WO2005106596A1 - 露光装置 - Google Patents

露光装置 Download PDF

Info

Publication number
WO2005106596A1
WO2005106596A1 PCT/JP2005/008117 JP2005008117W WO2005106596A1 WO 2005106596 A1 WO2005106596 A1 WO 2005106596A1 JP 2005008117 W JP2005008117 W JP 2005008117W WO 2005106596 A1 WO2005106596 A1 WO 2005106596A1
Authority
WO
WIPO (PCT)
Prior art keywords
exposure
image
function pattern
reference function
image data
Prior art date
Application number
PCT/JP2005/008117
Other languages
English (en)
French (fr)
Japanese (ja)
Inventor
Miyoshi Ito
Original Assignee
Integrated Solutions Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Integrated Solutions Co., Ltd. filed Critical Integrated Solutions Co., Ltd.
Priority to KR1020067022508A priority Critical patent/KR101103155B1/ko
Priority to CN2005800133483A priority patent/CN1947069B/zh
Publication of WO2005106596A1 publication Critical patent/WO2005106596A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7015—Reference, i.e. alignment of original or workpiece with respect to a reference not on the original or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
PCT/JP2005/008117 2004-04-28 2005-04-28 露光装置 WO2005106596A1 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
KR1020067022508A KR101103155B1 (ko) 2004-04-28 2005-04-28 노광 장치
CN2005800133483A CN1947069B (zh) 2004-04-28 2005-04-28 曝光装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004134443A JP4253708B2 (ja) 2004-04-28 2004-04-28 露光装置
JP2004-134443 2004-04-28

Publications (1)

Publication Number Publication Date
WO2005106596A1 true WO2005106596A1 (ja) 2005-11-10

Family

ID=35241832

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2005/008117 WO2005106596A1 (ja) 2004-04-28 2005-04-28 露光装置

Country Status (5)

Country Link
JP (1) JP4253708B2 (zh)
KR (1) KR101103155B1 (zh)
CN (2) CN1947069B (zh)
TW (1) TWI347450B (zh)
WO (1) WO2005106596A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101002156B1 (ko) 2008-03-31 2010-12-17 다이니폰 스크린 세이조우 가부시키가이샤 패턴 묘화 장치 및 패턴 묘화 방법
KR102065012B1 (ko) * 2016-07-26 2020-01-10 에이피시스템 주식회사 레이저 처리장치 및 레이저 처리방법
JP6917727B2 (ja) * 2017-02-15 2021-08-11 株式会社ディスコ レーザー加工装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法
JPH01125823A (ja) * 1987-11-10 1989-05-18 Nikon Corp アライメント装置
JPH0389511A (ja) * 1989-08-31 1991-04-15 Toppan Printing Co Ltd 露光装置
JPH03201454A (ja) * 1989-12-28 1991-09-03 Fujitsu Ltd 半導体装置の位置合わせ方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6010730A (ja) * 1983-06-30 1985-01-19 Toshiba Corp 半導体ウエハの位置合わせ方法
JPH01125823A (ja) * 1987-11-10 1989-05-18 Nikon Corp アライメント装置
JPH0389511A (ja) * 1989-08-31 1991-04-15 Toppan Printing Co Ltd 露光装置
JPH03201454A (ja) * 1989-12-28 1991-09-03 Fujitsu Ltd 半導体装置の位置合わせ方法
JP2004012903A (ja) * 2002-06-07 2004-01-15 Fuji Photo Film Co Ltd 露光装置

Also Published As

Publication number Publication date
CN1947069A (zh) 2007-04-11
KR20070001252A (ko) 2007-01-03
JP2005317800A (ja) 2005-11-10
JP4253708B2 (ja) 2009-04-15
KR101103155B1 (ko) 2012-01-04
CN1947069B (zh) 2010-09-29
TWI347450B (en) 2011-08-21
CN101846889A (zh) 2010-09-29
TW200535453A (en) 2005-11-01
CN101846889B (zh) 2012-05-09

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