JP4300509B2 - 投影光学系、露光装置、および露光方法 - Google Patents

投影光学系、露光装置、および露光方法 Download PDF

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Publication number
JP4300509B2
JP4300509B2 JP2003003867A JP2003003867A JP4300509B2 JP 4300509 B2 JP4300509 B2 JP 4300509B2 JP 2003003867 A JP2003003867 A JP 2003003867A JP 2003003867 A JP2003003867 A JP 2003003867A JP 4300509 B2 JP4300509 B2 JP 4300509B2
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Japan
Prior art keywords
lens group
optical system
projection optical
lens
concave surface
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Expired - Fee Related
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Japanese (ja)
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JP2004219501A5 (enExample
JP2004219501A (ja
Inventor
幸二 重松
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Nikon Corp
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Nikon Corp
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  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2003003867A 2003-01-10 2003-01-10 投影光学系、露光装置、および露光方法 Expired - Fee Related JP4300509B2 (ja)

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JP2003003867A JP4300509B2 (ja) 2003-01-10 2003-01-10 投影光学系、露光装置、および露光方法

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JP2003003867A JP4300509B2 (ja) 2003-01-10 2003-01-10 投影光学系、露光装置、および露光方法

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JP2004219501A JP2004219501A (ja) 2004-08-05
JP2004219501A5 JP2004219501A5 (enExample) 2008-02-28
JP4300509B2 true JP4300509B2 (ja) 2009-07-22

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Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (ko) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
CN102662307B (zh) * 2012-05-02 2014-03-12 中国科学院光电技术研究所 一种高分辨率投影光学系统
CN103278912B (zh) * 2013-06-19 2015-07-08 中国科学院光电技术研究所 一种折反式紫外光刻物镜
CN119758567B (zh) * 2025-03-10 2025-05-16 长春智冉光电科技有限公司 一种多波段紫外光学镜头

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