JP4276711B2 - 半導体製造装置制御システム - Google Patents

半導体製造装置制御システム Download PDF

Info

Publication number
JP4276711B2
JP4276711B2 JP00025598A JP25598A JP4276711B2 JP 4276711 B2 JP4276711 B2 JP 4276711B2 JP 00025598 A JP00025598 A JP 00025598A JP 25598 A JP25598 A JP 25598A JP 4276711 B2 JP4276711 B2 JP 4276711B2
Authority
JP
Japan
Prior art keywords
event
semiconductor manufacturing
manufacturing apparatus
recipe
group management
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP00025598A
Other languages
English (en)
Japanese (ja)
Other versions
JPH11195566A5 (https=
JPH11195566A (ja
Inventor
裕幸 岩倉
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP00025598A priority Critical patent/JP4276711B2/ja
Publication of JPH11195566A publication Critical patent/JPH11195566A/ja
Publication of JPH11195566A5 publication Critical patent/JPH11195566A5/ja
Application granted granted Critical
Publication of JP4276711B2 publication Critical patent/JP4276711B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Landscapes

  • General Factory Administration (AREA)
  • Testing And Monitoring For Control Systems (AREA)
JP00025598A 1998-01-05 1998-01-05 半導体製造装置制御システム Expired - Lifetime JP4276711B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP00025598A JP4276711B2 (ja) 1998-01-05 1998-01-05 半導体製造装置制御システム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP00025598A JP4276711B2 (ja) 1998-01-05 1998-01-05 半導体製造装置制御システム

Publications (3)

Publication Number Publication Date
JPH11195566A JPH11195566A (ja) 1999-07-21
JPH11195566A5 JPH11195566A5 (https=) 2006-02-16
JP4276711B2 true JP4276711B2 (ja) 2009-06-10

Family

ID=11468823

Family Applications (1)

Application Number Title Priority Date Filing Date
JP00025598A Expired - Lifetime JP4276711B2 (ja) 1998-01-05 1998-01-05 半導体製造装置制御システム

Country Status (1)

Country Link
JP (1) JP4276711B2 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6625513B1 (en) * 2000-08-15 2003-09-23 Applied Materials, Inc. Run-to-run control over semiconductor processing tool based upon mirror image target
KR100939329B1 (ko) * 2002-01-10 2010-01-28 어드밴스드 마이크로 디바이시즈, 인코포레이티드 에이전트 기반 제어 아키텍쳐
JP4686268B2 (ja) * 2005-06-21 2011-05-25 株式会社東芝 工程制御システム、工程制御方法及び電子装置の製造方法
JP7304692B2 (ja) * 2018-12-13 2023-07-07 東京エレクトロン株式会社 基板処理方法および基板処理装置
JP7334223B2 (ja) 2021-09-24 2023-08-28 株式会社Kokusai Electric 半導体デバイスの製造方法、基板処理システム及びプログラム
CN119790487A (zh) 2022-12-26 2025-04-08 株式会社国际电气 基板处理系统、基板处理装置、半导体器件的制造方法以及程序

Also Published As

Publication number Publication date
JPH11195566A (ja) 1999-07-21

Similar Documents

Publication Publication Date Title
US6269279B1 (en) Control system
JP4276711B2 (ja) 半導体製造装置制御システム
JPH1174170A (ja) 制御システム
TWI709037B (zh) 基本輸入輸出系統設置方法
US7595467B2 (en) Fault detection system and method for managing the same
US20070083282A1 (en) Failover system and method for semiconductor manufacturing equipment
KR100614573B1 (ko) 반도체 제조공정에서 발생하는 로트 전산정보의 일관성유지 시스템 및 그 방법
JP2004259757A (ja) 成膜時間の最適化方法及び成膜時間の最適化システム
CN100440145C (zh) 程控设备中进行更新的方法和程控设备
KR100510065B1 (ko) 반도체 제조를 위한 오버레이 장비 자동화 방법
KR100533986B1 (ko) 반도체 제조공정에서의 로트 데이터 손실 자동 교정시스템 및 그 방법
JP3309434B2 (ja) Pcのプログラミング装置
JP4434461B2 (ja) 時刻管理制御システムと、その時刻管理装置及び端末装置、及びコンピュータ装置
JPH0720930A (ja) 製造管理装置とこれを用いた製造管理方法
KR20250094559A (ko) 기판 처리 장치의 제어 방법
KR100533987B1 (ko) 반도체 제조공정에서의 분할된 로트의 재작업 방법
KR100576817B1 (ko) 반도체 공정 관리 시스템의 프로그램 업-데이트 방법
JP2002108636A (ja) 修正方法および修正装置
JP2900073B2 (ja) プログラマブルコントローラシステム
JPH0721030A (ja) ローディング方法
JP2008227066A (ja) 基板処理システム
JP3220716B2 (ja) 製造処理装置の制御システム
JPH10232703A (ja) プログラマブルコントローラ
CN115789861A (zh) 压缩机重启控制方法、装置、电子设备及存储介质
CN1448985A (zh) 半导体制造系统及其制程程序控制方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20040929

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050617

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20051207

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080219

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080414

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080513

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080710

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20081202

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20090121

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20090224

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20090309

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120313

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20120313

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130313

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20130313

Year of fee payment: 4

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20140313

Year of fee payment: 5

EXPY Cancellation because of completion of term