JP4338922B2 - 超低屈折率反射防止膜の作製方法及びこの超低屈折率反射防止膜を用いたディスプレイ用窓材 - Google Patents
超低屈折率反射防止膜の作製方法及びこの超低屈折率反射防止膜を用いたディスプレイ用窓材 Download PDFInfo
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- JP4338922B2 JP4338922B2 JP2001359178A JP2001359178A JP4338922B2 JP 4338922 B2 JP4338922 B2 JP 4338922B2 JP 2001359178 A JP2001359178 A JP 2001359178A JP 2001359178 A JP2001359178 A JP 2001359178A JP 4338922 B2 JP4338922 B2 JP 4338922B2
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- Prior art keywords
- refractive index
- film
- antireflection film
- window material
- low refractive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
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- 239000000463 material Substances 0.000 title claims description 36
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000758 substrate Substances 0.000 claims description 29
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 claims description 10
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 6
- UQEAIHBTYFGYIE-UHFFFAOYSA-N hexamethyldisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)C UQEAIHBTYFGYIE-UHFFFAOYSA-N 0.000 claims description 5
- 238000000034 method Methods 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 3
- 239000010408 film Substances 0.000 description 66
- 239000010410 layer Substances 0.000 description 15
- 239000011521 glass Substances 0.000 description 14
- 239000010409 thin film Substances 0.000 description 13
- 238000010304 firing Methods 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 7
- 239000007789 gas Substances 0.000 description 6
- 238000011282 treatment Methods 0.000 description 5
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000004965 Silica aerogel Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Images
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
Landscapes
- Electroluminescent Light Sources (AREA)
- Surface Treatment Of Glass (AREA)
- Silicon Compounds (AREA)
- Formation Of Insulating Films (AREA)
- Photovoltaic Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359178A JP4338922B2 (ja) | 2001-11-26 | 2001-11-26 | 超低屈折率反射防止膜の作製方法及びこの超低屈折率反射防止膜を用いたディスプレイ用窓材 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359178A JP4338922B2 (ja) | 2001-11-26 | 2001-11-26 | 超低屈折率反射防止膜の作製方法及びこの超低屈折率反射防止膜を用いたディスプレイ用窓材 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003158125A JP2003158125A (ja) | 2003-05-30 |
| JP2003158125A5 JP2003158125A5 (https=) | 2005-05-12 |
| JP4338922B2 true JP4338922B2 (ja) | 2009-10-07 |
Family
ID=19170233
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001359178A Expired - Fee Related JP4338922B2 (ja) | 2001-11-26 | 2001-11-26 | 超低屈折率反射防止膜の作製方法及びこの超低屈折率反射防止膜を用いたディスプレイ用窓材 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4338922B2 (https=) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4564364B2 (ja) * | 2004-01-19 | 2010-10-20 | 株式会社 日立ディスプレイズ | 有機エレクトロルミネッセンス表示装置とその製造方法 |
| JP5002135B2 (ja) * | 2005-06-16 | 2012-08-15 | 株式会社アルバック | 超低屈折率膜の作製方法 |
| JP5004461B2 (ja) * | 2005-11-17 | 2012-08-22 | 株式会社アルバック | 多孔質シリカ膜の形成方法 |
| JP5660750B2 (ja) * | 2008-04-09 | 2015-01-28 | 東京応化工業株式会社 | 拡散層の形成方法及び不純物拡散方法 |
| MY192479A (en) | 2008-10-17 | 2022-08-23 | Showa Denko Materials Co Ltd | Film having low refractive index film and method for producing the same, anti-reflection film and method for producing the same, coating liquid set for low refractive index film, substrate having microparticle-laminated thin film and method for producing the same, and optical member |
| CN116811232B (zh) * | 2023-06-26 | 2025-08-26 | 武汉大学 | 一种主动调控角度的Kirigami结构VO2智能窗及其搭设方法和应用 |
-
2001
- 2001-11-26 JP JP2001359178A patent/JP4338922B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2003158125A (ja) | 2003-05-30 |
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