JP4270005B2 - 孔構造体の製造方法 - Google Patents
孔構造体の製造方法 Download PDFInfo
- Publication number
- JP4270005B2 JP4270005B2 JP2004099307A JP2004099307A JP4270005B2 JP 4270005 B2 JP4270005 B2 JP 4270005B2 JP 2004099307 A JP2004099307 A JP 2004099307A JP 2004099307 A JP2004099307 A JP 2004099307A JP 4270005 B2 JP4270005 B2 JP 4270005B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- hole
- mold
- holes
- resin plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 35
- 238000000034 method Methods 0.000 title description 35
- 239000011148 porous material Substances 0.000 title 1
- 239000011347 resin Substances 0.000 claims description 89
- 229920005989 resin Polymers 0.000 claims description 89
- 238000000465 moulding Methods 0.000 claims description 13
- 238000004049 embossing Methods 0.000 claims description 9
- 238000003856 thermoforming Methods 0.000 claims description 9
- 239000010408 film Substances 0.000 description 16
- 239000006188 syrup Substances 0.000 description 12
- 235000020357 syrup Nutrition 0.000 description 12
- 239000002184 metal Substances 0.000 description 11
- 239000010409 thin film Substances 0.000 description 10
- 238000009713 electroplating Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000000919 ceramic Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 230000009477 glass transition Effects 0.000 description 3
- 238000001459 lithography Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000012530 fluid Substances 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 239000004926 polymethyl methacrylate Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 238000012719 thermal polymerization Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000009760 electrical discharge machining Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001746 injection moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
Images
Landscapes
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Casting Or Compression Moulding Of Plastics Or The Like (AREA)
Description
11 金型柱
2 樹脂シロップ
3 キャビティー
4 樹脂板
5 非貫通孔
6 薄膜部分
8 貫通孔を有する樹脂板(孔構造体)
Claims (3)
- 一方の表面にのみ開口する非貫通孔を有する樹脂板を形成する工程、及び該非貫通孔の底部に超音波を印加することにより該底部の樹脂を除去して孔を貫通させる工程を有することを特徴とする孔構造体の製造方法。
- 非貫通孔を有する樹脂板を形成する工程が、熱成形又はUV成形により行われることを特徴とする請求項1に記載の孔構造体の製造方法。
- 非貫通孔を有する樹脂板を形成する工程が、ホットエンボスにより行われることを特徴とする請求項1に記載の孔構造体の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004099307A JP4270005B2 (ja) | 2004-03-30 | 2004-03-30 | 孔構造体の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004099307A JP4270005B2 (ja) | 2004-03-30 | 2004-03-30 | 孔構造体の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2005280182A JP2005280182A (ja) | 2005-10-13 |
JP4270005B2 true JP4270005B2 (ja) | 2009-05-27 |
Family
ID=35179072
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004099307A Expired - Lifetime JP4270005B2 (ja) | 2004-03-30 | 2004-03-30 | 孔構造体の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4270005B2 (ja) |
-
2004
- 2004-03-30 JP JP2004099307A patent/JP4270005B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2005280182A (ja) | 2005-10-13 |
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