JP4298049B2 - 誘電体窓を用いたマイクロ波プラズマ処理装置 - Google Patents

誘電体窓を用いたマイクロ波プラズマ処理装置 Download PDF

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Publication number
JP4298049B2
JP4298049B2 JP09662899A JP9662899A JP4298049B2 JP 4298049 B2 JP4298049 B2 JP 4298049B2 JP 09662899 A JP09662899 A JP 09662899A JP 9662899 A JP9662899 A JP 9662899A JP 4298049 B2 JP4298049 B2 JP 4298049B2
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plasma processing
microwave
plasma
processing chamber
substrate
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Japanese (ja)
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JP2000294548A (ja
JP2000294548A5 (enExample
Inventor
伸昌 鈴木
学 松尾
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Canon Inc
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Canon Inc
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  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP09662899A 1999-04-02 1999-04-02 誘電体窓を用いたマイクロ波プラズマ処理装置 Expired - Fee Related JP4298049B2 (ja)

Priority Applications (1)

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JP09662899A JP4298049B2 (ja) 1999-04-02 1999-04-02 誘電体窓を用いたマイクロ波プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP09662899A JP4298049B2 (ja) 1999-04-02 1999-04-02 誘電体窓を用いたマイクロ波プラズマ処理装置

Publications (3)

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JP2000294548A JP2000294548A (ja) 2000-10-20
JP2000294548A5 JP2000294548A5 (enExample) 2008-02-14
JP4298049B2 true JP4298049B2 (ja) 2009-07-15

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JP09662899A Expired - Fee Related JP4298049B2 (ja) 1999-04-02 1999-04-02 誘電体窓を用いたマイクロ波プラズマ処理装置

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JP (1) JP4298049B2 (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3485896B2 (ja) * 2000-07-11 2004-01-13 東京エレクトロン株式会社 プラズマ処理装置
JP2002299240A (ja) * 2001-03-28 2002-10-11 Tadahiro Omi プラズマ処理装置
JP4386832B2 (ja) * 2002-05-24 2009-12-16 ショット アクチエンゲゼルシャフト Ｃｖｄコーティング用の回転装置
JP4563729B2 (ja) 2003-09-04 2010-10-13 東京エレクトロン株式会社 プラズマ処理装置
CN100492591C (zh) * 2003-09-04 2009-05-27 东京毅力科创株式会社 等离子处理装置
JP4775641B2 (ja) * 2006-05-23 2011-09-21 株式会社島津製作所 ガス導入装置
JP5653397B2 (ja) * 2012-08-23 2015-01-14 株式会社日立パワーソリューションズ マイクロ波加熱装置

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