JP4308564B2 - プラズマ処理装置及びプラズマ処理用トレー - Google Patents

プラズマ処理装置及びプラズマ処理用トレー Download PDF

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Publication number
JP4308564B2
JP4308564B2 JP2003104066A JP2003104066A JP4308564B2 JP 4308564 B2 JP4308564 B2 JP 4308564B2 JP 2003104066 A JP2003104066 A JP 2003104066A JP 2003104066 A JP2003104066 A JP 2003104066A JP 4308564 B2 JP4308564 B2 JP 4308564B2
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Japan
Prior art keywords
substrate
adhesive sheet
tray
plasma processing
vacuum chamber
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Expired - Fee Related
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JP2003104066A
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Japanese (ja)
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JP2004006300A (ja
JP2004006300A5 (enExample
Inventor
智洋 奥村
敏也 新田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Corp
Panasonic Holdings Corp
Original Assignee
Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2003104066A priority Critical patent/JP4308564B2/ja
Publication of JP2004006300A publication Critical patent/JP2004006300A/ja
Publication of JP2004006300A5 publication Critical patent/JP2004006300A5/ja
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Publication of JP4308564B2 publication Critical patent/JP4308564B2/ja
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JP2003104066A 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー Expired - Fee Related JP4308564B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003104066A JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2002106164 2002-04-09
JP2003104066A JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

Publications (3)

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JP2004006300A JP2004006300A (ja) 2004-01-08
JP2004006300A5 JP2004006300A5 (enExample) 2006-04-20
JP4308564B2 true JP4308564B2 (ja) 2009-08-05

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JP2003104066A Expired - Fee Related JP4308564B2 (ja) 2002-04-09 2003-04-08 プラズマ処理装置及びプラズマ処理用トレー

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JP (1) JP4308564B2 (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100739890B1 (ko) * 2003-05-02 2007-07-13 동경 엘렉트론 주식회사 처리가스도입기구 및 플라즈마 처리장치
JP4622764B2 (ja) * 2005-09-15 2011-02-02 パナソニック株式会社 プラズマ処理方法
JP5131762B2 (ja) * 2008-05-09 2013-01-30 サムコ株式会社 プラズマ処理方法及びプラズマ処理装置並びにプラズマ処理用トレイ
JP4709945B2 (ja) * 2009-04-13 2011-06-29 パナソニック株式会社 プラズマ処理装置及びプラズマ処理方法
WO2012077071A1 (en) * 2010-12-08 2012-06-14 Oc Oerlikon Balzers Ag Apparatus and method for depositing a layer onto a substrate
JP7002302B2 (ja) * 2016-12-13 2022-02-10 芝浦メカトロニクス株式会社 成膜装置

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JP2004006300A (ja) 2004-01-08

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