧光 放電、光輝放電、感應屏障放電、或閃光放電的燈;或是 利用電流加熱燈絲作為生光方式的鹵素燈或碳燈。 光學系統裡面之光學特性劣化的問題 短波長紫外光之透光特性減低的問題並不僅限於該透光 視窗外面的光學特性劣化,還包括該透光視窗裡面的光學 特性劣化。 近年來,為獲得短波長紫外光之較佳的透光特性,已經 有人開發出使用Si〇2作為前述的透光視窗。 另外,相較於從前,水銀蒸氣燈(其内部使用石英玻璃因 而會失去清晰度)的問題更為嚴重。水銀蒸氣燈中的石英玻 璃的功能係作為該燈内部於外部的真空邊界,而且還可用 來傳送該水銀發光所產生之紫外&,不過失去清晰度的現 象卻會劣化其透光特性,而且係決定燈壽命的一項因素。 舉例來說’於曰本專利公開申請案第Hei 5_325893號(專 利=開案4)中便提出-種利用發光管作為金屬蒸氣放電弧 光管來解決失去清晰度的對策,其採用表面粒度大小在丄 微米以下之破璃燈泡的粗糙内表面。如此作法會阻止該弧 光管的晶化(失去清晰度),即使已經運作很長—段時間亦 然,從而便可阻止光通量(照度維持率)下降,使得:影類型 的顯示器於經過一段長時間後仍可維持明亮的圖像及言。 質的顯示效果。 ° 929S0.doc •17· 1356439 此項技術已經被應用於弧光管中所使用的石英玻璃或高 石夕酸鹽玻璃中,而且雖然其亦可應用於慣用的250-360 nm 波長範圍的紫外光應用中,不過,190 nm波長之真空紫外 光所使用的石英玻璃的透射率的減低情形比較明顯。 另外’於曰本專利公開申請案第Hei 3-77258號(專利公開 案6)中便揭示一種針對254 nm紫外光常壓水銀蒸氣燈的技 術’其中合成石英玻璃的内表面塗佈著1至3%的金屬氧化 物顆粒(其平均顆粒直徑為1〇〇 μιη以下,於該等範例中,其 係由平均顆粒直徑為20 /im的金屬氧化物所組成)溶液。 另外’於日本專利公開申請案第Hei 8-2 12976號(專利公 開案7)中便揭示一種利用弧光管(其係由一石英玻璃管所組 成,該官内部密封著水銀,每一末端上則密封有複數個電 極)的放電燈,於該管的内部採用由ai2o3所組成的薄膜塗 層,其中該薄膜於靠近該管中心處之前述弧光管的内表面 處厚於其它的區域,明確地說,前述弧光管内表面上的厚 膜區為有效的光發射長度(其為該弧光管任一末端上該等 電極間的距離)之長度的1/3至1/2,而且前述厚膜區中的膜 厚度範圍介於〇_2 μιη至0.3 μιη之間,而其它區域中的膜厚度 範圍則介於0.1 #111至〇 15 μιη之間。 然而,此項先前技術與石英玻璃(尤其是使用於低壓水銀 放电;k中之石英玻璃)有關,而且其會調整水銀分子所在的 保濩膜的厚度,作為處理水銀被沉積於該弧光管内護壁上 攸而減低穿過該石英玻璃之透光率且造成該放電燈變暗 (其會進一步減低其照射效率)的問題的方法。 92980.doc -18- 1356439 再者,傳遞良好透光率之Si〇2的下限約為2〇〇 nm,真空 紫外光波長越短(波長小於200 nm),透光率便下降的越明 顯。再者,利用150 nm附近的真空紫外光的極短波長(例如 高能量氟雷射所使用的波長),不僅會發生前述透光率下降 的現象,該材料亦無法運用於該應用中,而且會失去其清 晰度。 此外,考慮到合成石夕土玻璃的透射率在穿過用以讓照射 燈光穿透之視窗材料的紫外光範圍中會明顯降低的事實, 曰本專利公開申請案第Hei 8-315771號(專利公開案5)中便 針對合成矽土玻璃揭示一種摻氟技術,其目標係改良運作 壽命。 然而,使用氟化合物來摻雜矽土玻璃基本母體僅於 160-190 nm波長範圍中允許約5〇%的透射範圍,而且其並無 法運用於真空紫外光的軚低波長中。 據此,當必須讓真空紫外光範圍的紫外光穿透時,鹼土 金屬鹵化物材料(例如CaFy LiF、MgF2等)便通常會被當作 透光視窗母體。 先前技術中合宜的範例便係前述的微波受激氫氣紫外光 燈,其可產生122 nm波長的的真空紫外光。可作為透光視 窗的僅知材料為CaFz、LiF、MgF2,因為LiF及CaF2的透光 率會從其顏色中心處開始顯著地降低,所以最常用的係 MgF2。不過’並無任何報告揭示過解決清晰度喪失的 對策。 也就是,當使用氟化鎂作為透光視窗的材料時,此等視 92980.doc -19- 1356439 窗的壽命會低於其它視窗材料,而且相較於使用其它視窗 材料的燈來說,燈本身的壽命僅約一半以下。 當利用S子能量高於透光視窗8中所使用之材料的吸收 波長的光(尤其是真空紫外光中的光)時,當源自該放電電聚 的光照射在透光視窗8之上時,該視f8便會出現缺陷,產 生所謂的顏色中心,其會降低透光率。此現象係CaF2、LiF、 MgF2以及其它驗土金屬画化物材料共同的現象,而且係因 為氟原子從其在晶格内正確位置處略為偏移所造成的。 另外,前述慣用技術全部解決的都係和合成石英相關的問 題’尤其是使用慣用波長紫外光作為光源的合成石英光學系 統。並無人提出實用技術來有效防止穿過MgF2的透光率減低 的問題,MgF2係微波受激氫氣紫外光燈所產生之122nm波長 真空紫外光所使用之透光視窗中所使用的材料。 由於此情況的關係,當透射率下降時,唯一的解決方式 便係置換該透光視窗。於先前技術中,上述的透光視窗8 遭到劣化係燈壽命的決定因素。於該先前技術中,一但該 燈的透光視窗8壽命到達盡頭,便必須以新的透光視窗進^ 置換,以便復原該燈的光發射強度。置換該透光視窗8需要 打破該燈的真空,並且需要數個人力工時,於該期間便無 法使用該燈。另外,於該置換循環中,該光源的輸出強度 會不斷地改變。每當置換該透光視窗時,便需要進行光強 度的校正作業。因此,於需要長期監視的應用中,此等燈 便會有使用上的困難(例如環境測量所使用的燈)。 【發明内容】 92980.doc •20- 1356439 本發明的開發係反映和先前技術相關的問題,而且其係 關於一種用來復原運用光學系統來傳遞透光、繞射、反射\ 頻譜生成以及干涉等效果且利用高光子能量光(例如慣用 的紫外光或真空紫外光)的各種裝置中的該等光學特性的 裝置與方法。明確地說,本發明的目的係防止或避免劣化 決定前述裝置之壽命的光㈣統,並且藉此來減低維修作 業(例如視窗置換)的頻率,並且降低此等作業的成本。All materials in the second vacuum zone 14 on Sr (ie, these good steels..., 0-rings and other sealing materials, optical components: 2: adjustment mechanism, and similar materials) should be oil-free (1 tone) The bright person itself should hardly emit any organic gas). ~ In the case of the semiconductor industry 'Because the processing size (the degree of circuit) is getting finer and finer, the wavelength of the exposure pattern used to fabricate the circuit = (4) the vacuum material. For example, for this: the wavelength of a denier argon excimer laser used as a light source is 193 ev when converted to energy, but in recent years, the development of laser stepper devices has been able to produce 157 nm. wavelength. In practice, however, it is difficult to avoid the emission of organic gases in the vacuum region 14, which may be caused by various factors, such as the 'defective dyeing of the sample of the mechanical transmission structure, the gas from which the gas rings out. The gas is released from the plastic parts, the degreasing or cleaning work of the parts is insufficient, or the 3 is dyed by the A & Therefore, in practical applications, it must be considered that organic gases are present in the aforementioned vacuum region. The organic gas in the vacuum region 14 has a specific probability of being absorbed on the outer surface 11 of the light-transmissive window 8 . This rate of absorption varies with the material (which includes/transmission of the type of organic gas such as the chimney and 6 hai), but the absorption itself is absolutely present in the image of 92980.doc 1356439 itself. When the organic gas is absorbed on the outer surface 11, the ultraviolet light (especially vacuum ultraviolet light) generated by the plasma will illuminate the organic gases, thereby directly exciting the organic gas molecules and promoting them to the active status. In this way, a reaction occurs which takes out hydrogen (in the dehydrogenation reaction, which is a constituent element of the organic gas), and finally the absorbed organic gas is converted into carbon (graphite). When this state is reached, it is no longer a gas, but a solid which itself adheres and accumulates on the outer surface u outside the light-transmitting window 8. Then, the carbon accumulation will absorb the new organic gas, and they will be converted into carbon after being irradiated by ultraviolet light (especially vacuum ultraviolet light), so that it will continue to grow. The outer surface U of the window 8 is covered by a carbon film. Since the carbon is black, it absorbs light of various wavelengths' and as the carbon continues to accumulate on the outer surface, the transmittance through the light transmissive window 8 becomes smaller and smaller. Here, for the convenience of explanation, we assume that the organic gases are hydrocarbon gases, and that the nitrogen removal reaction causes them to be converted into graphite. However, in practice, the organic gases T can include other elements than hydrocarbons. For example, oxygen, gas, iodine, fluorine, chlorine, etc., and like hydrocarbon gas, these organic gases can be absorbed on the outer surface 11 of the light-transmitting window 8, and then transmitted through ultraviolet light (especially vacuum ultraviolet light). The effect is converted and residual non-gas components. Therefore, strictly speaking, the growth part is not graphite, but an amorphous solid with carbon as its main component. For the purpose of illustrating the invention, the solid consisting essentially of carbon should be referred to as "carbon." The phenomenon of carbon growth requires the absorption of organic gases and the use of ultraviolet light (especially 92980.doc -12-1356439 vacuum ultraviolet light) to illuminate it. As the carbon continues to accumulate, the intensity of ultraviolet light (especially vacuum ultraviolet light) emitted from the outer surface 11 which already has carbon accumulation is significantly weakened. Carbon will continue to grow until all light intensity has disappeared. At this time, a new hydrogen removal reaction cannot occur, and the accumulation of the carbon film stops. Accordingly, this method is not a method in which the carbon film can be made indefinitely, and once the phenomenon is stopped, the film thickness of the limit is reached. It is understood that the phenomenon of carbon growth on the outer surface 11 of the light-transmitting window 8 does not proceed quickly. This problem is one of the problems caused by the smaller and smaller transmittance of the light-transmitting window 8 after a long period of time. In spectral imaging applications, when the amount of light from the source is reduced, it will drift, affecting the accuracy of the measurements, in applications involving surface treatment with ultraviolet light, due to weakened illumination. A problem arises when the relationship is insufficient. One way to solve the problem of carbon growth is to try to obtain an oil-free vacuum area. 14 However, once the organic matter has contaminated the vacuum area 14, the cleaning process is very difficult. Accordingly, conventional countermeasures for reducing the transmittance reduction caused by carbon accumulation on the outer surface of the light-transmitting window 8 involve removing the carbon by using a cleaning agent or a grinding process to restore the light-transmitting window 8 to its original state. Or completely replace the light-transmissive window 8. In the prior art, the light transmittance of the light-transmitting window 8 is reduced (i.e., deteriorated) as a determining factor for the life of the lamp. A lamp that has reached the end of its life will clean or replace its light-transmissive window 8, which requires breaking the vacuum zone 14 or the vacuum inside the lamp. This operation takes several hours, and the lamp cannot be used during this period. 0 92980.doc -13 - 1356439 Next, the conventional countermeasure for responding to the deterioration of the light transmission window due to carbon growth will be explained. The technique disclosed in Japanese Patent Application Laid-Open No. Hei. _ In this example, the source of light is a hydrogen lamp. When hydrogen gas is introduced into the 'discharge g', the halogen is sealed therein as the elemental-organic-based compound in which the square of the lamp is sealed. This means that an organic halogen substance has been introduced into the discharge region. Then, when the lamp is operated, the organic material decomposes and causes a lubricated material (mainly carbon) film to adhere to the inner protective wall of the discharge tube. The inner retaining wall functions as the light transmissive window, and adhering the material to its retaining wall results in a reduction in the amount of light generated. In the case of a countermeasure, the above-mentioned patent publication, the pre-shipment treatment of the lamps, forces a carbon film to adhere to the area as the light-transmitting window, where the carbon system is supposed to be during the operation of the lamp. The growth 'follows' will not cause any additional carbon growth during the normal operation of the lamp. This technology takes into account the fact that the generation of organic materials is limited and that this countermeasure can effectively create an environment in which no new growth occurs during the operation of the lamp. However, as explained above for the vacuum zone 14, if the device used must be open to the environment or vacuumed (for example, in a spectral imaging application where the sample must be replaced, the optical component must be adjusted. In the middle or during the surface treatment, the work piece must be replaced, etc., then the & ' specification requires no organic pollution during the assembly and adjustment process, but it is actually difficult to avoid such pollution, so It is not possible to use the tool of the plate treatment. The purpose of the plate treatment is not only different from the present invention, because the surface of the substrate must be under saturated conditions, so it is assumed that the water system is in a liquid state under the reaction conditions. Therefore, the method can only be used in an environment near near normal atmospheric pressure. Under vacuum conditions, it cannot perform optical 7L cleaning of light-transmissive windows and the like, and it does not solve the problem that must be broken when vacuum is broken. . Although the explanation so far is limited by the phenomenon occurring on the outer surface 11 of the light-transmitting window 8 but such a carbon growth phenomenon is not limited to the outer surface of the light-transmitting window 8. Usually, the phenomenon of carbon growth occurs on the surface of an object located in the vacuum region 14 which is illuminated by ultraviolet light (especially vacuum ultraviolet light) emitted from the light transmission window 8. As long as the conditions under which the organic gas appears and the conditions under which the ultraviolet light (especially the external light) occurs simultaneously, this phenomenon cannot be avoided. The "object" referred to in the explanation of the month includes the use of switching the spectroscopic application. a mirror of the light path; a filter; a condensing lens; and a diffractive element used in spectroscopic applications; a concentrating lens; and various filters and mirrors used in surface treatment applications, in other words, Any of a variety of optical components. In the following, any of these objects will be collectively referred to as "optical components". When carbon accumulates on the optical components, serious problems are caused by lowering the light transmittance and the light reflectance. In fact, it reduces or causes a total loss of functionality of the device used in the vacuum zone. In the past, in order to solve such light transmission and reflection degradation, it was necessary to replace it with a new photonic element. However, this method leads to very high maintenance costs, and the device cannot operate during the time when maintenance is necessary. The problem of lamp life caused by the deterioration of the light-transmitting window 8 is not limited. 92980.doc • 16-1356439 The microwave-excited hydrogen ultraviolet lamp described in the above example has the same problem in the following lamps: use Lamps of He, Ne, Ar, Kr, Xe, 02, N2, D2 (heavy molecule), Hg, etc. use high frequency discharge, arc discharge, glow discharge, inductive barrier discharge, or flash discharge in their discharge mode A lamp or a halogen or carbon lamp that uses a current to heat the filament as a light-emitting method. Problems of deterioration of optical characteristics in an optical system The problem of reduction in light transmission characteristics of short-wavelength ultraviolet light is not limited to deterioration of optical characteristics outside the light-transmitting window, and deterioration of optical characteristics in the light-transmitting window. In recent years, in order to obtain a preferable light transmission property of short-wavelength ultraviolet light, it has been developed to use Si〇2 as the aforementioned light-transmitting window. In addition, the problem of mercury vapor lamps, which use quartz glass internally and lose clarity, is more serious than before. The function of quartz glass in a mercury vapor lamp is used as the vacuum boundary inside the lamp, and can also be used to transmit the ultraviolet light generated by the mercury light, but the loss of sharpness deteriorates the light transmission property, and A factor that determines the life of a lamp. For example, in the patent application No. Hei 5_325893 (patent=opening 4), it is proposed to use a light-emitting tube as a metal vapor discharge arc tube to solve the problem of losing clarity, which adopts a surface grain size at The rough inner surface of the glass bulb below 丄 micron. This will prevent the crystallization of the arc tube (loss of clarity), even if it has been operating for a long time - the same time, thus preventing the luminous flux (illuminance maintenance rate) from falling, making the shadow type display a long time It can still maintain bright images and words. Quality display effect. ° 929S0.doc •17· 1356439 This technology has been applied to quartz glass or kaolinite glass used in arc tubes, and although it can also be applied to conventional UV-light applications in the 250-360 nm wavelength range. However, the reduction of the transmittance of quartz glass used for vacuum ultraviolet light at a wavelength of 190 nm is remarkable. Further, in the Japanese Patent Application Laid-Open No. Hei 3-77258 (Patent Publication No. 6), a technique for a 254 nm ultraviolet normal pressure mercury vapor lamp is disclosed, in which the inner surface of the synthetic quartz glass is coated with 1 to A solution of 3% of metal oxide particles (having an average particle diameter of 1 μm or less, which in these examples consists of a metal oxide having an average particle diameter of 20 / im). Further, in Japanese Patent Application Laid-Open No. Hei 8-2 12976 (Patent Publication No. 7), an arc tube (which is composed of a quartz glass tube which is sealed with mercury inside each end) is disclosed. a discharge lamp sealed with a plurality of electrodes, and a thin film coating composed of ai2o3 is used inside the tube, wherein the film is thicker than other regions at the inner surface of the arc tube near the center of the tube, The thick film region on the inner surface of the arc tube is 1/3 to 1/2 of the length of the effective light emission length (the distance between the electrodes on either end of the arc tube), and the thick film is as described above. The film thickness in the region ranges from 〇_2 μιη to 0.3 μηη, while the film thickness in other regions ranges from 0.1 #111 to 〇15 μιη. However, this prior art is related to quartz glass (especially for low-pressure mercury discharge; quartz glass in k), and it adjusts the thickness of the barrier film in which the mercury molecules are located, as the treated mercury is deposited on the inner wall of the arc tube. The method of lowering the transmittance of the quartz glass and causing the discharge lamp to become dark (which further reduces its irradiation efficiency). 92980.doc -18- 1356439 Furthermore, the lower limit of Si〇2 which transmits good light transmittance is about 2 〇〇 nm, and the shorter the wavelength of vacuum ultraviolet light (wavelength is less than 200 nm), the more obvious the light transmittance decreases. Furthermore, by using extremely short wavelengths of vacuum ultraviolet light near 150 nm (for example, wavelengths used for high-energy fluorine lasers), not only the aforementioned decrease in light transmittance occurs, but the material cannot be used in this application, and Will lose its clarity. In addition, in view of the fact that the transmittance of the synthetic shisha glass is significantly reduced in the range of ultraviolet light passing through the window material for illuminating the light, the patent application No. Hei 8-315771 (patent In publication 5), a fluorine-doped technique is disclosed for synthetic alumina glass, the goal of which is to improve the operational life. However, the use of a fluorine compound to dope the alumina glass base precursor allows a transmission range of only about 5% in the wavelength range of 160-190 nm, and it is not used in the low wavelength of vacuum ultraviolet light. Accordingly, an alkaline earth metal halide material (e.g., CaFy LiF, MgF2, etc.) is generally regarded as a light transmission window precursor when it is necessary to pass ultraviolet light in a vacuum ultraviolet range. A convenient example in the prior art is the aforementioned microwave excited hydrogen ultraviolet lamp, which produces vacuum ultraviolet light at a wavelength of 122 nm. The only known materials that can be used as the light-transmitting window are CaFz, LiF, and MgF2. Since the light transmittance of LiF and CaF2 is significantly reduced from the center of the color, the most commonly used is MgF2. However, no report has revealed a solution to the loss of clarity. That is, when magnesium fluoride is used as the material for the light-transmissive window, the life of the window of the 9280.doc -19-1356439 window is lower than that of other window materials, and compared with lamps using other window materials. Its life expectancy is only about half or less. When light having an S sub-energy higher than an absorption wavelength of a material used in the light-transmitting window 8 (especially light in vacuum ultraviolet light) is used, when light originating from the discharge electropolymer is irradiated on the light-transmitting window 8 At this time, the view f8 will have defects, resulting in a so-called color center, which will reduce the light transmittance. This phenomenon is a common phenomenon of CaF2, LiF, MgF2, and other soiled metallographic materials, and is caused by a slight shift of the fluorine atom from its correct position in the crystal lattice. Further, all of the above-mentioned conventional techniques have been solved in connection with the problem of synthetic quartz, in particular, a synthetic quartz optical system using conventional wavelength ultraviolet light as a light source. No one has proposed a practical technique to effectively prevent the problem of light transmittance passing through MgF2. The material used in the light transmission window used for the 122 nm wavelength vacuum ultraviolet light generated by the MgF2 microwave excited hydrogen ultraviolet lamp. Due to this situation, when the transmittance is lowered, the only solution is to replace the light transmission window. In the prior art, the above-described light transmission window 8 is subject to the determinant of the life of the deteriorated lamp. In this prior art, once the life of the light transmissive window 8 of the lamp reaches its end, it must be replaced with a new light transmission window to restore the light emission intensity of the lamp. Replacing the light transmissive window 8 requires breaking the vacuum of the lamp and requires several individual labor hours during which the lamp cannot be used. In addition, the output intensity of the light source is constantly changing during the replacement cycle. Whenever the light transmission window is replaced, the light intensity correction operation is required. Therefore, in applications that require long-term monitoring, these lamps have difficulties in use (such as those used in environmental measurements). SUMMARY OF THE INVENTION 92980.doc • 20-1356439 The development of the present invention reflects problems associated with prior art, and relates to a method for recovering optical systems for transmitting light transmission, diffraction, reflection, spectrum generation, interference, and the like. Apparatus and methods for effecting and utilizing such optical characteristics in various devices of high photon energy light, such as conventional ultraviolet light or vacuum ultraviolet light. In particular, it is an object of the present invention to prevent or avoid degradation of the light (4) system that determines the life of the aforementioned devices, and thereby reduce the frequency of maintenance operations (e.g., window replacement) and reduce the cost of such operations.

更明確地說,根據本發明第一較佳具體實施例,該目的 係提供一種防止或抑制該等光學系統遭到劣化的裝置及供 其使用的方法,從而減㈣修作業⑽如該等光學系統的置 換)的頻率,並且降低此等作業的成本,其方式係防止或抑 制碳累積在光學系統(例如位於透光視窗8外面的光學系統) 之表面上(舉例來說,累積於圖14所示之透光視窗8的外表 面Π之上)。 本發明的額外目的係藉由防止或抑制碳累積在位於真空More specifically, in accordance with a first preferred embodiment of the present invention, the object is to provide a device for preventing or suppressing degradation of such optical systems and a method for use thereof, thereby reducing (4) repair operations (10) such as such optics The frequency of the replacement of the system, and reduces the cost of such operations by preventing or inhibiting the accumulation of carbon on the surface of the optical system (e.g., the optical system located outside of the light transmissive window 8) (for example, accumulated in Figure 14) The outer surface of the light transmissive window 8 is shown above). An additional object of the present invention is to prevent or inhibit carbon build-up in a vacuum

區域中光路徑^光學元件之被照射表面及I光表面之 上使其可延長光學儀器的壽命,並且改良該些裝置的可 靠度。 义另外,根據本發明第二較佳具體實施例,於反映上面先 月J技術中所述的問題之後,該目的係在使用透光繞射、 反射、頻瑨以及干涉等組合效果的各種裝置中提供一種光 干系統及供其使用的方法,其係位於高光子能量光源(例如 電漿光及真空紫外光)的光路徑中。該光學系統可抑制該光 學儀器(例如前述的透鏡、視窗、干涉薄膜、稜鏡、主光罩、 92980.doc -21 · 1356439The light path in the area ^ the illuminated surface of the optical element and the I-light surface make it possible to extend the life of the optical instrument and improve the reliability of the devices. In addition, according to the second preferred embodiment of the present invention, after reflecting the problems described in the prior art, the object is in various devices using a combined effect of light transmission diffraction, reflection, frequency, and interference. A light drying system and method for use therefor are provided in a light path of a high photon energy source such as plasma light and vacuum ultraviolet light. The optical system can suppress the optical instrument (for example, the aforementioned lens, window, interference film, cymbal, main mask, 92980.doc -21 · 1356439

反射面鏡及類*|>扭V蓋WW 貝似的先干儀益,所有該等儀器皆係位於透 光視固8的内部’舉例來說,位於圖14所示之透光視窗8的 内表面10之上)遭到劣化,從而可在時間流逝後仍能維持穩 疋且極同的光輪出強度,並且利用各種光學系統來延長裝 置的寿命。 [第一較佳具體實施例] 為解決上述的問題,本案發明人繼續研究下面路線。 首先,於第一較佳具體實施例中,會詳細地分析透光視 囪8外面面向真空區域丨4處(例如外表面11)所發生的劣化情 形。實驗中所採用的裝置係圖14所示的裝置,其中透光視 窗8係透過形環13被附著至凸緣17的電㈣露側。該分 析係在透光視窗8的外表S11上進行,也就是,面向真空區 域14的表面,其為發出紫外光的表面。因為於相反側的内 表面10之上並未發現任何沉積物,所以,並不會於該表面 上進行任何詳細分析β 氟化鎂(MgF2)單晶係習用的透光視窗8材料,而且該晶軸 (c軸)會垂直該透射視窗的表面。晶體尺寸為英吋中Η扭瓜 厚。該晶體係Ohyo Koken Kogyo Co.,Ltd.所製造的uv等級 產物。可從同一批中取得數個此種晶體,而且該等所運用 的晶體的晶體品質及其表面條件皆一致。於該燈中使用該 4曰a體之後便可對該等晶體進行分析,而且會盡一切努力 來消除因該批内的任何變化所造成的任何錯誤誘發因素。 於該實驗中,第一項工作係使用光學顯微鏡在中心φ8 mm 區域(紫外光已經穿透該區)中來觀察透光視窗8的外表面 92980.doc -22- 1356439 11 ’以便觀察可能黏著的任何膜狀材料。接著,使用塑膠 鑛子到除任何的黏著材料,此時便會發現有一薄弱的材料 黏著膜黏著於外表面丨丨之上。 接著’便對該黏著材料實施元素分析。ΕΡΜΑ(電子探測X 射線顯微分析器)可用來對透光視窗8的外表面丨丨實施元素 分析。(分析條件:加速電壓丨5 kv,照射電流5Ε_8Α,測量 方法:定性分析、有限分析、映對分析。) 經過ΕΡΜΑ分析之後吾人發現,在該中心φ8 mm(紫外光 已經穿透該區)上會偵測到大量的碳。紫外光已經穿透之圓 形中心Φ 8 mm區域外面的甜甜圈形狀區會落在凸緣17的陰 影中,而且該區不會有任何紫外光穿透,不過,於該甜甜 圈形狀區中則會偵測到碳的污染位準。此Ερμα分析中的 「污染位準」所指的係即使在分析一已粗略清潔表面時仍 會產生的微弱的碳偵測信號。因此,無法避免發生會產生此 等仏號的碳黏著現象。據此,ΕΡΜΑ分析在碳方面的測量極 限會取決於該分析裝置的碳污染位準。當源自該中心φ 8 mm 區域的碳信-號位準與該污染信號位準作比較後,吾人發現 前者明顯較高,其證實在透光視窗的外表面丨丨之上出現了 膜狀的碳累積物。 如前面所述,參考圖14。所示的裝置,該碳增長的機制涉 及有機氣體存在於真空區域14中’而且當該些有機氣體於 s玄透光視έι 8之外表面11上被吸收時,然後當真空紫外光穿 透透光視窗8時,該等有機氣體便會進行除氫反應,將其轉 換成碳,其會累積於外表面11上。 92980.doc •23- 1356439 當於上述環境中繼續使用透光視窗8時,碳亦會繼續累 積▲,隨著時間流逝,其便會降低透光率。據此,和其初始 狀態相比’因為透光視窗8的透射率已經變小,所以,明顯 地需要有特定機制從外表面W移除此累積碳。因為吾人 發現外表面U上的膜狀碳累積物係劣化該透光視窗的主要 原因,所以,本案發明人便繼續研究對策,其便推演出下 文所述之本發明的完整結果。Reflective mirrors and class *|>Twisted V-cover WW-like first-hand instrument, all of these instruments are located inside the light-transmissive viewing frame 8 'For example, in the light-transmitting window 8 shown in Figure 14 The inner surface 10 is degraded so that it can maintain a stable and very similar light wheeling intensity after the passage of time, and utilizes various optical systems to extend the life of the device. [First Preferred Embodiment] In order to solve the above problems, the inventors of the present invention continued to study the following route. First, in the first preferred embodiment, the deterioration of the outer surface of the light-transmissive chamber 8 facing the vacuum region 丨 4 (e.g., the outer surface 11) will be analyzed in detail. The apparatus used in the experiment was the apparatus shown in Fig. 14, in which the light-transmitting window 8 was attached to the electric (four) exposed side of the flange 17 through the shaped ring 13. The analysis is performed on the outer surface S11 of the light-transmitting window 8, that is, the surface facing the vacuum region 14, which is a surface that emits ultraviolet light. Since no deposit is found on the inner surface 10 on the opposite side, no detailed analysis of the light transmissive window 8 material conventionally used for the beta magnesium fluoride (MgF2) single crystal system is performed on the surface, and The crystal axis (c-axis) is perpendicular to the surface of the transmission window. The crystal size is thick and thick in the inch. The uv grade product manufactured by the crystal system Ohyo Koken Kogyo Co., Ltd. Several such crystals can be obtained from the same batch, and the crystal quality and surface conditions of the crystals used are the same. The crystals can be analyzed after the 4 曰a body is used in the lamp, and every effort is made to eliminate any erroneous predisposing factors caused by any changes in the batch. In this experiment, the first work was to observe the outer surface of the light-transmissive window 8 92980.doc -22- 1356439 11 ' using an optical microscope in the center φ8 mm area (the ultraviolet light has penetrated the area) to observe the possible adhesion. Any membranous material. Next, using plastic ore to remove any adhesive material, a weak material is adhered to the outer surface of the crucible. Then, an elemental analysis is performed on the adhesive material. ΕΡΜΑ (Electron Detection X-Ray Microanalyzer) can be used to perform elemental analysis on the outer surface of the light-transmitting window 8 . (Analytical conditions: accelerating voltage 丨5 kv, irradiation current 5Ε_8Α, measurement method: qualitative analysis, finite analysis, reflection analysis.) After the ΕΡΜΑ analysis, we found that the center is φ8 mm (the ultraviolet light has penetrated the area) A lot of carbon will be detected. The donut-shaped area outside the Φ 8 mm area where the ultraviolet light has penetrated will fall in the shadow of the flange 17, and the area will not have any ultraviolet light penetration, but in the shape of the doughnut Carbon contamination levels are detected in the zone. The "pollution level" in this Ερμα analysis refers to a weak carbon detection signal that is generated even when analyzing a roughly clean surface. Therefore, carbon sticking that would cause such an nickname cannot be avoided. Accordingly, the measurement limit for carbon in the enthalpy analysis will depend on the carbon contamination level of the analytical device. When the carbon signal-number from the center of the φ 8 mm area is compared with the level of the pollution signal, we find that the former is significantly higher, which confirms that a film is present on the outer surface of the light-transmitting window. Carbon accumulation. As described above, reference is made to FIG. In the illustrated apparatus, the mechanism of carbon growth involves the presence of organic gases in the vacuum region 14 and when the organic gases are absorbed on the surface 11 outside the smectic light, then the vacuum ultraviolet light penetrates. When the light is transmitted through the window 8, the organic gases are subjected to a hydrogen removal reaction, which is converted into carbon, which accumulates on the outer surface 11. 92980.doc •23- 1356439 When the light-transmissive window 8 continues to be used in the above environment, the carbon will continue to accumulate ▲, which will reduce the light transmittance as time passes. Accordingly, since the transmittance of the light-transmitting window 8 has become smaller as compared with its initial state, it is apparent that a specific mechanism is required to remove the accumulated carbon from the outer surface W. Since we have found that the membranous carbon accumulation on the outer surface U is the main cause of deterioration of the light transmission window, the inventors of the present invention continue to study countermeasures, which in turn derives the complete result of the present invention as described below.

本案發明人經實驗證實下文所述之解決該項問題的方 式。該碳的原料係該等有機氣體,不過,實際上並益法完 全將其消除。另外,如果未被真空紫外光照射到的話,那 麼便不會發生任何的除氫反應,那麼該裝置便無法實現盆 作為發光裝置的功能。該等碳沉積物的位置會確切地匹配 該真空紫外光穿過以進行照射的位置。該真空紫外光會直 接激發該等有機氣體,迫使發生除氫反應,不過此高光子 能量並不僅激發有機氣體,還有許多種類的分子能夠㈣ 發’並且進入活性狀態。The inventor of the present invention has experimentally confirmed the solution to the problem described below. The carbon raw material is the organic gas, but it is virtually eliminated by the beneficial method. In addition, if it is not irradiated by vacuum ultraviolet light, then no hydrogen removal reaction will occur, and the device will not function as a light-emitting device. The location of the carbon deposits will exactly match where the vacuum ultraviolet light passes to illuminate. The vacuum ultraviolet light directly excites the organic gases, forcing a hydrogen removal reaction, but this high photon energy not only excites the organic gas, but also many kinds of molecules can (4) emit and enter an active state.

參考圖1作為範例’本範例中的光輸出裝置係一 122細波 長的真空紫外光輸出,其㈣㈣氫氣紐射法,而且此 真空紫外光的光子能量為1G.2e^此位準的光子能量將會 激發氧氣、h2〇氣體(蒸氣),並且能夠產生具有強烈氧化能 力,基團。維持真空區域14的原因係因為大氣中的氧氣、 二氧化碳、水蒸氣以及其它成份會吸收該真空紫外光^並 =弱其強度。據此,便要利用—真空幫浦來消除該吸收 "免(即大氣成份),以便產生真空區域14。 92980.doc -24- 1356439 然而,即使該些係大氣成份,因為其含有〇2、水蒸氣及 類似成份,所以吾人發現,適當地降低其濃度(減低其壓 力)’便可產生具有氧化能力的基團,而不會大幅地減弱該 真空紫外光。當該光輸出裝置運作於經濃度調整之大氣成 份共存的條件下而且當設計出後級真空區域14時,便可移 除透光視窗8之外表面11上的碳黏著物。另外,可以移除黏 著於真空區域14内所有光學元件表面上的碳。可以依此方 式來移除碳的原因係,碳黏著於透光視窗8之外表面丨丨上的 同時,該等基團亦會進行碳分解及移除作業,而且該等基 團分解及移除碳的速率超過碳的形成速率。 因為利用基團來對碳進行分解反應會將碳轉換成揮發性 分子,例如二氧化碳及水蒸氣,所以可以利用真空幫浦迅 速地從該系統中移除該些分子。於此情況中所產生的基團 係藉由激發氧分子所產生的元素氧及臭氧,以及經由激發 水蒸氣所產生的OH基團等。 再者’當該光輸出裝置在該些經濃度調整之大氣成份存 在時進行運作且當有預先存在的碳沉積於透光視窗8的外 表面11之上時,該碳便會逐漸地分解及移除,最後,便可 完全移除所有的碳並且將透光視窗8復原成原來的透光速 率。接著’該光輸出裝置便會利用已經有碳累積的光學元 件進行運作’而不必操作後級真空區域功能,並且可從已 經位於真空區域14中的該些光學元件的表面中移除碳。 據此’利用本發明的發現,便可避免劣化光輸出裝置的 透射視窗’使得該光輸出裝置所產生的光強度不會減弱, 92980.doc •25· 1356439 光的吸收函數目標以及不會妨礙作業的分壓。明確地說, 如果係氧氣的話,基本上該上限便應該係10mt〇rr(2()mt〇rr 以下)。假使超過分壓位準,那麼氧氣對該真空紫外光的吸 收率便會抵遠無法忽略的位置,其便會開始阻礙真空區域 14的功能性目標。然而,假使穿過真空區域14的光路徑長 度非常短的話,那麼便可忽略較高上限處之氧氣濃度的效 應。該上限值的精確設定可能係取決於以特定氣體分壓來 填充該真空區域14並且檢查是否阻礙該等功能性目標。明 確地說,可檢查真空紫外光的衰減程度來測量真空紫外光 的量。 氣體分壓的下限應該設在即將使用之負載的處理能力以 上。此處的「負載」所指的係碳累積於透光視窗8之外表面 11上的速率,其係取決於現存的有機氣體的種類及濃度, 以及穿過透光視窗8之真空紫外光9的強度。「處理能力」所 指的係藉由該真空紫外光激發該氣體所產生之該等基團能 夠分解及移除碳的速率。 本案發明人所實施的實驗涵蓋真空區域14的各種情況, 其中部份情況係未知的,舉例來說,於利用慣用加速分子 幫浦及乾式幫浦排氣系統所產生的真空區域14的情況中, 氧氣的下限約為㈣至mtG1T。如果存在此程度的氧氣 Ί麼針對該負載’其將呈現出足夠的處理能力。 水蒸氣可提供遠高於氧氣的處理能力,而且其實際下限應 該在0.005至〇·〇ι mtorr等級。 為精確設定此下限,可以利用氧來填充實際使用的真空 92980.doc -27- 1356439 系充’其特徵為至少會於該光學系統之光照射側(内側)上形 成一膜厚度為2-20 nm的保護膜,以防止該等氟原子從該光 學系統的表面剩離。 現在將解釋本發明與專利公開案4之間的差異◎專利公開 案4係關於於其弧光管内密封著水銀的水銀放電燈。該項技 術可藉由一 0.1私111至0.15 //111的鋁質保護膜等來防止水銀附 著於該弧形管的内護壁之上。 相反地,本發明則係關於真空紫外光範圍,其中會在被 真空紫外光照射的表面上塗敷一2 nm_2〇 11111的超薄膜,用 以防止氟剝離,此現象係用來替換該塗層於光學特性中所 造成的初始劣化情形。 將膜厚度限制在20 nm以下的原因係,如果更厚的話,其 便會吸收該真空紫外光,使其無法維持其作為光學元件的 功能。 2 n m以上的下限係因為必須確保均勻地覆蓋該晶體表面 上的保護膜。因為8丨02或人1203、Mg0、Ti〇2或Zr〇2的分子 直徑約為1-nm,所以如果該塗層的厚度未達至少2個分子的 話,其便無法於該晶體表面上提供一均勻的保護膜,以達 成本發明的功能。 當該膜厚度足夠的話,雖然目標係保護該光學系統的表 面,不過,因為金屬氧化物(例如81〇2或au〇3、Mg〇、Ti〇2、Referring to FIG. 1 as an example, the light output device in this example is a 122-wavelength vacuum ultraviolet light output, (4) (4) hydrogen injection method, and the photon energy of the vacuum ultraviolet light is 1 G. 2 e ^ photon energy of this level It will excite oxygen, h2 helium gas (vapor), and can produce groups with strong oxidizing power. The reason for maintaining the vacuum region 14 is because atmospheric oxygen, carbon dioxide, water vapor, and other components absorb the vacuum ultraviolet light and weaken its strength. Accordingly, a vacuum pump is used to eliminate the absorption "free (i.e., atmospheric composition) to create a vacuum region 14. 92980.doc -24- 1356439 However, even if these are atmospheric components, because they contain 〇2, water vapor and similar ingredients, we have found that appropriately reducing their concentration (reducing the pressure) can produce oxidative capacity. The group does not substantially weaken the vacuum ultraviolet light. When the light output device operates under the condition that the concentration-adjusted atmospheric components coexist and when the rear-stage vacuum region 14 is designed, the carbon adherend on the outer surface 11 of the light-transmitting window 8 can be removed. Additionally, carbon adhering to the surface of all of the optical components within the vacuum region 14 can be removed. The reason why carbon can be removed in this way is that while the carbon adheres to the surface of the light-transmissive window 8, the groups also undergo carbon decomposition and removal operations, and the groups are decomposed and removed. The rate of carbon removal exceeds the rate of carbon formation. Since the decomposition of carbon by a group converts carbon into volatile molecules such as carbon dioxide and water vapor, the vacuum pump can be used to quickly remove the molecules from the system. The group produced in this case is an elemental oxygen and ozone generated by exciting oxygen molecules, an OH group generated by exciting water vapor, and the like. Further, when the light output device operates in the presence of the concentration-adjusted atmospheric components and when pre-existing carbon is deposited on the outer surface 11 of the light-transmitting window 8, the carbon is gradually decomposed and Remove, and finally, all of the carbon is completely removed and the light transmissive window 8 is restored to its original transmission rate. The light output device then operates with optical elements that already have carbon accumulation without having to operate the post vacuum region function and remove carbon from the surfaces of the optical components that have been located in the vacuum region 14. According to the discovery of the present invention, it is possible to avoid deteriorating the transmission window of the light output device, so that the light intensity generated by the light output device is not weakened, and the absorption function of the light does not hinder the target. The partial pressure of the job. Specifically, if oxygen is present, basically the upper limit should be 10 mt rr (2 () mt 〇 rr or less). If the partial pressure level is exceeded, the oxygen absorption of the vacuum ultraviolet light will reach a position that cannot be ignored, and it will begin to impede the functional target of the vacuum region 14. However, if the length of the light path through the vacuum region 14 is very short, then the effect of the oxygen concentration at the upper limit can be ignored. The precise setting of this upper limit may depend on filling the vacuum zone 14 with a particular gas partial pressure and checking if these functional targets are obstructed. To be sure, the degree of vacuum ultraviolet light can be checked to check the amount of vacuum ultraviolet light. The lower limit of the gas partial pressure should be set above the processing capacity of the load to be used. Here, the "load" refers to the rate at which the carbon accumulates on the outer surface 11 of the light-transmitting window 8, depending on the type and concentration of the existing organic gas, and the vacuum ultraviolet light passing through the light-transmitting window 8 Strength of. "Processing power" refers to the rate at which the groups generated by the vacuum ultraviolet light excitation of the gas can decompose and remove carbon. The experiments carried out by the inventors of the present invention cover various situations of the vacuum region 14, some of which are unknown, for example, in the case of utilizing the vacuum region 14 produced by the conventional accelerated molecular pump and the dry pump exhaust system. The lower limit of oxygen is about (4) to mtG1T. If there is this level of oxygen, it will exhibit sufficient processing power for this load. Water vapor can provide much higher processing capacity than oxygen, and its actual lower limit should be in the order of 0.005 to 〇·〇ιtorr. In order to accurately set this lower limit, oxygen can be used to fill the vacuum actually used. 92980.doc -27-1356439 is characterized in that at least a film thickness of 2-20 is formed on the light irradiation side (inside) of the optical system. A protective film of nm prevents the fluorine atoms from remaining from the surface of the optical system. The difference between the present invention and Patent Publication 4 will now be explained. ◎ Patent Publication 4 relates to a mercury discharge lamp in which mercury is sealed in an arc tube. This technique prevents mercury from adhering to the inner wall of the curved tube by a 0.1 private 111 to 0.15 //111 aluminum protective film or the like. On the contrary, the present invention relates to a vacuum ultraviolet light range in which an ultra-thin film of 2 nm 2 〇 11111 is coated on a surface irradiated with vacuum ultraviolet light to prevent fluorine peeling, which is used to replace the coating layer. The initial degradation caused by optical characteristics. The reason for limiting the film thickness to 20 nm or less is that if it is thicker, it absorbs the vacuum ultraviolet light, making it impossible to maintain its function as an optical element. The lower limit of 2 n m or more is because it is necessary to ensure uniform coverage of the protective film on the surface of the crystal. Since 8丨02 or human 1203, Mg0, Ti〇2 or Zr〇2 has a molecular diameter of about 1-nm, if the thickness of the coating is less than at least 2 molecules, it cannot be provided on the surface of the crystal. A uniform protective film to achieve the function of the present invention. When the film thickness is sufficient, although the target is to protect the surface of the optical system, however, because of metal oxides (e.g., 81 〇 2 or au 〇 3, Mg 〇, Ti 〇 2

Zr〇2)並非係讓真空紫外光穿過的固有材料,所以,存在此 等保護膜會使得於該膜内吸收該真空紫外光,並且如圖13 所示般地減弱穿過抵達基底材料的紫外光的量。於2〇nm厚 92980.doc •33· 1356439 處,透射率僅為無任何膜時之透射率的1〇%。不㈣% 的初始透射率會大量地劣化該基底材料的光學特性’而且 於該劣化程度處,其亦無法作為一光學系統,而且可能备 有吸收該紫外光而劣化該保護膜本身之虞,並且會有因= 度而造成其從該光料統的表面剝離或是造成其它損壞: 虞。據此,12nm以下(較佳的係,1〇nm以下)的厚度將會 維持該基本母體之光料㈣避鄉m卩使在最糟 的情況中,仍能維持10%以上的光學特性。據此,因心 外光吸收的關係’吾人預期超過2Gnm的膜厚度可能無法提 供該光學系統預期的功能。 此外’鎖發生氧化時,該等氟原子會同時剥離,所以, 較佳的係至少於該光學系統的光照射側(内側)之上形成一 膜厚度為2-20 nm(較佳的係2·12 nm,更隹的係2 ι〇㈣, 由Si〇2或金屬氧化物所組成的保護臈,以防止該等氟原子 從該光學糸統之表面剝離。 矛J用本建4,便可同時抑制氟原子剝離且抑制該等前述 光學系.统表面發生氧化,從而避免該等光學系统的透光率 劣化。 有各種氣相的成長方法(例如蒸氣沉積法、離子電鍍法、 CVD法以及類似的方法)能夠用來形成該薄膜保護膜,不過 特佳的膜形成法則係離子束濺鍍法及電漿CVD法,因為此 等方法能夠沿著該等光學系統之研磨處理所產生的凹窩與 凸部產生非常均勻的膜厚度。 本發明的第一項建議係關於包含氣化物化合物的光學系 92980.doc -34- 1356439 統,其具有複數個表面面向且裸露至安裝於一光學儀器(其 具有一電漿所在的内部區)内的電漿,其中會於裸露至該電 漿的該氟化物化合物的表面上形成一由高抗電漿材料所組 成的2 nm-20 nm的保護膜。 此建議可透過抑制氟原子剝離或抑制前述光學系統表面 發生氧化來抑制該光學系統的透光率減低,否則便會因該 電漿環境而造成透光率劣化。Zr〇2) is not an intrinsic material that allows vacuum ultraviolet light to pass through, so the presence of such protective films causes the vacuum ultraviolet light to be absorbed within the film and weakens through the substrate material as shown in FIG. The amount of ultraviolet light. At 2 〇 nm thickness 92980.doc • 33· 1356439, the transmittance is only 1% of the transmittance without any film. The initial transmittance of not (4)% greatly degrades the optical characteristics of the base material' and at the extent of the deterioration, it cannot be used as an optical system, and may be provided by absorbing the ultraviolet light to deteriorate the protective film itself. And it may cause it to peel off from the surface of the light system or cause other damage due to the degree: 虞. Accordingly, the thickness of 12 nm or less (preferably, less than 1 nm) will maintain the light of the basic precursor (4), so that in the worst case, the optical characteristics of 10% or more can be maintained. Accordingly, due to the relationship of absorption of infrared light, it is expected that a film thickness exceeding 2 Gnm may not provide the intended function of the optical system. Further, when the lock is oxidized, the fluorine atoms are simultaneously peeled off. Therefore, it is preferred to form a film thickness of 2-20 nm at least on the light-irradiating side (inner side) of the optical system (preferably 2 · 12 nm, more awkward system 2 ι〇 (4), a protective layer consisting of Si〇2 or a metal oxide to prevent the fluorine atoms from being peeled off from the surface of the optical system. Simultaneously suppressing fluorine atom peeling and suppressing oxidation of the surface of the aforementioned optical system to avoid deterioration of light transmittance of the optical systems. Various gas phase growth methods (for example, vapor deposition method, ion plating method, CVD method) And a similar method) can be used to form the thin film protective film, but the preferred film forming method is ion beam sputtering and plasma CVD, because these methods can be produced along the grinding process of the optical systems. The dimples and projections produce a very uniform film thickness. The first suggestion of the present invention relates to an optical system containing a vapor compound, 92980.doc - 34-1356439, having a plurality of surface faces and exposed to an optical instrument a plasma in the inner region where the plasma is located, wherein a 2 nm to 20 nm protection consisting of a highly plasma resistant material is formed on the surface of the fluoride compound exposed to the plasma. This proposal can suppress the decrease of the light transmittance of the optical system by suppressing the peeling of the fluorine atoms or suppressing the oxidation of the surface of the optical system, or the light transmittance may be deteriorated due to the plasma environment.

於此情況中,前述的保護膜可能係任何的金屬氧化物, 例如si〇d Al2〇3、Mg0、Ti〇2、Zr〇2,其和上述的保護膜 相同藉由於該光學系統上形成該前述的保護膜,其中該 光學系統係由單晶氟化物材料所組成,其晶轴係沿著 該光照射的方向’而㈣保護臈的垂直表面係塗佈著抓 或金屬氧化物’那麼便可防止隨著該基本母體時間的流逝 因為真空紫外光照射而遭到劣化,其係以前述氟化物光學 糸統因該塗層而造成初始劣化作為取捨。In this case, the foregoing protective film may be any metal oxide such as si〇d Al2〇3, Mg0, Ti〇2, Zr〇2, which is the same as the above protective film by forming the optical system The foregoing protective film, wherein the optical system is composed of a single crystal fluoride material, the crystal axis of which is along the direction in which the light is irradiated, and (4) the vertical surface of the protective crucible is coated with a scratch or metal oxide. It is possible to prevent deterioration due to vacuum ultraviolet light irradiation as the basic matrix time elapses, which is a trade-off due to the initial deterioration of the fluoride optical system due to the coating.

此外,相較於該等氟化物化合物,因為上述金屬氧化$ 中的叫或.其它金屬氧化物具有較高的抗電漿性,所以』 便可防止氟剝離或抑制金屬原子氧化,而且因為本身為聋 化物,因此,當作為由氟化物材料所製成之光學系統射 =,於其遭到初始劣化之後,便可防止隨著母體的. “逝而遭到進一步劣化’否則便會因真空紫外光的” 而造成劣化。 I & π…、^ 本發月的第二項建議賴於_種制該等元件的方^ 其會使用該等前述光學“的該等光學特性,而且其; 92980.doc -35- 1356439 為事先於一光學系統上塗敷一由金屬氧化物(其係從Si〇2 或 Al2〇3、MgO、Ti02、Zr〇2 中所選出)所組成之 2nm-20nm 的保護膜’其中該膜會抑制因真空紫外光長時間的照射或 是對該基本母體進行電漿裸露而使得一結構元素從該基本 母體的表面剝離或是於該基本母體的表面發生氧化;以及 將該光學系統併入一具有真空紫外光源或電漿光源(其光 子此1南於該光學系統之基本母體的吸收波長)的預期元 件中。 根據本發明,因前述金屬氧化物保護膜造成特性的初始 劣化之後’藉由此膜便可抑制因真空紫外光的照射或是裸 露於電聚中造成複數個元素從該基本母體剝離或是於該基 本母體的表面發生氧化所導致的光學系統的基本母體隨著 日可間而遭到劣化的情形,其意謂著,於運作首次啟動之後, 該基本母體的光學輸出將不會進一步地減弱,如此便可延 長該等前述光輸出元件之反射面鏡的透光視窗的壽命。如 此作法亦可延長該等透光視窗或反射面鏡之置換維修間的 間隔’從而改良該等光輸出元件的運作速率,並且減低其 運作成本。 於此It况中,僅需要使用一會提供足夠光輸出的光源作 為構件來補償因前述保護膜而造成該光學系統的初始劣化 凊形’使其能夠延長該元件的壽命,從而不會造成整個系 統的透光率下降(透射率、反射率)。 —就疋田該光學系統事先塗佈前述的保護膜以抑制隨 考%間流逝因真空紫外光的照射或是裸露於電蒙中而造成 92980.doc -36- 1356439 其會隨㈣^a料錢數個元素從以本 母體剝離或被氧化),便 本 因前述保護膜而1杰Μ 3強該π件的光輸出來補償 / 成的初始劣化情形。舉例來說,於-作 ,喪測!光源的光輸出元件t,利用於至 : 上述光學系統(例如破泠佑, 側上破塗佈的 。… 透光視窗或反射面鏡),便可獲 仔較長時間穩定的光輸出,而且可針對 光輸出元件,並且維持不會減低的穩定透光率用=用該 穩定化該元件的控制作業及測量靈敏^。 纟可以 【實施方式】 & [第一較佳具體實施例] :下文範例中將參考圖示來說明本發明第一較佳 Μ时現方式,其可抑制或從透光視窗8之外表面U中移 除石反黏者物。此外,還將東办41 , Γ還將參考該專圖式來解釋用以抑制或 從位於真空區域14内之光學系絲由 一 尤于系統中移除碳黏著物的較佳且 體貫施例β 本發明並不侷限於該些示範具體實施例,其亦可有效地 套用於藉由電氣放電或加熱方式來產生光的燈或雷射裝置 中。 範例1 圖1為用來解釋使用於根據本發明第一較佳具體實施例 的第-範例中的微波受激氫氣紫外光燈之結構的示意圖。 附著透光視窗8的固定部件(凸緣)17係碟形,而且其中心 會對其放電们的内腔’而且其含有_開孔,該開孔^直徑 大於該放電管的内徑。視窗凸緣17包括一 〇形環狀溝槽,用 92980.doc -37- 1356439 以於透光視窗8之開孔上產生密封,而且還具有一中空的遮 帽狀型架20(其上附有複數個螺栓孔)以及一 〇形環狀溝 槽’該0形環狀溝槽會連接至放電管1,用以利用視窗凸緣 17維持真空。 型架20的内部結構採用兩級同心圓,並且會連接用於安 裝透光視窗8的空間及被放電管I包圍的空間。於包圍放電 管1的末端上,該面已經被切割成某個角度,以便可藉由壓 力將Ο形環13固定在正確的地方。圖中未顯示的螺線會進一 步被切成此末端的外周圍表面,並且藉由〇形環丨3的密封, 利用該柱狀開孔上方的鎖緊帽21形成放電管J的真空邊 界。視窗附著凸緣17、型架20、以及鎖緊帽21全部都係由 金屬製成,通常使用的係低污染的不鏽鋼或鋁,不過該材 料並不僅限於該些金屬。 現在將解釋具上述結構的微波受激氫氣紫外光燈的運作 情形。首先,會從放電管i中放電氣體供應開孔2中以2〇sccm 镇送氫氣放電氣體’ 1¾氣體已經過氦氣稀釋成ι/ι〇〇。該放 電氣體會藉由真空幫浦(未顯示)從排氣孔3被排出。藉由調 整放電氣體排氣孔3及該真空幫浦間所安裝的閥門(未顯示) 的孔徑’便可以調整排氣行為,以便讓該放電管⑽内部維 持在約5陶爾(665 Pa)。在從該透光視窗側朝放電管丨的方向 中產生放t氣流的原因係為盡可能地減低因&電電裝於放 電管1内部所產生的材料而於該視窗8上造成污染源。 接著,便從微波供應連接器中供應2 45 GHz、5〇 w的微 波給微波振1器4。可連續性地供應該等微波,亦可間歇: 92980.doc -38- 1356439 地供應。可以利用一調節器(未顯示)(其係安裝在被連接至 該微波電源與微波振盪器的電源線之中)來調整該電源與 負載(放電電漿)之間的微波功率輸出,用以於放電管^中產 生放電電漿7。被放電電漿7激發的氫原子會放射出1〇3 nm 與122 nm真空紫外光波長的光。因為利用MgF2作為透光視 窗8的材料,所以如下文的解釋般,103 nm光線會被MgF2 及收僅有122 nm波長的真空紫外光會進入真空區域丨4, 作輸出燈光(真空紫外光)9。 於此情況中,透光視窗8之安裝凸緣17中的開孔為Φ8ππη, 所以進入真空區域14中的輸出便係Φ8 mm的光通量。In addition, since the above-mentioned metal oxides have a higher resistance to plasma than the other metal oxides, it is possible to prevent fluorine peeling or inhibit oxidation of metal atoms, and because of itself It is a telluride. Therefore, when it is used as an optical system made of a fluoride material, it can be prevented from further deteriorating with the mother's "degraded" after it is subjected to initial deterioration. "UV light" causes deterioration. I & π..., ^ The second recommendation of this month is based on the fact that the elements of the elements are used, which will use the optical properties of the aforementioned opticals, and that; 92980.doc -35-1356439 A 2 nm-20 nm protective film consisting of a metal oxide (which is selected from Si〇2 or Al2〇3, MgO, Ti02, Zr〇2) is applied to an optical system in advance. Suppressing the detachment of a structural element from the surface of the basic matrix or oxidizing on the surface of the basic matrix due to long-time exposure of the vacuum ultraviolet light or plasma exposure of the basic matrix; and incorporating the optical system into one Having a vacuum ultraviolet light source or a plasma light source (the photon of which is about the absorption wavelength of the basic matrix of the optical system). According to the present invention, the initial deterioration of the characteristics due to the metal oxide protective film is caused by The film can suppress the basic matrix of the optical system caused by the vacuum ultraviolet light irradiation or being exposed to the electropolymer to cause a plurality of elements to be peeled off from the basic matrix or oxidized on the surface of the basic matrix. A situation in which the day and the day are deteriorated, which means that after the first start of operation, the optical output of the basic matrix will not be further weakened, so that the reflecting mirror of the aforementioned light output elements can be extended. The life of the light-transmissive window. This method can also extend the interval between the replacement windows of the light-transmissive windows or the mirrors to improve the operating speed of the light-emitting elements and reduce the operating cost. In this case, It is only necessary to use a light source that provides sufficient light output as a component to compensate for the initial deterioration of the optical system due to the aforementioned protective film, which makes it possible to extend the life of the component without causing a decrease in the transmittance of the entire system. (transmittance, reflectance) - In the case of Putian, the optical system was previously coated with the above protective film to suppress the exposure of vacuum ultraviolet light or bare in the electric monnel, as a result of the lapse of the test. It will be stripped or oxidized with (4) ^a a lot of elements from the mother body, and the light is compensated by the light output of the π piece due to the protective film. The initial deterioration situation. For example, the light output element t of the light source is used to: the above optical system (for example, broken, coated on the side.... light transmission window or reflective mirror) ), you can get a stable light output for a long time, and can be used for the light output component, and maintain the stable light transmittance that will not be reduced. = Use this to stabilize the control operation of the component and measure the sensitivity ^. Embodiments & [First Preferred Embodiment]: In the following examples, a first preferred embodiment of the present invention will be described with reference to the drawings, which can suppress or shift from the outer surface U of the light-transmitting window 8. In addition to the stone anti-adhesive material, in addition, the East Office 41, Γ will also refer to the specific map to explain the use of the optical wire located in the vacuum region 14 to remove or remove the carbon adhesive from the system. Preferred Embodiments of the Invention The present invention is not limited to the exemplary embodiments, and can be effectively applied to lamps or laser devices that generate light by electrical discharge or heating. Example 1 Figure 1 is a schematic view for explaining the structure of a microwave-excited hydrogen ultraviolet lamp used in the first example of the first preferred embodiment of the present invention. The fixing member (flange) 17 to which the light-transmitting window 8 is attached is in the shape of a dish, and its center discharges the inner cavity of it, and it contains an opening having a diameter larger than the inner diameter of the discharge tube. The window flange 17 includes a meandering annular groove, which is sealed by a 92980.doc -37-1356439 opening on the opening of the light transmissive window 8, and also has a hollow visor-like frame 20 (attached thereto) There are a plurality of bolt holes) and a ring-shaped annular groove which is connected to the discharge tube 1 for maintaining the vacuum by the window flange 17. The internal structure of the frame 20 is a two-stage concentric circle and is connected to a space for mounting the light-transmitting window 8 and a space surrounded by the discharge tube 1. On the end surrounding the discharge tube 1, the face has been cut at an angle so that the ring 13 can be fixed in the correct place by pressure. The spiral not shown in the drawing is further cut into the outer peripheral surface of the end, and the vacuum boundary of the discharge tube J is formed by the locking cap 21 above the cylindrical opening by the sealing of the dome ring 3. The window attachment flange 17, the frame 20, and the lock cap 21 are all made of metal, and generally used are low-pollution stainless steel or aluminum, but the material is not limited to the metals. The operation of the microwave-excited hydrogen ultraviolet lamp having the above structure will now be explained. First, hydrogen gas is discharged from the discharge gas supply opening 2 in the discharge tube i by 2 〇 sccm. The gas has been diluted with helium to ι/ι〇〇. The discharge gas is discharged from the vent hole 3 by a vacuum pump (not shown). The exhaust behavior can be adjusted by adjusting the aperture of the discharge gas vent 3 and the valve (not shown) installed between the vacuum pumps to maintain the interior of the discharge tube (10) at approximately 5 Torr (665 Pa). . The reason why the t-flow is generated in the direction from the light-transmitting window toward the discharge tube is to reduce the source of contamination on the window 8 by minimizing the material generated by the electric device inside the discharge tube 1. Next, a microwave of 2 45 GHz and 5 〇 w is supplied from the microwave supply connector to the microwave oscillator 4. The microwaves may be supplied continuously or intermittently: 92980.doc -38 - 1356439. A regulator (not shown) (which is mounted in the power line connected to the microwave power source and the microwave oscillator) can be used to adjust the microwave power output between the power source and the load (discharge plasma) for A discharge plasma 7 is generated in the discharge tube. The hydrogen atoms excited by the discharge plasma 7 emit light at a wavelength of 1 〇 3 nm and 122 nm vacuum ultraviolet light. Because MgF2 is used as the material of the light-transmissive window 8, as explained below, the 103 nm light will enter the vacuum region 丨4 by the vacuum ultraviolet light of MgF2 and the wavelength of only 122 nm, which is used as the output light (vacuum ultraviolet light). 9. In this case, the opening in the mounting flange 17 of the light transmission window 8 is Φ8ππη, so the output into the vacuum region 14 is a luminous flux of Φ8 mm.

MgF2(氟化鎂)單晶係習用的透光視窗8材料,該晶轴卜 軸)會垂直該透射視窗的表面。晶體尺寸為〇5英吋φ(127 mm Φ)χ1 。該晶體係 0hyo K〇ken K〇gy〇 c〇,Ud 所 製造的UV等級晶體。可從同一批中取得複數個晶體,而且 5亥專aa體會經過排序使其晶體品質及表面條件一致,以便 將該批内的任何變化消弭至僅能驗證該保護膜之效果的 程度。 - 此外,光二極體12的位置可接收燈輸出光9,用來監視該 燈的光輸出量。 可以利用下文所述的方法供應氧氣給真空區域14,同時 將該氣體調節至規定的分壓。 氧氣瓶23(Nippon Sanso Corporation所製造)充滿純氧(純度 4N) ’並且係被連接至調節器22。將該氣體壓力調節至〇. 1 kg/cm2且調節被連接至通道輸送管16c之可變浪漏閥19的孔 92980.doc •39- 1356439 猥後’該氣體便會通過大氣側上的輸送管16b,然後通過通 道密封機制(未顯示),並且從真空區域14内的輸送管16a被 饋入真空區域14中》被供應的量約1 sccm〇可透過一加速 分子幫浦(淨空速率50 L/min,由Mitsubishi Heavy Industries,Ltd.製造的型號TP-50)來淨空真空區域14,而且 該真空區域14下游端會被連接至一乾式幫浦(未顯示)。於此 情况中,該真空區域内的氧氣分壓會平衡在丨mt〇rr(丨毫陶 爾)處。因此,該等條件為真空區域4内的氧氣分壓等級至 少為1 mtorr(並且低於1 〇 mtorr)。 同時還會調整閥門孔徑提供5 mt〇rr、2加〇打及〇丨mt〇rr 來進行實驗,不過如稍後的解釋般,可獲得雷同的碳移除 效果。 本解釋内客中所提到的可變液漏闕並非一具有特殊規抬 的項目’其僅係一可進行精細孔徑調整的機制,而且可以 採用任何名稱的此種機制。 接者’便可運用光二極體12來測量具有前述結構之微波 受激氯氣紫外光燈所輸出的光量隨著時間的變化情形。 耳先,利用放電電漿7來激發該等氫原子,用以產生真空 紫外光’時間持續9〇個小時(约 相細、n七场 時(約4天)。接著,重覆該項測試, 仁部/又有氧氣供應,作為 读八早乍為控制組,也就是,操作前述的加 結果。 衣兄(〇·001加阳·),然後比較該等 積 結果顯示當於燈運作期間饋送氧氣的話, 而造成穿過透織窗8的透射率顯著地下降 便不會因碳累 。相反地,於 92980.doc 1356439 該控制組中,如果原來的透光率係100%的話,那麼因為透 光視_ 8上的碳累積的關係,經過該測試後的透射率便降至 35%。 圖1顯示出於該控制實驗中觀察到碳15以膜狀方式累積 及黏著。當該燈在有氧氣流下運作時,圖丨中所示的碳15 便不會黏著至透光視窗8。 當在使用後利用光學顯微鏡來觀察透光視窗8時,在有氧 氣饋送的樣本中並不會發現到任何的黏著物;但是在控制 樣本中’則會有材料以膜狀方式黏著於中心Φ8 mm範圍之 上(真空紫外光已經穿透該區)。利用塑膠鑷子刮除外表面i i 便可剝離該黏著材料,而且吾人發現該材料係一膜狀材 料’其具有一微弱的黏結力量黏著於外表面丨丨之上。 接著’便對該黏著材料實施元素分析。可以利用epma(電 子探測X射線顯微分析器)(Nippon Densh所製造的 JXA-8200)針對控制樣本對透光視窗8的外表面丨丨實施元素 分析,分析條件:加速電壓15 kv,照射電流5£_8八,測量 方法:定性分析、線性分析 '映對分析。結果顯示,於透 光視® 8之外表面u的中心φ8 mm區域(紫外光已經穿透該 區)中a偵測到大量的碳。該中心伞8 mm區域外面的環形區 會洛在凸緣17的陰影中,據此,該區便不會有任何紫外光 穿透,而且雖然ΕΡΜΑ分析顯示出此區中有污染位準的碳, 但疋亚不會有任何大量的碳黏著物β ΕΡΜΑ分析中的「污染 位準」所指的係在分析—已粗略清潔表面時所獲得的微弱 的奴#號位準。利用一電子束來照射一乾淨表面必定會造 92980.doc 1356439 成碳黏著’而且此信號位準係以黏著的碳為基礎。據此, 該刀析裝置本身的污染位準便會決定ερμα分析的測量下 限。相較於污染信號位準,源自中心、φ8麵範圍(紫外光已 、座穿透該n)的彳§號位準明顯較高,而該項發現證實了有碳 以膜狀方式累積於該透光視窗之外表面n之上。 圖7為利用EPMA所獲得之該控制實驗的線性分析結果。 圖7中軸的單位為毫米,其代表的係該MgF2晶體直徑上的 分析位置,對該晶體實施線性分析係以邊至邊的方式來實 施。 垂直軸代表的係於頻譜生成晶體LDE2處所偵測到之碳 k號強度。主要的分析條件列在圖7關係圖外面。 攸圖7可以瞭解,從該φ8 mm區域(紫外光已經穿透該區) 的碳中會有非常高的信號強度,其清楚地表示於該中心φ8 mm區域中有膜狀黏著物。 相反地,當該燈於氧氣流下運作之後,則無法從該透光 視窗之表面中偵測到任何超過該污染位準的明顯碳信號。 如上述於氧氣饋送下來操作該燈,便可防止或抑制透 光視窗8上發生碳增長情形。 實現此種對策便可抑制穿過該透光視窗之透射率下降, 從而可降低置換該視窗的維修作業成本,並且縮短該燈的 運作停工時間。 此具體實施例係以透光視窗作為範例,不過,本具體實 施例同樣可套用於採用反光面鏡(視窗)的裝置中。此等反光 面鏡範例為供雷射振盪器使用的反光面鏡及燈聚光面鏡。 92980.doc •42· 6439 下 文所述的具體實施例同樣可套用於反光面鏡的情況中 範例2 圖2為一微波受激氫氣紫外光燈之示意圖,其將用來說明 根據本發明第一較佳具體實施例的第二範例。與範例1雷同 的結構性元件與運作元件的進一步細節將會省略。透光視 窗8的詳細說明與範例1所解釋的部分相同。另外,光二極 體12的位置可接收發光燈9的光輸出,用來監視該燈的光輸 出量。 其會利用下面方法供應水蒸氣至真空區域14,並且調整 至特定的氣體分壓。玻璃管24(管徑φό mm)(其中裝填著 1 mL的水25,該水為經過蒸餾、離子交換處理及過濾的純 水)會透過凸緣17連接至輸送管16d。凸緣17的結構含有一 〇 形%,用以密封該玻璃管,使其與大氣隔絕,而且所有的 大氣成份都會事先被排出管外。水25會維持在室溫(25°c ), 而且内β卩蒸軋壓為24 torr(計算值)。此蒸氣壓會透過輸送管 16d於其主蒸氣壓處來供應,而且於調整可變洩漏閥19的孔 杈之後,其-便會通過大氣側上的輸送管16b,然後透過密封 機制(未顯示),經由輸送管l6a進入真空區域14中。供應量 約0.1 seem。可透過一加速分子幫浦(淨空速率5〇 L/min, 由 Mitsubishi Heavy Industries, Ltd·製造的型號TP-50)以及 下游處的乾式幫浦(未顯示)來淨空真空區域14。於此情況 中,該真空區域内的水蒸氣分壓會平衡在〇1 mt〇rr(〇丨毫陶 爾)處據此,真空區域14内的條件便係水蒸氣分壓等級至 少為〇· 1 mtorr(不過低於1 mtorr)。 92980.doc -43- 1356439 還會错由調整該閥門孔徑以1 mtorr及〇.〇 1 mtorr的 水蒸氣分壓來進行實驗,不過如稍後的解釋般,可獲得雷 同的碳移除效果。 接著,便可利用光二極體12來測量上述微波受激氫氣紫 外光燈的光輸出量隨著時間的變化情形。 首先,利用放電電漿7來激發氫原子,用以產生真空紫外 光,時間持續90個小時(約4天)。接著,在不供應水蒸氣下 操作該燈,也就是,進行該實驗時係利用前述的加速分子 幫浦來維持0.001 mtorr的壓力環境,然後比較兩項測試的 結果。 結果顯示當於供應水蒸氣時來操作該燈的話,便不會觀 察到因碳增長而造成穿過透光視窗8的透射率有任何的劣 化情形。相反地,於該控制實驗中,如果初始的透光率係 100%的話,那麼經過所測量的週期後,碳黏著物便會使得 透射率降至35%。 圖2中的碳15顯示的係於該控制實驗中觀察到的膜狀碳 黏著物,不過,當於燈運作期間供應水蒸氣的話,透光視 窗8上便不會有任何如圖2所示的碳15黏著物。 當在使用後利用光學顯微鏡來觀察透光視窗8之外表面 11時,在有水蒸氣供應至該燈時並不會觀察到任何的黏著 物,但是在控制視窗中,則會有物質以膜狀方式黏著於中 心Φ8 mm區域之上(真空紫外光已經穿透該區當利用塑膠 鑷子刮除外表面11時,便可剝離該黏著材料,而且吾人發 現會有一微弱黏結的材料黏著於外表面〖丨之上。 92980.doc • 44 · 1356439 /此時,便可對該黏著材料實施元素分析。利用ΕΡΜΑ所進 行的元素分析結果和範例丨中所解釋的結果雷同。 如上面的詳述,當該燈運作於有饋送水蒸氣的情況下 時,便證實了可防止或抑制碳黏著於透光視窗之上。 此項對策可抑制該透光視窗之透光率下降,從而可降低 和視窗置換相關的維修成本,並且縮短該燈因維修所造成 的運作停工時間。 範例3 圖3為一微波又激氫氣紫外光燈之示意圖,其將用來說明 根據本發明第一較佳具體實施例的第三範例。與範例1雷同 的結構性7G件與運作元件的進一步細節將會省略。透光視 窗8的詳細說明與範例1所解釋的部分相同。同樣地,光二 極體12的位置可接收發紐9的光輸出,用來監視該燈的光 輸出量。 其會利用下面規定的方法供應大氣成份至真空區域14, 並且調整至特定的氣體分壓。 可利用-條開放至大氣的管子來供應大氣成份至真空區 域14,經過調整可變洩漏閥19的孔徑之後,便可讓該等大 氣成份透過輸送管16b來移動,並且通過—密封機制(未顯 不),以便透過輸送管16a被導入真空區域14中。被供應的 S約1 Sccm。可透過一加速分子幫浦(淨空速率5〇 L/min, Mitsubishi Heavy industdes,Ltd 製造的型號τρ_5〇)以及 下游處的乾式幫浦(未顯示)來淨空真空區域14。於此情況 中,該真空區域内該等大氣成份會平衡在lmt〇rr(i毫陶爾) 92980.doc • 45- 1356439 處。據此,真空區域u内的條件便係該等大氣成份分壓等 級至少為1 mtorr(氡氣僅有0.2 mtorr)。 同樣會進行閥門孔徑調整以產生(M mt〇rr(氧氣僅有〇〇2The MgF2 (magnesium fluoride) single crystal is a conventional light transmissive window 8 material which is perpendicular to the surface of the transmission window. The crystal size is 〇5 inches 吋(127 mm Φ)χ1 . The crystal system 0hyo K〇ken K〇gy〇 c〇, a UV grade crystal made by Ud. A plurality of crystals can be obtained from the same batch, and the 5 Hai aa experience is sorted so that the crystal quality and surface conditions are consistent, so that any changes in the batch can be eliminated to the extent that the effect of the protective film can only be verified. - In addition, the position of the photodiode 12 can receive the lamp output light 9 for monitoring the light output of the lamp. Oxygen can be supplied to the vacuum zone 14 by the method described below while adjusting the gas to a prescribed partial pressure. The oxygen cylinder 23 (manufactured by Nippon Sanso Corporation) is filled with pure oxygen (purity 4N)' and is connected to the regulator 22. Adjust the gas pressure to kg1 kg/cm2 and adjust the hole of the variable leakage valve 19 connected to the passage conveying pipe 16c. 92980.doc •39-1356439 猥The gas will pass through the atmosphere side. The tube 16b is then passed through a channel sealing mechanism (not shown) and is fed into the vacuum region 14 from the delivery tube 16a in the vacuum region 14" is supplied in an amount of about 1 sccm 〇 through an accelerated molecular pump (headroom rate 50 L/min, model TP-50 manufactured by Mitsubishi Heavy Industries, Ltd., was used to evacuate the vacuum region 14, and the downstream end of the vacuum region 14 was connected to a dry pump (not shown). In this case, the partial pressure of oxygen in the vacuum region is balanced at 丨mt〇rr (丨米塔尔). Therefore, the conditions are such that the partial pressure of oxygen in the vacuum zone 4 is at least 1 mtorr (and less than 1 〇 mtorr). At the same time, the valve aperture is adjusted to provide 5 mt〇rr, 2 plus beats and 〇丨mt〇rr for experimentation, but as explained later, the same carbon removal effect can be obtained. The variable liquid leakage referred to in this interpretation is not a specially regulated item's. It is only a mechanism for fine-aperture adjustment, and such a mechanism can be used under any name. The receiver can use the photodiode 12 to measure the amount of light output by the microwave excited chlorine gas ultraviolet lamp having the aforementioned structure as a function of time. First, the discharge plasma 7 is used to excite the hydrogen atoms to generate vacuum ultraviolet light for a period of 9 hours (about 7 minutes (about 4 days). Then, repeat the test. , Renbu / there is oxygen supply, as a reading eight early as a control group, that is, operating the aforementioned addition results. Yi brother (〇·001 plus Yang·), and then compare the results show that during the operation of the lamp When the oxygen is fed, the transmittance through the translucent window 8 is significantly lowered and it is not caused by the carbon. Conversely, in the control group of 92880.doc 1356439, if the original transmittance is 100%, then The transmittance after the test was reduced to 35% due to the accumulation of carbon on the light transmission -8. Figure 1 shows that carbon 15 was observed to accumulate and adhere in a film-like manner for this control experiment. When operating under a stream of oxygen, the carbon 15 shown in the figure will not adhere to the light-transmissive window 8. When using the optical microscope to observe the light-transmissive window 8 after use, it will not be in the sample with oxygen feed. Found any adhesive; but in the control sample 'There will be a film adhered to the center Φ8 mm in a film-like manner (vacuum ultraviolet light has penetrated the area). The adhesive material can be peeled off by scraping the surface ii with a plastic tweezers, and we found that the material is a film. The material "has a weak bonding force adhered to the outer surface of the crucible. Then the elemental analysis of the adhesive material is carried out. An epma (electron detection X-ray microanalyzer) (JXA manufactured by Nippon Densh) can be used. -8200) Perform elemental analysis on the outer surface of the light-transmitting window 8 for the control sample. The analysis conditions are: acceleration voltage 15 kv, illumination current 5 £ _8 VIII, measurement method: qualitative analysis, linear analysis 'reflection analysis. A large amount of carbon is detected in the center φ8 mm area of the surface u outside the surface of the light transmission layer (the ultraviolet light has penetrated the area). The annular area outside the 8 mm area of the center umbrella is at the flange 17 In the shadow, according to this, there will be no UV light penetration in the area, and although the ΕΡΜΑ analysis shows that there is a polluted level of carbon in this area, it does not have any large amount of carbon binder β Ε. The “pollution level” in the ΜΑ analysis refers to the weak slave number obtained when analyzing the rough surface. Using an electron beam to illuminate a clean surface is bound to make 92980.doc 1356439 carbon Adhesion' and this signal level is based on the adhered carbon. According to this, the pollution level of the knife-removing device itself determines the lower limit of the measurement of ερμα analysis. Compared with the pollution signal level, it originates from the center, φ8 surface. The range of 紫外§ (the ultraviolet light has passed through the n) is significantly higher, and this finding confirms that carbon accumulates on the surface n outside the light-transmitting window in a film-like manner. The linear analysis results of the control experiment obtained by EPMA were used. The unit of the axis in Fig. 7 is millimeter, which represents the analysis position on the diameter of the MgF2 crystal, and the linear analysis of the crystal is carried out in an edge-to-edge manner. The vertical axis represents the intensity of the carbon k detected at the spectrally generated crystal LDE2. The main analysis conditions are listed outside the diagram of Figure 7. As can be seen from Fig. 7, there is a very high signal intensity in the carbon of the φ8 mm region (where ultraviolet light has penetrated the region), which clearly indicates that there is a film-like adhesive in the center φ8 mm region. Conversely, when the lamp is operated under a flow of oxygen, no significant carbon signal exceeding the level of contamination can be detected from the surface of the light transmissive window. By operating the lamp under oxygen feed as described above, it is possible to prevent or suppress the occurrence of carbon growth on the light transmission window 8. By realizing such a countermeasure, the decrease in transmittance through the light-transmitting window can be suppressed, thereby reducing the maintenance work cost for replacing the window and shortening the operation downtime of the lamp. This embodiment is exemplified by a light transmissive window, however, this embodiment can also be applied to a device employing a mirror (view). Examples of such reflective mirrors are reflective mirrors and lamp concentrating mirrors for use with laser oscillators. 92980.doc • 42· 6439 The specific embodiment described below can also be applied to the case of a reflective mirror. Example 2 FIG. 2 is a schematic diagram of a microwave excited hydrogen ultraviolet lamp, which will be used to illustrate the first according to the present invention. A second example of a preferred embodiment. Further details of the structural elements and operational elements that are identical to the example 1 will be omitted. The detailed description of the light transmission window 8 is the same as that explained in the example 1. Alternatively, the position of the photodiode 12 can receive the light output of the illuminating lamp 9 for monitoring the amount of light output from the lamp. It supplies water vapor to the vacuum zone 14 by the following method and adjusts to a specific gas partial pressure. The glass tube 24 (tube diameter φ ό mm) in which 1 mL of water 25 is charged, which is distilled, ion-exchanged and filtered, is connected to the delivery tube 16d through the flange 17. The structure of the flange 17 contains a 〇-shaped portion for sealing the glass tube from the atmosphere and all atmospheric components are previously discharged out of the tube. The water 25 is maintained at room temperature (25 ° C), and the internal β 卩 steaming pressure is 24 torr (calculated value). This vapor pressure is supplied through the delivery pipe 16d at its main vapor pressure, and after adjusting the orifice of the variable leakage valve 19, it passes through the delivery pipe 16b on the atmospheric side and then through the sealing mechanism (not shown). ) enters the vacuum region 14 via the transfer tube 16a. The supply is about 0.1 seem. The vacuum zone 14 can be evacuated through an accelerated molecular pump (headroom rate of 5 〇 L/min, model TP-50 manufactured by Mitsubishi Heavy Industries, Ltd.) and a dry pump (not shown) downstream. In this case, the partial pressure of water vapor in the vacuum region is balanced at 〇1 mt rrrr (〇丨m Torr). Accordingly, the conditions in the vacuum region 14 are at least the partial pressure of water vapor. 1 mtorr (but below 1 mtorr). 92980.doc -43- 1356439 It is also wrong to adjust the valve's pore size with a partial pressure of water of 1 mtorr and 〇.〇 1 mtorr, but as explained later, the same carbon removal effect can be obtained. Next, the photodiode 12 can be used to measure the change in the light output of the microwave excited hydrogen ultraviolet lamp with time. First, the discharge plasma 7 is used to excite hydrogen atoms for generating vacuum ultraviolet light for a period of 90 hours (about 4 days). Next, the lamp was operated without supplying steam, that is, the experiment was carried out using the aforementioned accelerated molecular pump to maintain a pressure environment of 0.001 mtorr, and then the results of the two tests were compared. As a result, it was revealed that when the lamp was operated while supplying water vapor, any deterioration of the transmittance through the light transmission window 8 due to carbon growth was not observed. Conversely, in this control experiment, if the initial transmittance is 100%, then after the measured period, the carbon adhesion will reduce the transmittance to 35%. The carbon 15 in Fig. 2 shows the film-like carbon adhesion observed in the control experiment. However, when the water vapor is supplied during the operation of the lamp, there will be no light transmission window 8 as shown in Fig. 2. Carbon 15 adhesive. When an optical microscope is used to observe the outer surface 11 of the light-transmitting window 8 after use, no adhesive is observed when water vapor is supplied to the lamp, but in the control window, there is a substance to the film. Adhesively adhered to the center Φ8 mm area (vacuum ultraviolet light has penetrated the area. When the surface 11 is scraped off with plastic tweezers, the adhesive material can be peeled off, and we find that a weakly bonded material adheres to the outer surface. 92980.doc • 44 · 1356439 / At this point, elemental analysis can be performed on the adhesive material. The results of the elemental analysis using ΕΡΜΑ are similar to those explained in the sample 。. As detailed above, when When the lamp is operated with water vapor, it is confirmed that the carbon can be prevented or inhibited from adhering to the light transmission window. This countermeasure can suppress the decrease of the transmittance of the light transmission window, thereby reducing the window displacement. Related maintenance costs, and shorten the operational downtime caused by the maintenance of the lamp. Example 3 Figure 3 is a schematic diagram of a microwave and hydrogen gas ultraviolet light, which will be used A third example of a first preferred embodiment of the present invention will be omitted. Further details of the structural 7G member and operating element identical to that of Example 1 will be omitted. The detailed description of the light transmissive window 8 is the same as that explained in Example 1. Similarly, the position of the photodiode 12 can receive the light output of the button 9 for monitoring the light output of the lamp. It supplies the atmospheric component to the vacuum region 14 and adjusts to a specific gas using the method specified below. Partial pressure. The tube can be supplied to the vacuum region 14 by means of a tube that is open to the atmosphere. After adjusting the aperture of the variable leakage valve 19, the atmospheric components can be moved through the delivery tube 16b and passed through the seal. The mechanism (not shown) is introduced into the vacuum zone 14 through the conveying pipe 16a. The supplied S is about 1 Sccm. It can be passed through an accelerated molecular pump (the clearance rate of 5 〇 L/min, manufactured by Mitsubishi Heavy industdes, Ltd.). Model τρ_5〇) and a dry pump (not shown) downstream to clear the vacuum zone 14. In this case, the atmospheric components in the vacuum zone will be balanced at lmt〇rr (i mota) 92980.doc • 45- 1356439. Accordingly, the conditions in the vacuum zone u are such that the partial pressure of the atmospheric components is at least 1 mtorr (the helium is only 0.2 mtorr). Aperture adjustment to produce (M mt〇rr (oxygen only 〇〇 2

咖叫的分不過如稿後的說明般,碳移除的效 的。 J 接著,便可利用光二極體12來測量具有上述結構之微波 受激氫氣紫外光燈的運作期間的光輸出隨著時間的變化情 形。 首先,利用放電電漿7來激發氫原子,並且產生真空紫外 光,時間持續90個小時(約4天)。接著,於運作期間:供應 該等大氣成份作為控制組,並且利用前述的加速分子幫浦 來產生0.001 mtorr的環境,然後比較兩項測試的結果。 當於燈運作時供應大氣成份的話,便不會觀察到因碳增 長而造成穿過透光視窗8的透光率有任何減弱的情形 過,於該控制測試中,碳增長則會讓穿過透光視窗8的透光 率從100%的初始值降至35%的透射率β 圖3中的碳15反映的係於該控制組中觀察到的膜狀碳黏 著物,不過,當於燈運作期間供應大氣成份的話,透光視 窗8上便不會有任何如圖3所示的碳15黏著物。 當在使用後利用光學顯微鏡來觀察透光視窗8之外表面 11時,在有大氣成份供應至該燈時並不會觀察到任何的黏 著物;但是在控制視窗中,則會有物質以膜狀方式黏著於 中心Φ8 mm區域之上(真空紫外光已經穿透該區)。當利用塑 膠鑷子到除外表面11時,便可剝離該黏著材料,而且吾人 92980.doc -46- 1356439 發現會有一微弱黏結的材料黏著於外表面u之上。 /此時便可對該黏著材料實施元素分析。利用Ερμα所進 仃的π素分析結果和範例i中所解釋的結果雷同。 如上面料述,“料作於㈣送大氣成份的情況下 時’便證實了可防止或抑制碳黏著於透光視窗之上。 此項對策可防止該透光視窗之透光率下降,從而可降低 和視窗置換相關的維修成本,並且縮短該燈因維修所造成 的運作停工時間。 範例4 圖4為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第四範例,該圖中 將說明利用輸出光來移除黏著至位於真空區域_之光學 系統上的碳的方法。與範例1雷同的結構性元件與運作元件 的進—步細節將會省略。透光視窗8的詳細說明與範例^ 解釋的部分相同。 圖4中的光學;^件27的位置會被發光燈9照射。碳Μ已經 =著於光學-元件27的兩側’並且係藉由真空紫外光9照射光 干元件27而產生的’同時於真空區域14内會有有機氣體存 在。因為有碳15黏著,所以,光學元件”的透射率便會下 降1而且必須進行維修。光學元件27會抵達此種狀態的原 因係因為該燈運作於真空狀態中。 此處將會使用-真Μ外光的干㈣光器料光學元件 27的範例’用以說明碳移除情形。真空紫外光的干涉慮光 器可視為-MgF2基板’於其表面上有—多層光學膜塗層。 92980.doc •47 1356439 這係光學部件(例如此干涉濾光器)的慣用結構。此干涉遽光 器係當作一帶通濾光器,因為其僅允許具有特定波長帶的 光通過’不過當碳15黏著於其表面上時,其作為干涉遽光 器的透射率便會下降,而且其作為光學元件的功能亦會因 而遭到劣化。據此,於已減弱透射率的特定階段處便必須 移除該碳或是置換該干涉濾光器。一般來說,因為具有光 學膜塗層的光學濾光器(例如干涉濾光器)的脆弱特性的關 係,欲對其進行清潔相當困難。清潔作業可能會改變該光 學膜的特性,而且很容易於清潔期間造成缺陷,例如到傷。 因此,基本上並無任何有效的清潔方法可用,因此吾人必 須選擇置換該部件。不過,一般來說,干涉濾光器係昂貴 的。卩件,因此成本會是一項問題。於範例4中,為證實本發 明的效果,該燈會在無氣體供應中運作,直到該干涉程度 的透射率從原來的100%數值下降至50%刻意將透射率減半 為止’然後便將光學元件27置放於真空區域14内。 範例1的方法係用來供應氧氣至真空區域14,其條件係真 空區域14中-之氧氣分壓維持在丨mt〇rr處。同時還會調整閥 門孔徑提供 10 mtorr、5 mtorr、2 mtorr、0.1 mtorr及 0.05 mt〇rr 來進行實驗’其可獲得雷同的碳移除效果。 接著,利用放電電漿來激發該等氫原子,以便發出真空 紫外光,時間持續90個小時(約4天)。當於燈運作期間供應 氧氣時,便可從光學元件27的表面中移除黏著碳15,而且 實際上光學凡件27的透射率會被復原至其原來的狀態。當 於光學顯微鏡下觀察光學元件的表面時,並不會發現任^ 92980.doc -48- 1356439 的黏著物。 *如上面的解釋,於饋送氧氣的情況下運作,便可清除黏 著至光學元件27上的碳。 ,此方法可防止該光學元件之透光率下降,從而可降低和 光子兀件置換相關的維修成本,並且縮短該燈因維修所造 成的運作停工時間。 範例5 圖5為該微波文激氫氣紫外光燈之示意圖,其係用來解釋 根據本發明第-較佳具體實施例的第五範例,該圖中將說 明利用發射燈光來移除黏著至位於真空區域以内之光學系 統上的碳的方法。與範例丨雷同的結構性元件與運作元件的 進一步細節將會省略。透光視窗8的詳細說明與範例丨所解 釋的部分相同。 圖5中,光學元件27的位置會接收燈9所發出的光。 該光學元件的進一步解釋將被省略,因為和範例4中的解 釋雷同。 於範例5中,為證實本發明的效果,該燈會在無氣體供應 中運作,直到該干涉程度的透射率從原來的1〇〇%數值下降 至50 /。刻忍將透射率減半為止,然後便將光學元件置放 於真空區域14内。 範例2的方法係用來供應水蒸氣至真空區域14,其條件係 真空區域14中之水蒸氣分壓維持在1 mtorr處。同時還會調 整闊門孔徑提供 5mtorr、2mtorr、〇.〇1 mtorr 及 0.005 mtorr 來進行實驗,其可獲得雷同的碳移除效果。 92980.doc -49· 1356439 接著’利用放電電漿來激發該等氫原子,以便發出真空 紫外光,時間持續90個小時(約4天)。當於燈運作期間供應 水蒸氣時’便可從光學元件27的表面中移除黏著碳15,而 且實際上光學元件27的透射率會被復原至其原來的狀態。 田於光學顯微鏡下觀察光學元件的表面時,並不會發現任 何的黏著物》 如上面的解釋’於饋送水蒸氣的情況下運作,便可清除 黏著至光學元件27上的碳15。 此方法可復原已遭劣化之光學元件,從而可降低和該光 千元件置換相關的維修成本,並且縮短該燈因維修所造成 的運作停工時間。 範例6 圖6為該微波夂激氫氣紫外光燈之示意圖,其係用來解釋 根據本發明第一較佳具體實施例的第六範例,該圖中將說 明利用發射燈光來移除黏著至位於真空區域14内之光學系 統上的碳15的方法。與範例丨雷同的結構性元件與運作元件 的進一步細·.郎將會省略。透光視窗8的詳細說明與範例i所 解釋的部分相同。 圖6中,光學元件27的位置會接收燈9所發出的光。該光 學兀件的進一步解釋將被省略,因為和範例4中的解釋雷 同0 於範例6中,為證實本發明的效果’該燈會在無氣體供應 中運作,直到該干涉程度的透射率從原來的1〇〇%數值下降 至50%刻意將透射率減半為止,然後便將光學元件27置放 92980.doc 1356439 於真空區域14内。 範例3的方法係用來供應大氣成份至真空區域14,其條件 係真空區域14中之該等大氣成份分壓錶持在1 mt〇rr處。 同時還會調整闊門孔徑提供2 mtorr&〇 1爪⑺打的大氣成 份分壓來進行實驗,其可獲得雷同的碳移除效果。 接著’利用放電電漿來激發該等氫原子,以便發出真空 1外光,時間持續9〇個小時(約4天)。當於燈運作期間供應 大氣成份時,便可從光學元件27的表面中移除黏著碳15, 而且實際上光學元件27的透射率會被復原至其原來的狀 態。當於光學顯微鏡下觀察光學元件的表面時,並不會發 現任何的點著物。 如上面的解釋,於饋送大氣成份的情況下運作便可清 除黏著至光學元件27上的碳15 ^此方法可復原已遭劣化之 光學疋件,從而可降低和該光學元件置換相關的維修成 本並且縮短該燈因維修所造成的運作停工時間。 [第二較佳具體實施例] 下文將參考附圖來解釋本明的第二較佳具體實施例,其 中會於該透光視窗之上塗佈一保護膜,用來防止或抑制該 視窗遭到劣化。不過,本發明並不僅限於此種組態,本質 上其亦可套用於藉由電氣放電或加熱方式來發光的燈以及 雷射元件中。 圖8為一微波受激氫氣紫外光燈的示意圖,其將會用來解 釋本發明的具體實施例1-3。透光視窗8的凸緣17係碟形, 而且其中心會對其放電管丨的内膛線,而且其含有一開孔, 92980.doc -51· 1356439 »亥開孔的直徑大於該放電管的直徑。視窗凸緣17包含一 〇 形環狀溝槽13b,作為於前述開孔上密封透光視窗8的構 件’而且還含有-令空的遮帽狀型架2〇(其包括作為附著用 途的複數個螺栓孔)以及一 〇形環狀溝槽13a,該Ο形環狀溝 槽13a係用來附著至放電管i,並且進一步允許凸緣17維持 真空。 型架20的内部表面係由兩級同心中空柱狀體所組成,其 會包圍用於安裝透光視窗8及放電管1的空間。於包圍放電 管1一側的末端表面上係0形環13c,其係安裝於對應該環直 U對角切割表面中。另外’會於此末端的外周圍表面上 切割複數條螺線(未顯示),允許安裝一柱狀、開放式帽21, 其會將Ο形環13c固定在正確的地方,並且界定放電管丨的真 空邊界。視窗附著凸緣17、型架2〇、以及帽21全部都係由 金屬製成,通常係不鏽鋼或鋁(其並非良好的污染源),不過 該材料並不僅限於該些金屬。 見在將解釋具上述結構的微波受激氫氣紫外光燈的運作 情形。首先,經由放電氣體供應開孔2將氦氣中的1/1〇〇氫 稀釋氣體以20 sccm的速率供應給放電管丨。該放電氣體會 藉由真空幫浦(未顯示)從放電氣體排氣孔3被排出,並且藉 由調整放電氣體排氣孔3及該真空幫浦間所安裝的閥門(未 顯示)的孔徑來控制排氣行為,以便將放電管丨的内部維持 在約5陶爾(665 Pah該放電氣體從該透光視窗側朝放電管i 流動的原因係為盡可能地在遠離透光視窗8的方向中排出 放電電漿7於放電管丨内部所產生的任何材料,以便減少該 92980.doc •52- 1356439 視窗8上的污染源。 微波振盪is調諧器18的形狀係柱狀,其係該微波振盪器 的、°構丨生元件,其允許調整該微波振盪器内的微波電磁場 分佈,而且其内徑使其可包圍放電管1。另外,其結構使其 月b夠插入且對齊於源自微波振盪器4之末端表面的軸方向 中,其可於該軸方向中滑動同時與微波振盪器4維持導電 性。調諧器18係由銅或黃銅所構成,和微波振藍器4所使用 的材料相同。該調諧器18的功能係調整該微波電磁場分 佈其可以其插入深度為基礎來產生電漿7,以便將微波生 成集中於中心6處。 接著,便從微波供應連接器5中供應2.45 GHz、5〇 w的微 波給微波振盪器4。可連續性地供應該等微波,亦可間歇性 地供應。在連接該微波電源與微波振盪器的電源傳輸線之 中會併入一調節器(未顯示)。其可被調整用來控制該電源與 該負載(放電電漿)之間的微波功率,用以於放電管1中產生 放電電漿h被放電電漿7激發的氫原子會產生1〇3111^與122 nm波長的真空紫外光束,其會通過透光視窗8並且允許將已 放射的燈光9送至外面。The call of the coffee is not as effective as the description after the manuscript. J Next, the photodiode 12 can be used to measure the change in light output during operation of the microwave excited hydrogen ultraviolet lamp having the above structure. First, the discharge plasma 7 is used to excite hydrogen atoms, and vacuum ultraviolet light is generated for a period of 90 hours (about 4 days). Next, during operation: the atmospheric components were supplied as control groups, and the aforementioned accelerated molecular pump was used to generate an environment of 0.001 mtorr, and then the results of the two tests were compared. When the atmosphere is supplied while the lamp is operating, no decrease in the transmittance through the light transmission window 8 due to carbon growth will be observed. In this control test, carbon growth will pass through. The transmittance of the light-transmitting window 8 is reduced from the initial value of 100% to the transmittance of 35%. The carbon 15 in Fig. 3 reflects the film-like carbon adhesion observed in the control group, however, when the lamp If the atmospheric components are supplied during operation, there will be no carbon 15 adhesive as shown in Figure 3 on the light-transmissive window 8. When an optical microscope is used to observe the outer surface 11 of the light-transmitting window 8 after use, no adhesive is observed when an atmospheric component is supplied to the lamp; however, in the control window, there is a substance to the film. The pattern is adhered to the center Φ8 mm area (vacuum ultraviolet light has penetrated the area). When the plastic tweezers are used to remove the surface 11, the adhesive material can be peeled off, and U.S. 92980.doc -46-1356439 finds that a weakly bonded material adheres to the outer surface u. / At this point, an elemental analysis of the adhesive material can be performed. The results of the π-analysis using Ερμα are similar to those explained in the example i. As mentioned in the above fabric, "when it is used in (4) when the atmospheric component is sent, it is confirmed that it can prevent or inhibit the adhesion of carbon to the light transmission window. This countermeasure can prevent the light transmittance of the light transmission window from being lowered, thereby Reducing the maintenance cost associated with window replacement and shortening the operation downtime caused by the maintenance of the lamp. Example 4 FIG. 4 is a schematic structural view of a microwave excited hydrogen ultraviolet lamp, which is used to explain the first comparison according to the present invention. A fourth example of a preferred embodiment, which illustrates the use of output light to remove carbon adhered to the optical system located in the vacuum region. The structural elements and operating elements of Example 1 are similar to those of the operating elements. The details will be omitted. The detailed description of the light-transmissive window 8 is the same as that of the example ^. The optical part of Figure 4 will be illuminated by the illuminating lamp 9. The carbon Μ has already been placed on the optical-element 27 The side 'and is generated by the vacuum ultraviolet light 9 illuminating the light-drying element 27. At the same time, organic gas is present in the vacuum region 14. Since the carbon 15 is adhered, the transmittance of the optical element is lowered. Drop 1 and must be repaired. The reason why the optical element 27 will reach this state is because the lamp operates in a vacuum state. An example of a dry (four) optical material optics 27 of the true external light will be used herein to illustrate the carbon removal scenario. The vacuum ultraviolet light interference optic can be viewed as a -MgF2 substrate having a multilayer optical film coating on its surface. 92980.doc • 47 1356439 This is the usual structure for optical components such as this interference filter. This interference chopper is used as a bandpass filter because it only allows light having a specific wavelength band to pass through 'but when the carbon 15 is adhered to its surface, its transmittance as an interfering chopper is reduced. Moreover, its function as an optical element is thus deteriorated. Accordingly, the carbon must be removed or replaced at a particular stage of reduced transmission. In general, cleaning the optical filter (e.g., interference filter) with an optical film coating is difficult to clean. Cleaning operations may alter the properties of the optical film and can easily cause defects during cleaning, such as injury. Therefore, basically no effective cleaning method is available, so we must choose to replace the part. However, in general, interference filters are expensive. The cost, so cost will be an issue. In Example 4, in order to confirm the effect of the present invention, the lamp will operate in a gas-free supply until the transmittance of the interference level is reduced from the original 100% value to 50%, and the transmittance is intentionally halved. Element 27 is placed in vacuum zone 14. The method of Example 1 is used to supply oxygen to the vacuum zone 14 under the condition that the partial pressure of oxygen in the vacuum zone 14 is maintained at 丨mt〇rr. At the same time, the valve aperture is adjusted to provide 10 mtorr, 5 mtorr, 2 mtorr, 0.1 mtorr and 0.05 mt rrrr for the experiment, which can achieve the same carbon removal effect. Next, the discharge plasma is used to excite the hydrogen atoms to emit vacuum ultraviolet light for a period of 90 hours (about 4 days). When oxygen is supplied during operation of the lamp, the adhering carbon 15 can be removed from the surface of the optical member 27, and in fact the transmittance of the optical member 27 is restored to its original state. When the surface of the optical element was observed under an optical microscope, the adhesive of any of 92980.doc -48-1356439 was not found. * As explained above, the carbon adhered to the optical element 27 can be removed by operating with oxygen. This method prevents the light transmittance of the optical element from being lowered, thereby reducing the maintenance cost associated with photonic element replacement and shortening the operational downtime of the lamp due to maintenance. Example 5 Figure 5 is a schematic view of the microwave-excited hydrogen ultraviolet lamp, which is used to explain a fifth example according to the first preferred embodiment of the present invention, which illustrates the use of the emission light to remove the adhesion to the location. The method of carbon on the optical system within the vacuum region. Further details of the structural and operational elements that are identical to the examples will be omitted. The detailed description of the light transmission window 8 is the same as that explained in the example. In Figure 5, the position of the optical element 27 receives the light emitted by the lamp 9. Further explanation of the optical element will be omitted because it is identical to the explanation in Example 4. In Example 5, in order to confirm the effect of the present invention, the lamp was operated in a gas-free supply until the transmittance of the interference level decreased from the original value of 1% to 50%. The transmissivity is halved and the optical element is placed in the vacuum region 14. The method of Example 2 was used to supply water vapor to the vacuum zone 14 under the condition that the partial pressure of water vapor in the vacuum zone 14 was maintained at 1 mtorr. At the same time, the wide door aperture is adjusted to provide 5mtorr, 2mtorr, 〇.〇1 mtorr and 0.005 mtorr for experiments, which can achieve the same carbon removal effect. 92980.doc -49· 1356439 Next, the discharge plasma is used to excite the hydrogen atoms to emit vacuum ultraviolet light for a period of 90 hours (about 4 days). When the water vapor is supplied during the operation of the lamp, the adhesive carbon 15 can be removed from the surface of the optical member 27, and in fact the transmittance of the optical member 27 is restored to its original state. When the surface of the optical element was observed under an optical microscope, it was found that any adhesive "as explained above" operates in the case of feeding water vapor, and the carbon 15 adhered to the optical member 27 can be removed. This method recovers the deteriorated optical component, thereby reducing the maintenance costs associated with the replacement of the optical component and reducing the operational downtime of the lamp due to maintenance. Example 6 FIG. 6 is a schematic view of the microwave-excited hydrogen ultraviolet lamp, which is used to explain a sixth example according to the first preferred embodiment of the present invention, which illustrates the use of the emission light to remove the adhesion to the location. A method of carbon 15 on an optical system within vacuum zone 14. Further details of the structural components and operational components that are identical to the examples will be omitted. The detailed description of the light transmission window 8 is the same as that explained in the example i. In Figure 6, the position of the optical element 27 receives the light emitted by the lamp 9. Further explanation of the optical element will be omitted because it is identical to the explanation in Example 4 in Example 6. To confirm the effect of the present invention, the lamp will operate in a gas-free supply until the transmittance of the interference level is from the original The value of 1% is lowered to 50% and the transmittance is intentionally halved, and then the optical element 27 is placed in the vacuum region 14 at 92580.doc 1356439. The method of Example 3 is for supplying atmospheric components to the vacuum zone 14 under the condition that the atmospheric component partial pressure gauges in the vacuum zone 14 are held at 1 mt rr. At the same time, the width of the wide door is adjusted to provide 2 mtorr & 〇 1 claw (7) atmospheric partial pressure to carry out the experiment, which can obtain the same carbon removal effect. The discharge plasma is then used to excite the hydrogen atoms to emit a vacuum 1 external light for a period of 9 hours (about 4 days). When the atmospheric component is supplied during the operation of the lamp, the adhesive carbon 15 can be removed from the surface of the optical member 27, and in fact the transmittance of the optical member 27 is restored to its original state. When the surface of the optical element is observed under an optical microscope, no dots are found. As explained above, the operation of the atmospheric component can remove the carbon adhering to the optical element 25. This method can restore the deteriorated optical element, thereby reducing the maintenance cost associated with the replacement of the optical element. And shorten the operational downtime caused by the maintenance of the lamp. [Second Preferred Embodiment] A second preferred embodiment of the present invention will be explained hereinafter with reference to the accompanying drawings in which a protective film is applied over the light-transmitting window to prevent or suppress the window from being damaged. To deterioration. However, the present invention is not limited to such a configuration, and it is naturally applicable to lamps and laser elements that emit light by electrical discharge or heating. Figure 8 is a schematic illustration of a microwave excited hydrogen ultraviolet lamp which will be used to illustrate specific embodiments 1-3 of the present invention. The flange 17 of the light-transmitting window 8 is in the shape of a dish, and the center thereof will have an inner lining of the discharge tube, and it has an opening. The diameter of the opening is 92980.doc -51· 1356439 »the diameter of the opening is larger than that of the discharge tube diameter. The window flange 17 includes a ring-shaped annular groove 13b as a member for sealing the light-transmitting window 8 on the opening, and also includes a hollow-shaped cap-shaped frame 2 (which includes a plurality of attachments for attachment purposes) A bolt hole) and a meandering annular groove 13a for attaching to the discharge tube i and further allowing the flange 17 to maintain a vacuum. The inner surface of the frame 20 is composed of a two-stage concentric hollow cylinder which encloses a space for mounting the light-transmitting window 8 and the discharge tube 1. On the end surface of the side surrounding the discharge tube 1, an O-ring 13c is attached, which is mounted in a corresponding U-diagonal cutting surface. In addition, a plurality of spirals (not shown) are cut on the outer peripheral surface of the end, allowing the installation of a columnar, open cap 21 which secures the beak ring 13c in the correct place and defines the discharge tube. Vacuum boundary. The window attachment flange 17, the frame 2, and the cap 21 are all made of metal, usually stainless steel or aluminum (which is not a good source of contamination), although the material is not limited to the metals. The operation of the microwave-excited hydrogen ultraviolet lamp having the above structure will be explained. First, 1/1 〇〇 hydrogen dilution gas in helium gas was supplied to the discharge vessel at a rate of 20 sccm via the discharge gas supply opening 2. The discharge gas is discharged from the discharge gas vent hole 3 by a vacuum pump (not shown), and by adjusting the aperture of the discharge gas vent hole 3 and a valve (not shown) installed between the vacuum pumps Controlling the exhaust behavior to maintain the interior of the discharge vessel at about 5 Torr (665 Pah, the discharge gas flowing from the light transmission window side toward the discharge tube i is as far as possible away from the light transmission window 8 Discharge any material generated by the discharge plasma 7 inside the discharge tube to reduce the source of contamination on the window 8 of the 92980.doc • 52-1356439. The microwave oscillation is the shape of the column 18, which is the microwave oscillation. a structure, which allows adjustment of the microwave electromagnetic field distribution within the microwave oscillator, and whose inner diameter is such that it can surround the discharge tube 1. In addition, its structure allows the month b to be inserted and aligned with the microwave In the axial direction of the end surface of the oscillator 4, it can slide in the axial direction while maintaining electrical conductivity with the microwave oscillator 4. The tuner 18 is made of copper or brass, and is used by the microwave blue 4 Same material The function of the tuner 18 is to adjust the microwave electromagnetic field distribution based on its insertion depth to generate a plasma 7 to concentrate the microwave generation at the center 6. Next, the microwave supply connector 5 is supplied with 2.45 GHz, 5 The microwave of 〇w is supplied to the microwave oscillator 4. The microwaves may be continuously supplied, or may be intermittently supplied. A regulator (not shown) is incorporated in the power transmission line connecting the microwave power source and the microwave oscillator. It can be adjusted to control the microwave power between the power source and the load (discharge plasma) for generating a discharge plasma in the discharge tube 1 and the hydrogen atoms excited by the discharge plasma 7 will generate 1〇3111. ^ A vacuum ultraviolet beam with a wavelength of 122 nm that passes through the light transmission window 8 and allows the emitted light 9 to be sent outside.

MgF2(氟化鎂)單晶可用來製造透光視窗8,而且其晶軸(c 軸)會垂直該透光視窗的表面β 於將透光視窗8安裝在圖8所示的位置之前,已經先在其 表面10之上塗敷一 Abo〆氧化鋁)薄膜塗層,作為保護膜 10 Α。該塗層係利用離子束濺鍍類型的膜形成法進行塗敷。 現在將解釋離子束膜形成法。以壓力維持在〇1匕的Ar 92980.doc •53- 1356439 %境作為膜形成氣體,並且利用20 kV的Ar離子加速電壓撞 擊3英吋Φ的經燒結a 12〇3目標物(純度4N),以便將源自該 目標物的Al2〇3濺鍍至透光視窗8的表面1〇之上,用以產生 該膜。可以利用一石英振盪器來實施膜厚度控制,其方式 错由冑先產生一校正曲線來詳細描述石英晶體振盪器數 量中的變化里與該膜厚度之間的關係。藉此,相應改變振 盪時間便可讓該膜形成預期的厚度。 用於產生保護膜10A的塗佈法並不僅限於上述的離子束 踐鍍膜形成法。可正確選擇方法與元件來產生由預期組成 物所構成的膜。其它可能的方法包括氣相法,例如蒸氣沉 積法、離子電鑛法、CVD法等。 料膜UU的正確膜厚度係取決於該等光學系統的表面 覆蓋情形及該122 nm真空紫外光㈣要的透射率。 保墁膜厚度的關係圖 較。如圖13所示,該 圖,其係與無任何塗層的初始狀態作比A MgF2 (magnesium fluoride) single crystal can be used to fabricate the light-transmissive window 8, and its crystal axis (c-axis) is perpendicular to the surface β of the light-transmitting window before the light-transmitting window 8 is mounted at the position shown in FIG. An ABo(R) Alumina) film coating is applied over the surface 10 as a protective film 10 Α. The coating is applied by a film formation method of an ion beam sputtering type. The ion beam film formation method will now be explained. Ar 92980.doc • 53-1356439 % maintained at a pressure of 〇1匕 as a film forming gas, and a sintered a 12〇3 target (purity 4N) of 3 吋Φ with a 20 kV Ar ion accelerating voltage. So that Al 2 〇 3 derived from the target is sputtered onto the surface 1 透光 of the light-transmitting window 8 to produce the film. The film thickness control can be carried out using a quartz oscillator in such a manner that a calibration curve is first generated to describe in detail the relationship between the variation in the number of quartz crystal oscillators and the thickness of the film. Thereby, the film is formed to a desired thickness by varying the oscillation time accordingly. The coating method for producing the protective film 10A is not limited to the above-described ion beam coating forming method. The method and components can be selected correctly to produce a film composed of the desired composition. Other possible methods include gas phase processes such as vapor deposition, ionization, CVD, and the like. The correct film thickness of the film UU depends on the surface coverage of the optical system and the desired transmittance of the 122 nm vacuum ultraviolet light. The relationship between the thickness of the film is compared. As shown in Figure 13, the figure is compared to the initial state without any coating.

面可顯示出,必須將該基板覆蓋至2 圖13為敷ai2〇3作為透光視窗塗層時,透光率變化與該 保護膜厚度的關係圖,立仫偽起& a & β ... 人 々顯微鏡)來觀察該表 nm以上的膜厚度, 92980.doc -54- 1356439 便形成一平坦、光滑的薄膜。 另外’就以有效保護該光學系統表面為目的所產生的20 nm以上非常厚的膜厚度而言,吾人發現,如果利用Si〇2或The surface can be shown that the substrate must be covered to 2 Figure 13 is the relationship between the change of the transmittance and the thickness of the protective film when applying ai2〇3 as the light-transmissive window coating, and the pseudo-pickup & a & ... human microscope) to observe the film thickness above the nm, 92980.doc -54 - 1356439 to form a flat, smooth film. In addition, in terms of a very thick film thickness of 20 nm or more produced for the purpose of effectively protecting the surface of the optical system, we have found that if Si〇2 or

AhO3、Mg〇、Ti0^Zr〇2所製成的保護臈,由於其對真空 紫外光的吸收率非常高,所以於使用該等光學系統時,該 等光學系統的特徵便會遭到實質劣化,而且該保護膜本身 的吸收所造成劣化與熱量便會導致其剝離,否則便會於該 光學系統的表面上產生問題。因為吸收真空紫外光會造成 光學系統無法如預期般地運作,所以膜厚度的上限會設在 2〇nm以上,較佳的係12nm以上,更佳的係10nm以上。 於目前的範例中,採用的係6 nm的保護膜厚度。於此保 護膜厚度處,122 nm波長光的透射率為5〇%,其中未使用 任何保護膜之初始狀態的透射率係指派為1〇〇〇/。。 此外,光二極體12的位置可接收燈發射光9,用來監視該 燈的光輸出。 ,接著,便可利用光二極體12來測量具有上述結構之微波 受激氫氣紫-外光燈的光輸出量中的任何變化。 首先,利用電漿7來激發該等氫原子,並且產生真空紫外 光波長範圍中的光,時間持續9〇個小時(約4天)。接著,利 用一不具有任何保護膜的透光視窗來取代透光視窗8,作為 控制組,並且重覆該項測試並且比較結果。 可以採用下面的估算方法》該透光視窗的初始透射率為 Tl(於控制實驗的情況中,T。,,使用後(也就是,9〇個小 時後較低的透射率為了2,然後便可以下面㈣式來叶算 92980.doc -55- 1356439 透射率的變化Δτ[%]: δΤ=(Τι-Τ2)/90 等式(1) 同時如下面等式的定義,亦可以劣化率K[%/hr.]來表示變化 . 率。 Κ=1〇〇 . ΔΤ/Τ〇 等式(2) 比較劣化率κ的大小便可快速地量化及估算透光視窗8的 劣化情形。當然,Κ值越低,該透光視窗的劣化情形越和緩, 其壽命就越長,而且需要進行置換的頻率就越低。 結果顯示,當於透光視窗8上使用一保護膜(Al2〇3)時’ 魯 劣化率Κ便為〇_〇4%/Hr。相反地,控制組的劣化率κ為 0.46%/Hr,約為經塗佈視窗的丨丨倍。以此估算為基礎,五 等發現,相較於未使用任何塗層,透光視窗8上的保護膜l〇A 可對壽命造成約1 〇倍的改良效果。 為證實保護膜10A的效果,將針對塗佈A12〇3作為保護膜 10A的透光視窗8於一燈之中使用前與使用後的xps表面分 析結果加以解釋;並且針對不具有保護膜的透光視窗的表 _ 面於一燈之中使用前與使用後的XPS表面分析結果加以解 釋,作為控制組。 圖9為該控制組使用前的分析結果。水平軸為氬氣時間, 其大小與濺鍍深度成正比。濺鍍時間零分鐘表示的係濺鍍 〜 前的初始狀態,而且其對應的係晶體表面的分析。一般來 _ 說,利用XPS分析,針對初始狀態所獲得的資訊反映的係 該物質的自然污染,其係以碳、氧或類似氣體的吸收成份 作為偵測結果。不過,因為實際上並無任何氣體,所以可 92980.doc -56- 1356439 從分析資料中省略。垂直轴表示的係XPS所發現的各種元 素的比例。 圖9顯示出’於使用前’該控制視窗沒有任何的氟損失。 雖然於該表面上發現微量的氧,不過,於該晶體内則未發 現有任何的氧存在。污染材料中的氧會自然地於該表面上 被吸收的原因係因為氬氣濺鍍會將其推入至該晶體之中。 據此,針對該晶體内有氧氣存在或不存在的情形,圖9所示 的氧氣數量應該解釋為作為校正其它分析結果之基礎所應 該使用的微小數量。 圖10為該控制組使用後的分析結果。圖10清楚地顯示出 該控制樣本表面中有氟損失。於該晶體中和該缺IL層相同 的深度處還會發現有大量的氧氣存在。因此,於該使用後 的控制樣本中,表面層顯示出缺F及氧化情形。此表面狀態 係造成122 nm波長真空紫外光之透射率下降的主要原因: 現在,會於透光視窗8之上塗敷由Al2〇3所製成厚度約$ nm的保護膜10入,而圖u顯示的則係使用前的分析結果。 該關係圖的-座標軸及解釋和圖9相同,其進一步細節將會省 略。於該關係圖中新加入了 A1(鋁),其為其中—種保護^成 份。圖11顯不出亂和鎂的同步曲線係從表面延伸至内部, 而氧與銘的同步曲線係從表面層延伸至内部。因此,儘管 有該保護膜塗層,;XPS分析合你兮矣品a 刀祈曰從該表面層偵㈣及鎮的信 號的原因係因為該XPS分析的解析度於深度方向中為數個 咖。因此,即使試圖測量理想的邊界分佈情形,不過 解析度寬度的形狀非常寬闊,所以其曲 丹曲線將不會呈現出階 92980.doc -57· 1356439 梯狀。另外,就5 nm的保護膜厚度而言,如果未實施約汕 分鐘的濺鍍的話,那麼該基板的MgF2晶體將會維持裸露。 這係因為Alz〇3及MgF2間的濺鍍效率差異所造成的結果。 專注於此點便可瞭解F及Mg、0及八丨曲線為同步的區域。 隶後,圖12顯示的係已經塗佈一約6 nm厚之a丨2〇3作為保 護膜的透光視窗8於使用後的分析結果。該等座標軸及解釋 和圖9相同,其進一步細節將會省略。圖12顯示出從表面延 伸至内部的氧與鋁的曲線係同步的。另外,圖中並未證實 該晶體内部有氧存在。此結果讓人瞭解,該保護膜已經避 免氧侵入該晶體内部。 相反地,從表面進入中心的氟與鎂的曲線係不同步的。 吾人可以清楚看出氟已經滲入保護膜…入的人丨2…之中。不 過,因為有保護膜10A的關係,雖然有氟存在於該保護膜内 部,但是氟並不會完全被排出而如同控制組(利用該機制其 便可輕易地以氧侵入作為替代物)中的情況般導致缺氟結 果。實際上,如果考慮圖12中沒有任何保護膜的情況的話, 便很容易解釋圖10所述之缺氟層及氧化物層的形成結果。 如上面的解釋般,利用保護膜1〇A作為透光視窗8上的塗 層,可以抑制缺氟層的生成,並且防止或抑制氧(氧化物層) 存在於該晶體内,而且當與控制組作比較時,具有該保護 膜塗層的透光視窗的劣化率K會降低約1〇倍。 此外,當利用si〇2塗層(膜厚度6nm)作為透光視窗8的保 護膜時,劣化率K約為0.06%/Hr。相反地,控制處的劣化率 K約為0.46%/Ηι*。此結果證實即使於該保護膜中使用s, 92980.doc -58- 1356439 亦可達到雷同的保護程度,劣化率K會有約8倍的改良效果β 此外和Ah〇3相同’亦可使用河§〇、1^〇2'&〇2等金屬氧 化物作為該等保護膜的材料,相較於氟化合物,在紫外光 照射下,該等金屬氧化物比較不會變色。 如上所述,根據本發明其上會形成保護膜的光學系統的 光學特性本身(例如,若為透光視窗,該特性則係透光率) 不如預先塗佈狀態中不具有該保護膜所提供的光學特性。 不過,並不適合單獨評估該些光學系統,比較重要的係評 估其被併入一光輸出元件(該元件係運用一光輸出元件之 系先的部伤)作為其一部份的效能。也就是,可以補償該 光學輸出元件中該等光學系統的前述初始缺點,並且讓該 光輸出符纟該系統所|求的規格,使纟可以維持該光學輸 出疋件的輸出並且提高其壽命,從而達到提供光學輸出元 件的目的其中可貫質降低其透光視窗的維修頻率及維修 成本。 此外,使用本發明作為測量應用中的光源特別有利。其 中一個範㈣對環境污染物的生成情形實施長期監視或類 似的作業。一般來說,當進行此類測量時,測量信號大小 及靈敏度係與該光輸出的平方值成正比。如上述,在°先前 技術中,改良該光源輸出便可改良該光源的測量靈敏度, 不過該等光學线的最終劣化情形則使其必須抑制該光學 系統的劣化情形使其不會降低光輸出並且減低測量靈敏 度。本發明中所使用的光學系統可延長該光輪出元件的壽 命,並且長期地維持更穩定的輸出特性,以便解決前面的 92980.doc -59- 1356439 問題並且提供一適合於長期環境監視中使用的光輸出元 件。 上面的實現範例係利用透光視窗作為範例,不過,其亦 可套用於利用反光面鏡(視窗)的元件中。此等反光面鏡範例 為使用於雷射振盪器中的反光面鏡及燈中所使用的聚光面 鏡。因此,該等反光面鏡可使用於雷同的實現範例中。 發明效果 如上所述,本發明可防止或抑制光學系統遭到劣化,特 別是因為碳增長所造成的劣化,碳增長會降低透射率並且 決定前面系統與光學元件的壽命,從而本發明可於運用高 光子能量光(例如慣用的紫外光或真空紫外光)之各種光學 裝置中降低置換光料、統之維修作㈣頻率並且降低作業 成本,當使用於利用複數個光學元件的系統中時,當該等 透射或反射光學元件係、位於—可分解之有機成份所在的近 真空區域的邊界㈣’透射、折射、頻譜生成、干涉等其 中一種或組合光學效果便可對作為繞射、折射、頻譜生成、 透射之真空區内之光路徑中的光學元件造成劣化,或者會 有欲進行照射的解析位置調整光學元件或其它表面存在, 其包括光學70件的容H、密封材料及位置調整儀器,例如 採用真空紫外光的半導體工業中所用的曝光裝置(步進機) 及色板。 明確地4 ’藉由防止或抑制因光學系統表面上的碳增長 而k成光子系統的透光率下降,便可防止或抑制該等光學 系統遭到劣化,從而減低置換光學系統的維修作業頻率, 92980.doc 1356439 並且降低作業成本。 另外#由防止或抑制增長於真空區域内光路徑中的光 學系統中的破照射表面及發射表面上,便可延長下游儀器 的壽命,並且改良該儀器的可靠度。 明確地說,因為本發明可防止或抑制因該透光視窗及其 匕光干元件上之碳増長而造成透光率減低,所以便可延長 清潔或置換該透光視窗的必要維修間隔,#而可改良該儀 器的運作速率並且減低維修成本。 另外,藉由防止或抑制增長於光輸出裝置可放射光之真 空區域内所使用之光學元件與光學系統的被照射表面及發 射表面上,便可延長下游裝置的壽命,並且改良該儀器的 可罪度。另外,本發明的方法可用來照射先前因碳增長而 遭到劣化的光學元件,以便照射該些已遭到劣化的光學元 件,並且將其復原至其原來的狀況。 因此,利用本發明,便可延長前述真空區域内所使用之 光學元件的清潔或置換維修循環,從而可改良該儀器的運 作速率並且-減低維修成本。 如上述’因為本發明可防止或抑制光學系統遭到劣化, 並且延長其必須被置換的維修循環,所以可以改良該儀器 的運作速率並且減低維修成本。 再者’將本發明的光學系統併入會運用光的儀器中,便 可延長此儀器的壽命,並且確保該儀器經過長時間後仍然 會有穩定的輸出特徵。 【圖式簡單說明】 92980.doc -61- 1356439 圖1為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第一範例。 圖2為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第二範例。 圖3為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第三範例。 圖4為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第四範例。 圖5為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第五範例。 圖6為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第一較佳具體實施例的第六範例。 圖7為根據本發明第一較佳具體實施例,針對黏著於該透 光視窗上之碳所作的ΕΡΜΑ分析結果。 圖8為一微波受激氫氣紫外光燈之結構示意圖,其係用來 解釋根據本發明第二較佳具體實施例。 圖9為不—具有保護膜塗層之透光視窗於被使用前之XPS 深度分佈測量關係圖。 圖10為不具有保護膜塗層之透光視窗於被使用後之XPS 深度分佈測量關係圖。 圖11為具有保護膜塗層之透光視窗於被使用前之XPS深 度分佈測量關係圖。 圖12為具有保護膜塗層之透光視窗於被使用後之XPS深 度分佈測量關係圖。 92980.doc 1356439 圖13為一光學系統初始狀態中之透光率在各種保護膜厚 度之間的關係圖。 圖14為根據先前技術之慣用的微波受激氫氣紫外光燈的 示意圖。 【主要元件符號說明】 1 放電管 2 放電氣體供應開孔 3 排氣孔 4 微波振盪器 5 微波供應連接器 6 微波濃度 7 放電電漿 8 透光視窗 9 真空紫外光 10 内表面 10A 保護膜 11 外表面 12 光二極體 13 〇形環 13a Ο形環狀溝槽 13b Ο形環狀溝槽 13c Ο形環 14 真空區域 15 碳 92980.doc -63- 1356439 16a 輸送管 16b 輸送管 16c 輸送管The protective enamel made of AhO3, Mg〇, Ti0^Zr〇2 has a very high absorption rate of vacuum ultraviolet light, so the characteristics of these optical systems are substantially degraded when using these optical systems. Moreover, the deterioration of the protective film itself and the heat cause the peeling thereof, which may cause problems on the surface of the optical system. Since the absorption of vacuum ultraviolet light causes the optical system to fail to operate as expected, the upper limit of the film thickness is set to be 2 nm or more, preferably 12 nm or more, more preferably 10 nm or more. In the current example, a 6 nm protective film thickness was used. At the thickness of the protective film, the transmittance of light at a wavelength of 122 nm was 5 %, and the transmittance of the initial state in which no protective film was used was assigned as 1 〇〇〇 /. . In addition, the position of the photodiode 12 can receive the light emitted by the lamp 9 for monitoring the light output of the lamp. Then, the photodiode 12 can be used to measure any change in the light output of the microwave excited hydrogen violet-external lamp having the above structure. First, the plasma 7 is used to excite the hydrogen atoms, and light in the ultraviolet ultraviolet wavelength range is generated for a period of 9 hours (about 4 days). Next, the light-transmitting window 8 was replaced with a light-transmissive window having no protective film as a control group, and the test was repeated and the results were compared. The following estimation method can be used: The initial transmittance of the light transmission window is Tl (in the case of the control experiment, T., after use (that is, the lower transmittance after 2 hours is 2, then The following equation (4) can be used to calculate the transmission change Δτ [%]: δ Τ = (Τι - Τ 2) / 90 Equation (1) At the same time, as defined by the following equation, the degradation rate K can also be [%/hr.] to indicate the change. Rate. Κ=1〇〇. ΔΤ/Τ〇 Equation (2) Comparing the magnitude of the degradation rate κ, it is possible to quickly quantify and estimate the deterioration of the light-transmitting window 8. Of course, The lower the enthalpy value, the slower the deterioration of the light-transmissive window, the longer the life of the light-transmissive window, and the lower the frequency at which replacement is required. The result shows that a protective film (Al2〇3) is used on the light-transmitting window 8. When the 'degradation rate is 〇 〇 4% / Hr. Conversely, the deterioration rate κ of the control group is 0.46% / Hr, which is about 丨丨 times the coated window. Based on this estimation, the fifth It was found that the protective film l〇A on the light-transmitting window 8 can improve the life by about 1 较 compared to no coating used. The effect of the protective film 10A is explained by the results of the xps surface analysis before and after use of the light-transmitting window 8 for coating A12〇3 as the protective film 10A; and for the light-transmitting window without the protective film The surface of the table _ is explained before use and the XPS surface analysis results after use as the control group. Figure 9 shows the analysis results before use of the control group. The horizontal axis is argon time, its size and sputtering The depth is proportional to. The sputter time is zero minutes, which indicates the initial state before sputtering, and the analysis of the corresponding crystal surface. Generally speaking, using XPS analysis, the information obtained for the initial state reflects The natural contamination of matter, which is the result of the absorption of carbon, oxygen or similar gases. However, since there is actually no gas, it can be omitted from the analysis data 92980.doc -56-1356439. Vertical axis representation The ratio of the various elements found in the XPS. Figure 9 shows that the control window does not have any fluorine loss before use. Although traces of oxygen are found on the surface, No oxygen is found in the crystal. The reason why the oxygen in the contaminated material is naturally absorbed on the surface is because argon sputtering pushes it into the crystal. For the presence or absence of oxygen in the crystal, the amount of oxygen shown in Figure 9 should be interpreted as a small amount that should be used as a basis for correcting other analytical results. Figure 10 shows the results of the analysis after use of the control group. 10 clearly shows that there is fluorine loss in the surface of the control sample. A large amount of oxygen is also found in the crystal at the same depth as the IL-deficient layer. Therefore, in the control sample after use, the surface layer is displayed. Fracture F and oxidation. This surface condition is the main cause of the decrease in the transmittance of vacuum ultraviolet light at 122 nm: Now, a protective film 10 made of Al2〇3 and having a thickness of about $ nm is applied over the light-transmitting window 8, and FIG. The results of the analysis before use are shown. The coordinate axis and interpretation of the diagram are the same as in Figure 9, and further details will be omitted. A1 (aluminum) has been newly added to the diagram, which is one of the protection components. Figure 11 shows that the synchronization curve of magnesium and magnesium extends from the surface to the inside, and the synchronization curve of oxygen and inscription extends from the surface layer to the inside. Therefore, despite the protective film coating, the XPS analysis is based on the fact that the signal from the surface layer (4) and the town is signaled because the resolution of the XPS analysis is several in the depth direction. Therefore, even if you try to measure the ideal boundary distribution, the shape of the resolution width is very wide, so the curve of the curve will not appear as a step 92980.doc -57· 1356439. In addition, in the case of a protective film thickness of 5 nm, if the sputtering of about 汕 minute is not performed, the MgF2 crystal of the substrate will remain bare. This is due to the difference in sputtering efficiency between Alz〇3 and MgF2. Focus on this point to understand the areas where F and Mg, 0 and gossip curves are synchronized. Thereafter, the graph shown in Fig. 12 has been coated with a light-transmissive window 8 of about 6 nm thick a丨2〇3 as a protective film after use. The coordinate axes and explanations are the same as in Fig. 9, and further details will be omitted. Figure 12 shows that the oxygen and aluminum curves extending from the surface to the inside are synchronized. In addition, the presence of oxygen in the crystal was not confirmed in the figure. This result shows that the protective film has prevented oxygen from intruding into the interior of the crystal. Conversely, the curve of fluorine and magnesium from the surface into the center is not synchronized. We can clearly see that fluorine has penetrated into the protective film... into the person 丨 2... However, because of the relationship of the protective film 10A, although fluorine is present inside the protective film, fluorine is not completely discharged as in the control group (which can be easily replaced with oxygen intrusion by this mechanism). The situation led to a lack of fluoride. In fact, if the case of the absence of any protective film in Fig. 12 is considered, the formation results of the fluorine-deficient layer and the oxide layer described in Fig. 10 can be easily explained. As explained above, by using the protective film 1A as a coating on the light-transmissive window 8, it is possible to suppress the formation of the fluorine-deficient layer and prevent or suppress the presence of oxygen (oxide layer) in the crystal, and when and control When the group is compared, the deterioration rate K of the light-transmitting window having the protective film coating is reduced by about 1 times. Further, when the si〇2 coating (film thickness: 6 nm) was used as the protective film of the light-transmitting window 8, the deterioration rate K was about 0.06%/Hr. Conversely, the deterioration rate K of the control is about 0.46% / Ηι *. This result confirms that even if s is used in the protective film, 92980.doc -58-1356439 can achieve the same degree of protection, and the deterioration rate K has an improvement effect of about 8 times. β is also the same as Ah〇3. Metal oxides such as 〇, 1^〇2'&〇2 are used as materials for the protective films, and the metal oxides do not change color under ultraviolet light irradiation as compared with fluorine compounds. As described above, the optical characteristics of the optical system on which the protective film is formed according to the present invention (for example, if it is a light-transmitting window, the characteristic is light transmittance) is not provided by the protective film in the pre-coated state. Optical properties. However, it is not suitable to evaluate these optical systems separately. The more important one is to evaluate the effectiveness of being incorporated into a light output component that uses a prior art component of a light output component. That is, the aforementioned initial shortcomings of the optical systems in the optical output element can be compensated for, and the light output is such that the system can maintain the output of the optical output element and increase its lifetime. Therefore, the purpose of providing the optical output component can be achieved, wherein the maintenance frequency and the maintenance cost of the light transmission window can be reduced. Furthermore, it is particularly advantageous to use the invention as a light source in measurement applications. One of them (4) implements long-term monitoring or similar operations on the generation of environmental pollutants. In general, when making such measurements, the measured signal size and sensitivity are proportional to the square of the light output. As described above, in the prior art, improving the output of the light source can improve the measurement sensitivity of the light source, but the final deterioration of the optical lines makes it necessary to suppress the deterioration of the optical system so that the light output is not lowered and Reduce measurement sensitivity. The optical system used in the present invention extends the life of the light wheeled component and maintains a more stable output characteristic over a long period of time in order to solve the aforementioned problem of 92980.doc -59-1356439 and to provide a suitable for long-term environmental monitoring. Light output element. The above implementation example uses a light-transmissive window as an example, but it can also be used in components that utilize a mirror (view). Examples of such mirrors are the mirrors used in laser oscillators and the concentrating mirrors used in lamps. Therefore, these mirrors can be used in the same implementation example. Effect of the Invention As described above, the present invention can prevent or suppress deterioration of an optical system, particularly due to deterioration caused by carbon growth, which reduces transmittance and determines the life of the front system and the optical element, so that the present invention can be applied High optical photon energy (such as conventional ultraviolet light or vacuum ultraviolet light) in various optical devices to reduce replacement light, maintenance (4) frequency and reduce operating costs, when used in systems using multiple optical components, when The transmissive or reflective optical element is located at the boundary of the near vacuum region where the decomposable organic component is located (4), such as transmission, refraction, spectrum generation, interference, etc., or a combination of optical effects can be used as diffraction, refraction, and spectrum. The optical element in the light path in the generated, transmitted vacuum region is degraded, or there is an analytical position adjustment optical element or other surface to be illuminated, including 70 pieces of optical H, sealing material and position adjustment instrument, For example, an exposure device (stepper) used in the semiconductor industry using vacuum ultraviolet light And swatches. Clearly 4' by preventing or suppressing the decrease in the transmittance of the photosystem caused by the carbon growth on the surface of the optical system, it is possible to prevent or suppress the deterioration of the optical system, thereby reducing the maintenance operation frequency of the replacement optical system. , 92980.doc 1356439 and reduce operating costs. In addition, by preventing or suppressing the growth of the under-illuminated surface and the emitting surface in the optical system in the optical path in the vacuum region, the life of the downstream instrument can be extended and the reliability of the instrument can be improved. In particular, since the present invention can prevent or suppress the decrease in light transmittance due to the carbon enthalpy on the light-transmitting window and its light-emitting element, the necessary maintenance interval for cleaning or replacing the light-transmitting window can be extended. It can improve the operating speed of the instrument and reduce maintenance costs. In addition, by preventing or suppressing the growth of the optical component and the illuminated surface and the emitting surface of the optical system used in the vacuum region where the light output device can emit light, the life of the downstream device can be extended, and the instrument can be improved. Guilty. Additionally, the method of the present invention can be used to illuminate optical components that have previously been degraded by carbon growth to illuminate the optical components that have been degraded and restore them to their original condition. Therefore, with the present invention, it is possible to extend the cleaning or replacement maintenance cycle of the optical member used in the aforementioned vacuum region, thereby improving the operating rate of the instrument and reducing the maintenance cost. As described above, since the present invention can prevent or suppress deterioration of the optical system and extend the maintenance cycle in which it must be replaced, the operating speed of the apparatus can be improved and the maintenance cost can be reduced. Furthermore, incorporating the optical system of the present invention into an instrument that utilizes light can extend the life of the instrument and ensure that the instrument will still have stable output characteristics over time. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a first example according to a first preferred embodiment of the present invention. Fig. 2 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a second example of the first preferred embodiment of the present invention. Fig. 3 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a third example of the first preferred embodiment of the present invention. Fig. 4 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a fourth example according to the first preferred embodiment of the present invention. Fig. 5 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a fifth example of the first preferred embodiment of the present invention. Fig. 6 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a sixth example of the first preferred embodiment of the present invention. Figure 7 is a graph showing the results of enthalpy analysis for carbon adhered to the permeable window in accordance with a first preferred embodiment of the present invention. Figure 8 is a schematic view showing the structure of a microwave excited hydrogen ultraviolet lamp for explaining a second preferred embodiment of the present invention. Figure 9 is a plot of XPS depth profile measurement for a non-transparent window with a protective film coating before being used. Figure 10 is a graph showing the XPS depth distribution measurement relationship of the light-transmitting window without the protective film coating after being used. Fig. 11 is a graph showing the relationship of XPS depth distribution measurement of a light-transmitting window having a protective film coating before being used. Fig. 12 is a graph showing the XPS depth distribution measurement relationship of the light-transmitting window having the protective film coating after being used. 92980.doc 1356439 Figure 13 is a graph showing the relationship between the light transmittance in the initial state of an optical system and the thickness of various protective films. Figure 14 is a schematic illustration of a conventional microwave excited hydrogen gas ultraviolet lamp according to the prior art. [Main component symbol description] 1 Discharge tube 2 Discharge gas supply opening 3 Exhaust hole 4 Microwave oscillator 5 Microwave supply connector 6 Microwave concentration 7 Discharge plasma 8 Light transmission window 9 Vacuum ultraviolet light 10 Inner surface 10A Protective film 11 Outer surface 12 photodiode 13 〇 ring 13a Ο ring groove 13b Ο ring groove 13c Ο ring 14 vacuum area 15 carbon 92980.doc -63- 1356439 16a duct 16b duct 16c duct

16d 輸送管 17 凸緣 18 微波振盪器調諧器 19 洩漏閥16d duct 17 flange 18 microwave oscillator tuner 19 leak valve

20 型架 21 鎖緊帽 22 調節器 23 氧氣瓶 24 玻璃管 25 水 27 光學元件20 frame 21 locking cap 22 adjuster 23 oxygen cylinder 24 glass tube 25 water 27 optical components

92980.doc -64-92980.doc -64-

Claims (1)

1356439 |0牌*贷^0曰修正本 第093112330號專利申請案 中文申請專利範圍替換本(100年5月) 十、申請專利範圍: 一種光學特性復原裝置,藉由防止、抑制、或改良位於 輸出光中或位於該輸出光之光路徑中之 特性劣化而改良光學系統之光學特性的可靠度 其中該光學系統係位於一有機成份可被分解的近真空區 域内’該劣化係因沉積或累積在該光學系統之光照:表 面、光反射表面、光發射表面(通稱為「發光表面」)上的 碳所造成的,而且該等表面係面向該真空區域,該 特性復原裝置包括: + -構件用於產生近真空區域,其可於活性能量存在時 激發碳的氧化反應,該近真空區域係面向該光學系統的 5亥等發光表面者; 一構件用以於該近真空區域中產生0H基團、oH-離子 、臭氧、02-離子、〇-基團等含氧原子的不穩定化學種; 一構件於該近真空區域内促進該等含氧原子的不穩定 化學種與該碳之間進行氧化反應;以及 其中該光學特性復原裝置會藉由該氧化反應移除或減 少沉積於該發光表面上之累積碳。 2. -種光學特性復原裝置’藉由防止、抑制、或改良位於 輸出光中或位於該輸出光之光路徑中之光學系統的光學 特性劣化而改良光學系統之光學特性的可靠度及壽命, 中該光學系統係位於一有機成份可被分解的近真空區 域内°玄劣化係因沉積或累積在該光學系統之光照射表 面、光反射表面、光發射表面(通稱為「發光表面」)上的 92980-I000520.doc 碳所造成的,而且該等表面係面向該真空區域,該光學 特性復原裝置包括: 一構件用於產生近真空區域,以激發碳的氧化反應, 該近真空區域係面向該光學系統的該等發光表面者; 一構件用以於該近真空區域中產生水蒸氣、氧、過氧 化氫、臭氧、或該等氣體與非活性氣體(包含空氣在内) 的混合氣體的氣流; 一構件於該近真空區域内供應活性能量,以便使上述 水洛氣、氧、過氧化氫、臭氧、或該等氣體與非活性氣 體(包含空氣在内)的混合氣體與該碳之間發生氧化反應; 以及 其中該光學特性復原裝置會藉由該氧化反應移除或減 少沉積於該發光表面上之累積碳。 一種光學特性復原㈣’藉由防止、抑制、或改良位於 輸出光中或位於該輸出光之光路徑中之光學系統的光學 特性劣化而改良光學系統之光學特性的可靠度及壽命, 其中該光學系統係位於一有機成份可被分解的近真空區 域内,該劣化係因沉積或累積在該光學系統之光照射表 面、光反射表面、光發射表面(通稱為「發光表面」)上的 碳所造成的,而且該等表面係面向該真空區域,該光學 特性復原方法包含步驟如下: 產生一近真空區域,於活性能量存在時激發碳的氧化反 應,該近真空區域係面向該光學系統的該等發光表面者; 於該近真空區域中產生0H基團、oh-離子、臭氧、〇2- 92980-1000520.doc 1356439 離子、ο-基團等含氧原子的不穩定化學種;以及 4· 藉由讓該沉積碳與該等含氧原子的不穩定化學種進行 反應以移除或減少沉積於該發光表面上之累積碳。 種光于特性復原方法,藉由防止、抑制、或改良位於 輪出光中或位於該輸出光之光路徑中之光學系統的光學 特性劣化而改良光學系統之光學特性的可靠度及壽命, 其中該光學系統係位於—有機成份可被分解的近真空區 域内’該劣化係因沉積或累積在該光學系統之光照射表 面、光反射表面、光發射表面(通稱為「發光表面」)上的 碳所造成的,而且該等表面係面向該真空區域,該光學 特性復原方法包含步驟如下: 產生近真空區域,於活性能量存在時激發碳的氧化 反應,其令該近真空區域係面向該光學系統的該等發光 表面者;以及 供應活性能量’同時供應含氧原子氣體的氣流至該近 真空區域中,以便移除或減少沉積在該發光表面上的累 積碳’其中’該含氧原子氣體係水蒸氣、I、過氧化氣 Φ 、臭氧、或該等氣體與非活性氣體(包含空氣在内)的混合 氣體。 5.如申請專利範圍第3或4項之光學特性復原方法,其中形 成該光路徑的光束係波長在38〇 nm以下的普通紫外光或 是波長在200 nm以下的真空紫外光,而且用於輸出該紫 外光或位於該輸出光之光路徑中的該光學系統係一含有 下述其中一者或其組合物的光學材料:氟化物(例如氟化 92980-I〇〇〇520doc 1356439 鎂、氟化鈣、氟化鋇、氟化鋁、冰晶石、Thi〇Hte或其它 氟化物化合物)、金屬氟化物(例如氟化鑭、氟化鎘氟化 鈾、氟化釔)或高純度的氧化物(例如合成石英玻璃或藍寶 石)。 6.如申請專利範圍第4項之光學特性復原方法,其中於分解 該近真空區域中之有機成份所產生的碳已經成長於該等 光學系統表面及對向表面上的情況中,該等被供應至該 近真空區域中的含氧原子氣體的分壓的下限值係設為高 於碳增長的速度。 7. 如申請專利範圍第4項之光學特性復原方法,其中於將該 真空紫外光照射至該光學系統或由該光學系統進行照射 時以復原該光學系統之該等光學特性的情況中,該等被 供應至該近真空區域中的含氧原子氣體的分壓的上限值 係設為低於該含氧原子氣體對該真空紫外光的吸收就其 在該近真空區域内實施其功能而言無法忽略的程度以 下。 8. 如申請專利範圍第7項之光學特性復原方法,其中係藉由 特定的含氧原子氣體的分壓實際填充該近真空區域將該 含氧原子氣體的分壓的上限值設至某一程度,然後測量 該光路徑上之真空紫外光的量’以檢查其衰減程度。 9. 如申請專利範圍第3或4項之光學特性復原方法,其中形 成該光路徑的光束係一具有真空紫外光波長範圍内之特 定波長的光束》 10·如申請專利範圍第3或4項之光學特性復原方法,其中形 92980-1000520.doc 1356439 11 成該光路徑的光束係一具有高光子能量的真空紫外光。 如申請專利範圍第4項之光學特性復原方法,其中當該含 氧原子氣體為氧氣時,氣體分壓的下限與上限間的範圍 係設在 0.02 mtorr-20 mtorr之間。 12. 如申請專利範圍第4項之光學特性復原方法,其中當該含 氧原子氣體為水蒸氣時,氣體分壓的下限與上限間的範 圍係设在 0.005 mtorr-20 mtorr之間。 13. 一種包括氟化物化合物的光學系統,其曝露在真空紫外 光或電漿光中的環境中,其光子能量高於該光學系統之 基本母體的吸收波長, 該光學系統包括由位於該近真空區域邊界處的複數個 透光部件或複數個反光部件所構成之光學元件,位於該 真空區域之光路徑中的繞射、折射、頻譜生成、透射及 繞射位置調整用光學元件,藉由照射光進行表面處理之 光學物體,及該等光學元件或光學物體之位置調整機構 或保持機構 '容器、密封材料, 其中至少於該光學系統之光照射側(内側)上形成一膜 厚度為2-20 nm的Si〇2或金屬氧化物保護膜,以防止該等 氟原子因照射光而從該光學系統的表面剝離。 14. 一種包括氤化物化合物的光學系統,其曝露在真空紫外 光或電漿光中的環境中’其光子能量高於該光學系統之 基本母體的吸收波長, 該光學系統包括由位於該近真空區域邊界處的複數個 透光部件或複數個反光部件所構成之光學元件,位於該 92980-1000520.doc 丄 *356439 真空區域之光路徑中的繞射、折射、頻譜生成、透射及 繞射位置調整用光學元件,藉由照射光進行表面處理之 光學物體,及該等光學元件或光學物體之位置調整機構 或保持機構、容器、密封材料, 其中至少於該光學系統之光照射側(内側)上形成一膜 厚度為2-20 11„1的以〇2或金屬氧化物保護膜,以防止該光 學系統的表面因照射光而發生氧化。 15· 一種包括氟化物的光學系統,其在具有電漿存在之内部空 間的光學裝置中面對曝露於電漿之位置而配置, 該光學系統包括由位於該近真空區域邊界處的複數個 透光部件或複數個反光部件所構成之光學元件,位於該 真空區域之光路徑中的繞射、折射、頻譜生成、透射及 繞射位置調整用光學元件,藉由照射光進行表面處理之 光學物體’及該等光學元件或光學物體之位置調整機構 或保持機構、容器、密封材料, 其中在曝露於該電漿的表面上形成一由電聚耐性較該 敦化物高的材料所組成的2 nm-20 nm的保護膜。 16. 如申請專利範圍第丨3至丨5項中任一項之光學系統其中 該光學系統係由單晶氟化物材料所組成,其晶軸㈠軸)係 沿著該光照射的方向,且在與晶軸垂直之面形成Si〇2或金 屬氧化物保護膜。 17. 如申請專利範圍第丨3至丨5項中任一項之光學系統,其中 該金屬氧化物保護膜係從Al2〇3、MgO、TiCh、Zr02中所 選出的。 92980-1000520.doc 1356439 18.如申請專利範圍第16項之光學系統,其中該金屬氧化物 保護膜係從A12〇3、MgO、Ti02、Zr〇2中所選出的。 19·如申請專利範圍第13至15項中任一項之光學系統,其中 該保護膜係由離子束濺鍍法或電漿CVD法所形成的。 20. 如申請專利範圍第16項之光學系統,其中該保護膜係由 離子束濺鍍法或電漿CVD法所形成的。 21. 如申請專利範圍第17項之光學系統’其中該保護膜係由 離子束濺鍍法或電漿CVD法所形成的》 22·如申請專利範圍第丨8項之光學系統,其中該保護膜係由 離子束濺鍍法或電漿CVD法所形成的。 23. —種使用一光學裝置的方法,其包括步驟如下: 事先於.光學系統上塗敷一由從Si〇2或a 1 203、MgO、Ti02 、Zr〇2中選出的金屬氧化物組成之2 nm-20 nm的保護膜, 其中该膜會抑制基本母體因真空紫外光照射或曝露於電 槳·造成基本母體結構元素從該基本母體表面剝離或基本 母體表面氧化所致經時劣化;以及 將泫光學系統併入一存在真空紫外光源或電漿光源之 目的裝置_使用,該真空紫外光源或電漿光源所具有的 光子能量高於該光學系統之基本母體的吸收波長。 24. 如申請專利範圍第23項之使用一光學裝置的方法,其中 忒等光源會提供足夠的光輸出來補償因該保護膜而造成 該光學系統的透射率初始劣化,而且該光學系統配置於 該光源之光學路徑之上,用以於初始劣化之後抑制光學 特性之劣化。 92980-1000520.doc1356439 | 0 card * loan ^ 0 曰 Amendment 093112330 Patent application Chinese patent application scope replacement (May 100) Ten, patent application scope: An optical property restoration device, by preventing, suppressing, or improving Reliability in the output light or in the optical path of the output light to improve the optical characteristics of the optical system, wherein the optical system is located in a near vacuum region where an organic component can be decomposed - the degradation is due to deposition or accumulation In the illumination of the optical system: the surface, the light reflecting surface, the light emitting surface (referred to as the "light emitting surface"), and the surfaces are facing the vacuum region, the characteristic restoring device comprises: For generating a near vacuum region, which is capable of exciting an oxidation reaction of carbon in the presence of active energy, the near vacuum region being facing a light emitting surface of the optical system; a member for generating a 0H basis in the near vacuum region Unstable chemical species containing oxygen atoms such as lumps, oH-ions, ozone, 02-ions, ruthenium-groups; a component promotes in the near vacuum region Between the oxygen atom and other labile chemical species with the oxidation reaction of carbon; and wherein the restoration means removes the optical properties or reduce the accumulation of carbon deposited on the light emitting surface by the oxidation reaction. 2. An optical property restoring device that improves the reliability and lifetime of optical properties of an optical system by preventing, suppressing, or improving the optical characteristics of an optical system located in or outputting an optical path of the output light. The optical system is located in a near vacuum region in which an organic component can be decomposed. The metamorphosis is deposited or accumulated on the light-illuminating surface, the light-reflecting surface, and the light-emitting surface (referred to as a "light-emitting surface") of the optical system. The optical property recovery device includes: a member for generating a near vacuum region to excite an oxidation reaction of carbon, the near vacuum region being oriented, and the surface of the surface is oriented to the vacuum region. The light emitting surface of the optical system; a member for generating water vapor, oxygen, hydrogen peroxide, ozone, or a mixed gas of the gas and the inert gas (including air) in the near vacuum region a gas stream; a component supplies active energy in the near vacuum region to cause the water, oxygen, hydrogen peroxide, ozone, or the Oxidizing a reactant gas and an inert gas (including air containing) between the mixed gas and carbon; and wherein the optical characteristic of the accumulated carbon will be removed by the restoration means or oxidation reduction reaction is deposited on the surface of the light emitting. An optical property restoration (4) 'improving the reliability and lifetime of the optical characteristics of an optical system by preventing, suppressing, or improving the optical characteristics of an optical system located in or out of the optical path of the output light, wherein the optical The system is located in a near vacuum region where an organic component can be decomposed, the degradation being due to carbon deposited or accumulated on the light-irradiating surface, the light-reflecting surface, and the light-emitting surface (referred to as the "light-emitting surface") of the optical system. And the surface is oriented to the vacuum region, the optical property recovery method comprising the steps of: generating a near vacuum region that excites an oxidation reaction of carbon in the presence of active energy, the near vacuum region facing the optical system An illuminating surface; an unstable chemical species containing an oxygen atom such as a 0H group, an oh-ion, an ozone, a 〇2-92980-1000520.doc 1356439 ion, an ο- group, etc. in the near vacuum region; Removing or reducing deposition on the luminescent surface by reacting the deposited carbon with the unstable chemical species of the oxygen-containing atoms Carbon deposits. The light characteristic recovery method improves the reliability and lifetime of the optical characteristics of the optical system by preventing, suppressing, or improving the optical characteristics of the optical system located in the pulverized light or in the optical path of the output light, wherein The optical system is located in a near vacuum region where the organic component can be decomposed. The degradation is due to carbon deposited or accumulated on the light-irradiating surface, the light-reflecting surface, and the light-emitting surface (referred to as the "light-emitting surface") of the optical system. The optical property restoring method comprises the steps of: generating a near vacuum region, exciting an oxidation reaction of carbon in the presence of active energy, wherein the near vacuum region faces the optical system And the supply of active energy 'while supplying a gas stream containing oxygen atom gas to the near vacuum region to remove or reduce accumulated carbon deposited on the light emitting surface, wherein the oxygen atomic gas system Water vapor, I, peroxygen gas Φ, ozone, or such gases and inert gases (including air in Inside) a mixture of gases. 5. The optical property recovery method according to claim 3, wherein the beam forming the light path is ordinary ultraviolet light having a wavelength of 38 〇 or less or vacuum ultraviolet light having a wavelength of 200 nm or less, and is used for The optical system that outputs the ultraviolet light or is located in the optical path of the output light is an optical material comprising one of: or a combination thereof: fluoride (eg, fluorinated 92980-I 〇〇〇 520doc 1356439 magnesium, fluorine) Calcium, barium fluoride, aluminum fluoride, cryolite, Thi〇Hte or other fluoride compounds), metal fluorides (such as barium fluoride, uranium fluoride fluoride, barium fluoride) or high purity oxides (eg synthetic quartz glass or sapphire). 6. The optical property recovery method according to claim 4, wherein in the case where the carbon generated by decomposing the organic component in the near vacuum region has grown on the surface of the optical system and the opposite surface, the The lower limit of the partial pressure of the oxygen-containing atom gas supplied to the near-vacuum region is set to be higher than the rate of carbon growth. 7. The optical property recovery method of claim 4, wherein in the case where the vacuum ultraviolet light is irradiated to or irradiated by the optical system to restore the optical characteristics of the optical system, The upper limit of the partial pressure of the oxygen-containing atom gas supplied to the near-vacuum region is set lower than the absorption of the vacuum ultraviolet light by the oxygen-containing atomic gas, and the function is performed in the near-vacuum region. The degree can not be ignored below. 8. The optical property recovery method according to claim 7, wherein the upper limit value of the partial pressure of the oxygen-containing atomic gas is set to a certain value by actually filling a partial vacuum region by a specific partial pressure of the oxygen-containing atomic gas. To a certain extent, the amount of vacuum ultraviolet light on the light path is then measured to check the degree of attenuation. 9. The optical characteristic recovery method according to claim 3, wherein the light beam forming the light path is a light beam having a specific wavelength within a wavelength range of vacuum ultraviolet light. 10 as claimed in claim 3 or 4 The optical property recovery method, wherein the beam of the light path is a vacuum ultraviolet light having a high photon energy. For example, in the optical property recovery method of claim 4, when the oxygen atom-containing gas is oxygen, the range between the lower limit and the upper limit of the partial pressure of the gas is set to be between 0.02 mtorr and 20 mtorr. 12. The optical property recovery method according to claim 4, wherein when the oxygen atom-containing gas is water vapor, the range between the lower limit and the upper limit of the partial pressure of the gas is set between 0.005 mtorr and 20 mtorr. 13. An optical system comprising a fluoride compound exposed to an environment of vacuum ultraviolet light or plasma light having a photon energy higher than an absorption wavelength of a basic matrix of the optical system, the optical system comprising being located in the near vacuum An optical element composed of a plurality of light transmissive members or a plurality of light reflecting members at a boundary of the region, an optical element for diffraction, refraction, spectrum generation, transmission, and diffraction position adjustment in the light path of the vacuum region, by irradiation An optical object that is surface-treated, and a position adjusting mechanism or a holding mechanism of the optical element or optical object, a container, a sealing material, wherein at least a film thickness of 2 is formed on a light-irradiating side (inside) of the optical system A 20 nm Si〇2 or metal oxide protective film prevents the fluorine atoms from being peeled off from the surface of the optical system by the irradiation of light. 14. An optical system comprising a telluride compound exposed to an environment of vacuum ultraviolet light or plasma light having a photon energy higher than an absorption wavelength of a basic matrix of the optical system, the optical system comprising being located in the near vacuum An optical element consisting of a plurality of light transmissive members or a plurality of light reflecting members at a boundary of the region, in the optical path of the vacuum region of 92980-1000520.doc 丄*356439, diffraction, refraction, spectrum generation, transmission, and diffraction position An optical element for conditioning, an optical object surface-treated by irradiation of light, and a position adjusting mechanism or a holding mechanism, a container, and a sealing material of the optical element or the optical object, wherein at least the light-irradiating side (inside) of the optical system A ruthenium 2 or metal oxide protective film having a film thickness of 2-20 11 „1 is formed thereon to prevent oxidation of the surface of the optical system by irradiation of light. 15. An optical system including fluoride having The optical device in which the internal space of the plasma exists is disposed facing the position exposed to the plasma, and the optical system includes An optical element composed of a plurality of light transmissive members or a plurality of light reflecting members at a boundary of a vacuum region, an optical element for diffracting, refraction, spectrum generation, transmission, and diffraction position adjustment in a light path of the vacuum region, An optical object' surface-treated by irradiated light and a position adjusting mechanism or a holding mechanism, a container, and a sealing material of the optical element or the optical object, wherein a surface formed on the surface of the plasma is formed by electroforming resistance An optical system of any of the materials of the present invention, wherein the optical system is composed of a single crystal fluoride material, The crystal axis (one) axis is along the direction in which the light is irradiated, and a Si〇2 or metal oxide protective film is formed on a surface perpendicular to the crystal axis. 17. As in any of claims 丨3 to 丨5 The optical system of the item, wherein the metal oxide protective film is selected from the group consisting of Al2〇3, MgO, TiCh, Zr02. 92980-1000520.doc 1356439 18. The optical system of claim 16 of the patent application, The optical oxide protective film is selected from the group consisting of A12〇3, MgO, TiO2, and Zr〇2. The optical system according to any one of claims 13 to 15, wherein the protective film is The optical system of the invention of claim 16 wherein the protective film is formed by ion beam sputtering or plasma CVD. The optical system of claim 17 wherein the protective film is formed by an ion beam sputtering method or a plasma CVD method. [22] The optical system of claim 8 wherein the protective film is Formed by ion beam sputtering or plasma CVD. 23. A method of using an optical device comprising the steps of: coating an optical system consisting of a metal oxide selected from Si 〇 2 or a 1 203, MgO, TiO 2 , and Zr 〇 2 a protective film of nm-20 nm, wherein the film inhibits deterioration of the basic matrix due to vacuum ultraviolet light exposure or exposure to the electric paddle, causing the basic parent structural element to be peeled off from the base matrix surface or substantially oxidized on the surface of the parent substrate; The xenon optical system incorporates a device having the purpose of a vacuum ultraviolet light source or a plasma light source having a photon energy higher than the absorption wavelength of the basic matrix of the optical system. 24. The method of using an optical device according to claim 23, wherein the light source such as helium provides sufficient light output to compensate for initial deterioration of transmittance of the optical system due to the protective film, and the optical system is disposed on Above the optical path of the light source, to suppress degradation of optical characteristics after initial degradation. 92980-1000520.doc
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