JP4253708B2 - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP4253708B2
JP4253708B2 JP2004134443A JP2004134443A JP4253708B2 JP 4253708 B2 JP4253708 B2 JP 4253708B2 JP 2004134443 A JP2004134443 A JP 2004134443A JP 2004134443 A JP2004134443 A JP 2004134443A JP 4253708 B2 JP4253708 B2 JP 4253708B2
Authority
JP
Japan
Prior art keywords
exposure
image
image data
reference function
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2004134443A
Other languages
English (en)
Japanese (ja)
Other versions
JP2005317800A (ja
JP2005317800A5 (zh
Inventor
三好 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
V Technology Co Ltd
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2004134443A priority Critical patent/JP4253708B2/ja
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Priority to CN2010102005923A priority patent/CN101846889B/zh
Priority to KR1020067022508A priority patent/KR101103155B1/ko
Priority to PCT/JP2005/008117 priority patent/WO2005106596A1/ja
Priority to TW094113749A priority patent/TWI347450B/zh
Priority to CN2005800133483A priority patent/CN1947069B/zh
Publication of JP2005317800A publication Critical patent/JP2005317800A/ja
Publication of JP2005317800A5 publication Critical patent/JP2005317800A5/ja
Application granted granted Critical
Publication of JP4253708B2 publication Critical patent/JP4253708B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2004134443A 2004-04-28 2004-04-28 露光装置 Expired - Fee Related JP4253708B2 (ja)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP2004134443A JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置
KR1020067022508A KR101103155B1 (ko) 2004-04-28 2005-04-28 노광 장치
PCT/JP2005/008117 WO2005106596A1 (ja) 2004-04-28 2005-04-28 露光装置
TW094113749A TWI347450B (en) 2004-04-28 2005-04-28 Exposing apparatus
CN2010102005923A CN101846889B (zh) 2004-04-28 2005-04-28 曝光装置
CN2005800133483A CN1947069B (zh) 2004-04-28 2005-04-28 曝光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134443A JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置

Publications (3)

Publication Number Publication Date
JP2005317800A JP2005317800A (ja) 2005-11-10
JP2005317800A5 JP2005317800A5 (zh) 2007-05-24
JP4253708B2 true JP4253708B2 (ja) 2009-04-15

Family

ID=35241832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004134443A Expired - Fee Related JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置

Country Status (5)

Country Link
JP (1) JP4253708B2 (zh)
KR (1) KR101103155B1 (zh)
CN (2) CN1947069B (zh)
TW (1) TWI347450B (zh)
WO (1) WO2005106596A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법
KR102065012B1 (ko) * 2016-07-26 2020-01-10 에이피시스템 주식회사 레이저 처리장치 및 레이저 처리방법
JP6917727B2 (ja) * 2017-02-15 2021-08-11 株式会社ディスコ レーザー加工装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法
JP2551049B2 (ja) * 1987-11-10 1996-11-06 株式会社ニコン アライメント装置
JP2797506B2 (ja) * 1989-08-31 1998-09-17 凸版印刷株式会社 露光装置
JPH03201454A (ja) * 1989-12-28 1991-09-03 Fujitsu Ltd 半導体装置の位置合わせ方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
CN1947069A (zh) 2007-04-11
KR20070001252A (ko) 2007-01-03
JP2005317800A (ja) 2005-11-10
KR101103155B1 (ko) 2012-01-04
CN1947069B (zh) 2010-09-29
WO2005106596A1 (ja) 2005-11-10
TWI347450B (en) 2011-08-21
CN101846889A (zh) 2010-09-29
TW200535453A (en) 2005-11-01
CN101846889B (zh) 2012-05-09

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