JP4309751B2 - フォトマスク修復方法 - Google Patents

フォトマスク修復方法 Download PDF

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Publication number
JP4309751B2
JP4309751B2 JP2003409607A JP2003409607A JP4309751B2 JP 4309751 B2 JP4309751 B2 JP 4309751B2 JP 2003409607 A JP2003409607 A JP 2003409607A JP 2003409607 A JP2003409607 A JP 2003409607A JP 4309751 B2 JP4309751 B2 JP 4309751B2
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JP
Japan
Prior art keywords
photomask
laser beam
laser light
repair method
defect
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Expired - Fee Related
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JP2003409607A
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English (en)
Japanese (ja)
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JP2004157548A5 (enExample
JP2004157548A (ja
Inventor
勝樹 大橋
広 井上
明 小野
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Toshiba Corp
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Toshiba Corp
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Priority to JP2003409607A priority Critical patent/JP4309751B2/ja
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Publication of JP2004157548A5 publication Critical patent/JP2004157548A5/ja
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Publication of JP4309751B2 publication Critical patent/JP4309751B2/ja
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  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP2003409607A 1997-06-27 2003-12-08 フォトマスク修復方法 Expired - Fee Related JP4309751B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003409607A JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP17169597 1997-06-27
JP2003409607A JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP17830098A Division JPH1172905A (ja) 1997-06-27 1998-06-25 フォトマスク修復方法、検査方法、検査装置及びフォトマスク製造方法

Publications (3)

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JP2004157548A JP2004157548A (ja) 2004-06-03
JP2004157548A5 JP2004157548A5 (enExample) 2005-09-22
JP4309751B2 true JP4309751B2 (ja) 2009-08-05

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ID=32827198

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003409607A Expired - Fee Related JP4309751B2 (ja) 1997-06-27 2003-12-08 フォトマスク修復方法

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JP (1) JP4309751B2 (enExample)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4309752B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法
US6849363B2 (en) 1997-06-27 2005-02-01 Kabushiki Kaisha Toshiba Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device
JP2009168524A (ja) * 2008-01-11 2009-07-30 Toshiba Corp 光学系、パターン検査装置、パターンの検査方法、パターンを有する物品の製造方法
JP6345431B2 (ja) * 2014-02-03 2018-06-20 株式会社ニューフレアテクノロジー 照明装置及びパターン検査装置
JP6768622B2 (ja) * 2017-09-28 2020-10-14 株式会社ニューフレアテクノロジー 検査方法および検査装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPH01114035A (ja) * 1987-10-28 1989-05-02 Hitachi Ltd 露光装置
DE69208413T2 (de) * 1991-08-22 1996-11-14 Kla Instr Corp Gerät zur automatischen Prüfung von Photomaske
US5668887A (en) * 1992-05-29 1997-09-16 Eastman Kodak Company Coating density analyzer and method using non-synchronous TDI camera
JP4309752B2 (ja) * 1997-06-27 2009-08-05 株式会社東芝 フォトマスク検査方法、フォトマスク検査装置及びフォトマスク製造方法

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Publication number Publication date
JP2004157548A (ja) 2004-06-03

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