TWI347450B - Exposing apparatus - Google Patents

Exposing apparatus

Info

Publication number
TWI347450B
TWI347450B TW094113749A TW94113749A TWI347450B TW I347450 B TWI347450 B TW I347450B TW 094113749 A TW094113749 A TW 094113749A TW 94113749 A TW94113749 A TW 94113749A TW I347450 B TWI347450 B TW I347450B
Authority
TW
Taiwan
Prior art keywords
exposing apparatus
exposing
Prior art date
Application number
TW094113749A
Other languages
English (en)
Other versions
TW200535453A (en
Inventor
Ito Miyoshi
Original Assignee
V Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by V Technology Co Ltd filed Critical V Technology Co Ltd
Publication of TW200535453A publication Critical patent/TW200535453A/zh
Application granted granted Critical
Publication of TWI347450B publication Critical patent/TWI347450B/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW094113749A 2004-04-28 2005-04-28 Exposing apparatus TWI347450B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004134443A JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置

Publications (2)

Publication Number Publication Date
TW200535453A TW200535453A (en) 2005-11-01
TWI347450B true TWI347450B (en) 2011-08-21

Family

ID=35241832

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094113749A TWI347450B (en) 2004-04-28 2005-04-28 Exposing apparatus

Country Status (5)

Country Link
JP (1) JP4253708B2 (zh)
KR (1) KR101103155B1 (zh)
CN (2) CN1947069B (zh)
TW (1) TWI347450B (zh)
WO (1) WO2005106596A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI744460B (zh) * 2017-02-15 2021-11-01 日商迪思科股份有限公司 雷射加工裝置

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법
KR102065012B1 (ko) * 2016-07-26 2020-01-10 에이피시스템 주식회사 레이저 처리장치 및 레이저 처리방법

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法
JP2551049B2 (ja) * 1987-11-10 1996-11-06 株式会社ニコン アライメント装置
JP2797506B2 (ja) * 1989-08-31 1998-09-17 凸版印刷株式会社 露光装置
JPH03201454A (ja) * 1989-12-28 1991-09-03 Fujitsu Ltd 半導体装置の位置合わせ方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI744460B (zh) * 2017-02-15 2021-11-01 日商迪思科股份有限公司 雷射加工裝置

Also Published As

Publication number Publication date
CN1947069A (zh) 2007-04-11
KR20070001252A (ko) 2007-01-03
JP2005317800A (ja) 2005-11-10
JP4253708B2 (ja) 2009-04-15
KR101103155B1 (ko) 2012-01-04
CN1947069B (zh) 2010-09-29
WO2005106596A1 (ja) 2005-11-10
CN101846889A (zh) 2010-09-29
TW200535453A (en) 2005-11-01
CN101846889B (zh) 2012-05-09

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees