JP4298547B2 - 位置決め装置およびそれを用いた露光装置 - Google Patents

位置決め装置およびそれを用いた露光装置 Download PDF

Info

Publication number
JP4298547B2
JP4298547B2 JP2004056225A JP2004056225A JP4298547B2 JP 4298547 B2 JP4298547 B2 JP 4298547B2 JP 2004056225 A JP2004056225 A JP 2004056225A JP 2004056225 A JP2004056225 A JP 2004056225A JP 4298547 B2 JP4298547 B2 JP 4298547B2
Authority
JP
Japan
Prior art keywords
stage
movement stage
magnetic plate
fine movement
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004056225A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005251788A (ja
JP2005251788A5 (enExample
Inventor
英雄 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2004056225A priority Critical patent/JP4298547B2/ja
Priority to US11/056,287 priority patent/US7333180B2/en
Publication of JP2005251788A publication Critical patent/JP2005251788A/ja
Publication of JP2005251788A5 publication Critical patent/JP2005251788A5/ja
Application granted granted Critical
Publication of JP4298547B2 publication Critical patent/JP4298547B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Linear Motors (AREA)
JP2004056225A 2004-03-01 2004-03-01 位置決め装置およびそれを用いた露光装置 Expired - Fee Related JP4298547B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2004056225A JP4298547B2 (ja) 2004-03-01 2004-03-01 位置決め装置およびそれを用いた露光装置
US11/056,287 US7333180B2 (en) 2004-03-01 2005-02-14 Positioning apparatus and exposure apparatus using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004056225A JP4298547B2 (ja) 2004-03-01 2004-03-01 位置決め装置およびそれを用いた露光装置

Publications (3)

Publication Number Publication Date
JP2005251788A JP2005251788A (ja) 2005-09-15
JP2005251788A5 JP2005251788A5 (enExample) 2007-04-12
JP4298547B2 true JP4298547B2 (ja) 2009-07-22

Family

ID=34917908

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004056225A Expired - Fee Related JP4298547B2 (ja) 2004-03-01 2004-03-01 位置決め装置およびそれを用いた露光装置

Country Status (2)

Country Link
US (1) US7333180B2 (enExample)
JP (1) JP4298547B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100773545B1 (ko) * 2006-02-15 2007-11-06 삼성전자주식회사 로킹장치를 구비한 ｘ-ｙ스테이지 구동장치와, 이를 채용한정보저장기기
JP2008153546A (ja) * 2006-12-19 2008-07-03 Canon Inc 移動体機構
JP5013941B2 (ja) * 2007-04-19 2012-08-29 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
JP2009016385A (ja) * 2007-06-29 2009-01-22 Canon Inc ステージ装置、露光装置及びデバイス製造方法
US8815575B2 (en) 2007-09-21 2014-08-26 Wisconsin Alumni Research Foundation Stepping optical reduction system
NL1036735A1 (nl) 2008-04-10 2009-10-13 Asml Holding Nv Shear-layer chuck for lithographic apparatus.
NL2003877A (en) 2009-02-05 2010-08-09 Asml Holding Nv Reticle support that reduces reticle slippage.
NL2005062A (en) * 2009-08-12 2011-02-15 Asml Netherlands Bv A positioning system and a method for positioning a substage with respect to a frame.
JP5849955B2 (ja) * 2010-09-07 2016-02-03 株式会社ニコン 移動体装置、露光装置、露光方法、フラットパネルディスプレイの製造方法、及びデバイス製造方法
CN102566293B (zh) * 2010-12-30 2015-04-15 上海微电子装备有限公司 二维长行程工作台运动系统
CN103376667B (zh) * 2012-04-20 2015-08-26 上海微电子装备有限公司 一种用于曝光装置的掩模台
US9377700B2 (en) 2012-06-01 2016-06-28 Asml Holding N.V. Determining position and curvature information directly from a surface of a patterning device
CN105470181B (zh) * 2014-09-10 2019-02-19 北京北方华创微电子装备有限公司 一种遮蔽盘传输装置及反应腔室
CN105485481B (zh) * 2015-12-20 2018-01-16 华南理工大学 一种位移可调节精密定位平台
CN106444294B (zh) * 2016-10-17 2018-05-11 上海华力集成电路制造有限公司 一种掩膜版固定系统
TWI797114B (zh) * 2017-03-31 2023-04-01 日商尼康股份有限公司 移動體裝置、曝光裝置、平板顯示器的製造方法、元件製造方法以及移動體的驅動方法
JP2025517618A (ja) * 2022-05-12 2025-06-10 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のための可動式ステージ

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3484684B2 (ja) * 1994-11-01 2004-01-06 株式会社ニコン ステージ装置及び走査型露光装置
JPH09180989A (ja) * 1995-12-26 1997-07-11 Toshiba Corp 露光装置および露光方法
US6130517A (en) * 1998-02-12 2000-10-10 Nikon Corporation Magnetic actuator producing large acceleration on fine stage and low RMS power gain
JP3745167B2 (ja) * 1998-07-29 2006-02-15 キヤノン株式会社 ステージ装置、露光装置およびデバイス製造方法ならびにステージ駆動方法
JP2003059797A (ja) * 2001-08-09 2003-02-28 Canon Inc 移動装置、ステージ装置及び露光装置
JP4366031B2 (ja) * 2001-09-17 2009-11-18 キヤノン株式会社 位置検出装置及び方法並びに露光装置、デバイスの製造方法

Also Published As

Publication number Publication date
US7333180B2 (en) 2008-02-19
US20050200827A1 (en) 2005-09-15
JP2005251788A (ja) 2005-09-15

Similar Documents

Publication Publication Date Title
JP4298547B2 (ja) 位置決め装置およびそれを用いた露光装置
US7087906B2 (en) Bellows with spring anti-gravity device
US6870600B2 (en) Vibration-attenuation devices and methods using pressurized bellows exhibiting substantially zero lateral stiffness
JP4194383B2 (ja) リニアモータ
JP2007103657A (ja) 光学素子保持装置、露光装置およびデバイス製造方法
EP1457834A2 (en) Positioning apparatus, exposure apparatus and method for producing device
JP3155936B2 (ja) リニアモータとステージ装置及びこれを用いた走査型露光装置やデバイス製造方法
JP4307288B2 (ja) 位置決め装置
US7880864B2 (en) Stage apparatus, exposure apparatus, and device manufacturing method
JP2005046941A (ja) ケーブル微動ユニット付きステージ装置
US7126674B2 (en) Positioning device and device manufacturing method
KR20120091160A (ko) 노광 장치, 노광 방법, 및 디바이스 제조 방법
JP2002033270A (ja) ガイドレスステージ
JP4566697B2 (ja) 位置決め装置およびそれを用いた露光装置、デバイス製造方法
US7157722B2 (en) Positioning device and method of initializing a positioning device
JP6228878B2 (ja) リソグラフィ装置およびデバイス製造方法
JP4528260B2 (ja) リソグラフィ装置およびアクチュエータ
US20070268475A1 (en) System and method for controlling a stage assembly
JP2005295762A (ja) ステージ装置および露光装置
JP2004134456A (ja) 移動装置及び露光装置並びにデバイスの製造方法
US7034474B2 (en) Auto-calibration of attraction-only type actuator commutations
JP2004281654A (ja) 駆動機構及びそれを用いた露光装置、デバイスの製造方法
JP2007258356A (ja) ステージ装置
JP4541849B2 (ja) 位置決め装置
JP4653189B2 (ja) リニアモータ製造方法

Legal Events

Date Code Title Description
A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20070228

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20070228

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080528

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080603

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080731

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090407

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090415

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120424

Year of fee payment: 3

LAPS Cancellation because of no payment of annual fees