GB0409587D0 - Lithography apparatus - Google Patents

Lithography apparatus

Info

Publication number
GB0409587D0
GB0409587D0 GB0409587A GB0409587A GB0409587D0 GB 0409587 D0 GB0409587 D0 GB 0409587D0 GB 0409587 A GB0409587 A GB 0409587A GB 0409587 A GB0409587 A GB 0409587A GB 0409587 D0 GB0409587 D0 GB 0409587D0
Authority
GB
United Kingdom
Prior art keywords
lithography apparatus
lithography
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
GB0409587A
Other versions
GB2413645A (en
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BOC Group Ltd
Original Assignee
BOC Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BOC Group Ltd filed Critical BOC Group Ltd
Priority to GB0409587A priority Critical patent/GB2413645A/en
Publication of GB0409587D0 publication Critical patent/GB0409587D0/en
Publication of GB2413645A publication Critical patent/GB2413645A/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
GB0409587A 2004-04-29 2004-04-29 Vacuum treatment for lithography wafer Withdrawn GB2413645A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB0409587A GB2413645A (en) 2004-04-29 2004-04-29 Vacuum treatment for lithography wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB0409587A GB2413645A (en) 2004-04-29 2004-04-29 Vacuum treatment for lithography wafer

Publications (2)

Publication Number Publication Date
GB0409587D0 true GB0409587D0 (en) 2004-06-02
GB2413645A GB2413645A (en) 2005-11-02

Family

ID=32408253

Family Applications (1)

Application Number Title Priority Date Filing Date
GB0409587A Withdrawn GB2413645A (en) 2004-04-29 2004-04-29 Vacuum treatment for lithography wafer

Country Status (1)

Country Link
GB (1) GB2413645A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ATE524767T1 (en) 2007-07-20 2011-09-15 Zeiss Carl Smt Gmbh METHOD FOR TESTING A WAFER FOR A CONTAMINATION LIMIT AND EUV PROJECTION EXPOSURE SYSTEM

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2155201B (en) * 1984-02-24 1988-07-13 Canon Kk An x-ray exposure apparatus
JPH10284373A (en) * 1997-04-03 1998-10-23 Nikon Corp Charged particle beam aligner
JPH10284389A (en) * 1997-04-01 1998-10-23 Hitachi Ltd Method and system for electron beam exposure
JPH11329328A (en) * 1998-05-08 1999-11-30 Hitachi Ltd Electron beam inspection device

Also Published As

Publication number Publication date
GB2413645A (en) 2005-11-02

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Legal Events

Date Code Title Description
WAP Application withdrawn, taken to be withdrawn or refused ** after publication under section 16(1)